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1. 发明公开

EP2457247A2 CLEANING DEVICE FOR TRANSMISSION ELECTRON MICROSCOPES 有权
标题翻译：清洗装置的透射电子显微镜
公开(公告)号：EP2457247A2
公开(公告)日：2012-05-30
申请号：EP10802601.4
申请日：2010-06-17
申请人： Xei Scientific, Inc.
发明人： VANE, Ronald, A. , MORGAN, Christopher, G. , SAFAR, George , VARLEY, David
IPC分类号： H01J37/26 , H01J9/38
CPC分类号： B08B7/0035 , H01J37/02 , H01J37/26 , H01J2237/022 , H01J2237/16 , H01J2237/20
摘要： An apparatus for cleaning the specimen and interior specimen chamber of Transmission Electron Microscopes, and similar electron- or charged-particle-beam instruments consisting of a plasma cleaning device mounted on a hollow rod that replaces the stage through the air lock of the instrument by being the same shape and size as the stage support rod. The plasma cleaning device is a small hollow cathode that is excited by RF power. Air or other oxygen containing mixtures is admitted to the plasma through the hollow rod at a pressure below 1 Torr. The plasma creates oxygen radicals from the oxygen containing gas. The oxygen radicals oxidize the hydrocarbons contamination and convert them to easily pumped gases. The apparatus can be attached to the electron microscope whenever cleaning is needed, and then is easily removed to return the instrument to its analytical function.

2. 发明公开

EP2399270A1 CHARGED PARTICLE LITHOGRAPHY APPARATUS AND METHOD OF GENERATING VACUUM IN A VACUUM CHAMBER 有权转让
标题翻译：与带电粒子微影设备
公开(公告)号：EP2399270A1
公开(公告)日：2011-12-28
申请号：EP10704819.1
申请日：2010-02-17
申请人： Mapper Lithography IP B.V.
发明人： DE BOER, Guido , BALTUSSEN, Sander , JAGER, Remco , PEIJSTER, Jerry, Johannes, Martinus , TEEPEN, Tijs, Frans , VAN NIEUWSTADT, Joris, Anne, Henri , WEEDA, Willem, Maurits , VAN VEEN, Alexander, Hendrik, Vincent
IPC分类号： H01J37/16 , H01J37/18 , H01J37/20 , H01J37/305 , H01J37/317
CPC分类号： H01J37/16 , B82Y10/00 , B82Y40/00 , H01J37/165 , H01J37/18 , H01J37/20 , H01J37/305 , H01J37/317 , H01J37/3174 , H01J2237/16
摘要： The invention relates to a charged particle lithography apparatus (100) with a charged particle source (101) for creating one or more charged particle beams (123), a charged particle projector (108, 109, 110) for projecting the beams onto a wafer; and a moveable wafer stage (132) for carrying the wafer (130). The charged particle source, charged particle projector, and moveable wafer stage are disposed in a common vacuum chamber (140) forming a vacuum environment. The vacuum chamber further has an opening for loading wafers into the chamber and a door.

3. 发明公开

EP1724809A1 Particle-optical apparatus for the irradiation of a sample 审中-公开
标题翻译： TeilchenoptischesGerätzur Bestrahlung einer Probe
公开(公告)号：EP1724809A1
公开(公告)日：2006-11-22
申请号：EP05076151.9
申请日：2005-05-18
申请人： FEI COMPANY
发明人： Knowles, Ralph W.
IPC分类号： H01J37/28
CPC分类号： H01J37/256 , H01J37/228 , H01J37/28 , H01J2237/16 , H01J2237/2608
摘要： Many particle-optical apparatus operate with a gas pressure near the sample (118) higher than in the particle-optical column. To avoid leakage into the column a pressure limiting aperture (PLA) with a small diameter is used through which the particle beam (160) leaves the column. Often there is also the need to combine the use of such a column with a path for electro-magnetic radiation, e.g. for the detection of X-rays or when a light-optical microscope is included for observation and/or navigation. Creating a path for this radiation (and optical elements thereof) typically results in an increased working distance for the column, resulting in several disadvantages. The invention offers a solution by placing a window (156) transparent to the electro-magnetic radiation but impervious to gas adjacent to the PLA (140), through which the beam of radiation (170) can enter and/or emerge from the column, to be guided and/or detected further.
摘要翻译：许多粒子光学装置在样品（118）附近的气体压力高于颗粒光学柱中操作。为了避免泄漏到柱中，使用具有小直径的压力限制孔（PLA），粒子束（160）离开柱。通常还需要将这种柱的使用与用于电磁辐射的路径相结合，例如，用于检测X射线或当包含用于观察和/或导航的光学显微镜时。为该辐射（及其光学元件）创建路径通常导致柱的工作距离增加，导致几个缺点。本发明通过将窗口（156）放置为对电磁辐射透明但不透过与PLA（140）相邻的气体而提供了解决方案，辐射束（170）可以通过该窗口进入和/或从柱子出来，被引导和/或进一步检测。

