会员体验
专利管家(专利管理)
工作空间(专利管理)
风险监控(情报监控)
数据分析(专利分析)
侵权分析(诉讼无效)
联系我们
交流群
官方交流:
QQ群: 891211   
微信请扫码    >>>
现在联系顾问~
热词
    • 6. 发明公开
    • Semiconductor integrated circuit comprising a current mirror circuit
    • Integrierte Halbleiterschaltung mit einer Stromspiegelschaltung
    • EP0700090A1
    • 1996-03-06
    • EP95109227.9
    • 1995-06-14
    • KABUSHIKI KAISHA TOSHIBA
    • Ito, Takao, c/o Int. Prop. Div., K.K. Toshiba
    • H01L27/07G05F3/26
    • H01L27/0722G05F3/265
    • A current mirror circuit comprises first and second lateral-type bipolar transistors (11, 12) having first and second conductive films (26) each formed via an insulation film (25), on the portion of the surface of a base region (22) between an emitter region (24) and a collector region (23). The first and second emitter regions (24) and the first and second collector regions (23) are formed in the surface region of the base region are separately from each other. A diode (13) is used as a bias circuit. The diode applies a bias voltage corresponding to the output current of the first transistor, that is, the reference current, to the first and second conductive films of the first and second transistors, so that the width of the channel formed in a base region is changed in accordance with the reference current, and therefore the current amplification rate of each transistor can be maintained at a high value even if a large operation current is supplied.
    • 电流镜电路包括具有通过绝缘膜(25)形成的第一和第二导电膜(26)的第一和第二横向型双极晶体管(11,12),在基极区域(22)的表面部分上, 在发射极区域(24)和集电极区域(23)之间。 第一和第二发射极区域(24)以及在基极区域的表面区域中形成的第一和第二集电极区域(23)彼此分开。 二极管(13)用作偏置电路。 二极管将对应于第一晶体管的输出电流(即,参考电流)的偏置电压施加到第一和第二晶体管的第一和第二导电膜,使得形成在基极区域中的沟道的宽度为 根据参考电流而变化,因此即使提供大的工作电流,也可以将各晶体管的电流放大率保持在高值。
    • 7. 发明公开
    • Gate controlled lateral bipolar junction transistor and method of fabrication thereof
    • 栅极控制的横向双极结晶体管及其制造方法
    • EP0657944A2
    • 1995-06-14
    • EP94308956.5
    • 1994-12-02
    • NORTHERN TELECOM LIMITED
    • Mahli, Duljit S.Kung, WilliamDeen, M. JamalIlowski, JohnKovacic, Stephen J.
    • H01L29/739H01L27/07H01L29/735
    • H03G1/007H01L27/0722H01L29/7302H01L29/735H01L29/7393
    • A gate controlled lateral bipolar junction transistor (GCLBJT) device for an integrated circuit and a method of fabrication thereof are provided. The GCLBJT resembles a merged field effect transistor and lateral bipolar transistor, i.e. a lateral bipolar transistor having base, emitter and collector terminals and a fourth terminal for controlling a gate electrode overlying an active base region. The device is operable as an electronically configurable lateral transistor. Advantageously a heavily doped buried layer provides a base electrode having a base contact which surrounds and encloses the collector. The surface region between emitter and collector is characterised by lightly doped regions adjacent and contiguous with the heavily doped emitter and collector, which effectively reduce the base width of the bipolar transistor and improve operation for analogue applications. A threshold adjust implant in the surface of the base region under the gate electrode allows for control of threshold voltage of the surface MOS channel. Performance parameters of the bipolar transistor may be adjusted via a signal to the fourth i.e., gate, terminal, to control inversion under the gate, thereby controlling the path of carriers between the emitter and collector. Transistor performance characteristics such as common-emitter current gain, unity-gain frequency, and the low frequency noise properties are all variable quantities which can be specified electronically, i.e. they are programmable by a signal applied to the gate. Concurrent use of field effect and bipolar injection phenomenon within the same device yield the salient device characteristics. Applications include mixer and modulation circuits.
    • 提供了一种用于集成电路的栅控横向双极结型晶体管(GCLBJT)器件及其制造方法。 GCLBJT类似于合并场效应晶体管和横向双极晶体管,即具有基极,发射极和集电极端子的横向双极晶体管,以及用于控制覆盖有源基极区域的栅极的第四端子。 该器件可作为电子可配置的横向晶体管进行操作。 有利的是,重掺杂埋层提供具有围绕并包围集电极的基极触点的基极。 发射极和集电极之间的表面区域由与重掺杂的发射极和集电极相邻并邻接的轻掺杂区域表征,这有效地减小了双极晶体管的基极宽度并且改进了用于模拟应用的操作。 在栅极电极下方的基极区域的表面中的阈值调整注入允许控制表面MOS沟道的阈值电压。 双极晶体管的性能参数可以通过一个信号调整到第四个即栅极端,以控制栅极下的反转,从而控制发射极和集电极之间的载流子路径。 诸如共发射极电流增益,单位增益频率和低频噪声特性之类的晶体管性能特性都是可变的量,它们可用电子方式指定,即它们可通过施加到栅极的信号来编程。 在同一器件内同时使用场效应和双极注入现象会产生显着的器件特性。 应用包括混频器和调制电路。