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1. 发明授权

EP0685003B1 VERFAHREN ZUR STABILISIERUNG DER PLASMAERZEUGUNG MITTELS ELEKTRONENSTRAHLVERDAMPFER 失效
标题翻译：方法用于稳定产生等离子体期电子式蒸发器
公开(公告)号：EP0685003B1
公开(公告)日：1996-10-16
申请号：EP94904133.9
申请日：1994-01-13
申请人： FRAUNHOFER-GESELLSCHAFT ZUR FÖRDERUNG DER ANGEWANDTEN FORSCHUNG E.V.
发明人： KIRCHHOFF, Volker , GOEDICKE, Klaus , METZNER, Christoph , SCHEFFEL, Bert
IPC分类号： C23C14/30 , H01J37/32 , H05H1/24 , H05H1/42
CPC分类号： H01J37/3005 , C23C14/32 , H01J37/304 , H01J37/3053 , H05H1/0012
摘要： The use of high-power electron guns in the coating of large substrate surfaces suffers from the disadvantage that plasma activation of the vapour is low. The aim of the invention is to ensure stable operation of high-rate evaporators and stable plasma activation of the vapour cloud, without the need for additional electrodes. This is achieved by setting the evaporation rate of the electron-beam evaporator at a level high enough for at least 10 % of the beam power to be absorbed by the vapour, while at the same time measuring the optical emission of the plasma generated. The operating parameters of the electron gun are then adjusted so that the optical emission, and hence the energy absorption, remain constant. The preferred applications of the method are in surface finishing in, for instance, metallurgy, mechanical engineering, optics and the packaging and glass industries.

2. 发明公开

EP0685003A1 VERFAHREN ZUR STABILISIERUNG DER PLASMAERZEUGUNG MITTELS ELEKTRONENSTRAHLVERDAMPFER 失效
标题翻译：方法用于稳定产生等离子体期电子式蒸发器。
公开(公告)号：EP0685003A1
公开(公告)日：1995-12-06
申请号：EP94904133.0
申请日：1994-01-13
申请人： FRAUNHOFER-GESELLSCHAFT ZUR FÖRDERUNG DER ANGEWANDTEN FORSCHUNG E.V.
发明人： KIRCHHOFF, Volker , GOEDICKE, Klaus , METZNER, Christoph , SCHEFFEL, Bert
IPC分类号： C23C14 , H01J37 , H05H1
CPC分类号： H01J37/3005 , C23C14/32 , H01J37/304 , H01J37/3053 , H05H1/0012
摘要： The use of high-power electron guns in the coating of large substrate surfaces suffers from the disadvantage that plasma activation of the vapour is low. The aim of the invention is to ensure stable operation of high-rate evaporators and stable plasma activation of the vapour cloud, without the need for additional electrodes. This is achieved by setting the evaporation rate of the electron-beam evaporator at a level high enough for at least 10 % of the beam power to be absorbed by the vapour, while at the same time measuring the optical emission of the plasma generated. The operating parameters of the electron gun are then adjusted so that the optical emission, and hence the energy absorption, remain constant. The preferred applications of the method are in surface finishing in, for instance, metallurgy, mechanical engineering, optics and the packaging and glass industries.

3. 发明公开

EP3068197A4 UNIGNITED PLASMA STATE DETECTION DEVICE AND UNIGNITED PLASMA STATE DETECTION METHOD 有权
标题翻译： DEVICE血浆UNENTZÜNDETEN国家对检测等离子态UNENTZÜNDETEN检测和方法
公开(公告)号：EP3068197A4
公开(公告)日：2017-06-07
申请号：EP13898096
申请日：2013-12-26
申请人： KYOSAN ELECTRIC MFG
发明人： YUZURIHARA ITSUO , AIKAWA SATOSHI , OHMA RYOSUKE
IPC分类号： H05H1/46 , H01J37/32
CPC分类号： H05H1/0012 , H01J37/32082 , H01J37/32174 , H01J37/32935 , H01J37/3299 , H05H1/46 , H05H2001/4645 , H05H2001/4682
摘要： In detecting the unignited state of plasma based on a reflected wave, false detection during a normal plasma ignition time is prevented so as to detect the unignited state during plasma abnormality. When a pulse output is supplied to a plasma load by pulse driving from an RF power source, the unignited state of plasma abnormality is detected on the basis of the continuous state of the reflected wave, whereby a total reflected wave generated in the unignited state during plasma abnormality is detected in distinction from the reflected wave generated in the normal ignited state. With this configuration, in detecting the unignited state by comparing a peak value of the reflected wave with a threshold, it is possible to prevent that a reflected wave generated in the normal ignited state is erroneously detected as the total reflected wave that is generated in the abnormal unignited state.
摘要翻译：在检测基于反射波等离子体的未点火状态，在正常的等离子点火时间误检测防止，从而等离子体异常期间检测未点火状态。当脉冲输出由脉冲从到RF功率源驱动供给到等离子体负载时，在反射波的连续状态，由此总反映在未点火状态期间波产生的基础上检测到的血浆异常的未点火状态等离子体异常通常在检测到区分从在正常状态下产生的反射波点燃。根据该结构，在通过比较阈值的反射波的峰值检测的未点火状态，所以能够防止没有被错误地检测在正常点燃状态下产生的反射波为总反射波并在所生成的异常未点燃的状态。

