专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明公开

EP4451308A1 SECONDARY RADIATION MITIGATION 审中-公开
公开(公告)号：EP4451308A1
公开(公告)日：2024-10-23
申请号：EP23168485.3
申请日：2023-04-18
申请人： Excillum AB
发明人： ROSÉN, Robert , HANSSON, Björn
IPC分类号： H01J35/14 , A61B6/03 , G01N23/00 , H01J35/18
CPC分类号： H01J35/153 , H01J2235/16620130101 , H05G1/02 , H01J35/147 , H01J35/186 , H01J35/30
摘要： An X-ray arrangement is disclosed, comprising an electron source (402) configured to provide an electron beam; an aperture (412) configured to limit an angular distribution of the electron beam, wherein the electron beam causes secondary X-ray radiation to be emitted from a region around the aperture; a secondary radiation limiting element configured to limit an angular distribution of the secondary X-ray radiation; a first deflector (403) configured to direct the electron beam to a desired location on a target (406), wherein the target is configured to generate primary X-ray radiation by interaction with the electron beam; and a detector (420) for detecting the primary X-ray radiation; wherein the secondary radiation limiting element and the detector are positioned to prevent the secondary X-ray radiation from reaching the detector. A corresponding method is also disclosed.

2. 发明授权

EP2542035B1 X-RAY IRRADIATION DEVICE AND ANALYSIS DEVICE 有权
公开(公告)号：EP2542035B1
公开(公告)日：2018-08-29
申请号：EP11762263.9
申请日：2011-03-30
申请人： National Institute for Materials Science , Ulvac-Phi, Inc.
发明人： YAMAZUI, Hiromichi , KOBAYASHI, Keisuke , IWAI, Hideo , KOBATA, Masaaki
IPC分类号： G01N23/2273 , H01J35/30 , H01J35/28 , G21K7/00 , G21K1/06
CPC分类号： G01N23/2273 , G01N2223/204 , G01N2223/206 , G21K1/06 , G21K7/00 , H01J35/28 , H01J35/30 , H01J2235/081 , H01J2235/086 , H01J2235/163
摘要： [Object] The present invention provides an X-ray irradiation device capable of adjusting the energy of X-rays in a wide range, and an analysis device equipped with the X-ray irradiation device. [Solving Means] An X-ray irradiation device according to an embodiment of the present invention focuses X-rays emitted from an X-ray generation mechanism to a predetermined focal position by a focusing mechanism. The X-ray generation mechanism has a structure which generates a plurality of X-rays having different wavelengths. The focusing mechanism has a structure in which the plurality of X-rays are focused to the same focal position by focusing elements having diffraction characteristics suitable for the wavelengths of the respective X-rays generated by the X-ray generation mechanism.

3. 发明授权

EP2742779B1 SYSTEM AND METHOD FOR X-RAY SOURCE WEIGHT REDUCTION 有权
标题翻译：用于减少X射线源重量的系统和方法
公开(公告)号：EP2742779B1
公开(公告)日：2017-04-26
申请号：EP12796177.9
申请日：2012-06-08
申请人： Rapiscan Systems, Inc.
发明人： LANGEVELD, Willem Gerhardus, Johannes , GOZANI, Tsahi , BENDAHAN, Joseph
IPC分类号： H01J35/14 , H01J35/30 , H01J35/08
CPC分类号： H01J35/30 , G21K1/093 , H01J35/08 , H01J35/14 , H01J37/141 , H01J37/1475 , H01J2235/081 , H01J2235/086 , H05G1/52

