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1. 发明公开

EP2557416A2 Sample surface inspection apparatus and method 审中-公开
标题翻译：样品表面检测设备和方法
公开(公告)号：EP2557416A2
公开(公告)日：2013-02-13
申请号：EP12007216.0
申请日：2003-04-17
申请人： Ebara Corporation
发明人： Hatakeyama, Masahiro , Watanabe, Kenji , Murakami, Takeshi , Satake, Tohru , Noji, Nobuharu
IPC分类号： G01N23/227 , H01L21/66 , H01J37/28
CPC分类号： G03F7/162 , G01N23/225 , H01J37/285 , H01J2237/204 , H01J2237/2812 , H01J2237/2814 , H01J2237/2855 , H01J2237/2857
摘要： The present invention provides a surface inspection method and apparatus for inspecting a surface of a sample, in which a resistive film is coated on the surface, and a beam is irradiated to the surface having the resistive film coated thereon, to thereby conduct inspection of the surface of the sample. In the surface inspection method of the present invention, a resistive film having an arbitrarily determined thickness t1 is first coated on a surface of a sample. Thereafter, a part of the resistive film having the arbitrarily determined thickness t1 is dissolved in a solvent, to thereby reduce the thickness of the resistive film to a desired level. This enables precise control of a value of resistance of the resistive film and suppresses distortion of an image to be detected.
摘要翻译：本发明提供一种用于检查样品表面的表面检查方法和设备，其中电阻膜被涂覆在表面上，并且光束被照射到其上涂覆有电阻膜的表面上，从而检查样品的表面。在本发明的表面检查方法中，首先将具有任意确定的厚度t1的电阻膜涂覆在样品的表面上。此后，将具有任意确定的厚度t1的电阻膜的一部分溶解在溶剂中，由此将电阻膜的厚度减小到期望的水平。这使得能够精确地控制电阻膜的电阻值并抑制待检测图像的失真。

2. 发明授权

EP1291900B1 Apparatus for detecting a fine geometry on a surface of a sample and method of manufacturing a semiconductor device 有权
标题翻译：装置用于检测样品和方法的表面上的微细结构的用于制造半导体器件
公开(公告)号：EP1291900B1
公开(公告)日：2011-01-12
申请号：EP02020243.8
申请日：2002-09-10
申请人： EBARA CORPORATION , KABUSHIKI KAISHA TOSHIBA
发明人： Hatakeyama, Masahiro , Murakami, Takeshi , Satake, Tohru , Noji, Nobuharu , Nagahama, Ichirota , Yamazaki, Yuichiro
IPC分类号： H01J37/26 , G01N21/88 , G06T7/00 , G21K7/00
CPC分类号： H01J37/244 , G01N21/9501 , G03F1/84 , H01J37/285 , H01J2237/2441 , H01J2237/2446

