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1. 发明公开

EP4295142A1 AN ILLUMINATION CONTROL DEVICE FOR A CHARGED PARTICLE ANALYSER 审中-实审
公开(公告)号：EP4295142A1
公开(公告)日：2023-12-27
申请号：EP22756636.1
申请日：2022-02-03
申请人： Scienta Omicron AB
发明人： OLOFSSON, Mikael
IPC分类号： G01N23/22 , G01N23/227 , H01J37/02 , H01J49/02 , H01J49/08 , G01N21/00 , G01N22/00

2. 发明公开

EP3891495A2 APERTURE DEVICE AND ANALYSER ARRANGEMENT 审中-公开
公开(公告)号：EP3891495A2
公开(公告)日：2021-10-13
申请号：EP19824409.7
申请日：2019-12-06
申请人： Scienta Omicron AB
发明人： AMANN, Peter , NILSSON, Anders
IPC分类号： G01N23/227 , H01J37/285

3. 发明公开

EP3161462A4 FEED-FORWARD OF MULTI-LAYER AND MULTI-PROCESS INFORMATION USING XPS AND XRF TECHNOLOGIES 有权转让
标题翻译： VORWÄRTSSCHUBVON MEHRSCHICHT- UND MULTIPROZESSINFORMATIONEN MIT XPS- UND XRF-TECHNOLOGIEN
公开(公告)号：EP3161462A4
公开(公告)日：2017-10-04
申请号：EP15812142
申请日：2015-06-19
申请人： REVERA INCORPORATED
发明人： POIS HEATH A , LEE WEI TI , BOT LAWRENCE V , KWAN MICHAEL C , KLARE MARK , LARSON CHARLES THOMAS
IPC分类号： G01B15/02 , G01N23/22 , G01N23/223 , G01N23/227
CPC分类号： G01B15/02 , G01N23/223 , G01N23/2273
摘要： Methods and systems for feed-forward of multi-layer and multi-process information using XPS and XRF technolgies are disclosed. In an example, a method of thin film characterization includes measuring first XPS and XRF intensity signals for a sample having a first layer above a substrate. A thickness of the first layer is determined based on the first XPS and XRF intensity signals. The information for the first layer and for the substrate is combined to estimate an effective substrate. Second XPS and XRF intensity signals are measured for a sample having a second layer above the first layer above the substrate. The method also involves determining a thickness of the second layer based on the second XPS and XRF intensity signals, the thickness accounting for the effective substrate.
摘要翻译：公开了使用XPS和XRF技术前馈多层和多处理信息的方法和系统。在一个示例中，薄膜表征的方法包括测量具有衬底上方的第一层的样本的第一XPS和XRF强度信号。基于第一XPS和XRF强度信号确定第一层的厚度。结合第一层和基底的信息来估计有效底物。测量第二XPS和XRF强度信号用于在衬底上方的第一层上具有第二层的样本。该方法还涉及基于第二XPS和XRF强度信号确定第二层的厚度，所述厚度考虑到有效衬底。

4. 发明公开

EP3036533A1 METHODS AND SYSTEMS FOR FABRICATING PLATELETS OF A MONOCHROMATOR FOR X-RAY PHOTOELECTRON SPECTROSCOPY 有权转让
标题翻译：方法和系统血小板从单色X射线光电子能谱的生产
公开(公告)号：EP3036533A1
公开(公告)日：2016-06-29
申请号：EP14837703.9
申请日：2014-08-19
申请人： ReVera Incorporated
发明人： FANTON, Jeffrey T. , SMEDT, Rodney , SCHUELER, Bruno W. , REED, David A.
IPC分类号： G01N23/22 , G01N23/227 , H01J49/48 , H01J37/256
CPC分类号： G01N23/20 , B23Q17/20 , G01N23/2273 , G21K1/06 , G21K2201/064 , H01J37/256 , Y10T29/49764 , Y10T29/49769 , Y10T29/49771 , Y10T29/53022
摘要： Methods and systems for fabricating platelets of a monochromator for X-ray photoelectron spectroscopy (XPS) are disclosed. For example, a method of fabricating a platelet of a monochromator for X-ray photoelectron spectroscopy involves placing a crystal on a stage of an X-ray measuring apparatus, the crystal having a top surface. The method also involves measuring, by X-ray reflection, an orientation of a crystal plane of the crystal, the crystal plane beneath the top surface of the crystal and having a primary axis. The method also involves measuring a surface angle of the top surface of the crystal by measuring a light beam reflected from the top surface of the crystal.

