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1. 发明授权

EP2238275B1 MULTI-PASS VACUUM COATING SYSTEMS 有权
公开(公告)号：EP2238275B1
公开(公告)日：2018-10-03
申请号：EP08868452.7
申请日：2008-12-29
申请人： Exatec, LLC.
发明人： GASWORTH, Steven, M.
IPC分类号： C23C14/56 , C23C16/54
CPC分类号： C23C16/50 , C23C14/568 , C23C16/4408 , C23C16/4409 , C23C16/54 , H01J37/32743 , H01J37/32752 , H01J37/32816 , H01J2237/3321 , H01L21/67173 , H01L21/67745
摘要： A multi-pass coating system and method for applying multiple coatings to substrates traversed through the system. The system includes at least one vacuum pump coupled to the system to establish a sub-atmospheric pressure within the system. The system also includes a least one coating zone where a coating layer is applied to the substrate and includes at least one transfer lock through which the substrates transition between atmospheric pressure outside the system and the sub-atmospheric pressure inside the system. To move the substrates through the system, the system includes a transport mechanism configured to move the substrates at least two times through the coating zone prior to the substrates being exited from the system.

2. 发明公开

EP3345206A1 PLASMA GENERATING APPARATUS AND METHOD OF MANUFACTURING PATTERNED DEVICES USING SPATIALLY RESOLVED PLASMA PROCESSING 审中-公开
公开(公告)号：EP3345206A1
公开(公告)日：2018-07-11
申请号：EP16758167.7
申请日：2016-08-30
申请人： Total S.A. , Ecole Polytechnique , Centre National de la Recherche Scientifique
发明人： JOHNSON, Erik , BRUNEAU, Bastien , ROCA I CABARROCAS, Pere , BULKIN, Pavel , HABKA, Nada
IPC分类号： H01J37/32 , H01L31/18 , C23C14/04 , C23C16/509
CPC分类号： H01J37/32091 , C23C16/04 , C23C16/045 , C23C16/45565 , C23C16/45574 , C23C16/505 , H01J37/32366 , H01J37/32541 , H01J37/32568 , H01J37/32816 , H01L31/03921 , H01L31/202 , Y02E10/50 , Y02P70/521
摘要： The invention concerns a plasma generating apparatus, for manufacturing devices having patterned layers, comprising a first electrode assembly (1) and a second electrode assembly (2) placed in a plasma reactor chamber, an electrical power supply (6) for generating a voltage difference between the first electrode assembly (1) and the second electrode assembly (2). According to the invention, the second electrode assembly (2) is configured for receiving a substrate (5), and the first electrode assembly (1) comprises a plurality of protrusions (11) and a plurality of recesses (12, 13, 14, 15, 16, 17, 18), the protrusions (11) and recesses (12, 13, 14, 15, 16, 17, 18) being dimensioned and set at respective distances (D1, D2) from the surface (51) of the substrate (5) so as to generate a plurality of spatially isolated plasma zones (21, 22) located selectively either between said surface (51) of the substrate (5) and said plurality of recesses (12, 13, 14, 15, 16, 17, 18) or between said surface (51) of the substrate (5) and said plurality of protrusions (11).

3. 发明授权

EP3095126B8 ENDBLOCK FOR ROTATABLE TARGET WITH ELECTRICAL CONNECTION BETWEEN COLLECTOR AND ROTOR AT PRESSURE LESS THAN ATMOSPHERIC PRESSURE 有权
公开(公告)号：EP3095126B8
公开(公告)日：2018-02-14
申请号：EP14827991.2
申请日：2014-12-30
申请人： Guardian Europe S.à.r.l. , Guardian Glass, LLC
发明人： GALAN, Gilbert , USELDING, Jean-Philippe , COMANS, Guy , SCHLOREMBERG, Marcel
IPC分类号： H01J37/34 , H01J37/32 , C23C14/35
CPC分类号： C23C14/34 , H01J37/32816 , H01J37/3405 , H01J37/3411 , H01J37/3417 , H01J37/342 , H01J37/3435 , H01J37/3497 , H01J2237/332
摘要： An endblock for a rotatable sputtering target, such as a rotatable magnetron sputtering target, is provided. A sputtering apparatus, including one or more such endblock(s), includes locating the electrical contact(s) (e.g., brush(es)) between the collector and rotor in the endblock(s) in an area under vacuum (as opposed to in an area at atmospheric pressure).

