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1. 发明公开

EP2444993A1 Load lock chamber, substrate processing system and method for venting 审中-公开
标题翻译： Schleusenkammer，Substratverarbeitungssystem undBelüftungsverfahren
公开(公告)号：EP2444993A1
公开(公告)日：2012-04-25
申请号：EP10188415.3
申请日：2010-10-21
申请人： Applied Materials, Inc.
发明人： Gebele, Thomas , Leipnitz, Thomas , Buschbeck, Wolfgang , Bangert, Stefan , Lindenberg, Ralph
IPC分类号： H01L21/00
CPC分类号： H01L21/67201 , Y10T137/0379
摘要： A lock chamber for a substrate processing system is provided which includes at least a first conduit adapted to provide an inner portion of the lock chamber in fluid communication with atmospheric pressure or overpressure. Additionally, the lock chamber includes at least a first control valve for controlling a flow rate of the fluid communication of the inner portion of the chamber with the atmospheric pressure or the overpressure, wherein the control valve is adapted to continuously control the flow rate. Furthermore, an according method, a computer program and a computer readable medium adapted for performing the method is provided.
摘要翻译：提供了一种用于基板处理系统的锁定室，其包括至少第一导管，其适于提供与大气压或超压流体连通的锁定室的内部。另外，锁定室至少包括第一控制阀，用于控制室内部与大气压或超压力的流体连通的流量，其中控制阀适于连续地控制流量。此外，提供了一种适用于执行该方法的依据方法，计算机程序和计算机可读介质。

2. 发明授权

EP2746423B1 Deposition arrangement, deposition apparatus and method of operation thereof 有权
公开(公告)号：EP2746423B1
公开(公告)日：2019-12-18
申请号：EP12198683.0
申请日：2012-12-20
申请人： Applied Materials, Inc.
发明人： Keller, Stefan , Schüssler, Uwe , Dieguez-Campo, Jose Manuel , Bangert, Stefan , Kwak, Byung-Sung Leo
IPC分类号： C23C14/14 , C23C14/54 , H01M4/38 , C23C14/24

3. 发明授权

EP2130940B1 Arrangement and method for removing alkali- or alkaline earth-metals from a vacuum coating chamber 有权
标题翻译：装置和方法，用于从真空涂覆室中除去碱金属或碱土金属，
公开(公告)号：EP2130940B1
公开(公告)日：2017-04-05
申请号：EP08009925.2
申请日：2008-05-30
申请人： Applied Materials, Inc.
发明人： Bangert, Stefan , Dieguez-Campo, José Manuel , König, Michael , Krishna, Nety M. , Kwak, Byung-Sung Leo
IPC分类号： C23C14/24
CPC分类号： C23C14/564 , C23C16/4405 , C23C16/4412

4. 发明公开

EP2747122A1 Plasma enhanced deposition arrangement for evaporation of dielectric materials, deposition apparatus and methods of operating thereof 审中-公开
标题翻译：对于介电材料沉积装置的汽化和它们的操作方法等离子增强沉积装置
公开(公告)号：EP2747122A1
公开(公告)日：2014-06-25
申请号：EP12198692.1
申请日：2012-12-20
申请人： Applied Materials, Inc.
发明人： Keller, Stefan , Bangert, Stefan , Kwak, Byung-Sung Leo
IPC分类号： H01J37/32 , H01M4/04 , H01M10/04
CPC分类号： C23C14/243 , C23C14/0676 , C23C14/246 , C23C14/30 , C23C14/32 , C23C14/50 , H01J37/32091 , H01J37/32357 , H01J37/3244 , H01M4/0428 , H01M4/1391 , H01M10/052 , H01M10/0562
摘要： A depositing arrangement for evaporation of a dielectric material onto a substrate is described. The deposition arrangement a vapor distribution showerhead, a holder for providing the dielectric material in the vapor distribution showerhead, wherein the holder has a feeding unit for feeding the dielectric material into the vapor distribution showerhead, an energy source configured for melting and evaporating the dielectric material in the vapor distribution showerhead or sublimating the dielectric material in the vapor distribution showerhead, wherein the vapor distribution showerhead has one or more outlets for directing the vaporized dielectric material towards a substrate, and particularly wherein the energy source emits electrons or photons, wherein the electrons or photons melt and evaporate the dielectric material or sublimate the dielectric material. The arrangement further includes a plasma source configured for providing a plasma between the vapor distribution showerhead and the substrate.
摘要翻译：用于介电材料的蒸发到基片A沉积装置进行说明。沉积装置的蒸汽分配喷头，用于在蒸气分配喷头提供所述介电材料，worin保持器的保持器具有一进料单元，用于将电介质材料供给到所述蒸汽分配喷头到能量源，其配置用于熔化和蒸发该介电材料在蒸汽分配喷头或升华的蒸气分配喷头中的介电材料，worin蒸气分配喷头具有一个或多个出口，用于引导汽化的介电材料朝向基板，特别worin能量源发射电子或光子，worin电子或光子熔化和蒸发该介电材料或升华介电材料。该装置包括还用于蒸汽分配喷头和基片之间提供等离子体的等离子体源。

