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1. 发明公开

EP3229265A1 METHODS AND APPARATUS FOR DEPOSITING AND/OR ETCHING MATERIAL ON A SUBSTRATE 有权
标题翻译：用于在衬底上沉积和/或蚀刻材料的方法和设备
公开(公告)号：EP3229265A1
公开(公告)日：2017-10-11
申请号：EP17172932.0
申请日：2013-02-27
申请人： Oxford Instruments Nanotechnology Tools Limited
发明人： MCNIE, Mark Edward , COOKE, Michael Joseph , LEA, Leslie Michael
IPC分类号： H01L21/3213 , H01L21/3065
CPC分类号： H01J37/32926 , C23C16/50 , C23C16/52 , G05B19/418 , G05B2219/34198 , H01J37/32449 , H01J37/32816 , H01J37/32834 , H01J37/32917 , H01J2237/24564 , H01J2237/24585 , H01J2237/248 , H01J2237/3321 , H01J2237/334 , H01L21/306 , H01L21/30655 , H01L22/12 , H01L22/26
摘要： Methods are disclosed for depositing material onto and/or etching material from a substrate in a surface processing tool having a processing chamber, a controller and one or more devices for adjusting the process parameters within the chamber. The method comprises: the controller instructing the one or more devices according to a series of control steps, each control step specifying a defined set of process parameters that the one or more devices are instructed to implement, wherein at least one of the control steps comprises the controller instructing the one or more devices to implement a defined set of constant process parameters for the duration of the step, including at least a chamber pressure and gas flow rate through the chamber, which duration is less than the corresponding gas residence time (T gr ) of the processing chamber for the step.
摘要翻译：公开了用于在具有处理室，控制器和一个或多个用于调节室内的工艺参数的装置的表面处理工具中将材料沉积到衬底上和/或从衬底蚀刻材料的方法。该方法包括：控制器根据一系列控制步骤指示一个或多个设备，每个控制步骤指定一个或多个设备被指示实施的定义的一组过程参数，其中至少一个控制步骤包括所述控制器指示所述一个或多个装置在所述步骤的持续时间内实施限定的恒定过程参数组，所述恒定过程参数包括至少腔室压力和通过所述腔室的气体流量，所述持续时间小于相应的气体停留时间（Tgr ）用于该步骤的处理室。

2. 发明公开

EP3180456A2 VERFAHREN UND VORRICHTUNG ZUR ENERGIEEINSPARUNG UND GLEICHZEITIGEN ERHÖHUNG DER DURCHLAUFGESCHWINDIGKEIT BEI VAKUUM-BESCHICHTUNGSANLAGEN 有权
标题翻译：方法和装置节约能源，同时增加总变速真空镀膜系统
公开(公告)号：EP3180456A2
公开(公告)日：2017-06-21
申请号：EP15785048.8
申请日：2015-08-05
申请人： Grenzebach Maschinenbau GmbH
发明人： KLEIDEITER, Gerd , KRISCH, Thomas , FIUKOWSKI, Jörg , GAWER, Olaf
IPC分类号： C23C14/35 , C23C14/56 , H01J37/34
CPC分类号： H01J37/32834 , C23C14/352 , C23C14/52 , C23C14/562 , C23C14/564 , C23C14/568 , H01J37/32513 , H01J37/32761 , H01J37/32779 , H01J37/32788 , H01J37/32816 , H01J37/32889 , H01J37/32899 , H01J37/3405 , H01J37/3408
摘要： Disclosed are an apparatus and a method for saving energy while increasing the conveying speed in vacuum coating plants consisting of a series of sputtering segments (3) and gas separation segments (2) along with a continuous substrate plane (1). Said apparatus has the following features: a) each of the sputtering segments (3) consists of a tank tub (12) inside which a conveying device (11) is located; the flange (6) of the tank is positioned in the immediate vicinity above the substrate plane (1); a cathode bearing block (5), along with targets (8) and gas inlet ducts (10), is located in the tank cover (4) in the immediate vicinity of the substrate together with splash guards (9); b) in the region of the substrate plane (1), the gas separation segments (2) are provided with a tunnel cover (14) that extends along the entire length of the gas separation segment (2); c) sputtering segments (3) and/or gas separation segments (2) are evacuated using one or more vacuum pumps (15), and the air pumped in said process is trapped in an air reservoir (25) having an adjustable volume.
摘要翻译：公开的是装置和节能，同时提高在真空镀膜植物的输送速度由一系列溅射链段（3）和气体分离段的方法（2）地连同一个连续的衬底平面图（1）。所述装置具有以下特征：a）各溅射链段（3），其内部的输送装置（11）位于一个槽桶（12）的besteht; 罐的凸缘（6）在衬底平面以上（1）附近的位置; 阴极支承块（5），沿着与所述目标（8）和气体入口导管（10）位于所述槽盖（4）在基片的附近与防溅罩一起（9）; b）在衬底平面（1）的区域中，气体分离段（2）设置有一个风道罩（14）并沿着所述气体分离段的整个长度上延伸（2）; c）中溅射段（3）和/或气体分离段（2）使用一个或多个真空泵（15抽真空），并且在所述过程中泵送的空气被捕获在具有在可调体积空气储存器（25）。

