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    • 10. 发明公开
    • Semiconductor device, semiconductor stacked module structure, stacked module structure and method of manufacturing same
    • 半导体器件中,半导体层叠结构模块,用于生产层状模块结构及其制程
    • EP2903021A1
    • 2015-08-05
    • EP14153041.0
    • 2014-01-29
    • J-Devices Corporation
    • Inoue, HiroshiKatsumata, AkioSawachi, ShigenoriYamagata, Osamu
    • H01L23/00H01L25/10
    • H01L24/19H01L24/29H01L24/32H01L24/73H01L24/82H01L24/92H01L24/97H01L25/105H01L2224/04105H01L2224/12105H01L2224/13022H01L2224/13024H01L2224/131H01L2224/2919H01L2224/32225H01L2224/73267H01L2224/82031H01L2224/82039H01L2224/92244H01L2224/97H01L2225/1035H01L2225/1058H01L2924/12042H01L2924/15311H01L2224/83H01L2224/82H01L2924/014H01L2924/00
    • A semiconductor device (100), having an insulating substrate (102); a semiconductor element (101) which is mounted on one main surface of the insulating substrate via adhesive (103), with an element circuit surface of the semiconductor element facing upwards; a first insulating material layer (104a) which seals the element circuit surface of the semiconductor element and the insulating substrate peripheral thereto; a first metal thin film wire layer (105) which is provided on the first insulating material layer (104a) and a portion of which is exposed to an external surface; a first insulating material layer (104b) which is provided on the first metal thin film wire layer (105); a second insulating material layer (107) which is provided on a main surface of the insulating substrate (102) where the semiconductor element is not mounted; a second metal thin film wire layer (106) which is provided inside the second insulating material layer and a portion of which is exposed to an external surface; a via (108) which passes through the insulating substrate and which electrically connects the first metal thin film wire layer (105) in the first insulating material layer (104a) and the second metal thin film wire layer (106); and an external electrode (109) which is formed on the first metal thin film wire layer (105), the semiconductor device having a structure in which the second metal thin film wire layer, an electrode arranged on the element circuit surface of the semiconductor element, the first metal thin film wire layer, the via and the external electrode formed on the first metal thin film wire layer are electrically connected.
    • 一种半导体装置(100),具有对绝缘衬底(102); 其经由粘合剂(103)安装在所述绝缘基片的一个主表面,与面向上的半导体元件的元件电路表面上的半导体元件(101)的所有; 密封该半导体元件的元件电路表面和外周在其上的绝缘基板的第一绝缘材料层(104A); 其上设置有第一绝缘材料层(104A)和所有的暴露于外部表面上的一部分上的第1金属薄膜层金属线(105)的所有; 其设置在所述第一金属薄膜层金属线(105)的第一绝缘材料层(104B); 其设置在其中的半导体元件没有被安装在绝缘基板(102)的主表面上的第二绝缘材料层(107)的所有; 该第二绝缘材料层和所有的暴露于外部表面上的部分的内侧设置的第二金属薄膜层金属线(106)的所有; 通孔(108),通过绝缘基板和通过其电连接在所述第一绝缘材料层中的第一金属薄膜层金属线(105)(104A)和所述第二金属薄膜层金属线(106); 和所有其在第1金属薄膜布线层(105)上形成了外部电极(109),具有在上电极上的第2金属薄膜布线层的半导体元件的元件电路表面上排列的结构的半导体器件 中,第一金属薄膜层金属线,通孔和形成在所述第1金属薄膜层导线与外部电极电连接。