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1. 发明公开

EP1273907A1 WAFER INSPECTING METHOD, WAFER INSPECTING INSTRUMENT, AND ELECTRON BEAM APPARATUS 审中-公开
标题翻译：手段和工具晶片检测和ELECTRON DEVICE
公开(公告)号：EP1273907A1
公开(公告)日：2003-01-08
申请号：EP01980963.1
申请日：2001-11-02
申请人： Ebara Corporation , Nikon Corporation
发明人： NAKASUJI, Mamoru , NOJI, Nobuharu , SATAKE, Tohru , HAMASHIMA, Muneki , KIMBA, Toshifumi , HATAKEYAMA, Masahiro , WATANABE, Kenji , SOBUKAWA, Hirosi , KARIMATA, Tsutomu , YOSHIKAWA, Shoji , OOWADA, Shin , SAITO, Mutsumi
IPC分类号： G01N23/225 , H01J37/28
CPC分类号： G01N23/225 , H01J37/06 , H01J37/073 , H01J37/185 , H01J37/20 , H01J37/222 , H01J37/244 , H01J37/28 , H01J2237/082 , H01J2237/202 , H01J2237/20228 , H01J2237/204 , H01J2237/22 , H01J2237/24564 , H01J2237/2806 , H01J2237/2816 , H01J2237/2817
摘要： The present invention relates to a substrate inspection apparatus for inspecting a pattern formed on a substrate by irradiating a charged particle beam onto the substrate. The substrate inspection apparatus comprises: an electron beam apparatus including a charged particle beam source for emitting a charged particle beam, a primary optical system for irradiating the charged particle beam onto the substrate, a secondary optical system into which a secondary charged particle beam is introduced, the secondary charged particle beam being emitted from the substrate by an irradiation of the charged particle beam, a detection system for detecting the secondary charged particle beam introduced into said secondary optical system and outputting as an electric signal, and a process control system for processing and evaluating the electric signal; a stage unit for holding the substrate and moving the substrate relatively to said electron beam apparatus; a working chamber capable of shielding at least an upper region of the stage unit form outside to control under desired atmosphere; and a substrate load-unload mechanism for transferring the substrate into or out of the stage.

2. 发明公开

EP1261016A1 ELECTRON BEAM DEVICE AND SEMICONDUCTOR DEVICE PRODUCTION METHOD USING THE DEVICE 审中-公开
标题翻译： ELECTRON DEVICE而那些使用的半导体模块的制造方法
公开(公告)号：EP1261016A1
公开(公告)日：2002-11-27
申请号：EP01980965.6
申请日：2001-11-02
申请人： EBARA CORPORATION , Nikon Corporation
发明人： NAKASUJI, Mamoru , NOJI, Nobuharu , SATAKE, Tohru , HAMASHIMA, Muneki , HATAKEYAMA, Masahiro , WATANABE, Kenji , KATO, Takao , SOBUKAWA, Hirosi , KARIMATA, Tsutomu , YOSHIKAWA, Shoji , KIMBA, Toshifumi , OOWADA, Shin , SAITO, Mutsumi
IPC分类号： H01J37/063 , H01J37/29 , H01L21/027 , H01L21/66
CPC分类号： B82Y10/00 , B82Y40/00 , G01N23/225 , H01J37/06 , H01J37/063 , H01J37/073 , H01J37/185 , H01J37/20 , H01J37/222 , H01J37/244 , H01J37/28 , H01J37/3174 , H01J2237/0435 , H01J2237/0635 , H01J2237/082 , H01J2237/202 , H01J2237/20228 , H01J2237/204 , H01J2237/22 , H01J2237/2446 , H01J2237/24485 , H01J2237/24564 , H01J2237/2806 , H01J2237/2816 , H01J2237/2817
摘要： The present invention provides an electron beam apparatus for irradiating a sample with primary electron beams to detect secondary electron beams generated from a surface of the sample by the irradiation for evaluating the sample surface. In the electron beam apparatus, an electron gun has a cathode for emitting primary electron beams. The cathode includes a plurality of emitters for emitting primary electron beams, arranged apart from one another on a circle centered at an optical axis of a primary electro-optical system. The plurality of emitters are arranged such that when the plurality of emitters are projected onto a straight line parallel with a direction in which the primary electron beams are scanned, resulting points on the straight line are spaced at equal intervals.

