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    • 7. 发明公开
    • A semiconductor device and method of fabrication thereof
    • 一种半导体器件及其制造方法
    • EP0902487A2
    • 1999-03-17
    • EP98300278.3
    • 1998-01-15
    • Vydyanath, Honnavalli R.
    • Vydyanath, Honnavalli R.
    • H01L33/00H01S3/19
    • H01S5/32341H01L33/325H01S5/305H01S5/3054H01S5/3059H01S5/32
    • A method of providing shallow acceptor and donor energy levels to produce higher conductivity semiconductor materials, relies on the coulombic pairing of donor and acceptor elements. One exemplary embodiment is applied to create shallow acceptor levels in the III-V nitride materials via the coulombic pairing of group I elements which, in principle, act as double acceptors occupying metal lattice sites with group IV or group VI elements which act as single donors occupying metal or nitrogen lattice sites, respectively. The resulting pairs act as single acceptors with an energy level much closer to the valence band edge than that of either the first or second level of the group I element acceptors in their unpaired state. This approach, when optimized, can result in creating acceptor levels much shallower than the Mg acceptors currently used to make p-type GaN and its alloys. The donor and acceptor species comprising the coulombic pairs may be either the result of external doping or the result of deviation from stoichiometry or from a combination of both.
    • 提供浅受主和施主能级以产生更高电导率的半导体材料的方法依赖于施主元素和受主元素的库仑配对。 一个示例性实施方案被用于通过I族元素的库仑配对在III-V族氮化物材料中产生浅受主能级,其原则上充当占据金属晶格位点的具有IV族或VI族元素的双受体,其充当单个供体 分别占据金属或氮晶格位置。 由此产生的对作为单受体,其能级接近于价带边缘,与未配对状态下的I族元素受体的第一或第二能级相比。 这种方法经过优化后,可以产生比目前用于制造p型GaN及其合金的Mg受主更浅的受主能级。 包含库伦对的供体和受体物种可以是外部掺杂的结果,也可以是偏离化学计量学的结果或者两者的组合。