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1. 发明授权

EP1592821B1 VERFAHREN ZUR HERSTELLUNG EINER MULTILAYERSCHICHT UND VORRICHTUNG ZUR DURCHFÜHRUNG DES VERFAHRENS 有权
标题翻译：一种用于生产多层层和设备用于实施过程
公开(公告)号：EP1592821B1
公开(公告)日：2009-01-14
申请号：EP03812171.1
申请日：2003-12-03
申请人： Leybold Optics GmbH
发明人： SCHERER, Michael , PISTNER, Jürgen , LEHNERT, Walter , HAGEDORN, Harro , DEPPISCH, Gerd , RÖDER, Mario
IPC分类号： C23C14/00 , C23C14/02 , C23C14/58
CPC分类号： C23C14/0094 , C23C14/0078 , C23C14/024 , C23C14/08 , C23C14/547 , H01J37/34 , H01J2237/3321
摘要： The invention relates to a method for producing a coating (1) on a displaceable substrate (2) in a vacuum chamber (10) with the aid of a residual gas, by means of a sputtering device (3, 7), said coating (1) being formed from at least two constituents, whereby a sputtering material of the sputtering device (3, 7) constitutes at least one first constituent and a reactive component of the residual gas constitutes a second constituent. The method comprises the following steps: reactive deposition of a coating (1) on the substrate (2) by the addition of a reactive component, with a predetermined stoichiometric deficit of the reactive component in a zone of the sputtering device (3, 7); displacement of the substrate (2) with the deposited coating (1) into the vicinity of a plasma source (5), which is located in the vacuum chamber (10) at a predetermined distance from the sputtering device (3, 7); modification of the structure and/or stoichiometry of the coating (1) by the action of the plasma of the plasma source (5), preferably by the addition of a predetermined quantity of the reactive component, to reduce the optical loss of the coating (1). The invention also relates to a method for producing a multilayer coating with the aid of at least one coating device that can be reactively operated (3) and at least one reaction device (5) in a vacuum chamber (10). According to said method, a second coating is deposited on a first coating of at least one substrate (2) that can be displaced in relation to the coating device (3) or the reaction device (5), with the aid of the reactive component and the structure and/or stoichiometry of at least one coating is modified using the reaction device (5). The aim of the invention is to reduce the optical loss of the multilayer coating to below a predetermined value in a zone of the second coating adjoining the first coating. To achieve this, an interface is created with a thickness dI and a value for the deficit of the reactive component DEF that is less than a value DEFI. The invention further relates to a device for producing coatings according to said methods, in addition to a coating and a multilayer coating produced according to the inventive method.

2. 发明公开

EP1592821A2 VERFAHREN ZUR HERSTELLUNG EINER MULTILAYERSCHICHT UND VORRICHTUNG ZUR DURCHFÜHRUNG DES VERFAHRENS 有权
标题翻译：一种用于生产多层层和设备用于实施过程
公开(公告)号：EP1592821A2
公开(公告)日：2005-11-09
申请号：EP03812171.1
申请日：2003-12-03
申请人： Leybold Optics GmbH
发明人： SCHERER, Michael , PISTNER, Jürgen , LEHNERT, Walter , HAGEDORN, Harro , DEPPISCH, Gerd , RÖDER, Mario
IPC分类号： C23C14/00 , C23C14/02 , C23C14/58
CPC分类号： C23C14/0094 , C23C14/0078 , C23C14/024 , C23C14/08 , C23C14/547 , H01J37/34 , H01J2237/3321
摘要： The invention relates to a method for producing a coating (1) on a displaceable substrate (2) in a vacuum chamber (10) with the aid of a residual gas, by means of a sputtering device (3, 7), said coating (1) being formed from at least two constituents, whereby a sputtering material of the sputtering device (3, 7) constitutes at least one first constituent and a reactive component of the residual gas constitutes a second constituent. The method comprises the following steps: reactive deposition of a coating (1) on the substrate (2) by the addition of a reactive component, with a predetermined stoichiometric deficit of the reactive component in a zone of the sputtering device (3, 7); displacement of the substrate (2) with the deposited coating (1) into the vicinity of a plasma source (5), which is located in the vacuum chamber (10) at a predetermined distance from the sputtering device (3, 7); modification of the structure and/or stoichiometry of the coating (1) by the action of the plasma of the plasma source (5), preferably by the addition of a predetermined quantity of the reactive component, to reduce the optical loss of the coating (1). The invention also relates to a method for producing a multilayer coating with the aid of at least one coating device that can be reactively operated (3) and at least one reaction device (5) in a vacuum chamber (10). According to said method, a second coating is deposited on a first coating of at least one substrate (2) that can be displaced in relation to the coating device (3) or the reaction device (5), with the aid of the reactive component and the structure and/or stoichiometry of at least one coating is modified using the reaction device (5). The aim of the invention is to reduce the optical loss of the multilayer coating to below a predetermined value in a zone of the second coating adjoining the first coating. To achieve this, an interface is created with a thickness dI and a value for the deficit of the reactive component DEF that is less than a value DEFI. The invention further relates to a device for producing coatings according to said methods, in addition to a coating and a multilayer coating produced according to the inventive method.