3. 发明公开

EP2614520A1 OZONE AND PLASMA GENERATION USING ELECTRON BEAM TECHNOLOGY 审中-公开
标题翻译：臭氧和等离子体产生用电子技术
公开(公告)号：EP2614520A1
公开(公告)日：2013-07-17
申请号：EP11847948.4
申请日：2011-12-16
申请人： Hitachi Zosen Corporation
发明人： BAKHTARI, Kaveh
IPC分类号： H01L21/306
CPC分类号： B01J19/085 , C01B13/10 , H01J3/02 , H01J33/00 , H01J37/3233 , H01J37/32357 , H01J37/32816
摘要： This invention proposes, among other things, systems and methods for providing ozone generators or plasma generators that generate an electric field in an electron generation chamber that is separate from a reaction chamber. An electron beam emitter in an electron generation chamber is configured to emit a beam of electrons and is separated from the reaction chamber by an electron permeable barrier that provides a window through which the beam of electrons passes. The electrons are accelerated to the required energy in the electron generation chamber and transmitted through the barrier to the reaction chamber, where an input gas source introduces an input gas into the reaction chamber. The input gas may react with the beam of electrons inside the reaction chamber to form an output gas comprising a plasma or a concentration of ozone, and the output gas passes from the reaction chamber to a wafer processing chamber.

4. 发明授权

EP2238275B1 MULTI-PASS VACUUM COATING SYSTEMS 有权
公开(公告)号：EP2238275B1
公开(公告)日：2018-10-03
申请号：EP08868452.7
申请日：2008-12-29
申请人： Exatec, LLC.
发明人： GASWORTH, Steven, M.
IPC分类号： C23C14/56 , C23C16/54
CPC分类号： C23C16/50 , C23C14/568 , C23C16/4408 , C23C16/4409 , C23C16/54 , H01J37/32743 , H01J37/32752 , H01J37/32816 , H01J2237/3321 , H01L21/67173 , H01L21/67745
摘要： A multi-pass coating system and method for applying multiple coatings to substrates traversed through the system. The system includes at least one vacuum pump coupled to the system to establish a sub-atmospheric pressure within the system. The system also includes a least one coating zone where a coating layer is applied to the substrate and includes at least one transfer lock through which the substrates transition between atmospheric pressure outside the system and the sub-atmospheric pressure inside the system. To move the substrates through the system, the system includes a transport mechanism configured to move the substrates at least two times through the coating zone prior to the substrates being exited from the system.

