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1. 发明专利

JP2011228742A Optical sensor device and method of detecting euv radiation 有权
标题翻译：光传感器装置和检测EUV辐射的方法
公开(公告)号：JP2011228742A
公开(公告)日：2011-11-10
申请号：JP2011162445
申请日：2011-07-25
申请人： Asml Netherlands Bv , Koninklijke Philips Electronics Nv , エーエスエムエルネザーランズビー.ブイ. , コーニンクレッカフィリップスエレクトロニクスエヌヴィ
发明人： WILHELMUS VAN HERPEN MAARTEN MARINUS JOHANNES , BANINE VADIM YEVGENYEVICH , JOHANNES CHRISTIAAN LEONARDUS FRANKEN , OLAV WALDEMAR VLADIMIR FRIJNS , DERK JAN WILFRED KLUNDER , NIELS MACHIEL DRIESSEN , SOER WOUTER ANTHON
IPC分类号： H01L21/027 , G21K1/06 , H05G2/00
CPC分类号： G03F7/70916 , G01N21/15 , G03F7/70558
摘要： PROBLEM TO BE SOLVED: To provide an optical sensor device capable of monitoring the extent of contamination accumulated in an EUV system.SOLUTION: An optical sensor device for use in an extreme ultraviolet ray lithography system comprises an optical sensor including a sensor surface and a removing mechanism for removing debris from the sensor surface. Therefore, measurement of the dose and/or contamination can be accomplished favorably for the lithography system.
摘要翻译：要解决的问题：提供能够监测在EUV系统中累积的污染程度的光学传感器装置。解决方案：用于极紫外线光刻系统的光学传感器装置包括光学传感器，其包括传感器表面和用于从传感器表面去除碎屑的去除机构。因此，对于光刻系统，可以有利地实现剂量和/或污染物的测量。版权所有（C）2012，JPO＆INPIT

2. 发明专利

JP2010258447A Lithographic radiation source, collector, apparatus and method 审中-公开
标题翻译：光刻辐射源，收集器，装置和方法
公开(公告)号：JP2010258447A
公开(公告)日：2010-11-11
申请号：JP2010093599
申请日：2010-04-15
申请人： Asml Netherlands Bv , エーエスエムエルネザーランズビー.ブイ.
发明人： SOER WOUTER ANTHON , JAK MARTIN JACOBUS JOHAN
IPC分类号： H01L21/027 , H05G2/00
CPC分类号： G21K1/062 , B82Y10/00 , G02B17/0892 , G03B27/54 , G03F7/70175 , G03F7/702 , G03F7/70958 , G21K2201/061 , G21K2201/064
摘要： PROBLEM TO BE SOLVED: To provide more effective radiation sources by, improving the efficiency of the collector assembly, to reduce the excitation power used to produce radiation, to extend the life of the radiation sources by, and to improve the efficiency of light collection for the EUV radiation.
SOLUTION: A collector assembly for use in a laser-produced plasma extreme ultraviolet radiation source for use in lithography has a collector body 40 having a collecting mirror 42 and a window 43 in the collector body 40. The window is transmissive to excitation radiation beam, which may be an infrared laser beam in general, so that the beam passes through the window to excite the plasma, and the window has an EUV mirror on its surface, which is also transmissive to the excitation radiation beam but which reflects EUV generated by the plasma to the light collecting site of the collecting mirror. The window may improve the collection efficiency and reduce non-uniformity in the image at the light collecting site. Radiation sources, lithographic apparatus and device manufacturing methods may make use of the collector.
COPYRIGHT: (C)2011,JPO&INPIT
摘要翻译：要解决的问题：为了提供更有效的辐射源，通过提高收集器组件的效率，减少用于产生辐射的激发功率，以延长辐射源的寿命并提高其效率轻集合EUV辐射。解决方案：用于在光刻中使用的激光产生的等离子体极紫外辐射源的集电器组件具有在集电体40内具有集光镜42和窗43的集电体40。辐射束，其通常可以是红外激光束，使得光束通过窗口以激发等离子体，并且窗口在其表面上具有EUV反射镜，其也对激发辐射束是透射的，但反射EUV 由等离子体产生到收集镜的聚光部位。该窗口可以提高收集效率并降低光收集位置图像的不均匀性。辐射源，光刻设备和设备制造方法可以利用收集器。版权所有（C）2011，JPO＆INPIT