4. 发明授权

EP2991095B1 High voltage feedthrough assembly, electron diffraction apparatus and method of electrode manipulation in a vacuum environment 失效
$High voltage feedthrough assembly, electron diffraction apparatus and method of electrode manipulation in a vacuum environment$
标题翻译：高压馈通组件，电子衍射装置和真空环境中的电极操纵方法
公开(公告)号：EP2991095B1
公开(公告)日：2018-01-31
申请号：EP14002942.2
申请日：2014-08-25
申请人： Max-Planck-Gesellschaft zur Förderung der Wissenschaften e.V.
发明人： Hirscht, Julian
IPC分类号： H01J37/02 , H01J37/295 , H01J37/065 , H01J37/073
CPC分类号： H01J37/023 , H01J37/065 , H01J37/073 , H01J37/248 , H01J37/26 , H01J37/261 , H01J37/295 , H01J2237/06333 , H01J2237/06341 , H01J2237/16
摘要： A high voltage feedthrough assembly 100 for providing an electric potential in a vacuum environment comprises a flange connector 10 being adapted for a connection with a vacuum vessel 201, wherein the flange connector 10 has an inner side facing to the vacuum vessel 201 and an outer side facing to an environment of the vacuum vessel 201, a vacuum-tight insulator tube 20 having a longitudinal extension with a first end facing to the flange connector 10 and a second end being adapted for projecting into the vacuum vessel 201, and an electrode device coupled to the second end of the insulator tube 20, wherein the electrode device has a front electrode 31 facing to the vacuum vessel 201 and a cable adapter 32 for receiving a high-voltage cable 214, wherein a flexible tube connector 40 is provided for a vacuum-tight coupling of the insulator tube 20 with the flange connector 10, and a manipulator device 50 is connected with the insulator tube 20 for adjusting a geometrical arrangement of the insulator tube 20 relative to the flange connector 10. Furthermore, an electron diffraction apparatus 200 including the high voltage feedthrough assembly 100 and a method of manipulating an electrode device in a vacuum environment are described.

5. 发明公开

EP3069366A1 MULTI-ELECTRODE STACK ARRANGEMENT 有权转让
标题翻译：多电极叠层安排
公开(公告)号：EP3069366A1
公开(公告)日：2016-09-21
申请号：EP14802838.4
申请日：2014-11-14
申请人： Mapper Lithography IP B.V.
发明人： URBANUS, Willem Henk , WIELAND, Marco Jan-Jaco
IPC分类号： H01J37/065 , H01J37/317 , H01J37/12
CPC分类号： G21K1/02 , G21K5/04 , H01J37/026 , H01J37/065 , H01J37/12 , H01J37/16 , H01J37/24 , H01J37/3002 , H01J37/3007 , H01J37/3174 , H01J37/3175 , H01J37/3177 , H01J2237/002 , H01J2237/0216 , H01J2237/024 , H01J2237/032 , H01J2237/04 , H01J2237/1215 , H01J2237/16 , H01J2237/1825 , H01J2237/303 , H01J2237/30472
摘要： The invention relates to an electrode stack (70) comprising stacked electrodes (71-80) for manipulating a charged particle beam along an optical axis (A). Each electrode comprises an electrode body with an aperture for the charged particle beam. The electrode bodies are mutually spaced and the electrode apertures are coaxially aligned along the optical axis. The electrode stack comprises electrically insulating spacing structures (89) between each pair of adjacent electrodes for positioning the electrodes (71-80) at predetermined mutual distances along the axial direction (Z). A first electrode and a second electrode each comprise an electrode body with one or more support portions (86), wherein each support portion is configured to accommodate at least one spacing structure (89). The electrode stack has at least one clamping member (91-91c) configured to hold the support portions (86) of the first and second electrodes, as well as the intermediate spacing structure (89) together.