4. 发明授权

EP2380412B1 METHODS AND APPARATUS FOR DUAL CONFINEMENT AND ULTRA-HIGH PRESSURE IN AN ADJUSTABLE GAP PLASMA CHAMBER 有权
标题翻译：用于可调间隙等离子室中的双重约束和超高压力的方法和装置
公开(公告)号：EP2380412B1
公开(公告)日：2017-09-27
申请号：EP09837887.0
申请日：2009-12-16
申请人： LAM Research Corporation
发明人： FISCHER, Andreas , HUDSON, Eric
IPC分类号： H05H1/34 , H01J37/32 , C23C16/509 , C23C16/458 , C23C16/455
CPC分类号： H01J37/32091 , H01J37/32449 , H01J37/32532 , H01J37/32541 , H01J37/32568 , H01J37/32623 , H01J37/32642 , H01J37/32816 , H01J37/3299 , H01L21/3065

5. 发明公开

EP3032925A4 PLASMA PROCESSING DEVICE AND PLASMA PROCESSING METHOD 有权
标题翻译：等离子电视机
公开(公告)号：EP3032925A4
公开(公告)日：2017-03-22
申请号：EP14834309
申请日：2014-07-03
申请人： TOKYO ELECTRON LTD
发明人： MARUYAMA KOJI , HORIGUCHI MASATO , MATSUKI TETSURI , KOSHIISHI AKIRA
IPC分类号： H05H1/46 , H01J37/32 , H01L21/3065
CPC分类号： H01J37/32165 , H01J37/32091 , H01J37/32357 , H01J37/32422 , H01J37/3244 , H01J37/32532 , H01J37/32568 , H01J37/32816 , H01J2237/332 , H01J2237/334 , H01L21/02104 , H01L21/3065 , H01L21/67069
摘要： A plasma processing apparatus includes a dielectric member having communication holes through which an internal space communicates with a processing space; a first electrode and a second electrode arranged to face each other with the internal space therebetween; a first gas supply device which supplies a first processing gas into the internal space; a first high frequency power supply which supplies a first high frequency power to at least one of the first electrode and the second electrode to generate a first plasma of the first processing gas; a depressurizing device which introduces the first processing gas and radicals in the first plasma into the processing space; a second high frequency power supply which supplies a second high frequency power to generate a second plasma of the first processing gas and to attract ions into a target object; and a control unit which adjusts, by controlling a total amount of the first high frequency powers, an amount of the radicals in the second plasma and adjusts, by controlling a ratio between the first high frequency powers, an amount of the ions in the second plasma.
摘要翻译：等离子体处理装置包括具有连通孔的电介质构件，内部空间与处理空间连通; 第一电极和第二电极，被布置成彼此面对并具有内部空间; 第一气体供给装置，其将第一处理气体供给到所述内部空间; 第一高频电源，其向第一电极和第二电极中的至少一个提供第一高频电力，以产生第一处理气体的第一等离子体; 将第一等离子体中的第一处理气体和自由基引入处理空间的减压装置; 提供第二高频电力以产生所述第一处理气体的第二等离子体并将离子吸引到目标物体中的第二高频电源; 以及控制单元，其通过控制第一高频功率的总量来调整第二等离子体中的自由基的量，并且通过控制第一高频功率之间的比例来调整第二高频功率中的离子的量等离子体。