3. 发明公开

EP1936953A2 A tdi detecting device, a feed-through equipment, an electron beam apparatus using these device and equipment, and a semiconductor device manufacturing method using the same electron beam apparatus 审中-公开
标题翻译：装置TDI检测，实现系统，在该装置的电子束装置，以及设施和制造方法，具有该电子束装置的半导体器件
公开(公告)号：EP1936953A2
公开(公告)日：2008-06-25
申请号：EP08007124.4
申请日：2002-05-14
申请人： EBARA CORPORATION
发明人： Hatakeyama, Masahiro , Satake, Tohru , Murakami, Takeshi , Watanabe, Kenji , Noji, Nobuharu
IPC分类号： H04N3/15
CPC分类号： H01J37/222 , G01N21/956 , H01J37/224 , H01J37/244 , H01J2237/2445 , H01J2237/2447 , H01R13/2421 , H04N5/2253 , Y10S439/935
摘要： An electron beam apparatus comprises a TDI sensor 64 and a feed-through device 50. The feed-through device has a socket contact 54 for interconnecting a pin 52 attached to a flanged 51 for separating different environments and the other pin 53 making a pair with the pin 52, in which the pin 52, the other pin 53 and the socket contact 54 together construct a connecting block, and the socket contact 54 has an elastic member 61. Accordingly, even if a large number of connecting blocks are provided, the connecting force may be kept to such a low level as to prevent the breakage in the sensor. The pin 53 is connected with the TDI sensor 64, in which a pixel array has been adaptively configured based on the optical characteristic of an image projecting optical system. That sensor has a number of integration stages that can reduce the field of view of the image projecting optical system to as small as possible so that a maximal acceptable distortion within the field of view may be set larger. Further, the number of integration stage may be determined such that the data rate of the TDI sensor would not be reduced but the number of pins would not be increased as much as possible. Preferably, the number of line count may be almost equal to the number of integration stages.
摘要翻译：一种电子束装置包括TDI传感器64和一个馈通装置50的馈通装置具有用于分离不同的环境中，而另一个销53使一对具有互连附接至凸缘51的销52的插座接触件54 销52，其中销52，另一销53与插座触点54共同构成一个连接块，和插座接触件54具有弹性件61上。因此，即使提供大量的连接块，所述连接力可被保持为低电平作为谋求防止传感器破损。该销53与TDI传感器64，其中，一个像素阵列被配置为基于图像投影光学系统的光学特性自适应地连接，即传感器具有多个积分级的也可以减少视图的图像的场投影光学系统，以尽可能小的所以没有的视野内的最大可接受失真可被设定得较大。此外，可确定开采检查积分级的数目也TDI传感器的数据速率将不会减少，但引脚的数量将不增加尽可能。优选地，行计数的数量可以几乎等于积分级的数量。

4. 发明授权

EP0738788B1 Thin-Film vapor deposition apparatus 失效
标题翻译：植物为薄膜的气相沉积
公开(公告)号：EP0738788B1
公开(公告)日：2003-08-13
申请号：EP96106207.2
申请日：1996-04-19
申请人： EBARA CORPORATION
发明人： Takeuchi, Noriyuki , Murakami, Takeshi , Shinozaki, Hiroyuki , Tsukamoto, Kiwamu , Nakaniwa, Masaru , Matsuda, Naoki
IPC分类号： C23C16/44 , C23C16/46 , C23C16/52
CPC分类号： C23C16/4557 , C23C16/45565 , C23C16/52

5. 发明公开

EP1291900A2 Apparatus for detecting a fine geometry on a surface of a sample and method of manufacturing a semiconductor device 有权
标题翻译：用于检测样品表面上的精细几何结构的设备以及制造半导体器件的方法
公开(公告)号：EP1291900A2
公开(公告)日：2003-03-12
申请号：EP02020243.8
申请日：2002-09-10
申请人： EBARA CORPORATION , Kabushiki Kaisha Toshiba
发明人： Hatakeyama, Masahiro , Murakami, Takeshi , Satake, Tohru , Noji, Nobuharu , Nagahama, Ichirota , Yamazaki, Yuichiro
IPC分类号： H01J37/26 , G01N21/88 , G06T7/00 , G21K7/00
CPC分类号： H01J37/244 , G01N21/9501 , G03F1/84 , H01J37/285 , H01J2237/2441 , H01J2237/2446
摘要： A detecting apparatus for detecting a fine geometry on a surface of a sample, wherein an irradiation beam is irradiated against the sample placed in a different environment different from an atmosphere and a secondary radiation emanated from the sample is detected by a sensor, and wherein the sensor is disposed at an inside of the different environment, a processing device to process detection signals from the sensor is disposed at an outside of the different environment, and a transmission means transmits detection signals from the sensor to the processing device.
摘要翻译：一种检测装置，用于检测样品表面上的精细几何形状，其中照射光束照射放置在不同于大气的不同环境中的样品，并且由样品发出的二次辐射由传感器检测，并且其中，传感器布置在不同环境的内部，处理来自传感器的检测信号的处理装置布置在不同环境的外部，并且传输装置将来自传感器的检测信号传输到处理装置。