6. 发明公开

EP3021347A1 Charged Particle Microscope with barometric pressure correction 审中-公开
标题翻译：带气压校正的带电粒子显微镜
公开(公告)号：EP3021347A1
公开(公告)日：2016-05-18
申请号：EP14192805.1
申请日：2014-11-12
申请人： FEI COMPANY
发明人： Moers, Marco , Visscher, Albert
IPC分类号： H01J37/02 , H01J37/26
CPC分类号： H01J37/265 , H01J37/02 , H01J2237/0216 , H01J2237/16
摘要： A method of using a Charged Particle Microscope, comprising the following steps:
- Providing a specimen on a specimen holder;
- Directing a beam of charged particles from a source through an illuminator so as to irradiate the specimen;
- Using a detector to detect a flux of radiation emanating from the specimen in response to said irradiation,

particularly comprising the following steps:
- Providing the microscope with a barometric pressure sensor;
- Providing an automatic controller with a pressure measurement signal from said barometric pressure sensor;
- Invoking said controller to use said signal as input to a control procedure, to compensate for a relative positional error of said beam and said specimen holder on the basis of said signal.
摘要翻译：一种使用带电粒子显微镜的方法，包括以下步骤： - 在样品架上提供样品; - 通过照明器将来自光源的带电粒子束引导以照射样品; - 使用检测器检测响应于所述照射从样本发出的辐射通量，具体包括以下步骤： - 为显微镜提供气压传感器; - 为自动控制器提供来自所述大气压力传感器的压力测量信号; - 调用所述控制器以使用所述信号作为控制过程的输入，以基于所述信号来补偿所述光束和所述样本保持器的相对位置误差。

7. 发明公开

EP2991095A1 High voltage feedthrough assembly, electron diffraction apparatus and method of electrode manipulation in a vacuum environment 失效
$High voltage feedthrough assembly, electron diffraction apparatus and method of electrode manipulation in a vacuum environment$
标题翻译： Hochspannungsdurchführungsanordnung，Elektronenbrechungsvorrichtung und Verfahren zur Elektrodenmanipulation in einer Vakuumumgebung
公开(公告)号：EP2991095A1
公开(公告)日：2016-03-02
申请号：EP14002942.2
申请日：2014-08-25
申请人： Max-Planck-Gesellschaft zur Förderung der Wissenschaften e.V.
发明人： Hirscht, Julian
IPC分类号： H01J37/02 , H01J37/295 , H01J37/065 , H01J37/073
CPC分类号： H01J37/023 , H01J37/065 , H01J37/073 , H01J37/26 , H01J37/295 , H01J2237/06333 , H01J2237/06341 , H01J2237/16
摘要： A high voltage feedthrough assembly 100 for providing an electric potential in a vacuum environment comprises a flange connector 10 being adapted for a connection with a vacuum vessel 201, wherein the flange connector 10 has an inner side facing to the vacuum vessel 201 and an outer side facing to an environment of the vacuum vessel 201, a vacuum-tight insulator tube 20 having a longitudinal extension with a first end facing to the flange connector 10 and a second end being adapted for projecting into the vacuum vessel 201, and an electrode device coupled to the second end of the insulator tube 20, wherein the electrode device has a front electrode 31 facing to the vacuum vessel 201 and a cable adapter 32 for receiving a high-voltage cable 214, wherein a flexible tube connector 40 is provided for a vacuum-tight coupling of the insulator tube 20 with the flange connector 10, and a manipulator device 50 is connected with the insulator tube 20 for adjusting a geometrical arrangement of the insulator tube 20 relative to the flange connector 10. Furthermore, an electron diffraction apparatus 200 including the high voltage feedthrough assembly 100 and a method of manipulating an electrode device in a vacuum environment are described.
摘要翻译：用于在真空环境中提供电位的高压馈通组件100包括适于与真空容器201连接的凸缘连接器10，其中凸缘连接器10具有面向真空容器201的内侧和外侧面向真空容器201的环境的真空密封绝缘管20具有纵向延伸部，其第一端面向凸缘连接器10，第二端部适于突出到真空容器201中;以及电极装置，到绝缘体管20的第二端，其中电极装置具有面向真空容器201的前电极31和用于接收高压电缆214的电缆适配器32，其中为真空提供柔性管连接器40 绝缘体管20与凸缘连接器10的一个很好的耦合，并且操纵器装置50与绝缘管20连接，用于调节绝缘体管20的几何排列 e绝缘体管20相对于凸缘连接器10.此外，描述了包括高压馈通组件100的电子衍射装置200以及在真空环境中操作电极装置的方法。