5. 发明公开

EP3345206A1 PLASMA GENERATING APPARATUS AND METHOD OF MANUFACTURING PATTERNED DEVICES USING SPATIALLY RESOLVED PLASMA PROCESSING 审中-公开
公开(公告)号：EP3345206A1
公开(公告)日：2018-07-11
申请号：EP16758167.7
申请日：2016-08-30
申请人： Total S.A. , Ecole Polytechnique , Centre National de la Recherche Scientifique
发明人： JOHNSON, Erik , BRUNEAU, Bastien , ROCA I CABARROCAS, Pere , BULKIN, Pavel , HABKA, Nada
IPC分类号： H01J37/32 , H01L31/18 , C23C14/04 , C23C16/509
CPC分类号： H01J37/32091 , C23C16/04 , C23C16/045 , C23C16/45565 , C23C16/45574 , C23C16/505 , H01J37/32366 , H01J37/32541 , H01J37/32568 , H01J37/32816 , H01L31/03921 , H01L31/202 , Y02E10/50 , Y02P70/521
摘要： The invention concerns a plasma generating apparatus, for manufacturing devices having patterned layers, comprising a first electrode assembly (1) and a second electrode assembly (2) placed in a plasma reactor chamber, an electrical power supply (6) for generating a voltage difference between the first electrode assembly (1) and the second electrode assembly (2). According to the invention, the second electrode assembly (2) is configured for receiving a substrate (5), and the first electrode assembly (1) comprises a plurality of protrusions (11) and a plurality of recesses (12, 13, 14, 15, 16, 17, 18), the protrusions (11) and recesses (12, 13, 14, 15, 16, 17, 18) being dimensioned and set at respective distances (D1, D2) from the surface (51) of the substrate (5) so as to generate a plurality of spatially isolated plasma zones (21, 22) located selectively either between said surface (51) of the substrate (5) and said plurality of recesses (12, 13, 14, 15, 16, 17, 18) or between said surface (51) of the substrate (5) and said plurality of protrusions (11).

6. 发明授权

EP3095126B8 ENDBLOCK FOR ROTATABLE TARGET WITH ELECTRICAL CONNECTION BETWEEN COLLECTOR AND ROTOR AT PRESSURE LESS THAN ATMOSPHERIC PRESSURE 有权
公开(公告)号：EP3095126B8
公开(公告)日：2018-02-14
申请号：EP14827991.2
申请日：2014-12-30
申请人： Guardian Europe S.à.r.l. , Guardian Glass, LLC
发明人： GALAN, Gilbert , USELDING, Jean-Philippe , COMANS, Guy , SCHLOREMBERG, Marcel
IPC分类号： H01J37/34 , H01J37/32 , C23C14/35
CPC分类号： C23C14/34 , H01J37/32816 , H01J37/3405 , H01J37/3411 , H01J37/3417 , H01J37/342 , H01J37/3435 , H01J37/3497 , H01J2237/332
摘要： An endblock for a rotatable sputtering target, such as a rotatable magnetron sputtering target, is provided. A sputtering apparatus, including one or more such endblock(s), includes locating the electrical contact(s) (e.g., brush(es)) between the collector and rotor in the endblock(s) in an area under vacuum (as opposed to in an area at atmospheric pressure).

7. 发明授权

EP2380412B1 METHODS AND APPARATUS FOR DUAL CONFINEMENT AND ULTRA-HIGH PRESSURE IN AN ADJUSTABLE GAP PLASMA CHAMBER 有权
标题翻译：用于可调间隙等离子室中的双重约束和超高压力的方法和装置
公开(公告)号：EP2380412B1
公开(公告)日：2017-09-27
申请号：EP09837887.0
申请日：2009-12-16
申请人： LAM Research Corporation
发明人： FISCHER, Andreas , HUDSON, Eric
IPC分类号： H05H1/34 , H01J37/32 , C23C16/509 , C23C16/458 , C23C16/455
CPC分类号： H01J37/32091 , H01J37/32449 , H01J37/32532 , H01J37/32541 , H01J37/32568 , H01J37/32623 , H01J37/32642 , H01J37/32816 , H01J37/3299 , H01L21/3065

