专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明公开

EP2741309A2 X-ray apparatus with deflectable electron beam 有权
标题翻译： Röntgenstrahlenvorrichtungmit ablenkbarem Elektronenstrahl
公开(公告)号：EP2741309A2
公开(公告)日：2014-06-11
申请号：EP13195676.5
申请日：2013-12-04
申请人： Bruker AXS GmbH
发明人： Ollinger, Christoph , Michaelsen, Carsten , Kleine, Andreas , Graf, Jürgen
IPC分类号： H01J35/08 , H01J35/30
CPC分类号： H01J35/30 , G21K1/06 , G21K1/067 , H01J35/08 , H01J35/14 , H01J2235/082 , H01J2235/086 , H05G1/58
摘要： An x-ray apparatus (1), comprising
- an electron beam source (2), emitting an electron beam (3),
- a target (4), onto which the electron beam (3) is directed, thus forming a focal spot (5; 5a, 5b) on the target (4),
- x-ray optics (6), collecting x-rays emitted from the focal spot (5; 5a, 5b) and forming an x-ray beam (8),
- and a sample position (9) at which the x-ray beam (8) is directed,
is characterized in that the x-ray apparatus (1) further comprises an electrostatic or electromagnetic electron beam deflection device (10), suitable for moving the focal spot (5; 5a, 5b) on the target (4),
and in that in any direction (x, y, z) the extension of the focal spot (5; 5a, 5b) is smaller at least by a factor F, with F=1.5, than the extension of the target (4). The invention provides an x-ray apparatus wherein aligning the x-ray optics with respect to a microfocus x-ray source is simplified.
摘要翻译：一种x射线装置（1），包括 - 发射电子束（3）的电子束源（2）， - 电子束（3）所指向的靶（4），从而形成焦点（5; 5a，5b）上的x射线（5; 5a，5b），并且形成x射线束（8），以及X射线束（8）所指向的样本位置（9）的特征在于，所述x射线装置（1）还包括适于移动的静电或电磁电子束偏转装置（10）目标（4）上的焦斑（5; 5a，5b），以及在任何方向（x，y，z）上焦点（5; 5a，5b）的延伸至少小于一个因子 F，F = 1.5，比目标（4）的延伸。本发明提供了一种x射线设备，其中相对于微焦点x射线源对准X射线光学器件。

2. 发明公开

EP2741309A3 X-ray apparatus with deflectable electron beam 有权
标题翻译：与偏转电子束X射线装置
公开(公告)号：EP2741309A3
公开(公告)日：2016-05-18
申请号：EP13195676.5
申请日：2013-12-04
申请人： Bruker AXS GmbH
发明人： Ollinger, Christoph , Michaelsen, Carsten , Kleine, Andreas , Graf, Jürgen
IPC分类号： H01J35/08 , H01J35/30 , G21K1/06
CPC分类号： H01J35/30 , G21K1/06 , G21K1/067 , H01J35/08 , H01J35/14 , H01J2235/082 , H01J2235/086 , H05G1/58
摘要： An x-ray apparatus (1), comprising
- an electron beam source (2), emitting an electron beam (3),
- a target (4), onto which the electron beam (3) is directed, thus forming a focal spot (5; 5a, 5b) on the target (4),
- x-ray optics (6), collecting x-rays emitted from the focal spot (5; 5a, 5b) and forming an x-ray beam (8),
- and a sample position (9) at which the x-ray beam (8) is directed,
is characterized in that the x-ray apparatus (1) further comprises an electrostatic or electromagnetic electron beam deflection device (10), suitable for moving the focal spot (5; 5a, 5b) on the target (4),
and in that in any direction (x, y, z) the extension of the focal spot (5; 5a, 5b) is smaller at least by a factor F, with F=1.5, than the extension of the target (4). The invention provides an x-ray apparatus wherein aligning the x-ray optics with respect to a microfocus x-ray source is simplified.

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式