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    • 11. 发明专利
    • SAMPLE MOVING APPARATUS
    • JPH02262092A
    • 1990-10-24
    • JP8359289
    • 1989-03-31
    • TOSHIBA CORP
    • AKAMA YOSHIAKISAKAI AKIRASUGIHARA KAZUYOSHI
    • G12B5/00
    • PURPOSE:To linearly move a sample stand by eliminating the strain of a bimorph element in the displacement direction thereof at the time of the movement of the sample stand by using the bimorph element of waveform driving fixed at both end parts thereof and displaced in the thickness direction at the central part thereof. CONSTITUTION:A bimorph element is formed into such a structure that two thin plate-shaped piezoelectric bodies 61, 62 are superposed one upon another and thin metal plates becoming electrodes 63, 64, 65 are arranged to said bodies on the inner and outer sides thereof. The supports 51 - 54 at four corners supporting the respective bimorph elements 41 - 44 are made taller than other supports 55 - 59 so that a sample stand 70 can move smoothly between the supports 55 - 59 and a floor surface without generating trouble such as friction. When the bimorph elements each having a thickness of 0.5mm or less are assembled as shown by a drawing, displacement quantity per 1V is about 1mum and, therefore, position resolving power of about 10Angstrom can be respectively realized in X- and Y- directions.
    • 13. 发明专利
    • SCANNING CAPACITANCE MICROSCOPY
    • JPH01250002A
    • 1989-10-05
    • JP7444588
    • 1988-03-30
    • TOSHIBA CORP
    • AKAMA YOSHIAKISUGIHARA KAZUYOSHI
    • G01B7/34G01Q10/02G01Q10/04G01Q30/18G01Q60/46
    • PURPOSE:To prevent a pickup stylus from colliding against the surface of a sample through the operation of a piezoelectric element by providing the piezoelectric element between the pickup stylus and a coarse adjusting mechanism as its feed mechanism. CONSTITUTION:The pickup stylus 1 is put close to the sample 2 and the electrostatic capacity between an electrode and the sample surface is obtained by a capacity detecting circuit 23. The pickup stylus 1 is integrated with a 1st piezoelectric element 22 for fine movement and a 2nd piezoelectric element 53 for coarse movement. When the pickup stylus 1 is too close to the surface of the sample 2, a signal is sent to a piezoelectric driver 63 so as to stop applying a voltage to the 2nd piezoelectric element 53 for coarse movement from a servo controller 25 if the signal from the capacity detecting circuit 23 exceeds a set value. Similarly, when the pickup stylus 1 is too close to the sample 1 at the time of the fine movement, the signal is sent to the piezoelectric driver 29 so as to stop applying the voltage to the 1st piezoelectric element 22 from the servo controller 25 to prevent the pickup stylus 1 from colliding against the sample 2.
    • 15. 发明专利
    • ELECTRON BEAM DRAWING APPARATUS
    • JP2000299269A
    • 2000-10-24
    • JP10537399
    • 1999-04-13
    • TOSHIBA CORP
    • AKAMA YOSHIAKIFUJII TAKAYOSHI
    • H01L21/027G03F7/20G21K1/087G21K5/04
    • PROBLEM TO BE SOLVED: To increase the drawing speed and thereby improve the throughput by providing a control section that releases electrons toward a board from a plurality of electron guns arranged on the board. SOLUTION: An electron beam drawing apparatus 10 comprises a vacuum chamber 11, a stage 12 located within the chamber 11 for mounting a wafer W thereon, and an exposing section 13 arranged opposite to the stage 12. The apparatus 10 has the section 13 formed of a plurality of chips located together in order to implement collective transfer. The section 13 includes electron guns 20 and a control section 30 for controlling the guns 20. A point electron source and a line electron source are formed of microemitters and microcathodes prepared by a semiconductor process, and are arranged in a manner corresponding to a pattern. The point and line electron sources are formed to have pointed tips. Further, the section 30 has the function of applying a negative voltage to the point and line electron sources and a positive voltage to lead-out electrodes.
    • 19. 发明专利
    • MATERIAL STRAIN MEASURING DEVICE
    • JPH0712528A
    • 1995-01-17
    • JP15365793
    • 1993-06-24
    • TOSHIBA CORP
    • AKAMA YOSHIAKIUNO TETSUO
    • G01B11/16G01N3/06
    • PURPOSE:To measure elongation and local strain simultaneously by displacing an elongation measurement system along with the elongation of a test material and then displacing a strain measurement system following it for moving measurement light. CONSTITUTION:Laser beams 20 from a laser oscillator 16 pass through a shift optical system 17 and enter a pair of indentations at the measurement position of a test material 8 in a strain measurement system 3. Generated interference light 22 enters a light reception element 18 and the image data of interference fringe images are sent to a computer 21 and are analyzed there. When the material 8 is elongated, a hand 4 of an elongation measurement system 2 is displaced for a fixing body 5 and the spacing of the hand 4 increases. Then, a different induction voltage is generated at the elongation detection parts at two locations provided between the hand 4 and the fixing body 5 and then the amount of spacing change of the hand 4 is obtained according to the difference. In this case, the fixing body 5 follows the displacement of the hand 4 and the measurement system 3 changes in one piece, thus continuing to apply the laser beams 20 to the measurement position constantly and measuring the local material strain accurately and simultaneously with the elongation of the material 8.