5. 发明公开

EP3032563A1 Analyser instrument 审中-公开
标题翻译： Analysatorinstrument
公开(公告)号：EP3032563A1
公开(公告)日：2016-06-15
申请号：EP14197165.5
申请日：2014-12-10
申请人： VG Scienta AB
发明人： Karlsson, Patrik , Backlund, Klas , Åhlund, John
IPC分类号： H01J37/256 , G01N23/227
CPC分类号： H01J37/04 , G01N23/2273 , H01J37/09 , H01J37/285 , H01J2237/0453 , H01J2237/049 , H01J2237/2855
摘要： The present invention relates to an aperture means and an analyser instrument for analysing energies and/or spatial information by means of charged particles emitted from a sample, the particles emitted in result of incident irradiation on the sample. The analyser instrument comprises a lens arrangement for influencing a beam of charged particles emitted from the sample, the arrangement comprising a first aperture means. The lens arrangement is provided with differential pumping means to create differences in pressures at different stages along the optical axis of the lens arrangement. A measurement region is disposed downstream of said lens arrangement and having an inlet opening for receiving said beam of charged particles and the lens arrangement comprises a second aperture means within the differential pumping means. The present invention is characterised in that for a predefined resolution, the second aperture means is configured with respect to its position and size to restrict the angular interval accepted by the analyser instrument in image mode operation so as to maintain the focus point of the analyser instrument also for other modes of operation than the imaging mode.
摘要翻译：本发明涉及一种用于通过从样品发射的带电粒子分析能量和/或空间信息的孔径装置和分析仪器，该颗粒是由样品中的入射照射结果而发射的。分析仪器包括用于影响从样品发射的带电粒子束的透镜装置，该装置包括第一孔装置。透镜装置设置有差分泵送装置，以在透镜装置的光轴上的不同阶段产生压力差异。测量区域设置在所述透镜装置的下游，并且具有用于接收所述带电粒子束的入口，并且所述透镜装置包括所述差分泵送装置内的第二孔径装置。本发明的特征在于，对于预定分辨率，第二孔径装置相对于其位置和尺寸被配置以限制分析仪器在图像模式操作中接受的角度间隔，以便保持分析仪器的聚焦点也适用于其他操作模式，而不是成像模式。

6. 发明公开

EP2966437A1 DETERIORATION ANALYSIS METHOD AND CHEMICAL STATE MEASUREMENT METHOD 有权
标题翻译： SCHÄDIGUNGSUNGSANALYSEVERFAHREN
公开(公告)号：EP2966437A1
公开(公告)日：2016-01-13
申请号：EP15183317.5
申请日：2013-10-04
申请人： SUMITOMO RUBBER INDUSTRIES LIMITED
发明人： Kaneko, Fusae , Kishimoto, Hiroyuki
IPC分类号： G01N23/06 , G01N33/44 , G01N23/227
CPC分类号： G01N33/445 , G01N23/085 , G01N23/087 , G01N23/2273 , Y10T436/255
摘要： The present invention provides a deterioration analysis method capable of analyzing in detail deterioration of a polymer material, and in particular deterioration in the surface condition of a polymer material with low conductivity. The present invention relates to a deterioration analysis method including irradiating a polymer material with a metal coating having a thickness of 100 Å or less formed thereon, with high intensity X-rays, and measuring X-ray absorption while varying the energy of the X-rays, to analyze deterioration of the polymer.
摘要翻译：本发明提供能够详细分析聚合物材料的劣化，特别是低导电性的聚合物材料的表面状态劣化的劣化分析方法。劣化分析方法技术领域本发明涉及一种劣化分析方法，其特征在于，对高分子材料进行高强度X射线照射具有厚度为以下的金属涂层的高分子材料，并且测定X射线吸收，以分析聚合物的劣化。