3. 发明公开

EP2425445A1 VERFAHREN ZUR ERZEUGUNG EINES PLASMASTRAHLS SOWIE PLASMAQUELLE 有权
标题翻译：方法产生等离子体束和等离子体源
公开(公告)号：EP2425445A1
公开(公告)日：2012-03-07
申请号：EP10747406.6
申请日：2010-04-27
申请人： Leybold Optics GmbH
发明人： SCHERER, Michael , PISTNER, Jürgen
IPC分类号： H01J37/32
CPC分类号： H01J37/3266 , H01J37/32357
摘要： In the method for producing a plasma jet, which is extracted from a plasma produced by electric and magnetic fields by a high frequency voltage being applied to an extraction electrode and an HF electrode apparatus having an excitation electrode with an excitation surface, a plasma chamber being arranged between an extraction electrode and an excitation surface and, as compared with the extraction electrode, the time average of the plasma lying at a higher potential accelerating positive plasma ions, and the plasma and extracted plasma jet being influenced by a magnetic field, the invention provides that, in order to produce a magnetic field, use is made of a planar magnetron which is arranged after the excitation electrode on the side facing away from the plasma, and the magnetic north poles and magnetic south poles of which are directed into the interior of the plasma chamber, so that a curved magnetic field projecting into the interior of the plasma chamber is formed. In the plasma source for carrying out the method, having a plasma vessel with an extraction electrode and having an HF electrode apparatus, having an excitation electrode with an excitation surface, which is or can be connected via a matching network to an HF generator, a plasma chamber, in which a plasma can be excited, being located between excitation surface and extraction electrode, and the size of the area of the extraction electrode and of the excitation surface being chosen such that virtually all of the high frequency voltage is dropped across the extraction electrode; having a magnetic device for reducing the magnetic field, provision is made for the magnetic device to have at least one magnetic north pole and one magnetic south pole, which are in each case arranged after the excitation electrode on the side facing away from the plasma chamber and are directed into the interior of the plasma chamber, so that a curved magnetic field projecting into the interior of the plasma chamber can be formed, wherein at least one of the north or south poles is designed to be elongated, so that a tunnel-like region can be formed in which charged particles can be retained and along which they are able to propagate.

