专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明公开

EP2457247A2 CLEANING DEVICE FOR TRANSMISSION ELECTRON MICROSCOPES 有权
标题翻译：清洗装置的透射电子显微镜
公开(公告)号：EP2457247A2
公开(公告)日：2012-05-30
申请号：EP10802601.4
申请日：2010-06-17
申请人： Xei Scientific, Inc.
发明人： VANE, Ronald, A. , MORGAN, Christopher, G. , SAFAR, George , VARLEY, David
IPC分类号： H01J37/26 , H01J9/38
CPC分类号： B08B7/0035 , H01J37/02 , H01J37/26 , H01J2237/022 , H01J2237/16 , H01J2237/20
摘要： An apparatus for cleaning the specimen and interior specimen chamber of Transmission Electron Microscopes, and similar electron- or charged-particle-beam instruments consisting of a plasma cleaning device mounted on a hollow rod that replaces the stage through the air lock of the instrument by being the same shape and size as the stage support rod. The plasma cleaning device is a small hollow cathode that is excited by RF power. Air or other oxygen containing mixtures is admitted to the plasma through the hollow rod at a pressure below 1 Torr. The plasma creates oxygen radicals from the oxygen containing gas. The oxygen radicals oxidize the hydrocarbons contamination and convert them to easily pumped gases. The apparatus can be attached to the electron microscope whenever cleaning is needed, and then is easily removed to return the instrument to its analytical function.

2. 发明公开

EP2399270A1 CHARGED PARTICLE LITHOGRAPHY APPARATUS AND METHOD OF GENERATING VACUUM IN A VACUUM CHAMBER 有权转让
标题翻译：与带电粒子微影设备
公开(公告)号：EP2399270A1
公开(公告)日：2011-12-28
申请号：EP10704819.1
申请日：2010-02-17
申请人： Mapper Lithography IP B.V.
发明人： DE BOER, Guido , BALTUSSEN, Sander , JAGER, Remco , PEIJSTER, Jerry, Johannes, Martinus , TEEPEN, Tijs, Frans , VAN NIEUWSTADT, Joris, Anne, Henri , WEEDA, Willem, Maurits , VAN VEEN, Alexander, Hendrik, Vincent
IPC分类号： H01J37/16 , H01J37/18 , H01J37/20 , H01J37/305 , H01J37/317
CPC分类号： H01J37/16 , B82Y10/00 , B82Y40/00 , H01J37/165 , H01J37/18 , H01J37/20 , H01J37/305 , H01J37/317 , H01J37/3174 , H01J2237/16
摘要： The invention relates to a charged particle lithography apparatus (100) with a charged particle source (101) for creating one or more charged particle beams (123), a charged particle projector (108, 109, 110) for projecting the beams onto a wafer; and a moveable wafer stage (132) for carrying the wafer (130). The charged particle source, charged particle projector, and moveable wafer stage are disposed in a common vacuum chamber (140) forming a vacuum environment. The vacuum chamber further has an opening for loading wafers into the chamber and a door.