3. 发明专利

JP2010045355A Radiation source, lithography apparatus and device manufacturing method 审中-公开
标题翻译：辐射源，光刻设备和器件制造方法
公开(公告)号：JP2010045355A
公开(公告)日：2010-02-25
申请号：JP2009182957
申请日：2009-08-06
申请人： Asml Netherlands Bv , エーエスエムエルネザーランズビー.ブイ.
发明人： WILHELMUS VAN HERPEN MAARTEN MARINUS JOHANNES , BANINE VADIM YEVGENYEVICH , KLUNDER DERK JAN WILFRED , SOER WOUTER ANTHON
IPC分类号： H01L21/027
CPC分类号： G21K1/062 , B82Y10/00 , G03F7/70033 , G03F7/70925 , G21K2201/064 , H05G2/005
摘要： PROBLEM TO BE SOLVED: To prevent damage to a component of a lithography apparatus, in particular, a mirror located nearby a plasma source due to contaminant particles. SOLUTION: The lithography apparatus includes a radiation source which generates extreme ultraviolet radiation. The radiation source includes a chamber in which plasma is generated and the mirror which reflects radiation emitted by the plasma. The mirror includes a multilayer structure including an Mo/Si alternation layer. A border Mo layer or border Si layer or a border diffusion barrier layer of the alternation layer forms an uppermost layer of the mirror, and the uppermost layer faces the chamber inward. A hydrogen group generator generates hydrogen in the chamber. The hydrogen group removes debris, generated from the plasma, from the mirror. COPYRIGHT: (C)2010,JPO&INPIT
摘要翻译：要解决的问题：为了防止光刻设备的部件，特别是由于污染物颗粒而位于等离子体源附近的反射镜的损坏。解决方案：光刻设备包括产生极紫外辐射的辐射源。辐射源包括其中产生等离子体的室和反射由等离子体发射的辐射的反射镜。反射镜包括包括Mo / Si交替层的多层结构。边界Mo层或边界Si层或交替层的边界扩散阻挡层形成反射镜的最上层，最上层向内面向腔室。氢气发生器在腔室中产生氢气。氢离子从镜子中除去从等离子体产生的碎片。版权所有（C）2010，JPO＆INPIT

4. 发明专利

JP2008288590A Assembly provided with radiation source, reflector and contaminant barrier 有权
标题翻译：装配有辐射源，反射器和污染物拦截器
公开(公告)号：JP2008288590A
公开(公告)日：2008-11-27
申请号：JP2008128618
申请日：2008-05-15
申请人： Asml Netherlands Bv , エーエスエムエルネザーランズビー.ブイ.
发明人： SOER WOUTER ANTHON , WILHELMUS VAN HERPEN MAARTEN M
IPC分类号： H01L21/027 , G03F7/20
CPC分类号： G03B27/42 , G03F7/70175 , G03F7/70916
摘要： PROBLEM TO BE SOLVED: To provide an improved assembly provided with a radiation source, a radiation reflector and a contaminant barrier, particularly, for example, an assembly which can offer improved properties for providing radiation to be employed in EUV lithography. SOLUTION: The contaminant barrier is constructed to receive a radiation from a radiation source and reflect the radiation toward a radiation reflector, and the radiation reflector is constructed to return back the radiation received from the contaminant barrier to reflect toward the contaminant barrier. COPYRIGHT: (C)2009,JPO&INPIT
摘要翻译：要解决的问题：提供一种改进的组件，其提供有辐射源，辐射反射器和污染物屏障，特别是例如可提供用于提供在EUV光刻中使用的辐射的改进性能的组件。解决方案：污染物屏障被构造为接收来自辐射源的辐射并将辐射反射到辐射反射器，并且辐射反射器被构造为使从污染物屏障接收的辐射返回以反射到污染物屏障。版权所有（C）2009，JPO＆INPIT