7. 发明授权

EP3095126B1 ENDBLOCK FOR ROTATABLE TARGET WITH ELECTRICAL CONNECTION BETWEEN COLLECTOR AND ROTOR AT PRESSURE LESS THAN ATMOSPHERIC PRESSURE 有权
标题翻译： ENDBLOCK用于旋转式目标，集电器和转子之间的电气连接压力低于大气压力
公开(公告)号：EP3095126B1
公开(公告)日：2017-12-13
申请号：EP14827991.2
申请日：2014-12-30
申请人： Guardian Europe S.à.r.l. , Guardian Industries Corp.
发明人： GALAN, Gilbert , USELDING, Jean-Philippe , COMANS, Guy , SCHLOREMBERG, Marcel
IPC分类号： H01J37/34 , H01J37/32 , C23C14/35
CPC分类号： C23C14/34 , H01J37/32816 , H01J37/3405 , H01J37/3411 , H01J37/3417 , H01J37/342 , H01J37/3435 , H01J37/3497 , H01J2237/332

8. 发明公开

EP3055441A1 CATHODIC ARC DEPOSITION APPARATUS AND METHOD 有权转让
标题翻译： VORRICHTUNG UND VERFAHREN ZUR ABLAGERUNG VONKATHODENBÖGEN
公开(公告)号：EP3055441A1
公开(公告)日：2016-08-17
申请号：EP14852888.8
申请日：2014-09-25
申请人： United Technologies Corporation
发明人： BALZANO, Thomas , BEERS, Russell A.
IPC分类号： C23C14/32
CPC分类号： H01J37/3266 , C23C14/0635 , C23C14/0641 , C23C14/0664 , C23C14/081 , C23C14/083 , C23C14/14 , C23C14/325 , H01J37/32055 , H01J37/32522 , H01J37/32614 , H01J37/32669 , H01J37/32816 , H01J37/3435 , H01J2237/327 , H01J2237/332
摘要： A cathodic arc coating apparatus includes a vessel, a cathode disposed in the vessel, and a stinger assembly. The stinger assembly includes a first magnetic field generator disposed in a first stinger cup in selective contact with the cathode. The first stinger cup has at least a first electrically conductive cup portion spaced from a second electrically conductive cup portion by a thermally insulating layer therebetween.
摘要翻译：阴极电弧涂覆装置包括容器，设置在容器中的阴极和支架组件。所述托管架组件包括设置在与所述阴极选择性接触的第一托管杯中的第一磁场发生器。第一刺管杯具有至少第一导电杯部分，其间通过隔热层与第二导电杯部分间隔开。

9. 发明公开

EP2614520A4 OZONE AND PLASMA GENERATION USING ELECTRON BEAM TECHNOLOGY 审中-公开
标题翻译：臭氧和等离子体产生用电子技术
公开(公告)号：EP2614520A4
公开(公告)日：2015-12-23
申请号：EP11847948
申请日：2011-12-16
申请人： HITACHI SHIPBUILDING ENG CO
发明人： BAKHTARI KAVEH
IPC分类号： H01L21/306 , H01J37/32 , H05H1/24
CPC分类号： B01J19/085 , C01B13/10 , H01J3/02 , H01J33/00 , H01J37/3233 , H01J37/32357 , H01J37/32816

10. 发明公开

EP2817261A1 METHOD AND SYSTEM FOR GRAPHENE FORMATION 审中-实审
标题翻译：方法和系统的形成图的
公开(公告)号：EP2817261A1
公开(公告)日：2014-12-31
申请号：EP13751679.5
申请日：2013-02-22
申请人： California Institute of Technology
发明人： BOYD, David A.
IPC分类号： C01B31/02 , B01J19/12 , C07C9/04
CPC分类号： C01B31/0453 , B01J19/088 , B01J19/22 , B01J2219/0879 , B01J2219/0894 , B82Y30/00 , B82Y40/00 , C01B32/186 , C23C16/0245 , C23C16/26 , C23C16/52 , C23C16/545 , H01J37/32082 , H01J37/32449 , H01J37/32522 , H01J37/32816 , H01J2237/335 , H01L21/02046 , H01L21/02425 , H01L21/02527 , H01L21/0262 , H01L21/02661 , H01L29/1606 , H01L29/32
摘要： A method for forming graphene includes providing a substrate and subjecting the substrate to a reduced pressure environment. The method also includes providing a carrier gas and a carbon source and exposing at least a portion of the substrate to the carrier gas and the carbon source. The method further includes performing a surface treatment process on the at least a portion of the substrate and converting a portion of the carbon source to graphene disposed on the at least a portion of the substrate.

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