3. 发明公开

EP1724809A1 Particle-optical apparatus for the irradiation of a sample 审中-公开
标题翻译： TeilchenoptischesGerätzur Bestrahlung einer Probe
公开(公告)号：EP1724809A1
公开(公告)日：2006-11-22
申请号：EP05076151.9
申请日：2005-05-18
申请人： FEI COMPANY
发明人： Knowles, Ralph W.
IPC分类号： H01J37/28
CPC分类号： H01J37/256 , H01J37/228 , H01J37/28 , H01J2237/16 , H01J2237/2608
摘要： Many particle-optical apparatus operate with a gas pressure near the sample (118) higher than in the particle-optical column. To avoid leakage into the column a pressure limiting aperture (PLA) with a small diameter is used through which the particle beam (160) leaves the column. Often there is also the need to combine the use of such a column with a path for electro-magnetic radiation, e.g. for the detection of X-rays or when a light-optical microscope is included for observation and/or navigation. Creating a path for this radiation (and optical elements thereof) typically results in an increased working distance for the column, resulting in several disadvantages. The invention offers a solution by placing a window (156) transparent to the electro-magnetic radiation but impervious to gas adjacent to the PLA (140), through which the beam of radiation (170) can enter and/or emerge from the column, to be guided and/or detected further.
摘要翻译：许多粒子光学装置在样品（118）附近的气体压力高于颗粒光学柱中操作。为了避免泄漏到柱中，使用具有小直径的压力限制孔（PLA），粒子束（160）离开柱。通常还需要将这种柱的使用与用于电磁辐射的路径相结合，例如，用于检测X射线或当包含用于观察和/或导航的光学显微镜时。为该辐射（及其光学元件）创建路径通常导致柱的工作距离增加，导致几个缺点。本发明通过将窗口（156）放置为对电磁辐射透明但不透过与PLA（140）相邻的气体而提供了解决方案，辐射束（170）可以通过该窗口进入和/或从柱子出来，被引导和/或进一步检测。

4. 发明授权

EP1933037B1 Anordnung mit Vakuumpumpe 有权
公开(公告)号：EP1933037B1
公开(公告)日：2018-09-05
申请号：EP07022563.6
申请日：2007-11-21
申请人： PFEIFFER VACUUM GMBH
发明人： Mädler, Matthias , Fahrenbach, Peter
IPC分类号： F04D17/16 , F04D19/04 , F04D29/60
CPC分类号： F04D19/042 , F04D19/04 , F04D29/601 , H01J2237/16 , H01J2237/1825

5. 发明公开

EP3175218A1 LADESTATION ZUM UMLADEN VON GEFRORENEN PROBEN BEI TIEFEN TEMPERATUREN 审中-公开
标题翻译： LENESTATION ZUM UMLADEN VON GEFRORENEN PROBEN贝TIEFEN TEMPERATUREN
公开(公告)号：EP3175218A1
公开(公告)日：2017-06-07
申请号：EP15738325.8
申请日：2015-07-15
申请人： Leica Mikrosysteme GmbH
发明人： LIHL, Reinhard , GAECHTER, Leander
IPC分类号： G01N1/42 , G01N1/06 , G01N1/32
CPC分类号： H01J37/20 , G01N1/06 , G01N1/32 , G01N1/42 , G02B21/00 , H01J37/18 , H01J37/26 , H01J2237/16 , H01J2237/20221 , H01J2237/262
摘要： The invention relates to a loading station (100, 200) for transferring a frozen sample for electron microscopy, comprising a chamber (104, 204), which is open in the upward direction and which can be at least partially filled with a coolant, wherein the chamber (104, 204) has, in a side wall thereof, at least two connections (101a, 102a, 103a) for different sample transfer devices (101, 102, 103), wherein the connections (101a, 102a, 103a) allow a frozen sample to be inserted into the chamber (104, 204) by means of a selected sample transfer device and allow a frozen sample to be removed from the chamber by means of a different sample transfer device, and wherein a receptacle (108, 208) for at least two differently designed sample holders (109, 110) is arranged in the chamber (104, 204), wherein the at least two sample holders (109, 110) can be detachably fastened to at least one of the sample transfer devices (101) in order to insert the frozen sample into the chamber (104, 204) and to remove the frozen sample from the chamber (104, 204).
摘要翻译：本发明涉及一种用于传送用于电子显微镜的冷冻样本的装载站（100,200），其包括腔室（104,204），所述腔室在向上方向上打开并且可以至少部分地填充有冷却剂，其中腔室（104,204）在其侧壁中具有用于不同样本转移装置（101,102,103）的至少两个连接件（101a，102a，103a），其中连接件（101a，102a，103a）允许利用选定的样本转移装置将冷冻样本插入腔室（104,204）中，并允许通过不同的样本转移装置将冷冻样本从腔室移除，并且其中容器（108,208 ）至少两个不同设计的样本保持器（109,110）被布置在腔室（104,204）中，其中至少两个样本保持器（109,110）可以可拆卸地固定到至少一个样本传送装置（101）以便将冷冻样本插入腔室（104,204）中并且t o从腔室（104,204）移除冷冻样本。