5. 发明专利

JP2011044708A Spectral purity filter for use in lithographic device 审中-公开
标题翻译：用于光刻设备的光谱滤光片
公开(公告)号：JP2011044708A
公开(公告)日：2011-03-03
申请号：JP2010181490
申请日：2010-08-16
申请人： Asml Netherlands Bv , エーエスエムエルネザーランズビー.ブイ.
发明人： JAK MARTIN JACOBUS JOHAN , BANINE VADIM YEVGENYEVICH , WILHELMUS VAN HERPEN MAARTEN MARINUS JOHANNES , SOER WOUTER ANTHON , YAKUNIN ANDREY MIKHAILOVICH
IPC分类号： H01L21/027 , G21K3/00
CPC分类号： G03B27/72 , G02B5/201 , G03F7/70191 , G03F7/70575 , G03F7/70825 , G03F7/70941 , G21K1/06 , G21K1/10 , G21K2201/067
摘要： PROBLEM TO BE SOLVED: To provide an improved or alternative spectral purity filter, or a spectral purity filter arrangement.
SOLUTION: This spectral purity filter includes a plurality of apertures extending in a member. The apertures are structured to suppress radiation of a first wavelength and allow at least a part of radiation of a second wavelength to permeate the apertures. The radiation of the second wavelength is shorter than the radiation of the first wavelength. The apertures extend in the member in various directions to be substantially aligned with radiation constituting a non-parallel radiation beam.
COPYRIGHT: (C)2011,JPO&INPIT
摘要翻译：要解决的问题：提供改进的或替代的光谱纯度滤光器或光谱纯度滤光器装置。解决方案：该光谱纯度滤光器包括在构件中延伸的多个孔。孔被构造成抑制第一波长的辐射，并允许第二波长的至少一部分辐射渗透孔。第二波长的辐射比第一波长的辐射短。孔在构件中在各个方向上延伸以与构成非平行辐射束的辐射基本对齐。版权所有（C）2011，JPO＆INPIT

6. 发明专利

JP2011014899A Spectral purity filter, lithographic apparatus, and method for manufacturing a spectral purity filter 审中-公开
标题翻译：光谱滤光片，光刻设备和制造光谱滤光片的方法
公开(公告)号：JP2011014899A
公开(公告)日：2011-01-20
申请号：JP2010141165
申请日：2010-06-22
申请人： Asml Netherlands Bv , エーエスエムエルネザーランズビー.ブイ.
发明人： JAK MARTIN JACOBUS JOHAN , BANINE VADIM YEVGENYEVICH , WILHELMUS VAN HERPEN MAARTEN MARINUS JOHANNES , SOER WOUTER ANTHON , GLUSHKOV DENIS ALEXANDROVICH , YAKUNIN ANDREY MIKHAILOVICH
IPC分类号： H01L21/027 , G02B5/20 , G21K3/00
CPC分类号： G03B27/72 , G02B5/204 , G02B5/208 , G03F7/70191 , G03F7/70575
摘要： PROBLEM TO BE SOLVED: To provide an EUV spectral purity filter which is efficient and easy to manufacture without causing any defect associated with silicidation of a reflective coating in a hydrogen radical atmosphere.SOLUTION: A transmissive spectral purity filter is configured to transmit extreme ultraviolet radiation. The spectral purity filter includes a filter part having a plurality of apertures to transmit extreme ultraviolet radiation and to suppress transmission of a second type of radiation. The apertures may be manufactured in carrier material such as silicon by an anisotropic etching process and topped with a reflective layer such as Mo metal, Ru metal, TiN or RuO. A diffusion barrier layer such as silicon nitride SiN, or silicon dioxide SiOis provided between the metal and the semiconductor to prevent diffusion and silicidation of the metal at elevated temperatures.
摘要翻译：要解决的问题：提供一种有效且易于制造的EUV光谱纯度过滤器，而不会引起与氢气氛中的反射涂层的硅化相关的任何缺陷。解决方案：透射光谱纯度过滤器被配置为透射极紫外辐射。光谱纯度滤光器包括具有多个孔以便透射极紫外辐射并抑制第二类辐射的透射的滤光器部分。孔可以通过各向异性蚀刻工艺在诸如硅的载体材料中制成，并且覆盖有诸如Mo金属，Ru金属，TiN或RuO的反射层。在金属和半导体之间设置有诸如氮化硅SiN或二氧化硅SiO 2的扩散阻挡层，以防止金属在升高的温度下扩散和硅化。