8. 发明授权

EP2457247B1 CLEANING DEVICE FOR TRANSMISSION ELECTRON MICROSCOPES 有权
标题翻译：清洗装置的透射电子显微镜
公开(公告)号：EP2457247B1
公开(公告)日：2014-04-16
申请号：EP10802601.4
申请日：2010-06-17
申请人： Xei Scientific, Inc.
发明人： VANE, Ronald, A. , MORGAN, Christopher, G. , SAFAR, George , VARLEY, David
IPC分类号： H01J37/26 , H01J9/38 , B08B7/00 , H01J37/02
CPC分类号： B08B7/0035 , H01J37/02 , H01J37/26 , H01J2237/022 , H01J2237/16 , H01J2237/20

9. 发明公开

EP2584586A1 CHARGED PARTICLE DEVICE 审中-公开
标题翻译： VORRICHTUNGFÜRGELADENE TEILCHEN
公开(公告)号：EP2584586A1
公开(公告)日：2013-04-24
申请号：EP11795646.6
申请日：2011-06-10
申请人： Hitachi High-Technologies Corporation
发明人： ENOMOTO Hirohisa , SUZUKI Wataru , KITAYAMA Shinya
IPC分类号： H01J37/20 , H01J37/16
CPC分类号： H01J37/20 , H01J37/3056 , H01J2237/0216 , H01J2237/16 , H01J2237/20207 , H01J2237/20214 , H01J2237/20235 , H01J2237/31749
摘要： A charged particle device that can prevent an effect of a vibration and suppress relative displacement between a charged particle generator and a specimen stage without reducing a movement range of the specimen stage is achieved. The charged particle device (1) has a long cylindrical column (2) at its upper portion and a hollow specimen chamber (3) arranged under the column (2). The specimen chamber (3) is divided into a specimen chamber upper portion (3a) and a specimen chamber bottom portion (3b). A vertical vibration of the specimen chamber upper portion (3a) is larger than a horizontal vibration of the specimen chamber upper portion (3a). A horizontal vibration of the specimen chamber bottom portion (3b) is large. The column (2) has a charged particle gun and a detector. The column (1) and a specimen stage supporter (4) are held by the specimen chamber upper portion (3a), while the specimen stage supporter (4) holds the specimen stage (5). A central axis of the column (1) and a central axis of the specimen stage supporter (4) match each other or are parallel to each other. Even if an environmental sound is added to the column (2) or the specimen chamber (3), the column (2) and the specimen stage (5) are fixed to the specimen chamber upper portion (3a) and vibrate in an integrated manner. Thus, relative displacement hardly occurs between the charged particle generator and a specimen.
摘要翻译：实现了能够防止振动影响并抑制带电粒子发生器与样本台之间的相对位移而不减少样本台的移动范围的带电粒子装置。带电粒子装置（1）在其上部具有长圆柱体（2）和布置在柱（2）下方的中空标本室（3）。试样室（3）分为试样室上部（3a）和试样室底部（3b）。试样室上部（3a）的垂直振动大于试样室上部（3a）的水平振动。试样室底部（3b）的水平振动大。柱（2）具有带电粒子枪和检测器。柱体（1）和试样台支架（4）由样品室上部（3a）保持，而试样台支架（4）保持试样台（5）。柱（1）的中心轴线和样品台支撑件（4）的中心轴彼此匹配或彼此平行。即使在柱（2）或样品室（3）中添加环境声音，也将柱（2）和样品台（5）固定在试样室上部（3a）上，并以一体的方式振动。因此，带电粒子发生器与试样之间几乎不发生相对位移。

10. 发明授权

EP1933037B1 Anordnung mit Vakuumpumpe 有权
公开(公告)号：EP1933037B1
公开(公告)日：2018-09-05
申请号：EP07022563.6
申请日：2007-11-21
申请人： PFEIFFER VACUUM GMBH
发明人： Mädler, Matthias , Fahrenbach, Peter
IPC分类号： F04D17/16 , F04D19/04 , F04D29/60
CPC分类号： F04D19/042 , F04D19/04 , F04D29/601 , H01J2237/16 , H01J2237/1825

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