6. 发明公开

EP3069368A1 ELECTRODE COOLING ARRANGEMENT 有权转让
标题翻译：电极冷却装置
公开(公告)号：EP3069368A1
公开(公告)日：2016-09-21
申请号：EP14799152.5
申请日：2014-11-14
申请人： Mapper Lithography IP B.V.
发明人： URBANUS, Willem Henk , WIELAND, Marco Jan-Jaco
IPC分类号： H01J37/317 , H01J37/065
CPC分类号： G21K1/02 , G21K5/04 , H01J37/026 , H01J37/065 , H01J37/12 , H01J37/16 , H01J37/24 , H01J37/3002 , H01J37/3007 , H01J37/3174 , H01J37/3175 , H01J37/3177 , H01J2237/002 , H01J2237/0216 , H01J2237/024 , H01J2237/032 , H01J2237/04 , H01J2237/1215 , H01J2237/16 , H01J2237/1825 , H01J2237/303 , H01J2237/30472
摘要： The invention relates to a collimator electrode, comprising an electrode body (81) that is provided with a central electrode aperture (82), wherein the electrode body defines an electrode height between two opposite main surfaces, and wherein the electrode body accommodates a cooling conduit (105) inside the electrode body for transferring a cooling liquid (102). The electrode body preferably has a disk shape or an oblate ring shape. The invention further relates to a collimator electrode stack for use in a charged particle beam generator, comprising a first collimator electrode and a second collimator electrode that are each provided with a cooling conduit (105) for transferring the cooling liquid (102), and a connecting conduit (110) for a liquid connection between the cooling conduits of the first and second collimator electrodes.

7. 发明公开

EP3021348A1 CHARGED PARTICLE MICROSCOPE WITH BAROMETRIC PRESSURE CORRECTION 审中-公开
标题翻译：带压力校正的带电粒子显微镜
公开(公告)号：EP3021348A1
公开(公告)日：2016-05-18
申请号：EP15193785.1
申请日：2015-11-10
申请人： FEI Company
发明人： Moers, Marco , Visscher, Albert
IPC分类号： H01J37/02 , H01J37/26
CPC分类号： H01J37/265 , H01J37/02 , H01J2237/0216 , H01J2237/16
摘要： A method of using a Charged Particle Microscope, comprising the following steps:
- Providing a specimen on a specimen holder;
- Directing a beam of charged particles from a source through an illuminator so as to irradiate the specimen;
- Using a detector to detect a flux of radiation emanating from the specimen in response to said irradiation,

particularly comprising the following steps:
- Providing the microscope with a barometric pressure sensor;
- Providing an automatic controller with a pressure measurement signal from said barometric pressure sensor;
- Invoking said controller to use said signal as input to a control procedure, to compensate for a relative positional error of said beam and said specimen holder on the basis of said signal.
摘要翻译：一种使用带电粒子显微镜的方法，包括以下步骤： - 在样品架上提供样品; - 通过照明器将来自光源的带电粒子束引导以照射样品; - 使用检测器检测响应于所述照射从样本发出的辐射通量，具体包括以下步骤： - 为显微镜提供气压传感器; - 为自动控制器提供来自所述大气压力传感器的压力测量信号; - 调用所述控制器以使用所述信号作为控制过程的输入，以基于所述信号来补偿所述光束和所述样本保持器的相对位置误差。

8. 发明公开

EP2642505A4 FIELD EMISSION APPARATUS AND HAND-HELD NONDESTRUCTIVE INSPECTION APPARATUS 审中-公开
标题翻译：场发射装置和便携式装置非破坏性测试
公开(公告)号：EP2642505A4
公开(公告)日：2016-01-06
申请号：EP11839819
申请日：2011-06-08
申请人： MICRO X JAPAN LTD
发明人： ISHIGURO YOSHIHISA , HABA MASANORI
IPC分类号： H01J5/02 , H01J1/46 , H01J7/24 , H01J35/16
CPC分类号： H01J19/54 , H01J19/42 , H01J35/065 , H01J2201/30469 , H01J2235/062 , H01J2237/16