3. 发明公开

EP3597916A1 INFORMATION PROCESSING DEVICE, INFORMATION PROCESSING SYSTEM, INFORMATION PROCESSING METHOD, PROGRAM, SUBSTRATE PROCESSING DEVICE, REFERENCE DATA DETERMINATION DEVICE, AND REFERENCE DATA DETERMINATION METHOD 审中-公开
公开(公告)号：EP3597916A1
公开(公告)日：2020-01-22
申请号：EP18766870.2
申请日：2018-03-13
申请人： Ebara Corporation
发明人： MAISHIGI, Keiji , SUGIURA, Tetsuro , USUI, Katsuaki , HATAKEYAMA, Masahiro , HONMA, Chikako , OSUGA, Toru , IWASAKI, Koichi , LIN, Jie Yuan
IPC分类号： F04B51/00 , G05B19/418
摘要： An information processing apparatus detecting presence or absence of abnormality of a vacuum pump derived from a product produced within a target vacuum pump, including:
a determination unit configured to determine a normal variation range or a normal time variation behavior of a target state quantity which is a state quantity varying depending on a load of gas flowing into the vacuum pump, based on at least one of past target state quantities of the target vacuum pump or another vacuum pump; and
a comparison unit configured to compare a current target state quantity of the target vacuum pump with the normal variation range or the normal time variation behavior and output the comparison result.

4. 发明公开

EP3089193A1 METHOD FOR DETECTING A FINE GEOMETRY 无效
标题翻译： VERFAHREN ZUR ERFASSUNG EINER FEINEN GEOMETRIE
公开(公告)号：EP3089193A1
公开(公告)日：2016-11-02
申请号：EP16172147.7
申请日：2002-09-10
申请人： Ebara Corporation
发明人： HATAKEYAMA, Masahiro , MURAKAMI, Takeshi , SATAKE, Tohru , NOJI, Nobuharu , NAGAHAMA, Ichirota , YAMAZAKI, Yuichiro
IPC分类号： H01J37/244 , H01J37/28 , H01J37/285
CPC分类号： H01J37/244 , G01N21/9501 , G03F1/84 , H01J37/285 , H01J2237/2441 , H01J2237/2446
摘要： A detecting apparatus for detecting a fine geometry on a surface of a sample, wherein an irradiation beam is irradiated against the sample placed in a different environment different from an atmosphere and a secondary radiation emanated from the sample is detected by a sensor, and wherein the sensor is disposed at an inside of the different environment, a processing device to process detection signals from the sensor is disposed at an outside of the different environment, and a transmission means transmits detection signals from the sensor to the processing device.
摘要翻译：一种用于检测样品表面上的精细几何形状的检测装置，其中照射束照射放置在不同于大气的不同环境中的样品，并且通过传感器检测从样品发出的二次辐射，并且其中传感器设置在不同环境的内部，处理来自传感器的检测信号的处理装置设置在不同环境的外部，并且传输装置将检测信号从传感器传送到处理装置。

