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    • 8. 发明公开
    • METAL-FILM FORMING APPARATUS AND METAL-FILM FORMING METHOD
    • METALLFILMHERSTELLUNGSVORRICHTUNG发布METALLFILMHERSTELLUNGSVERFAHREN
    • EP3037571A1
    • 2016-06-29
    • EP15202454.3
    • 2015-12-23
    • Toyota Jidosha Kabushiki Kaisha
    • HIRAOKA, MotokiYANAGIMOTO, HiroshiSATO, Yuki
    • C25D3/00C25D5/02C25D17/00C25D17/14H05K3/00
    • A metal-film forming apparatus (1A) includes: an anode (11); a resin substrate (B) having a surface on which a conductor pattern layer (D) that serves as a cathode is formed; a solid electrolyte membrane (13) that contains metal ions and is between the anode and the resin substrate, the solid electrolyte membrane contacting a surface of the conductor pattern layer when a metal film is formed; a power supply (16); and a conductive member (17A) that is arranged contacting the conductor pattern layer when the metal film is formed, such that a negative electrode of the power supply is electrically connected to the conductor pattern layer, the conductive member being detachable from the conductor pattern layer, wherein the metal ions are reduced to deposit metal that forms the metal film on the surface of the conductor pattern layer when the voltage is applied.
    • 金属膜形成装置(1A)包括:阳极(11); 形成有作为阴极的导体图案层(D)的表面的树脂基板(B) 含有金属离子并且位于阳极和树脂基板之间的固体电解质膜(13),当形成金属膜时,所述固体电解质膜与所述导体图案层的表面接触; 电源(16); 以及导电构件(17A),其在形成所述金属膜时被布置成与所述导体图案层接触,使得所述电源的负极电连接到所述导体图案层,所述导电构件可从所述导体图案层拆卸 其中,当施加电压时,金属离子被还原以沉积在导体图案层的表面上形成金属膜的金属。
    • 10. 发明公开
    • FILM FORMING APPARATUS FOR METAL COATING FILM AND FILM FORMING METHOD THEREFOR
    • FILMBILDENDE VORRICHTUNGFÜREINEN METALLBESCHICHTUNGSFILM UND FILMBILDUNGSVERFAHRENDAFÜR
    • EP3070191A1
    • 2016-09-21
    • EP14861239.3
    • 2014-11-12
    • TOYOTA JIDOSHA KABUSHIKI KAISHA
    • HIRAOKA, MotokiYANAGIMOTO, HiroshiSATO, Yuki
    • C25D17/00C25D13/00
    • C25D5/06C25D3/00C25D17/00C25D17/002C25D17/005C25D17/14
    • Provided is film formation apparatus of a metal film and a film formation method therefor capable of forming a homogeneous metal film of a uniform thickness stably, while being less affected by the surface state of the anode. A film formation apparatus 1A includes: an anode 11; a solid electrolyte membrane 13 disposed between the anode 11 and a base B serving as a cathode; and a power supply unit 14 to apply voltage between the anode 11 and the base B, the film formation apparatus being configured so that, when the solid electrolyte membrane 13 is brought into contact with a surface of the base B, and voltage is applied between the anode 11 and the base B, metal is deposited on the surface of the base B from metal ions included inside of the solid electrolyte membrane 13, so that the metal film F made of the metal is formed. The film formation apparatus 1A includes a mounting base 21 on which the base B is to be placed, and the mounting base 21 has a suction unit 22 to suck the solid electrolyte membrane 13 from a side of the base B so that the solid electrolyte membrane 13 is brought into intimate contact with the surface of the base B during formation of the metal film F.
    • 提供一种金属膜的成膜装置及其成膜方法,能够稳定地形成均匀厚度均匀的金属膜,同时受到阳极表面状态的影响较小。 成膜装置1A包括:阳极11; 设置在阳极11和用作阴极的基体B之间的固体电解质膜13; 以及在阳极11和基体B之间施加电压的电源单元14,成膜装置被构造成使得当固体电解质膜13与基体B的表面接触时, 阳极11和基底B,金属由固体电解质膜13内部的金属离子沉积在基体B的表面上,形成由金属制成的金属膜F. 成膜装置1A包括:安装基座21,其上放置有基座B;安装基座21具有吸引单元22,用于从基座B侧吸取固体电解质膜13,使固体电解质膜 13在金属膜F的形成期间与基体B的表面紧密接触。