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    • 4. 发明公开
    • FILM FORMATION DEVICE AND FILM FORMATION METHOD FOR FORMING METAL FILM
    • FILMBILDUNGSVORRICHTUNG电影电视节目ZUR HERSTELLUNG VON METALLSCHICHTEN
    • EP2818585A1
    • 2014-12-31
    • EP13751478.2
    • 2013-02-21
    • TOYOTA JIDOSHA KABUSHIKI KAISHA
    • HIRAOKA, MotokiYANAGIMOTO, HiroshiSATO, YukiYOSHIOKA, Takayasu
    • C25D17/12C25D17/14
    • Provided are a film formation device and a film formation method for forming a metal film, with which metal films with a desired thickness can be continuously formed on surfaces of a plurality of substrates. A film formation device 1A includes at least a positive electrode 11, a negative electrode 12, a solid electrolyte membrane 13 arranged on a surface of the positive electrode 12, between the positive electrode and a substrate to serve as the negative electrode, and a power supply unit E adapted to apply a voltage across the positive electrode 11 and the substrate B. A voltage is applied across the positive electrode 11 and the substrate B to deposit metal on a surface of the substrate from metal ions contained in the solid electrolyte membrane 13, whereby a metal film F made of metal is formed. The positive electrode 11 is made of a porous body that allows a solution L containing metal ions to pass therethrough and supplies the metal ions to the solid electrolyte membrane 13.
    • 提供一种用于形成金属膜的成膜装置和成膜方法,可以在多个基板的表面上连续地形成具有所需厚度的金属膜。 成膜装置1A至少包括正极11,负极12,布置在正极12的表面上的固体电解质膜13,正极和基板之间用作负极,功率 供给单元E适于在正电极11和基板B两端施加电压。在正电极11和基板B两端施加电压,以将固体电解质膜13中所含的金属离子上的金属沉积在基板的表面上 由此形成由金属制成的金属膜F. 正极11由允许包含金属离子的溶液L通过并将金属离子供给固体电解质膜13的多孔体制成。