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    • 9. 发明公开
    • Pattern formation method and apparatus using atomic beam holography technology
    • 全息摄影师Verfahren und Vorrichtung zur Erzeugung von Mustern mit Atomstrahlen
    • EP0950930A2
    • 1999-10-20
    • EP99107172.1
    • 1999-04-13
    • NEC CORPORATION
    • Fujita, JunichiShimizu, Fujio c/o Department of Applied Physics
    • G03H5/00H01J37/317
    • G03H5/00H01J2237/3175
    • A pattern formation method wherein a very small pattern composed of a desired element (atoms) is formed directly on a substrate by using atomic beam hologram technology. Quantum coherent reflection of an atomic wave is utilized. A coherent atomic beam is irradiated as a material wave, for example, upon a hologram of the transmission type to modulate the atomic beam with pattern information included in the hologram. The atomic beam having passed through and diffracted by the hologram is introduced to a reflecting plane so that the atomic beam may be quantum coherent reflected by the reflecting plane, and the atomic beam thus reflected is introduced into a substrate. A binary (two-value) hologram produced by computer synthesis is used suitably as the hologram. A hologram of the potential control type may be also used.
    • 通过使用原子束全息图技术,在基板上直接形成由期望的元素(原子)构成的非常小的图案的图案形成方法。 利用原子波的量子相干反射。 相干原子束作为材料波被照射,例如,在透射型全息图上,用包含在全息图中的图案信息来调制原子束。 通过全息图衍射的原子束被引入反射平面,使得原子束可以被反射平面反射的量子相干,并将如此反射的原子束引入到衬底中。 通过计算机合成产生的二值(双值)全息图被适当地用作全息图。 也可以使用电位控制型的全息图。