4. 发明公开

EP2307588A1 VERFAHREN ZUR HERSTELLUNG EINES SCHICHTSYSTEMS AUF EINEM SUBSTRAT, SOWIE SCHICHTSYSTEM 有权
标题翻译：用于生产层系统的基片和层系
公开(公告)号：EP2307588A1
公开(公告)日：2011-04-13
申请号：EP09777408.7
申请日：2009-07-23
申请人： Leybold Optics GmbH
发明人： PISTNER, Jürgen , SCHMAUDER, Torsten , KÜPER, Stephan
IPC分类号： C23C14/06 , C23C14/02 , B05D5/06 , C23C14/04
CPC分类号： C23C14/0641 , C23C14/0015 , C23C14/025 , C23C14/04 , C23C16/006
摘要： The invention relates to a method for producing a layer system on a dielectric substrate (12), wherein a metal layer (14) is applied to the substrate (12) in a coating step (110) and, in a subsequent coating step (140), a further layer (24) of given layer thickness is applied, wherein the metal layer (14) has a sheet resistance > 10 MOhm, and a mean reflection degree > 50%, wherein the further layer (24), when applied with the same layer thickness in the further coating step (140) to the substrate (12) has a sheet resistance 10 MOhm. The invention further relates to a layer system on a dielectric substrate (12), wherein a metal layer (14) is applied to the substrate (12) in a coating step (110) and in a subsequent further coating step (140) a further layer (24) of given layer thickness is applied, wherein the metal layer (14) has a sheet resistance > 10 MOhm, and a mean reflection degree > 50%, wherein the further layer (24), when applied with the same layer thickness in the further coating step (140) to the substrate (12) has a sheet resistance 10 MOhm. A housing can further be provided with said layer system.

5. 发明公开

EP2761643A1 VERFAHREN UND VORRICHTUNG ZUR ERZEUGUNG EINER REFLEKTIONSMINDERNDEN SCHICHT AUF EINEM SUBSTRAT 有权转让
标题翻译：方法和装置产生的减反射层上的衬底
公开(公告)号：EP2761643A1
公开(公告)日：2014-08-06
申请号：EP12772719.6
申请日：2012-09-28
申请人： Leybold Optics GmbH
发明人： SCHERER, Michael , PISTNER, Jürgen , HAGENDORN, Harro , KLOSCH-TRAGESER, Michael
IPC分类号： H01J37/32 , H01J37/34 , C23C14/00 , C23C14/02 , C23C14/50 , C23C14/56 , C23C14/52
CPC分类号： H01J37/32082 , C23C14/0036 , C23C14/021 , C23C14/022 , C23C14/024 , C23C14/34 , C23C14/505 , C23C14/52 , C23C14/568 , C23C14/5826 , H01J37/32733 , H01J37/32779 , H01J37/32889 , H01J37/34 , H01J37/3408 , Y10T428/31504
摘要： The invention relates to an apparatus (1) for producing a reflection‑reducing layer on a surface (21) of a plastics substrate (20). The apparatus comprises a first sputtering device (3) for applying a base layer (22) to the surface (21) of the plastics substrate (20), a plasma source (4) for plasma‑etching the coated substrate surface (21), and a second sputtering device (5) for applying a protective layer (24) to the substrate surface (21). These processing devices (3, 4, 5) are arranged jointly in a vacuum chamber (2), which has inlets (8) for processing gases. In order to move the substrate (20) between the processing devices (3, 4, 5) in the interior of the vacuum chamber (2), a conveying apparatus (10) is provided which is preferably in the form of a rotary table (11). - Furthermore, the invention relates to a method for producing such a reflection‑reducing layer on the surface (21) of the plastics substrate (20).
摘要翻译：本发明涉及的基板的装置（1）的塑料（20）的表面（21）上产生减反射层。该装置包括：第一溅射装置（3），用于将基体层（22）到所述塑料衬底的表面（21）（20），等离子源（4），用于等离子体蚀刻所述涂覆的基材表面（21）以及用于将保护层（24），以在基板表面（21）的第二溅射装置（5）。这些处理装置（3，4，5）在真空室（2），其具有入口（8），用于处理气体被联合地布置。为了将处理设备之间移动所述衬底（20）（3，4，5）在所述真空腔室（2）的内部，一个传送装置（10）提供的所有其优选在一个旋转台的形式（ 11）。进一步地，本发明涉及一种用于制造塑料基板（20）的表面（21）上求降低反射层的方法。

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