7. 发明公开

EP2823504A1 ANALYSER ARRANGEMENT FOR PARTICLE SPECTROMETER 有权转让
标题翻译：用于粒子谱仪的分析仪安排
公开(公告)号：EP2823504A1
公开(公告)日：2015-01-14
申请号：EP12870629.8
申请日：2012-03-06
申请人： VG Scienta AB
发明人： WANNBERG, Björn
IPC分类号： H01J49/48 , G01N23/227 , H01J37/05 , H01J49/00
CPC分类号： H01J49/48 , G01N23/2273 , G01N2223/085 , H01J37/05 , H01J49/0031 , H01J49/06 , H01J49/061 , H01J49/484 , H01J2237/0535
摘要： The present invention relates to a method for determining at least one parameter related to charged particles emitted from a particle emitting sample (11), e.g. a parameter related to the energies, the start directions, the start positions or the spin of the particles. The method comprises the steps of guiding a beam of charged particles into an entrance of a measurement region by means of a lens system (13), and detecting positions of the particles indicative of said at least one parameter within the measurement region. Furthermore, the method comprises the steps of deflecting the particle beam at least twice in the same coordinate direction before entrance of the particle beam into the measurement region. Thereby, both the position and the direction of the particle beam at the entrance (8) of the measurement region (3) can be controlled in a way that to some extent eliminates the need for physical manipulation of the sample (11). This in turn allows the sample to be efficiently cooled such that the energy resolution in energy measurements can be improved.
摘要翻译：本发明涉及一种用于确定与从粒子发射样本（11）发射的带电粒子相关的至少一个参数的方法，例如，与粒子的能量，开始方向，开始位置或旋转有关的参数。该方法包括以下步骤：借助于透镜系统（13）将带电粒子束引导到测量区域的入口中，并且检测指示测量区域内的所述至少一个参数的粒子的位置。此外，该方法包括以下步骤：在粒子束进入测量区域之前使粒子束在相同的坐标方向上偏转至少两次。因此，可以以某种程度控制测量区域（3）的入口（8）处的粒子束的位置和方向两者，从而在一定程度上消除了对样本（11）的物理操纵的需要。这转动允许样品被有效地冷却，使得能量测量中的能量分辨率可以改善。

8. 发明授权

EP2133903B1 Electron spectroscopy 有权
标题翻译：电子能谱
公开(公告)号：EP2133903B1
公开(公告)日：2014-06-04
申请号：EP09251534.5
申请日：2009-06-11
申请人： Kratos Analytical Limited
发明人： Page, Simon
IPC分类号： H01J37/08 , H01J37/05 , H01J37/295 , H01J37/30 , G01N23/22 , H01J49/48 , G01N23/227
CPC分类号： H01J37/05 , G01N23/2273 , H01J37/08 , H01J37/295 , H01J37/30 , H01J2237/05 , H01J2237/08 , H01J2237/0815

9. 发明公开

EP2270480A4 ANALYTICAL METHOD 审中-公开
标题翻译：分析程序
公开(公告)号：EP2270480A4
公开(公告)日：2014-01-15
申请号：EP09734458
申请日：2009-04-10
申请人： ULVAC INC , ULVAC PHI INC
发明人： KUNIBE TOSHIJYU , SANADA NORIAKI , SAKAI DAISUKE
IPC分类号： G01N23/227 , G01N1/32 , G01N23/225
CPC分类号： G01N23/2252 , G01N1/32

10. 发明公开

EP1793410A4 SPHERICAL ABERRATION CORRECTION ELECTROSTATIC LENS, INPUT LENS, ELECTRON SPECTROSCOPIC DEVICE, PHOTOELECTRON MICROSCOPE, AND MEASUREMENT SYSTEM 有权
标题翻译：静电透镜校正球面像差，输入镜头，电子分光设备，光电子显微镜和测量系统
公开(公告)号：EP1793410A4
公开(公告)日：2009-10-21
申请号：EP04822204
申请日：2004-11-09
申请人： NAT UNIV CORP NARA INST , JEOL LTD
发明人： DAIMON HIROSHI , MATSUDA HIROYUKI , KATO MAKOTO , KUDO MASATO
IPC分类号： H01J37/244 , G01N23/227 , H01J37/12 , H01J37/285
CPC分类号： H01J37/12 , G01N23/227 , H01J37/153 , H01J37/244 , H01J37/285 , H01J49/067 , H01J49/48 , H01J2237/2448 , H01J2237/24485 , H01J2237/2522

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