6. 发明公开

EP0799907A1 Liquid material vaporizer apparatus and gas ejection device 失效
标题翻译： Vorrichtung zum Verdampfen einerFlüssigkeitund Gasausstosseinrichtung
公开(公告)号：EP0799907A1
公开(公告)日：1997-10-08
申请号：EP97105636.1
申请日：1997-04-04
申请人： EBARA CORPORATION
发明人： Fukunaga, Yukio , Murakami, Takeshi , Ogure, Naoaki , Hongo, Akihisa
IPC分类号： C23C16/44
CPC分类号： C23C16/4557 , C23C16/4486 , C23C16/45565
摘要： A vaporizer apparatus is disclosed which enables to efficiently vaporize a liquid material for the production of high dielectric thin film devices by allowing a sufficient dwell time for complete vaporization of the feed liquid, to prevent degradation of the feed gas after vaporization and to provide a stable supply of the vaporized feed gas to the substrate. The vaporizer apparatus comprises an outer member having a cylindrical inner surface, an inner member having a cylindrical outer surface opposing to the cylindrical inner surface of the outer member, and a feed material passage having a spiral configuration is formed on at least one of the cylindrical inner surface and the cylindrical outer surface. The feed material passage communicates with a feed liquid entry opening and a feed gas exit opening. A heating device is provided for heating at least one of the outer member and inner member.
摘要翻译：公开了一种蒸发器装置，其能够通过允许足够的停留时间来充分蒸发进料液体，从而有效地蒸发用于生产高电介质薄膜器件的液体材料，以防止蒸发后进料气体的劣化并提供稳定的将蒸发的进料气体供应到基底。蒸发器装置包括具有圆柱形内表面的外部构件，具有与外部构件的圆柱形内表面相对的圆柱形外表面的内部构件，并且具有螺旋构造的进给材料通道形成在至少一个圆柱形内表面和圆柱形外表面。进料材料通道与进料液入口和进料气体出口开口连通。提供加热装置用于加热外部构件和内部构件中的至少一个。

7. 发明公开

EP0738788A2 Thin-Film vapor deposition apparatus 失效
标题翻译： Anlage zur Dampfabscheidung vonDünnschichten
公开(公告)号：EP0738788A2
公开(公告)日：1996-10-23
申请号：EP96106207.2
申请日：1996-04-19
申请人： EBARA CORPORATION
发明人： Takeuchi, Noriyuki , Murakami, Takeshi , Shinozaki, Hiroyuki , Tsukamoto, Kiwamu , Nakaniwa, Masaru , Matsuda, Naoki
IPC分类号： C23C16/44 , C23C16/46 , C23C16/52
CPC分类号： C23C16/4557 , C23C16/45565 , C23C16/52
摘要： A thin-film vapor deposition apparatus has a reaction casing defining a reaction chamber, a stage for supporting a substrate, the stage being disposed in the reaction chamber, and a shower head supported on the reaction casing in confronting relation to the stage, for discharging a material gas toward the substrate on the stage for depositing a thin film on the substrate. A plurality of flow path systems are disposed in various regions of the shower head and the reaction casing, for passing a heating medium to control the temperatures of the regions under the control of a temperature controller.
摘要翻译：薄膜蒸镀装置具有限定反应室的反应壳体，支撑基板的台，设置在反应室中的台和与台相对地支撑在反应壳体上的喷头，用于排出向衬底上的材料气体，用于在衬底上沉积薄膜。多个流路系统设置在淋浴头和反应壳体的各个区域中，用于通过加热介质以控制温度控制器控制下的区域的温度。

8. 发明授权

EP2190002B1 Method for detecting a fine geometry 有权
标题翻译：用于检测精细几何的方法
公开(公告)号：EP2190002B1
公开(公告)日：2016-06-01
申请号：EP10001779.7
申请日：2002-09-10
申请人： EBARA CORPORATION , Kabushiki Kaisha Toshiba
发明人： Hatakeyama, Masahiro , Murakami, Takeshi , Satake, Tohru , Noji, Nobuharu , Nagahama, Ichirota , Yamazaki, Yuichiro
IPC分类号： H01J37/244 , H01J37/28 , H01J37/285
CPC分类号： H01J37/244 , G01N21/9501 , G03F1/84 , H01J37/285 , H01J2237/2441 , H01J2237/2446