7. 发明专利

JP2009278090A Lithographic apparatus 有权
标题翻译： LITHOGRAPHIC设备
公开(公告)号：JP2009278090A
公开(公告)日：2009-11-26
申请号：JP2009114454
申请日：2009-05-11
申请人： Asml Netherlands Bv , エーエスエムエルネザーランズビー.ブイ.
发明人： SOER WOUTER ANTHON , WILHELMUS VAN HERPEN MAARTEN M
IPC分类号： H01L21/027 , G02B3/08 , G02B5/00 , G03F7/20
CPC分类号： G02B27/44 , G02B5/1838 , G02B5/1876 , G02B27/4244 , G02F1/061 , G03F7/70191 , G21K1/06 , G21K2201/067
摘要： PROBLEM TO BE SOLVED: To provide a device useful as an improved spectrum impurity filter. SOLUTION: A zone plate includes a plurality of first and second regions which are adjacently and alternately arranged continuously. The first region is structured to be substantially transmissive on a first predetermined radiation wavelength and a second predetermined radiation wavelength different from the first predetermined radiation wavelength. The second region is structured to be substantially non-transmissive, diffractive, or reflective on the first predetermined radiation wavelength, and is substantially transmissive on the second predetermined radiation wavelength. COPYRIGHT: (C)2010,JPO&INPIT
摘要翻译：要解决的问题：提供可用作改进的光谱杂质过滤器的装置。解决方案：区域板包括多个相邻和交替排列连续的第一和第二区域。第一区被构造为在第一预定辐射波长和不同于第一预定辐射波长的第二预定辐射波长上基本上透射。第二区域被构造为在第一预定辐射波长上基本上不透射，衍射或反射，并且在第二预定辐射波长上基本上是透射的。版权所有（C）2010，JPO＆INPIT

8. 发明专利

JP2009267407A Radiation source 有权
标题翻译：辐射源
公开(公告)号：JP2009267407A
公开(公告)日：2009-11-12
申请号：JP2009103511
申请日：2009-04-22
申请人： Asml Netherlands Bv , エーエスエムエルネザーランズビー.ブイ.
发明人： VAN EMPEL TJARKO ADRIAAN RUDOL , BANINE VADIM YEVGENYEVICH , LOOPSTRA ERIK ROELOF , SOER WOUTER ANTHON , WILHELMUS VAN HERPEN MAARTEN M
IPC分类号： H01L21/027 , G03F7/20
CPC分类号： G03F7/70916 , G21K2201/064 , H05G2/005
摘要： PROBLEM TO BE SOLVED: To provide a lithography apparatus including a radiation source which reduces heat load to buffer gas as well as an amount of infiltration into its collector of the contamination being generated accompanying extreme ultraviolet generation. SOLUTION: The extreme ultraviolet radiation source includes: a radiation emitter which emits the radiation; a collector which collects the radiation; and a contamination trap which traps the contamination emitted from the radiation source. The contamination trap includes: a plurality of foils extending substantially radially; a first magnetic ring located outside the outer cone trajectory of the radiation collected by the collector; and a second magnetic ring located inside the trajectory of the radiation collected by the collector. These magnetic rings provide magnetic field having components parallel to the foils. COPYRIGHT: (C)2010,JPO&INPIT
摘要翻译：要解决的问题：提供一种包括辐射源的光刻设备，该辐射源减少缓冲气体的热负荷以及随着极紫外线产生而产生的污染物的渗透量。解决方案：极紫外辐射源包括：发射辐射的辐射发射器; 收集辐射的收集器; 以及捕获从辐射源发射的污染物的污染阱。污染物捕集器包括：基本上径向延伸的多个箔片; 位于由收集器收集的辐射的外锥轨迹外的第一磁环; 以及位于由收集器收集的辐射的轨迹内的第二磁环。这些磁环提供具有平行于箔的部件的磁场。版权所有（C）2010，JPO＆INPIT

