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1. 发明公开

EP3839640A1 IMPROVED RECONSTRUCTION ALGORITHMS OF ELECTRON-BASED HOLOGRAMS 有权
公开(公告)号：EP3839640A1
公开(公告)日：2021-06-23
申请号：EP20213660.2
申请日：2020-12-14
申请人： FEI Company
发明人： Liu, Kun , Bahm, Alan , Straw, Marcus
IPC分类号： G03H1/08 , G03H5/00 , G06T7/00 , G03H1/04 , G06T5/00 , G03H1/00
摘要： Apparatuses and methods for improved reconstructions of electron-based holograms are disclosed herein. An example method at least includes forming a hologram of a sample and a known object, forming a reconstruction of the known object using a reconstruction algorithm, comparing the reconstruction of the known object to a reference reconstruction of the known object, and adjusting the reconstruction algorithm based on the comparison of the reconstruction of the known object to the reference reconstruction of the known object. The example method may further include forming a reconstruction of the sample using the adjusted reconstruction algorithm.

2. 发明公开

EP2613338A3 Determination of emission parameters from field emission sources 有权
标题翻译：的场发射源发射参数的确定
公开(公告)号：EP2613338A3
公开(公告)日：2015-04-08
申请号：EP13150442.5
申请日：2013-01-08
申请人： FEI Company
发明人： Swanson, Lynwood , Schwind, Gregory , Kellogg, Sean , Liu, Kun
IPC分类号： H01J37/073
CPC分类号： H01J37/00 , G01T1/29 , H01J37/02 , H01J37/073 , H01J2237/06316 , H01J2237/06341 , H01J2237/065
摘要： The state of an emitter can be determined by measurements of how the current changes with the extraction voltage. A field factor β function is determined by a series of relatively simple measurements of charged particles emitted at different conditions. The field factor can then be used to determine derived characteristics of the emission that, in the prior art, were difficult to determine without removing the source from the focusing column and mounting it in a specialized apparatus. The relations are determined by the source configuration and have been found to be independent of the emitter shape, and so emission character can be determined as the emitter shape changes over time, without having to determine the emitter shape and without having to redefine the relation between the field factor and the series of relatively simple measurements, and the relationships between the field factor and other emission parameters.

3. 发明公开

EP2492949A3 Stable cold field emission electron source 有权
标题翻译： Stabile，kalte Feldemissionselektronenquelle
公开(公告)号：EP2492949A3
公开(公告)日：2014-01-22
申请号：EP12155682.3
申请日：2012-02-16
申请人： FEI Company
发明人： Liu, Kun , Schwind, Gregory A.
IPC分类号： H01J37/063 , H01J37/073
CPC分类号： H01J23/06 , H01J37/063 , H01J37/073 , H01J2237/022
摘要： A cold field emission (CFE) electron source for a focused electron beam system such as a transmission electron microscope (TEM), scanning transmission electron microscope (STEM), or scanning electron microscope (SEM) is disclosed which substantially improves both source emission stability and frequency noise characteristics. The source employs an emitter enclosure electrode (552) behind the CFE tip (503) which, in conjunction with the extractor electrode (508), defines a closed volume that can be thoroughly cleaned by electron impact desorption (EID) and radiative heating from a heated filament (530) located between the emitter enclosure electrode and extractor electrode.
摘要翻译：公开了用于聚焦电子束系统如透射电子显微镜（TEM），扫描透射电子显微镜（STEM）或扫描电子显微镜（SEM）的冷场发射（CFE）电子源，其基本上改善了源极发射稳定性和频率噪声特性。该源使用在CFE尖端（503）后面的发射器外壳电极（552），其与提取器电极（508）一起限定可以通过电子轰击解吸（EID）彻底清洁的封闭体积和来自位于发射体外壳电极和提取器电极之间的加热丝（530）。

4. 发明公开

EP1610377A3 System for modifying small structures 有权
标题翻译：系统修改小结构
公开(公告)号：EP1610377A3
公开(公告)日：2009-04-29
申请号：EP05075796.2
申请日：2005-04-07
申请人： FEI COMPANY
发明人： Gu, George Y. , Bassom, Neil J. , Gannon, Thomas J. , Liu, Kun
IPC分类号： H01L21/768 , H01L21/288
CPC分类号： H01L21/76894 , C25D3/665 , C25D5/02 , C25F3/12 , C25F3/14 , H01L21/2885 , H01L21/32134 , H01L21/76892
摘要： A charge transfer mechanism is used to locally deposit material or remove material to alter for a small structure, such as a part of an integrated circuit (114, 1100). A local electrochemical cell (110) is created without having to immerse the entire work piece in a bath. The charge transfer mechanism can be used together with a charged particle beam (702, 802, 902) or laser system to modify small structures, such as integrated circuits or micro-electromechanical system. The charge transfer process can be performed in air or, in some embodiments, in a vacuum chamber (700).