9. 发明公开

EP3189540A1 PROCESS GAS ENHANCEMENT FOR BEAM TREATMENT OF A SUBSTRATE 审中-公开
标题翻译：工艺气体增强用于基板的光束处理
公开(公告)号：EP3189540A1
公开(公告)日：2017-07-12
申请号：EP15837426.4
申请日：2015-09-01
申请人： Tel Epion Inc.
发明人： GRAF, Michael , RUSSELL, Noel , GWINN, Matthew C. , LEITH, Allen J.
IPC分类号： H01L21/205 , H01L21/265
CPC分类号： H01L21/3065 , H01J27/026 , H01J37/317 , H01J2237/006 , H01J2237/0812 , H01J2237/16 , H01J2237/31732 , H01J2237/3174 , H01L21/31116 , H01L21/32136
摘要： A beam processing system and method of operating are described. In particular, the beam processing system includes a beam source having a nozzle assembly that is configured to introduce a primary gas through the nozzle assembly to a vacuum vessel in order to produce a gaseous beam, such as a gas cluster beam, and optionally, an ionizer positioned downstream from the nozzle assembly, and configured to ionize the gaseous beam to produce an ionized gaseous beam. The beam processing system further includes a process chamber within which a substrate is positioned for treatment by the gaseous beam, and a secondary gas source, wherein the secondary gas source includes a secondary gas supply system that delivers a secondary gas, and a secondary gas controller that operatively controls the flow of the secondary gas injected into the beam processing system downstream of the nozzle assembly.
摘要翻译：描述了光束处理系统和操作方法。具体而言，束处理系统包括具有喷嘴组件的束源，该喷嘴组件被配置为将通过喷嘴组件的主气体引入真空容器以产生气体束如气体束束，并且可选地包括电离器，其定位在喷嘴组件的下游，并且被配置为使气体束电离以产生电离的气体束。该束处理系统还包括：处理室，在该处理室中，衬底被定位以用于由气体束处理;以及第二气体源，其中第二气体源包括输送第二气体的第二气体供给系统和第二气体控制器其可操作地控制喷射到喷嘴组件下游的射束处理系统中的二次气体的流动。

10. 发明公开

EP1933037A3 Anordnung mit Vakuumpumpe 有权
标题翻译：与真空泵安排
公开(公告)号：EP1933037A3
公开(公告)日：2014-04-23
申请号：EP07022563.6
申请日：2007-11-21
申请人： PFEIFFER VACUUM GMBH
发明人： Mädler, Matthias , Fahrenbach, Peter
IPC分类号： F04D17/16 , F04D19/04 , F04D29/60
CPC分类号： F04D19/042 , F04D19/04 , F04D29/601 , H01J2237/16 , H01J2237/1825
摘要： Anordnung mit einer Vakuumkammer, welche einen Kammerflansch aufweist, und einer Vakuumpumpe, welche einen in einem Rotorgehäuse angeordneten, schnelldrehenden Rotor und einen Pumpenflansch aufweist. Um im Falle eines Rotor-Stator-Kontakts freiwerdende Drehmomente sicher aufzufangen, schlägt die Erfindung vor, dass die Anordnung ein drehmomentsicheres Sicherungsmittel aufweist, welches das Rotorgehäuse mit einer Drehmomentsenke verbindet.
摘要翻译：带真空室的装置有真空室法兰和真空泵，真空泵有一个布置在转子壳体内的高速转子和一个泵法兰。为了在转子 - 定子接触的情况下安全地吸收释放的转矩，本发明提出，该装置具有将转子壳体与转矩槽连接的防扭矩固定装置。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式