5. 发明公开

EP2397899A1 Mask holding device 审中-公开
标题翻译： TrägeranordnungfürMaske
公开(公告)号：EP2397899A1
公开(公告)日：2011-12-21
申请号：EP10166022.3
申请日：2010-06-15
申请人： Applied Materials, Inc.
发明人： Bangert, Stefan , Landgraf, Heike , Schuessler, Uwe
IPC分类号： G03F1/00 , H01L51/00 , C23C14/04 , G03F7/20
CPC分类号： G03F7/707 , C23C14/042
摘要： A holding device (100) adapted for holding a mask (201) and a substrate (101) during processing of the substrate (101) is provided. The holding device (100) includes a mask frame (203) adapted for supporting the mask (202) and a substrate carrier (102) adapted for carrying the substrate (101) to be processed. The substrate carrier (102) has at least one recess (103) adapted for receiving the mask frame (203) which holds the mask (202).
摘要翻译：提供一种适于在基板（101）的处理期间保持掩模（201）和基板（101）的保持装置（100）。保持装置（100）包括适于支撑掩模（202）的掩模框架（203）和适于承载要处理的基板（101）的基板载体（102）。衬底载体（102）具有适于接收保持掩模（202）的掩模框架（203）的至少一个凹部（103）。

6. 发明公开

EP2130940A1 Arrangement and method for removing alkali- or alkaline earth-metals from a vacuum coating chamber 有权
标题翻译：装置和方法，用于从真空涂覆室中除去碱金属或碱土金属，
公开(公告)号：EP2130940A1
公开(公告)日：2009-12-09
申请号：EP08009925.2
申请日：2008-05-30
申请人： Applied Materials, Inc.
发明人： Bangert, Stefan , Dieguez-Campo, Jose Manuel , König, Michael , Krishna, Nety M. , Kwak, Byung-Sung Leo
IPC分类号： C23C14/24
CPC分类号： C23C14/564 , C23C16/4405 , C23C16/4412
摘要： The invention relates to a cleaning method in which from a vacuum coating chamber (3) of a coating installation (1) for the coating of substrates (2) with alkali- or alkaline earth-metals, residues of alkali- or alkaline earth-metals are removed. For this purpose into the chamber (3) a gas from the group of N 2 , O 2 or air is introduced, which reacts with the alkali- or alkaline earth-metals to form the corresponding solid compounds. Water can additionally be introduced into the vacuum coating chamber (3).
After the alkali- or alkaline earth-metals have reacted with the gas, the corresponding solid compound is removed from the vacuum coating chamber.
摘要翻译：本发明从一个真空涂覆室涉及其中的清洁方法（3）的涂布装置的（1）为衬底（2）与碱金属或碱土金属，碱金属或碱土类金属的残基的涂层被删除。用于此目的的进入腔室（3）的气体选自N 2，O 2或空气被引入，其与碱金属或碱土金属反应以形成相应的固体化合物。水可以附加地引入真空涂层室（3）。之后的碱金属或碱土类金属已经与气体反应时，对应的固体化合物从真空涂覆室中移除。

