基本信息:
- 专利标题： Plasma focus high energy photon source with blast shield
- 专利标题（中）：具有阻隔高能光子的等离子体源
- 申请号：EP00105278.6 申请日：2000-03-14
- 公开(公告)号：EP1037510A3 公开(公告)日：2004-01-02
- 发明人： Partlo, William N. , Fomenkov, Igor V. , Birx, Daniel L.
- 申请人： Cymer, Inc.
- 申请人地址： 16750 Via del Campo Court San Diego, CA 92127-1712 US
- 专利权人： Cymer, Inc.
- 当前专利权人： Cymer, Inc.
- 当前专利权人地址： 16750 Via del Campo Court San Diego, CA 92127-1712 US
- 代理机构： Grünecker, Kinkeldey, Stockmair & Schwanhäusser Anwaltssozietät
- 优先权： US268243 19990315; US442582 19991118; US324526 19990602
- 主分类号： H05G2/00
- IPC分类号： H05G2/00
摘要：
A high energy photon source. A pair of plasma pinch electrodes are located in a vacuum chamber. The chamber contains a working gas which includes a noble buffer gas and an active gas chosen to provide a desired spectral line. A pulse power source provides electrical pulses at voltages high enough to create electrical discharges between the electrodes to produce very high temperature, high density plasma pinches in the working gas providing radiation at the spectral line of the active gas. A blast shield positioned just beyond the location of the high density pinch provides a physical barrier which confines the pinch limiting its axial elongation. A small port is provided in the blast shield that permits the radiation but not the plasma to pass through the shield. In a preferred embodiment a surface of the shield facing the plasma is dome-shaped.
公开/授权文献:
- EP1037510A2 Plasma focus high energy photon source with blast shield 公开/授权日：2000-09-20
IPC结构图谱:
| H | 电学 |
| --H05 | 其他类目不包含的电技术 |
| ----H05G | X射线技术 |
| ------H05G2/00 | 没有X射线管的、专用于产生X射线的设备或方法，如有等离子产生 |