4. 发明公开

EP3068197A1 UNIGNITED PLASMA STATE DETECTION DEVICE AND UNIGNITED PLASMA STATE DETECTION METHOD 有权
标题翻译： DEVICE血浆UNENTZÜNDETEN国家对检测等离子态UNENTZÜNDETEN检测和方法
公开(公告)号：EP3068197A1
公开(公告)日：2016-09-14
申请号：EP13898096.6
申请日：2013-12-26
申请人： Kyosan Electric Mfg. Co., Ltd.
发明人： YUZURIHARA, Itsuo , AIKAWA, Satoshi , OHMA, Ryosuke
IPC分类号： H05H1/46
CPC分类号： H05H1/0012 , H01J37/32082 , H01J37/32174 , H01J37/32935 , H01J37/3299 , H05H1/46 , H05H2001/4645 , H05H2001/4682
摘要： In detecting the unignited state of plasma based on a reflected wave, false detection during a normal plasma ignition time is prevented so as to detect the unignited state during plasma abnormality. When a pulse output is supplied to a plasma load by pulse driving from an RF power source, the unignited state of plasma abnormality is detected on the basis of the continuous state of the reflected wave, whereby a total reflected wave generated in the unignited state during plasma abnormality is detected in distinction from the reflected wave generated in the normal ignited state. With this configuration, in detecting the unignited state by comparing a peak value of the reflected wave with a threshold, it is possible to prevent that a reflected wave generated in the normal ignited state is erroneously detected as the total reflected wave that is generated in the abnormal unignited state.

5. 发明公开

EP1867220A1 PROCEDE ET DISPOSITIF POUR GENERER UN FLUX THERMIQUE CHARGE DE PARTICULES 有权
标题翻译：对于颗粒生成方法和设备载入热力江
公开(公告)号：EP1867220A1
公开(公告)日：2007-12-19
申请号：EP06726217.0
申请日：2006-03-03
申请人： ASTRIUM SAS
发明人： CONTE, Dominique , DONNART, Philippe , SAUVAGE, Nicolas
IPC分类号： H05H1/42
CPC分类号： H05H1/0012 , H05H1/42
摘要： The invention concerns a method and a device for generating a thermal flux loaded with particles. Said device comprises a plasma source (1) including one end having a main axis (2) along which is directed a plasma jet (3) outwards and at least one particle injector (5) having at least one outlet (6), said injector (5) being designed to inject a carrier gas and particles into the plasma jet (3). The invention is characterized in that the device comprises a support mobile in two directions for positioning the injector (5) axially and radially relative to said main axis (2) and sloping means for controlling the angular position of said injector (5) relative to an axis (7) perpendicular to said main axis (2), a first optical sensor (9) and viewing means for detecting the average trajectory of the particles from the output of the injector (5) and in the plasma jet (3), and means for determining the average speed (10, 11) of said particles.

6. 发明授权

EP2776806B1 IONISATIONSMANOMETER 有权
标题翻译：电离
公开(公告)号：EP2776806B1
公开(公告)日：2017-04-12
申请号：EP12772963.0
申请日：2012-10-17
申请人： GSI Helmholtzzentrum für Schwerionenforschung GmbH
发明人： KOLLMUS, Holger
IPC分类号： G01L21/32 , G01L21/34 , A61N5/10 , H01J41/02 , H05H1/00 , H05H7/00
CPC分类号： G01L21/32 , A61N5/1048 , F04C2270/0421 , G01L21/34 , H01J41/02 , H05H1/0012 , H05H7/00 , H05H2007/008