5. 发明授权

EP1393546B1 A SOCKET CONTACT AND FEED-THROUGH DEVICE 有权
标题翻译：连接套管和单位KOPPEL
公开(公告)号：EP1393546B1
公开(公告)日：2008-11-05
申请号：EP02769596.4
申请日：2002-05-14
申请人： EBARA CORPORATION
发明人： HATAKEYAMA, Masahiro , SATAKE, Tohru , MURAKAMI, Takeshi , WATANABE, Kenji , NOJI, Nobuharu
IPC分类号： H04N3/15 , H01J37/26 , G01N21/956 , H01R13/00
CPC分类号： H01J37/222 , G01N21/956 , H01J37/224 , H01J37/244 , H01J2237/2445 , H01J2237/2447 , H01R13/2421 , H04N5/2253 , Y10S439/935
摘要： An electron beam apparatus comprises a TDI sensor (64) and a feed-through device (50). The feed-through device has a socket contact (54) for interconnecting a pin (52) attached to a flanged (51) for separating different environments. The other pin (53) making a pair with the pin (52) and the socket contact (54) together construct a connecting block, and the socket contact (54) has an elastic member (61). The pin (53) is connected with the TDI sensor (64), in which a pixel array has been adaptively configured based on the optical characteristic of an image projecting optical system. That sensor has a number of integration stages that can reduce the field of view of the image projecting optical system. Further, the number of integration stage may be determined such that the data rate of the TDI sensor would not be reduced but the number of pins would not be increased as much as possible. Preferably, the number of line count may be almost equal to the number of integration stages.

6. 发明公开

EP1914787A1 DETECTION DEVICE AND INSPECTION DEVICE 有权
标题翻译： DETEKTIONSEINRICHTUNG UNTERSUCHUNGSEINRICHTUNG
公开(公告)号：EP1914787A1
公开(公告)日：2008-04-23
申请号：EP06782616.4
申请日：2006-08-10
申请人： EBARA CORPORATION
发明人： HATAKEYAMA, Masahiro , YOSHIKAWA, Shoji , SUEMATSU, Kenichi , KARIMATA, Tsutomu , NOJI, Nobuharu
IPC分类号： H01J37/244 , G01R31/302 , H01J37/29 , H01L21/66
CPC分类号： H01J37/261 , H01J37/244 , H01J37/28 , H01J2237/2441 , H01J2237/2446
摘要： An inspecting apparatus for reducing a time loss associated with a work for changing a detector is characterized by comprising a plurality of detectors 11, 12 for receiving an electron beam emitted from a sample W to capture image data representative of the sample W, and a switching mechanism M for causing the electron beam to be incident on one of the plurality of detectors 11, 12, where the plurality of detectors 11, 12 are disposed in the same chamber MC. The plurality of detectors 11, 12 can be an arbitrary combination of a detector comprising an electron sensor for converting an electron beam into an electric signal with a detector comprising an optical sensor for converting an electron beam into light and converting the light into an electric signal. The switching mechanism M may be a mechanical moving mechanism or an electron beam deflector.
摘要翻译：用于减少与用于改变检测器的工作相关联的时间损失的检查装置的特征在于包括多个检测器11,12，用于接收从样本W发射的电子束以捕获表示样本W的图像数据，以及切换机构M，用于使电子束入射到多个检测器11,12中的一个上，其中多个检测器11,12设置在同一室MC中。多个检测器11,12可以是包括用于将电子束转换为电信号的电子传感器的检测器的任意组合，其中包括用于将电子束转换成光并将光转换成电信号的光学传感器的检测器。切换机构M可以是机械移动机构或电子束偏转器。