4. 发明公开

EP2741309A3 X-ray apparatus with deflectable electron beam 有权
标题翻译：与偏转电子束X射线装置
公开(公告)号：EP2741309A3
公开(公告)日：2016-05-18
申请号：EP13195676.5
申请日：2013-12-04
申请人： Bruker AXS GmbH
发明人： Ollinger, Christoph , Michaelsen, Carsten , Kleine, Andreas , Graf, Jürgen
IPC分类号： H01J35/08 , H01J35/30 , G21K1/06
CPC分类号： H01J35/30 , G21K1/06 , G21K1/067 , H01J35/08 , H01J35/14 , H01J2235/082 , H01J2235/086 , H05G1/58
摘要： An x-ray apparatus (1), comprising
- an electron beam source (2), emitting an electron beam (3),
- a target (4), onto which the electron beam (3) is directed, thus forming a focal spot (5; 5a, 5b) on the target (4),
- x-ray optics (6), collecting x-rays emitted from the focal spot (5; 5a, 5b) and forming an x-ray beam (8),
- and a sample position (9) at which the x-ray beam (8) is directed,
is characterized in that the x-ray apparatus (1) further comprises an electrostatic or electromagnetic electron beam deflection device (10), suitable for moving the focal spot (5; 5a, 5b) on the target (4),
and in that in any direction (x, y, z) the extension of the focal spot (5; 5a, 5b) is smaller at least by a factor F, with F=1.5, than the extension of the target (4). The invention provides an x-ray apparatus wherein aligning the x-ray optics with respect to a microfocus x-ray source is simplified.

5. 发明授权

EP2160750B1 FAST DOSE MODULATION USING Z-DEFLECTION IN A ROTATING ANODE OR ROTATING FRAME TUBE 有权转让
标题翻译： FAST DOSISMODULIERUNG关于Z-偏转的旋转阳极或旋转框架管
公开(公告)号：EP2160750B1
公开(公告)日：2012-02-29
申请号：EP08763358.2
申请日：2008-06-17
申请人： Philips Intellectual Property & Standards GmbH , Koninklijke Philips Electronics N.V.
发明人： BEHLING, Rolf, K., O.
IPC分类号： H01J35/14
CPC分类号： H01J35/14 , H01J35/10 , H01J35/26 , H01J35/30 , H01J2235/086
摘要： A fast dose modulation using a z-deflection in a rotating anode or a rotating frame tube, where the electron beam is deflected from a first focal spot region to a second focal spot region being formed on the anode, wherein only the electromagnetic beam generated in the first focal spot region contributes to the useful electromagnetic exposure beam, wherein the second focal spot region is designed to avoid emission of electromagnetic beams into the direction of a useful electromagnetic beam direction.

6. 发明授权

EP1883093B1 Computertomograph 有权
标题翻译： CT扫描仪
公开(公告)号：EP1883093B1
公开(公告)日：2011-11-16
申请号：EP07111789.9
申请日：2007-07-05
申请人： Forster, Jan , Forster, Renate
发明人： Forster, Jan , Müller, Reinhold
IPC分类号： H01J35/30 , A61B6/03
CPC分类号： H01J35/30 , A61B6/032 , A61B6/035 , A61B6/4028 , A61B6/4291 , A61B6/482 , A61B6/50

7. 发明授权

EP2238908B1 Anordnung zur Elektronenstrahltomographie 有权转让
标题翻译：安排电子断层扫描
公开(公告)号：EP2238908B1
公开(公告)日：2011-08-24
申请号：EP10158136.1
申请日：2010-03-29
申请人： Helmholtz-Zentrum Dresden - Rossendorf e.V.
发明人： Hampel, Uwe
IPC分类号： A61B6/03 , H01J35/30
CPC分类号： A61B6/4028 , A61B6/032 , H01J35/30 , H01J2235/086