7. 发明公开

EP2776806A2 IONISATIONSMANOMETER 有权
公开(公告)号：EP2776806A2
公开(公告)日：2014-09-17
申请号：EP12772963.0
申请日：2012-10-17
申请人： GSI Helmholtzzentrum für Schwerionenforschung GmbH
发明人： KOLLMUS, Holger
IPC分类号： G01L21/32 , G01L21/34 , A61N5/10 , H01J41/02 , H05H1/00 , H05H7/00
CPC分类号： G01L21/32 , A61N5/1048 , F04C2270/0421 , G01L21/34 , H01J41/02 , H05H1/0012 , H05H7/00 , H05H2007/008
摘要： The invention relates to a measurement device (1, 2, 3, 4, 5) having an electron-releasing device (8), an electron-accepting device (13, 31, 32) and an ion-accepting device (19, 23, 24), a measuring section device (6) being provided, which is formed separately from the at least one electron-accepting device (13, 31, 32).
摘要翻译：本发明涉及一种具有电子释放装置（8），电子接受装置（13,31,32）和离子接受装置（19,23）的测量装置（1,2,3,4,5），24）中，提供了与所述至少一个电子接收装置（13,31,32）分开形成的测量部分装置（6）。

8. 发明公开

EP0081785A2 Plasma monitor 失效
标题翻译：装置等离子的研究。
公开(公告)号：EP0081785A2
公开(公告)日：1983-06-22
申请号：EP82111261.2
申请日：1982-12-06
申请人： Hitachi, Ltd.
发明人： Osada, Hisajiro , Hiratsuka, Yutaka
IPC分类号： G01N21/64 , H05H1/00
CPC分类号： H05H1/0012 , C23C14/54 , G01N21/6402
摘要： Disclosed is a plasma monitor which measures the distribution of particular chemical species (atom, molecule, ion) in plasma generated inside an instrument making use of the plasma. Laser light having a particular wavelength is radiated to the particular chemical species so as to let it generate fluorescence. The fluorescence is picked up for each of a plurality of zones divided in the radiating direction of the laser light and the concentration of the chemical species in each zone is determined on the basis of the intensity of the fluorescence in each zone in order to determine the concentration distribution of the particular chemical species contained in the plasma. The operative condition within the sealed vessel can be grasped more accurately by measuring the distribution of the concentration of the chemical species which is closely related with the condition of deposition or etching.

9. 发明授权

EP3068197B1 UNIGNITED PLASMA STATE DETECTION DEVICE AND UNIGNITED PLASMA STATE DETECTION METHOD 有权
标题翻译：非对等等离子体状态检测装置和非对等等离子体状态检测方法
公开(公告)号：EP3068197B1
公开(公告)日：2018-05-16
申请号：EP13898096.6
申请日：2013-12-26
申请人： Kyosan Electric Mfg. Co., Ltd.
发明人： YUZURIHARA, Itsuo , AIKAWA, Satoshi , OHMA, Ryosuke
IPC分类号： H05H1/00 , H05H1/46 , H01J37/32
CPC分类号： H05H1/0012 , H01J37/32082 , H01J37/32174 , H01J37/32935 , H01J37/3299 , H05H1/46 , H05H2001/4645 , H05H2001/4682
摘要： In detecting the unignited state of plasma based on a reflected wave, false detection during a normal plasma ignition time is prevented so as to detect the unignited state during plasma abnormality. When a pulse output is supplied to a plasma load by pulse driving from an RF power source, the unignited state of plasma abnormality is detected on the basis of the continuous state of the reflected wave, whereby a total reflected wave generated in the unignited state during plasma abnormality is detected in distinction from the reflected wave generated in the normal ignited state. With this configuration, in detecting the unignited state by comparing a peak value of the reflected wave with a threshold, it is possible to prevent that a reflected wave generated in the normal ignited state is erroneously detected as the total reflected wave that is generated in the abnormal unignited state.

10. 发明授权

EP1867220B1 PROCEDE ET DISPOSITIF POUR GENERER UN FLUX THERMIQUE CHARGE DE PARTICULES 有权
标题翻译：对于颗粒生成方法和设备载入热力江
公开(公告)号：EP1867220B1
公开(公告)日：2015-02-25
申请号：EP06726217.0
申请日：2006-03-03
申请人： Airbus Defence and Space SAS
发明人： CONTE, Dominique , DONNART, Philippe , SAUVAGE, Nicolas
IPC分类号： H05H1/42
CPC分类号： H05H1/0012 , H05H1/42

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