7. 发明公开

EP1703539A1 ELECTRON BEAM DEVICE 审中-公开
标题翻译：电子束装置
公开(公告)号：EP1703539A1
公开(公告)日：2006-09-20
申请号：EP04821103.1
申请日：2004-11-25
申请人： EBARA CORPORATION
发明人： WATANABE, Kenji , SATAKE, Tohru; , NAKASUJI, Mamoru; , MURAKAMI, Takeshi , KARIMATA, Tsutomu; , NOJI, Nobuharu , TOHYAMA, Keiichi; , HATAKEYAMA, Masahiro
IPC分类号： H01J37/29 , H01J37/073 , H01J37/12 , H01J37/147 , H01L21/66
CPC分类号： H01J37/261 , H01J37/28 , H01J2237/06341 , H01J2237/2446 , H01J2237/24592 , H01J2237/2538
摘要： An electron beam apparatus is provided for evaluating a sample at a high throughput and a high S/N ratio. As an electron beam emitted from an electron gun is irradiated to a sample (W) placed on an X-Y-θ stage (9-1) through an electrostatic lens (4-1), an objective lens (11-1) and the like, secondary electrons or reflected electrons are emitted from the sample (W). The primary electron beam is incident at an incident angle set at approximately 35° or more by controlling a deflector (8-1). Electrons emitted from the sample is guided in the vertical direction, and focused on a detector. The detector is made up of an MCP (14-1), a fluorescent plate (15-1), a relay lens (16-1), and a TDI (or CCD) (17-1). An electric signal from the TDI (17-1) is supplied to a personal computer (18-1) for image processing to generate a two-dimensional image of the sample.
摘要翻译：提供电子束装置用于以高吞吐量和高S / N比评估样品。当从电子枪发射的电子束通过静电透镜（4-1）照射到放置在XY-θ台（9-1）上的样品（W）时，物镜（11-1）等从样品（W）发射二次电子或反射电子。通过控制偏转器（8-1），一次电子束以大约35°或更大的入射角入射。从样品发射的电子在垂直方向上被引导，并聚焦在检测器上。检测器由MCP（14-1），荧光板（15-1），中继透镜（16-1）和TDI（或CCD）（17-1）组成。将来自TDI（17-1）的电信号提供给用于图像处理的个人计算机（18-1）以产生样本的二维图像。

8. 发明公开

EP1339100A1 INSPECTION METHOD AND APPARATUS USING ELECTRON BEAM, AND DEVICE PRODUCTION METHOD USING IT 审中-公开
标题翻译：研究的方法和设备具有电子这些组件使用的过程
公开(公告)号：EP1339100A1
公开(公告)日：2003-08-27
申请号：EP01980962.3
申请日：2001-11-02
申请人： Ebara Corporation
发明人： KIMBA, Toshifumi , SATAKE, Tohru , KARIMATA, Tsutomu , WATANABE, Kenji , NOJI, Nobuharu , MURAKAMI, Takeshi , HATAKEYAMA, Masahiro , NAKASUJI, Mamoru , SOBUKAWA, Hirosi , YOSHIKAWA, Shoji , OOWADA, Shin , SAITO, Mutsumi
IPC分类号： H01L21/66 , H01J37/29 , G01N23/225
CPC分类号： H01J37/222 , G01N23/225 , G01N23/2251 , H01J37/06 , H01J37/073 , H01J37/185 , H01J37/20 , H01J37/244 , H01J37/28 , H01J2237/0216 , H01J2237/082 , H01J2237/2002 , H01J2237/2007 , H01J2237/202 , H01J2237/20228 , H01J2237/204 , H01J2237/22 , H01J2237/24564 , H01J2237/2806 , H01J2237/2813 , H01J2237/2816 , H01J2237/2817 , H01L2224/48227 , H01L2924/01019 , H01L2924/01025 , H01L2924/01057 , H01L2924/01067 , H01L2924/01078 , H01L2924/10253 , H01L2924/12032 , H01L2924/3025 , H01L2924/00
摘要： A substrate inspection apparatus 1-1 (Fig. 1) of the present invention performs the following steps of: carrying a substrate "S" to be inspected into an inspection chamber 23-1; maintaining a vacuum in said inspection chamber; isolating said inspection chamber from a vibration; moving successively said substrate by means of a stage 26-1 with at least one degree of freedom; irradiating an electron beam having a specified width; helping said electron beam reach to a surface of said substrate via a primary electron optical system 10-1; trapping secondary electrons emitted from said substrate via a secondary electron optical system 20-1 and guiding it to a detecting system 35-1; forming a secondary electron image in an image processing system based on a detection signal of a secondary electron beam obtained by said detecting system; detecting a defective location in said substrate based on the secondary electron image formed by said image processing system; indicating and/or storing said defective location in said substrate by CPU 37-1; and taking said completely inspected substrate out of the inspection chamber. Thereby, the defect inspection on the substrate can be performed successively with high level of accuracy and efficiency as well as with higher throughput.