5. 发明授权

EP3399537B1 GUN LENS DESIGN IN A CHARGED PARTICLE MICROSCOPE 有权
公开(公告)号：EP3399537B1
公开(公告)日：2019-10-16
申请号：EP18170249.9
申请日：2018-05-01
申请人： FEI Company
发明人： Mohammadi-Gheidari, Ali , Henstra, Alexander , Tiemeijer, Peter Christiaan , Liu, Kun , Dona, Pleun , Schwind, Gregory A. , Van de Water, Gerbert Jeroen , Bischoff, Maarten
IPC分类号： H01J37/065 , H01J37/067 , H01J37/145 , H01J37/28

6. 发明公开

EP2613338A2 Determination of emission parameters from field emission sources 有权
标题翻译： on on on。。。。。。。。。。。。。
公开(公告)号：EP2613338A2
公开(公告)日：2013-07-10
申请号：EP13150442.5
申请日：2013-01-08
申请人： FEI Company
发明人： Swanson, Lynwood , Schwind, Gregory , Kellogg, Sean , Liu, Kun
IPC分类号： H01J37/073
CPC分类号： H01J37/00 , G01T1/29 , H01J37/02 , H01J37/073 , H01J2237/06316 , H01J2237/06341 , H01J2237/065
摘要： The state of an emitter can be determined by measurements of how the current changes with the extraction voltage. A field factor β function is determined by a series of relatively simple measurements of charged particles emitted at different conditions. The field factor can then be used to determine derived characteristics of the emission that, in the prior art, were difficult to determine without removing the source from the focusing column and mounting it in a specialized apparatus. The relations are determined by the source configuration and have been found to be independent of the emitter shape, and so emission character can be determined as the emitter shape changes over time, without having to determine the emitter shape and without having to redefine the relation between the field factor and the series of relatively simple measurements, and the relationships between the field factor and other emission parameters.
摘要翻译：发射极的状态可以通过测量电流如何随提取电压而变化来确定。场因子²功能由在不同条件下发射的带电粒子的一系列相对简单的测量来确定。然后可以使用场因子来确定在现有技术中难以确定的衍射特征，而不需要从聚焦柱移除源并将其安装在专门的装置中。关系由源配置确定，并且已经被发现与发射体形状无关，因此，随着时间的推移，可以确定发射体形状随着发射体形状的变化，而不必确定发射体的形状，而不必重新定义场因子和一系列相对简单的测量，以及场因子与其他发射参数之间的关系。

7. 发明公开

EP3809444A3 PULSED CPB ELECTRON SOURCE WITH FAST BLANKER FOR ULTRAFAST TEM APPLICATIONS 审中-公开
公开(公告)号：EP3809444A3
公开(公告)日：2021-07-07
申请号：EP20197328.6
申请日：2020-09-22
申请人： FEI Company
发明人： Liu, Kun , Kieft, Erik René
IPC分类号： H01J37/073 , H01J37/09 , H01J37/26
摘要： Charged particle beams (CPBs) are modulated using a beam blanker/deflector and an electrically pulsed extraction electrode in conjunction with a field emitter and a gun lens. With such modulation, CPBs can provide both pulsed and continuous mode operation as required for a particular application, while average CPB current is maintained within predetermined levels, such as levels that promote X-ray safe operation. Either the extraction electrode or the beam blanker/deflector can define CPB pulse width, CPB on/off ratio, or both.

8. 发明授权

EP2613338B1 Determination of emission parameters from field emission sources 有权
标题翻译：的场发射源发射参数的确定
公开(公告)号：EP2613338B1
公开(公告)日：2016-03-30
申请号：EP13150442.5
申请日：2013-01-08
申请人： FEI Company
发明人： Swanson, Lynwood , Schwind, Gregory , Kellogg, Sean , Liu, Kun
IPC分类号： H01J37/073
CPC分类号： H01J37/00 , G01T1/29 , H01J37/02 , H01J37/073 , H01J2237/06316 , H01J2237/06341 , H01J2237/065

9. 发明授权

EP1610377B1 System for modifying small structures 有权
标题翻译：系统修改小结构
公开(公告)号：EP1610377B1
公开(公告)日：2012-01-11
申请号：EP05075796.2
申请日：2005-04-07
申请人： FEI COMPANY
发明人： Gu, George Y. , Bassom, Neil J. , Gannon, Thomas J. , Liu, Kun
IPC分类号： H01L21/768 , H01L21/288
CPC分类号： H01L21/76894 , C25D3/665 , C25D5/02 , C25F3/12 , C25F3/14 , H01L21/2885 , H01L21/32134 , H01L21/76892

10. 发明公开

EP4057318A1 MECHANICALLY-STABLE ELECTRON SOURCE 审中-公开
公开(公告)号：EP4057318A1
公开(公告)日：2022-09-14
申请号：EP22161243.5
申请日：2022-03-10
申请人： FEI Company
发明人： Liu, Kun , Schwind, Gregory , Bahm, Alan
IPC分类号： H01J1/18 , H01J1/15 , H01J1/146 , H01J1/304 , H01J37/065
摘要： An electron source has an insulating base, a pair of conductive terminals, an insulating support member, a drift isolation member, an emitter-cathode, and one or more heating elements. The conductive terminals are exposed from a first surface of the insulating base. The insulating support member extends from the first surface of the insulating base. The drift isolation member is disposed at an end of the insulating support member remote from the insulating base. The emitter-cathode is coupled to the drift isolation member. The one or more heating elements are coupled to the conductive terminals and the drift isolation member. The combination of the drift isolation member with the insulating support member can prevent stress-induced drift from impacting position of the emitter-cathode, thereby improving the mechanical stability of the electron source.

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