8. 发明公开

EP3032925A4 PLASMA PROCESSING DEVICE AND PLASMA PROCESSING METHOD 有权
标题翻译：等离子电视机
公开(公告)号：EP3032925A4
公开(公告)日：2017-03-22
申请号：EP14834309
申请日：2014-07-03
申请人： TOKYO ELECTRON LTD
发明人： MARUYAMA KOJI , HORIGUCHI MASATO , MATSUKI TETSURI , KOSHIISHI AKIRA
IPC分类号： H05H1/46 , H01J37/32 , H01L21/3065
CPC分类号： H01J37/32165 , H01J37/32091 , H01J37/32357 , H01J37/32422 , H01J37/3244 , H01J37/32532 , H01J37/32568 , H01J37/32816 , H01J2237/332 , H01J2237/334 , H01L21/02104 , H01L21/3065 , H01L21/67069
摘要： A plasma processing apparatus includes a dielectric member having communication holes through which an internal space communicates with a processing space; a first electrode and a second electrode arranged to face each other with the internal space therebetween; a first gas supply device which supplies a first processing gas into the internal space; a first high frequency power supply which supplies a first high frequency power to at least one of the first electrode and the second electrode to generate a first plasma of the first processing gas; a depressurizing device which introduces the first processing gas and radicals in the first plasma into the processing space; a second high frequency power supply which supplies a second high frequency power to generate a second plasma of the first processing gas and to attract ions into a target object; and a control unit which adjusts, by controlling a total amount of the first high frequency powers, an amount of the radicals in the second plasma and adjusts, by controlling a ratio between the first high frequency powers, an amount of the ions in the second plasma.
摘要翻译：等离子体处理装置包括具有连通孔的电介质构件，内部空间与处理空间连通; 第一电极和第二电极，被布置成彼此面对并具有内部空间; 第一气体供给装置，其将第一处理气体供给到所述内部空间; 第一高频电源，其向第一电极和第二电极中的至少一个提供第一高频电力，以产生第一处理气体的第一等离子体; 将第一等离子体中的第一处理气体和自由基引入处理空间的减压装置; 提供第二高频电力以产生所述第一处理气体的第二等离子体并将离子吸引到目标物体中的第二高频电源; 以及控制单元，其通过控制第一高频功率的总量来调整第二等离子体中的自由基的量，并且通过控制第一高频功率之间的比例来调整第二高频功率中的离子的量等离子体。

9. 发明公开

EP3262210A1 Procédé de traitement par plasma de récipients, comprenant une phase d'imagerie thermique 有权
标题翻译：一种等离子体处理容器的方法，包括热成像阶段
公开(公告)号：EP3262210A1
公开(公告)日：2018-01-03
申请号：EP16707892.2
申请日：2016-02-10
申请人： Sidel Participations
发明人： DEAU, Thierry
IPC分类号： C23C16/04 , C23C16/511 , C23C16/52 , G01N25/00 , G01N21/84 , G01N21/90 , B05D7/22 , B29C59/14 , H01J37/32 , H05H1/24 , G01B11/06
CPC分类号： C23C16/52 , B05D1/62 , B05D7/02 , B05D7/20 , B29C59/142 , C23C16/045 , C23C16/26 , C23C16/511 , G01N21/8422 , G01N21/9081 , G01N25/72 , H01J37/32192 , H01J37/32394 , H01J37/32816 , H01J37/3299 , H05H2001/4607 , H05H2245/123
摘要： Process for treating a container (2) with plasma, for depositing a barrier layer on an internal face of the container (2), this process comprising operations consisting in: after the plasma has been extinguished, obtaining a thermal image of the container (2); comparing the thermal image of the container with a reference thermal image stored in memory; and, if the thermal image of the container (2) differs from the reference thermal image, modifying at least one of the following parameters: internal pressure, external pressure, precursor gas flow rate, microwave frequency, microwave power, duration of the treatment.

10. 发明公开

EP3055441A4 CATHODIC ARC DEPOSITION APPARATUS AND METHOD 有权转让
标题翻译： VORRICHTUNG UND VERFAHREN ZUR ABLAGERUNG VONKATHODENBÖGEN
公开(公告)号：EP3055441A4
公开(公告)日：2017-05-17
申请号：EP14852888
申请日：2014-09-25
申请人： UNITED TECHNOLOGIES CORP
发明人： BALZANO THOMAS , BEERS RUSSELL A
IPC分类号： C23C14/32 , H01J37/32
CPC分类号： H01J37/3266 , C23C14/0635 , C23C14/0641 , C23C14/0664 , C23C14/081 , C23C14/083 , C23C14/14 , C23C14/325 , H01J37/32055 , H01J37/32522 , H01J37/32614 , H01J37/32669 , H01J37/32816 , H01J37/3435 , H01J2237/327 , H01J2237/332
摘要： A cathodic arc coating apparatus includes a vessel, a cathode disposed in the vessel, and a stinger assembly. The stinger assembly includes a first magnetic field generator disposed in a first stinger cup in selective contact with the cathode. The first stinger cup has at least a first electrically conductive cup portion spaced from a second electrically conductive cup portion by a thermally insulating layer therebetween.
摘要翻译：阴极电弧涂覆设备包括容器，设置在容器中的阴极和托管架组件。托管架组件包括设置在与阴极选择性接触的第一托管架杯中的第一磁场发生器。第一托管架杯具有至少第一导电杯部分，第一导电杯部分与第二导电杯部分通过其间的隔热层间隔开。

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