9. 发明公开

EP1635374A1 ELECTRON BEAM DEVICE, ELECTRON BEAM INSPECTION METHOD, ELECTRON BEAM INSPECTION DEVICE, PATTERN INSPECTION METHOD AND EXPOSURE CONDITION DETERMINATION METHOD 审中-公开
标题翻译：电子装置，用于测定曝光条件分析的电子法，电子扫描设备，图案检查方法和步骤
公开(公告)号：EP1635374A1
公开(公告)日：2006-03-15
申请号：EP04729530.8
申请日：2004-04-26
申请人： EBARA CORPORATION
发明人： NOJI, Nobuharu , SATAKE, Tohru; , SOBUKAWA, Hirosi , KIMBA, Toshifumi; , HATAKEYAMA, Masahiro , YOSHIKAWA, Shoji , MURAKAMI, Takeshi , WATANABE, Kenji , KARIMATA, Tsutomu; , SUEMATSU, Kenichi; , TABE, Yutaka; , TAJIMA, Ryo; , TOHYAMA, Keiichi;
IPC分类号： H01J37/28 , H01L21/66 , G01N23/225
CPC分类号： G01N23/225 , H01J37/05 , H01J37/28 , H01J2237/2441 , H01J2237/2446 , H01J2237/2817
摘要： A system for further enhancing speed, i.e. improving throughput in a SEM-type inspection apparatus is provided.
An inspection apparatus for inspecting a surface of a substrate produces a crossover from electrons emitted from an electron beam source 25·1, then forms an image under a desired magnification in the direction of a sample W to produce a crossover. When the crossover is passed, electrons as noises are removed from the crossover with an aperture, an adjustment is made so that the crossover becomes a parallel electron beam to irradiate the substrate in a desired sectional form. The electron beam is produced such that the unevenness of illuminance is 10% or less.
Electrons emitted from the sample W are detected by a detector 25·11.
摘要翻译：一种用于进一步提高速度，即系统改善的SEM型检查装置可以通过被提供。用于检查基板的表面的检查装置生成从电子束源25·1发射的电子交叉，然后在试样W以产生交叉的方向上的期望倍率下形成图像。当交叉通过，电子作为噪声被从交叉除去与孔径其中调节以使没有交叉变为平行电子束照射基片在所期望的截面形状。产生检查的电子束没有凹凸照度为10％或更小。从试样W放出的电子由检测器25·11检测到的

10. 发明公开

EP1393546A1 A TDI DETECTING DEVICE, A FEED-THROUGH EQUIPMENT AND ELECTRON BEAM APPARATUS USING THESE DEVICES 有权
标题翻译：连接套管和单位KOPPEL
公开(公告)号：EP1393546A1
公开(公告)日：2004-03-03
申请号：EP02769596.4
申请日：2002-05-14
申请人： EBARA CORPORATION
发明人： HATAKEYAMA, Masahiro , SATAKE, Tohru , MURAKAMI, Takeshi , WATANABE, Kenji , NOJI, Nobuharu
IPC分类号： H04N3/15 , H01J37/26 , G01N21/956 , H01R13/00
CPC分类号： H01J37/222 , G01N21/956 , H01J37/224 , H01J37/244 , H01J2237/2445 , H01J2237/2447 , H01R13/2421 , H04N5/2253 , Y10S439/935
摘要： An electron beam apparatus comprises a TDI sensor (64) and a feed-through device (50). The feed-through device has a socket contact (54) for interconnecting a pin (52) attached to a flanged (51) for separating different environments. The other pin (53) making a pair with the pin (52) and the socket contact (54) together construct a connecting block, and the socket contact (54) has an elastic member (61). The pin (53) is connected with the TDI sensor (64), in which a pixel array has been adaptively configured based on the optical characteristic of an image projecting optical system. That sensor has a number of integration stages that can reduce the field of view of the image projecting optical system. Further, the number of integration stage may be determined such that the data rate of the TDI sensor would not be reduced but the number of pins would not be increased as much as possible. Preferably, the number of line count may be almost equal to the number of integration stages.

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