基本信息:
- 专利标题： X-RAY IRRADIATION DEVICE AND ANALYSIS DEVICE
- 申请号：EP11762263.9 申请日：2011-03-30
- 公开(公告)号：EP2542035B1 公开(公告)日：2018-08-29
- 发明人： YAMAZUI, Hiromichi , KOBAYASHI, Keisuke , IWAI, Hideo , KOBATA, Masaaki
- 申请人： National Institute for Materials Science , Ulvac-Phi, Inc.
- 申请人地址： 2-1 Sengen 1-chome Tsukuba-shi, Ibaraki 305-0047 JP
- 专利权人： National Institute for Materials Science,Ulvac-Phi, Inc.
- 当前专利权人： National Institute for Materials Science,Ulvac-Phi, Inc.
- 当前专利权人地址： 2-1 Sengen 1-chome Tsukuba-shi, Ibaraki 305-0047 JP
- 代理机构： Markfort, Iris-Anne Lucie
- 优先权： JP2010080669 20100331
- 国际公布： WO2011122020 20111006
- 主分类号： G01N23/2273
- IPC分类号： G01N23/2273 ; H01J35/30 ; H01J35/28 ; G21K7/00 ; G21K1/06
摘要：
[Object] The present invention provides an X-ray irradiation device capable of adjusting the energy of X-rays in a wide range, and an analysis device equipped with the X-ray irradiation device. [Solving Means] An X-ray irradiation device according to an embodiment of the present invention focuses X-rays emitted from an X-ray generation mechanism to a predetermined focal position by a focusing mechanism. The X-ray generation mechanism has a structure which generates a plurality of X-rays having different wavelengths. The focusing mechanism has a structure in which the plurality of X-rays are focused to the same focal position by focusing elements having diffraction characteristics suitable for the wavelengths of the respective X-rays generated by the X-ray generation mechanism.
公开/授权文献:
- EP2542035A1 X-RAY IRRADIATION DEVICE AND ANALYSIS DEVICE 公开/授权日：2013-01-02
IPC结构图谱:
| G | 物理 |
| --G01 | 测量；测试 |
| ----G01N | 借助于测定材料的化学或物理性质来测试或分析材料 |
| ------G01N23/00 | 利用未包括在G01N21/00或G01N22/00组内的波或粒子辐射来测试或分析材料，例如X射线、中子 |
| --------G01N23/02 | .通过使辐射透过材料 |
| ----------G01N23/225 | ..利用电子或离子微探针 |
| ------------G01N23/2273 | ...测量光电子光谱，例如用于化学分析的电子光谱 |