8. 发明公开

EP2238908A1 Anordnung zur Elektronenstrahltomographie 有权转让
公开(公告)号：EP2238908A1
公开(公告)日：2010-10-13
申请号：EP10158136.1
申请日：2010-03-29
申请人： Forschungszentrum Dresden - Rossendorf e.V.
发明人： Hampel, Uwe
IPC分类号： A61B6/03 , H01J35/30
CPC分类号： A61B6/4028 , A61B6/032 , H01J35/30 , H01J2235/086
摘要： Aufgabe der vorliegenden Erfindung ist es, eine Anordnung zur Elektronenstrahltomographie anzugeben, die eine kontinuierliche und gleichzeitige Aufnahme zweidimensionaler Schnittbilder eines Objektes in verschiedenen Durchstrahlungsebenen mit hoher zeitlicher und räumlicher Auflösung gestattet.
Die Erfindung beinhaltet, dass die Targets ( 5 ) von Öffnungen ( 14 ) gegebener Breite und regelmäßiger Anordnung in Umfangsrichtung durchbrochen sind, wobei die Öffnungen ( 14 ) in den Targets ( 5 ) jeweils auf einer Bahnkurve liegen, die den Schnitt der Mantelfläche des Elektronenstrahlkegels ( 11 ) mit dem jeweiligen Target ( 5 ) bilden; die in Strahlrichtung aufeinanderfolgenden Targets ( 5 ) mit jeweils einem kleinen Winkelversatz zum davorliegenden Target ( 5 ) bezüglich der optischen Achse ( 10 ) angeordnet sind, so dass ein entlang der Mantelfläche des Elektronenstrahlkegels ( 11 ) zirkulierender Elektronenstrahl ( 4 ) mit mindestens einem Teil seines Querschnitts nacheinander die Materialstege ( 15 ) zwischen den Öffnungen ( 14 ) aller Targets ( 5 ) bestrahlt und zu jedem Target ( 5 ) ein Röntgendetektorbogen ( 6 ) koplanar radial vor oder hinter dem jeweiligen Target ( 5 ) angeordnet ist.
摘要翻译：该配置具有目标（5）的最前目标，该目标（5）相对于位于前面的相应目标相对于光轴（10）以小的角度偏移排列。电子束（4）沿着电子束锥体（11）的壳体循环，以连续地照射所有目标物的开口（14）之间的材料网。用于每个靶的X射线检测器弧（6）在相应目标的前面或后面以径向方式布置成共面的方式。

9. 发明公开

EP2160750A2 FAST DOSE MODULATION USING Z-DEFLECTION IN A ROTATING ANODE OR ROTATING FRAME TUBE 有权转让
标题翻译： FAST DOSISMODULIERUNG关于Z-偏转的旋转阳极或旋转框架管
公开(公告)号：EP2160750A2
公开(公告)日：2010-03-10
申请号：EP08763358.2
申请日：2008-06-17
申请人： Philips Intellectual Property & Standards GmbH , Koninklijke Philips Electronics N.V.
发明人： BEHLING, Rolf, K., O.
IPC分类号： H01J35/14
CPC分类号： H01J35/14 , H01J35/10 , H01J35/26 , H01J35/30 , H01J2235/086
摘要： A fast dose modulation using a z-deflection in a rotating anode or a rotating frame tube, where the electron beam is deflected from a first focal spot region to a second focal spot region being formed on the anode, wherein only the electromagnetic beam generated in the first focal spot region contributes to the useful electromagnetic exposure beam, wherein the second focal spot region is designed to avoid emission of electromagnetic beams into the direction of a useful electromagnetic beam direction.

10. 发明公开

EP1970934A2 X-ray examination apparatus and X-ray examination method using the same 审中-公开
标题翻译： Röntgenstrahluntersuchungsvorrichtungund entsprechendesRöntgenstrahluntersuchungsverfahren
公开(公告)号：EP1970934A2
公开(公告)日：2008-09-17
申请号：EP08152634.5
申请日：2008-03-12
申请人： Omron Corporation
发明人： Masuda, Masayuki , Matsunami, Tsuyoshi , Koizumi, Haruyuki
IPC分类号： H01J35/30 , H05G1/26 , A61B6/02
CPC分类号： H01J35/30 , A61B6/032 , A61B6/4028 , H05G1/26
摘要： An X-ray examination apparatus (100) changes a position of each X-ray sensor (23) by rotating a sensor base (22), and resets a starting position of X-ray emission that becomes a X-ray focal position so that the X-ray enters each X-ray sensor after the position thereof is changed. A scanning X-ray source (10) deflects an electron beam to easily change the position where the electron beam impinges a target of the X-ray source to an arbitrary location. The irradiating position of the electron beam then can be easily moved according to an accumulated irradiation time on the target. Therefore, maintenance can be performed without interrupting the X-ray examination.
摘要翻译： X射线检查装置（100）通过旋转传感器基座（22）来改变各X射线传感器（23）的位置，并且将X射线焦点位置的X射线发射的起始位置复位，使得在其位置改变之后，X射线进入每个X射线传感器。扫描X射线源（10）偏转电子束以容易地改变电子束将X射线源的目标物撞击到任意位置的位置。然后电子束的照射位置可以根据目标上累积的照射时间容易地移动。因此，可以在不中断X射线检查的情况下进行维护。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式