7. 发明公开

EP2086033A1 Method of coating a substrate and coating installation 审中-公开
标题翻译： Verfahren zur Beschichtung eines Substrats und Beschichtungsanlage
公开(公告)号：EP2086033A1
公开(公告)日：2009-08-05
申请号：EP08101176.9
申请日：2008-01-31
申请人： Applied Materials, Inc.
发明人： König, Michael , Michael, Klaus , Bangert, Stefan , Hoffmann, Uwe , Landgraf, Heike
IPC分类号： H01L51/00
CPC分类号： H01L51/0021 , H01L51/5203
摘要： A method according to the invention comprises the step of providing a large-area substrate 1 and a first semiconductor, metal, or TCO (Transparent Conductive Oxide) layer 2 deposited on a surface of the substrate 1 ( Fig. 1a ). In the next process step illustrated in Fig. 1b a patterned mask layer 3 is printed on top of the first layer 2. The mask layer 3 consists of a phase-change material, e.g. wax, which may be deposited in an inkjet printing method. The phase-change material 3 has the ability to change in phase from a liquid to a solid state upon contact with the substrate 1. In a third process step a second semiconductor, metal, TCO (Transparent Conductive Oxide) layer 4 is deposited on top of the mask layer 3 and on the first layer 2 where the first layer 2 is not protected by the phase-change masking material 3. Afterwards, in a process step indicated in Fig. 1d the phase-change material 3 is removed. The second patterned layer structure 5 is arranged on top of the first layer 2 in the areas that had not been protected by the phase-change material. The method is proposed particularly for providing a first electrode of an organic electronic device.
摘要翻译：根据本发明的方法包括提供大面积衬底1和沉积在衬底1（图1a）的表面上的第一半导体，金属或TCO（透明导电氧化物）层2的步骤。在图1所示的下一个工艺步骤中，在图1b中，图案化的掩模层3被印刷在第一层2的顶部上。掩模层3由相变材料，例如，蜡，其可以以喷墨印刷方法沉积。相变材料3在与基板1接触时具有从液体到固态的相位变化的能力。在第三工艺步骤中，将第二半导体，金属，TCO（透明导电氧化物）层4沉积在顶部并且在第一层2上，第一层2不被相变掩模材料3保护。之后，在图1所示的处理步骤中，在图1d中，除去相变材料3。在未被相变材料保护的区域中，第二图案层结构5布置在第一层2的顶部上。特别提出了提供有机电子器件的第一电极的方法。

8. 发明公开

EP2746423A1 Evaporator, deposition arrangement, deposition apparatus and methods of operation thereof 有权
标题翻译： Verdampfer，Abscheidungsanordnung，Abscheidungsvorrichtung und Betriebsverfahrendafür
公开(公告)号：EP2746423A1
公开(公告)日：2014-06-25
申请号：EP12198683.0
申请日：2012-12-20
申请人： Applied Materials, Inc.
发明人： Keller, Stefan , Schüssler, Uwe , Dieguez-Campo, Jose Manuel , Bangert, Stefan , Kwak, Byung-Sung Leo
IPC分类号： C23C14/24
摘要： A depositing arrangement for evaporation of a material including an alkali metal or alkaline earth metal, and for deposition of the material on a substrate is described. The arrangement a first chamber configured for liquefying the material, a valve being in fluid communication with the first chamber, and being downstream of the first chamber, wherein the valve is configured for control of the flow rate of the liquefied material through the valve, an evaporation zone being in fluid communication with the valve, and being downstream of the valve, wherein the evaporation zone is configured for vaporizing the liquefied material, and one or more outlets for directing the vaporized material towards the substrate.
摘要翻译：描述了用于蒸发包括碱金属或碱土金属的材料并用于将材料沉积在基底上的沉积布置。所述装置构造成用于液化所述材料的第一室，与所述第一室流体连通并且位于所述第一室的下游的阀，其中所述阀构造成用于控制通过所述阀的液化材料的流速，蒸发区与阀流体连通，并且位于阀的下游，其中蒸发区被配置用于蒸发液化材料，以及一个或多个出口，用于将蒸发的材料引向衬底。

9. 发明授权

EP2128303B1 Arrangement for coating a substrate 有权
标题翻译：用于涂布基材的布置
公开(公告)号：EP2128303B1
公开(公告)日：2013-03-13
申请号：EP08009926.0
申请日：2008-05-30
申请人： Applied Materials, Inc.
发明人： Bangert, Stefan , Dieguez-Campo, Jose Manuel , König, Michael , Krishna, Nety M. , Kwak, Byung-Sung Leo
IPC分类号： C23C14/24
CPC分类号： C23C14/243

10. 发明授权

EP2098609B1 Coating apparatus with rotation module 有权
标题翻译：涂布机用旋转模块
公开(公告)号：EP2098609B1
公开(公告)日：2012-08-15
申请号：EP09153086.5
申请日：2009-02-18
申请人： Applied Materials, Inc.
发明人： Bangert, Stefan , Koenig, Michael , Schueßler, Uwe , Gertmann, Reiner
IPC分类号： C23C14/04 , C23C14/56 , C23C16/04 , C23C16/54
CPC分类号： C23C14/568 , C23C14/042 , C23C16/042 , C23C16/54 , H01L21/67173 , H01L21/682

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