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1. 发明公开

EP1357577A8 Arc-coating process with rotating cathodes 有权
标题翻译：电弧沉积与旋转阴极
公开(公告)号：EP1357577A8
公开(公告)日：2003-12-17
申请号：EP02008914.0
申请日：2002-04-22
申请人： Pivot a.s.
发明人： Jilek, Mojmir , Cselle, Tibor , Holubar, Pavel , Blösch, Peter , Morstein, Marcus
IPC分类号： H01J37/34 , H01J37/32
CPC分类号： H01J37/32055 , C23C14/325 , H01J37/3402 , H01J2237/022
摘要： A PVD method is proposed for coating substrates (10) in a vacuum chamber (20) with at least one anode (30), a cathode (40) and a magnetic field source (42). The cathode (40) can be controlled by the magnetic field source (42) in relation to the direction of the separated material. The method is based on the additional step of effectively turning the magnetic field source before the coating process so that the particles separated from the cathode (40) by the arc can impact on a chamber wall and thus cleaning processes can be carried out in the chamber and at the cathode. It is further proposed that the coating should be carried out successively in relation to the height by moving the magnetic field source (42) upwards and downwards, wherein the magnetic field source (42) is turned relative to the cathode (40) during the upward and downward movement and thus the deposition rate is varied in relation to the height. In the upper region and in the lower region of the deposition process the magnetic field source (42) acquires a direction in which the deposition rate is higher than in the central region.

2. 发明授权

EP2670878B1 MAGNETRON SPUTTERING PROCESS 有权
标题翻译： MAGNETRONSPUTTERVERFAHREN
公开(公告)号：EP2670878B1
公开(公告)日：2015-12-30
申请号：EP11815615.7
申请日：2011-12-31
申请人： Pivot a.s.
发明人： ZINDULKA, Ondrej , JILEK, Mojmir
IPC分类号： C23C14/00 , C23C14/35 , H01J37/34
CPC分类号： C23C14/0042 , C23C14/35 , H01J37/3405

3. 发明授权

EP1749118B1 A HARD, WEAR-RESISTANT ALUMINUM NITRIDE BASED COATING 有权
标题翻译：坚硬，耐磨的基于氮化TIGHT COVER铝
公开(公告)号：EP1749118B1
公开(公告)日：2014-04-09
申请号：EP05739548.5
申请日：2005-04-18
申请人： Pivot a.s.
发明人： CODDET, Olivier , JILEK, Mojmir , MORSTEIN, Marcus , SIMA, Michal
IPC分类号： C23C30/00 , C23C14/32 , C23C14/35
CPC分类号： C23C14/352 , C23C14/024 , C23C14/027 , C23C14/0641 , Y10T428/31678

4. 发明公开

EP2705522A1 GLOW DISCHARGE APPARATUS AND METHOD WITH LATERAL ROTATING ARC CATHODES 有权转让
标题翻译：电晕放电装置和方法有侧面旋转电弧阴极
公开(公告)号：EP2705522A1
公开(公告)日：2014-03-12
申请号：EP12719954.5
申请日：2012-05-03
申请人： Pivot A.S.
发明人： CSELLE, Tibor , MOJMIR, Jilek
IPC分类号： H01J37/34 , H01J37/32
CPC分类号： C23C14/3464 , C23C14/0641 , C23C14/325 , C23C14/34 , H01J37/32055 , H01J37/34 , H01J37/3405 , H01J37/3411 , H01J37/3438 , H01J37/3441
摘要： To improve the result of a glow discharge process is disclosed to be performed in a Physical Vapor Deposition (PVD) coating apparatus comprising a door, at least 2 lateral rotating cathodes with targets. The apparatus is equipped by rotating shields or tube shutters (4). The method comprises the steps of operating the apparatus so that the arc of said second electrode (2) burns directly to said door. The rotary shield or tube shutter on a first electrode (1) is open and said rotary shield or tube shutter (4) on a second electrode (2) is closed. Then a positive potential is applied on said first electrode (1), so that a potential between said second electrode (2) and said first electrode (1) is applied. The positive potential applied on said first electrode (1) is selected so that the electron stream does not burn only against the door since the electrons being affected by the higher potential to said first electrode (1). (Figure 1)

5. 发明公开

EP2484796A1 Magnetron sputtering process 审中-公开
标题翻译：磁控Sputterverfahren
公开(公告)号：EP2484796A1
公开(公告)日：2012-08-08
申请号：EP11153461.6
申请日：2011-02-04
申请人： Pivot a.s.
发明人： Zindulka, Ondrej , Jílek, Mojmír
IPC分类号： C23C14/00
CPC分类号： C23C14/0042 , C23C14/35 , H01J37/3405
摘要： To control reactive magnetron sputtering process using a reactive gas or reactive gases the process pressure is regulated by means of the flow of the reactive gas or the reactive gases, respectively. Oscillations of the flow of the reactive gas or the reactive gases, respectively are determined and used as feedback to determine the process pressure.
摘要翻译：为了控制使用反应气体或反应气体的反应性磁控管溅射工艺，分别通过反应气体或反应气体的流动来调节过程压力。确定反应气体或反应气体的流动的振荡并用作反馈以确定过程压力。