9. 发明专利

JP2010021550A Spectral purity filter to be used for lithographic apparatus 有权
标题翻译：用于光刻设备的光谱滤光片
公开(公告)号：JP2010021550A
公开(公告)日：2010-01-28
申请号：JP2009162313
申请日：2009-07-09
申请人： Asml Netherlands Bv , エーエスエムエルネザーランズビー.ブイ.
发明人： SOER WOUTER ANTHON , WILHELMUS VAN HERPEN MAARTEN MARINUS JOHANNES , BANINE VADIM YEVGENYEVICH , JAK MARTIN JACOBUS JOHAN , YAKUNIN ANDREY MIKHAILOVICH
IPC分类号： H01L21/027
CPC分类号： G03F7/702 , G03F7/70191 , G03F7/70575 , G21K1/10
摘要： PROBLEM TO BE SOLVED: To provide a spectral purity filter capable of holding the mechanical robustness of the spectral purity filter and reducing a manufacturing cost. SOLUTION: There is a problem in a conventional spectral purity filter that since the filter is too miniaturized, manufacturing options usable for the preparation of an apertures are restricted and/or expensive. In the spectral purity filter including apertures, the apertures are configured so as to diffract radiation of a first wavelength and transmit at least a part of the radiation of a second wavelength through them, wherein the second radiation wavelength is shorter than the first radiation wavelength and the apertures have a diameter larger than 20 μm. COPYRIGHT: (C)2010,JPO&INPIT

10. 发明专利

JP2009267408A Radiation source, and lithography apparatus 有权
标题翻译：辐射源和光刻设备
公开(公告)号：JP2009267408A
公开(公告)日：2009-11-12
申请号：JP2009103512
申请日：2009-04-22
申请人： Asml Netherlands Bv , エーエスエムエルネザーランズビー.ブイ.
发明人： SOER WOUTER ANTHON , WILHELMUS VAN HERPEN MAARTEN M , JAK MARTIN JACOBUS JOHAN
IPC分类号： H01L21/027
CPC分类号： G03F7/70916 , G03F7/70033 , G03F7/70058
摘要： PROBLEM TO BE SOLVED: To provide a radiation source which is configured to generate extreme ultraviolet rays.
SOLUTION: The radiation source includes: a plasma forming site located at a position where a laser radiation beam contacts fuel to form a plasma; a collector which collects the extreme ultraviolet rays formed in the plasma forming site, thereby forming an extreme ultraviolet ray beam; a contamination barrier having a plurality of foils at least part of which is located between the plasma forming site and the collector; and a rotatable base connected with the plurality of foils operatably. The rotatable base is so configured that the laser radiation beam passes through the contamination barrier and reaches the plasma forming site.
COPYRIGHT: (C)2010,JPO&INPIT
摘要翻译：要解决的问题：提供被配置为产生极紫外线的辐射源。解决方案：辐射源包括：位于激光辐射束接触燃料以形成等离子体的位置处的等离子体形成位置; 收集在等离子体形成部位形成的极紫外线的收集体，形成极紫外线光束; 污染屏障，其具有多个箔片，其至少一部分位于等离子体形成部位和集电体之间; 以及与所述多个箔可操作地连接的可旋转底座。可旋转底座被配置成使得激光辐射束通过污染屏障并到达等离子体形成位置。版权所有（C）2010，JPO＆INPIT

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