9. 发明公开

EP2508903A2 Inspection device using secondary charged particle detection 有权
标题翻译： Prüfgerät，basierend auf der Detektion geladenerSekundärteilchen
公开(公告)号：EP2508903A2
公开(公告)日：2012-10-10
申请号：EP12001774.4
申请日：2012-03-15
申请人： EBARA CORPORATION
发明人： Hatakeyama, Masahiro , Yoshikawa, Shoji , Murakami, Takeshi , Watanabe, Kenji , Naito, Yoshihiko , Toma, Yasushi , Karimata, Tsutomu , Hayashi, Takehide , Tsukamoto, Kiwamu , Kohama, Tatsuya , Kobayashi, Noboru
IPC分类号： G01R31/305 , G01R31/308 , H01J37/244 , H01J37/252 , H01J37/304
CPC分类号： H01J37/09 , G01N23/22 , G01N23/223 , G01N23/2251 , G01N2223/611 , H01J37/10 , H01J37/20 , H01J37/222 , H01J37/244 , H01J37/265 , H01J37/28 , H01J37/29 , H01J2237/0048 , H01J2237/022 , H01J2237/032 , H01J2237/038 , H01J2237/045 , H01J2237/0458 , H01J2237/0473 , H01J2237/0492 , H01J2237/061 , H01J2237/06333 , H01J2237/166 , H01J2237/186 , H01J2237/2002 , H01J2237/2007 , H01J2237/2008 , H01J2237/2448 , H01J2237/2482 , H01J2237/2485 , H01J2237/2817 , H01J2237/2855 , H01J2237/2857
摘要： An inspection device for inspecting a surface of an inspection object using a beam includes a beam generator (10000) which is capable of generating one of either charge particles or an electromagnetic wave as a beam (10000A), a primary optical system (72) which is capable of guiding and irradiating the beam to the inspection object supported within a working chamber, a secondary optical system (74) which is capable of including a first movable numerical aperture (10008) and a first detector (761;76) which detects secondary charge particles generated from the inspection object (W), the secondary charge particles passing through the first movable numerical aperture, an image processing system (763) which is capable of forming an image based on the secondary charge particles detected by the first detector; and a second detector (76-2) arranged between the first movable numerical aperture (10008) and the first detector (76) and which detects a location and shape at a cross over location of the secondary charge particles generated from the inspection object (W).
摘要翻译：用于使用光束检查检查对象的表面的检查装置包括能够产生作为光束（10000A）的电荷粒子或电磁波之一的光束发生器（10000），主光学系统（72），其能够将梁引导和照射到支撑在工作室内的检查对象物，能够包括第一可移动数值孔径（10008）和第二检测器（761; 76）的辅助光学系统（74），其检测次级从检查对象（W）产生的充电微粒，通过第一可移动数值孔径的二次电荷粒子，能够基于由第一检测器检测的二次电荷粒子形成图像的图像处理系统（763）以及布置在所述第一可移动数值孔径（10008）和所述第一检测器（76）之间的第二检测器（76-2），并且检测在从所述检查对象（W）产生的所述次级电荷颗粒的交叉位置处的位置和形状）。

10. 发明授权

EP0852970B1 Vapor feed supply system 失效
标题翻译：系统的蒸汽供应
公开(公告)号：EP0852970B1
公开(公告)日：2006-07-26
申请号：EP98100218.1
申请日：1998-01-08
申请人： EBARA CORPORATION
发明人： Horie, Kuniaki , Suzuki, Hidenao , Nakada, Tsutomu , Murakami, Takeshi , Fukunaga, Yukio , Abe, Masahito , Shinozaki, Hiroyuki , Tsukamoto, Kiwamu , Shibasaki, Mitsunao , Araki, Yuji , Ueyama, Hiroyuki
IPC分类号： B08B9/00 , C23C16/44 , B01D8/00 , F16K51/00
CPC分类号： C23C16/448 , B08B9/00 , C23C16/4407 , Y10S134/902

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