6. 发明授权

EP1673488B1 MODULARE VORRICHTUNG ZUR BESCHICHTUNG VON OBERFLÄCHEN 有权转让
标题翻译：模块化设备FOR表面涂覆
公开(公告)号：EP1673488B1
公开(公告)日：2009-10-07
申请号：EP04790508.8
申请日：2004-10-15
申请人： Platit AG , Pivot a.s.
发明人： CSELLE, Tibor , JILEK, Mojmir
IPC分类号： C23C14/32 , C23C14/34 , H01J37/32
CPC分类号： H01J37/32568 , C23C14/325 , C23C14/3464 , H01J37/32055
摘要： The invention relates to a vacuum chamber for coating items (10) in which a physical vapor deposition method (PVD) is carried out. The aim of the invention is to create a vacuum chamber of the aforementioned kind which can be provided with modular cathodes. For this purpose, the vacuum chamber is provided with a plurality of receiving devices in which a plurality of cathodes each can be arranged. A first receiving device (30) for receiving one or more cathodes (40, 42, 44, 46) is provided substantially in the center of the vacuum chamber (20) and two additional receiving devices (32, 34) for receiving at least one cathode (48, 50, 52, 54) each are provided on the edges of the vacuum chamber (20) in a door-like manner.

7. 发明授权

EP1357577B1 Arc-coating process with rotating cathodes 有权
标题翻译：电弧沉积与旋转阴极
公开(公告)号：EP1357577B1
公开(公告)日：2008-02-13
申请号：EP02008914.0
申请日：2002-04-22
申请人： Pivot a.s.
发明人： Jilek, Mojmir , Cselle, Tibor , Holubar, Pavel , Blösch, Peter , Morstein, Marcus
IPC分类号： H01J37/34 , H01J37/32
CPC分类号： H01J37/32055 , C23C14/325 , H01J37/3402 , H01J2237/022

8. 发明公开

EP1357577A1 Arc-coating process with rotating cathodes 有权
标题翻译：旋转阴极的电弧涂覆工艺
公开(公告)号：EP1357577A1
公开(公告)日：2003-10-29
申请号：EP02008914.0
申请日：2002-04-22
申请人： Pivot a.s.
发明人： Morstein, Marcus , Cselle, Tibor
IPC分类号： H01J37/34 , H01J37/32
CPC分类号： H01J37/32055 , C23C14/325 , H01J37/3402 , H01J2237/022
摘要： A PVD method is proposed for coating substrates (10) in a vacuum chamber (20) with at least one anode (30), a cathode (40) and a magnetic field source (42). The cathode (40) can be controlled by the magnetic field source (42) in relation to the direction of the separated material. The method is based on the additional step of effectively turning the magnetic field source before the coating process so that the particles separated from the cathode (40) by the arc can impact on a chamber wall and thus cleaning processes can be carried out in the chamber and at the cathode. It is further proposed that the coating should be carried out successively in relation to the height by moving the magnetic field source (42) upwards and downwards, wherein the magnetic field source (42) is turned relative to the cathode (40) during the upward and downward movement and thus the deposition rate is varied in relation to the height. In the upper region and in the lower region of the deposition process the magnetic field source (42) acquires a direction in which the deposition rate is higher than in the central region.
摘要翻译：提出了PVD方法用于在具有至少一个阳极（30），阴极（40）和磁场源（42）的真空室（20）中涂覆衬底（10）。阴极（40）可以由磁场源（42）相对于分离材料的方向进行控制。该方法基于在涂布过程之前有效地转动磁场源的附加步骤，使得通过电弧从阴极（40）分离的颗粒可以撞击腔室壁，并且因此清洁过程可以在腔室并在阴极处。进一步提出，通过向上和向下移动磁场源（42），涂层应该相对于高度连续地进行，其中磁场源（42）相对于阴极（40）在向上并向下移动，因此沉积速率相对于高度而变化。在沉积过程的上部区域和下部区域中，磁场源（42）获得沉积速率高于中心区域的方向。

9. 发明授权

EP2705522B1 GLOW DISCHARGE APPARATUS AND METHOD WITH LATERAL ROTATING ARC CATHODES 有权转让
标题翻译：辉光放电装置和具有横向旋转电极的方法
公开(公告)号：EP2705522B1
公开(公告)日：2017-06-28
申请号：EP12719954.5
申请日：2012-05-03
申请人： Pivot A.S.
发明人： CSELLE, Tibor , MOJMIR, Jilek , LÜMKEMANN, Andreas
IPC分类号： H01J37/34 , H01J37/32 , C23C14/32 , C23C14/34
CPC分类号： C23C14/3464 , C23C14/0641 , C23C14/325 , C23C14/34 , H01J37/32055 , H01J37/34 , H01J37/3405 , H01J37/3411 , H01J37/3438 , H01J37/3441

10. 发明授权

EP2788522B1 FILTERED CATHODIC ARC DEPOSITION APPARATUS AND METHOD 有权
标题翻译：真空弧沉积装置清洁，阴极和方法
公开(公告)号：EP2788522B1
公开(公告)日：2016-02-03
申请号：EP12801511.2
申请日：2012-11-30
申请人： Pivot A.S.
发明人： JILEK SEN., Mojmir , JILEK JUN., Mojmir , CODDET, Olivier
IPC分类号： C23C14/32 , C23C14/35 , H01J37/34 , C23C14/06 , C23C14/08 , C23C14/56 , C23C14/54 , C23C14/34 , H01J37/32
CPC分类号： C23C14/3414 , C23C14/0605 , C23C14/0641 , C23C14/08 , C23C14/325 , C23C14/35 , C23C14/54 , C23C14/564 , H01J37/32055 , H01J37/32422 , H01J37/3266 , H01J37/32871 , H01J37/3405 , H01J37/3426 , H01J37/3458

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