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    • 81. 发明公开
    • Method of fabricating a multipole lens, multipole lens, and charged-particle beam instrument equipped therewith
    • Verfahren zur Herstellung einer Multipollinse,Multipollinse und damitausgerüstetesTeilchenstrahlapparat
    • EP1463086A3
    • 2006-05-17
    • EP04251594.0
    • 2004-03-19
    • JEOL Ltd.
    • Kawai, Eiji
    • H01J37/10H01J9/02H01J37/141
    • H01J37/141H01J9/236Y10S430/143
    • A method of efficiently fabricating a multipole lens using a simple procedure is offered. The multipole lens has plural polar elements (23) and an annular holding member (25). Each polar element has a held portion (22). The annular holding member is provided with through-holes (25a) for holding the held portions of the polar elements. A resin (24) is injected into the through-holes in the holding member via openings (32) formed in the holding member, the openings being in communication with the through-holes. The injected resin is cured, thus holding the held portions of the polar elements to the holding member within the through-holes.
      The invention also extends to the multipole lens so fabricated, and to a charged-particle beam instrument comprising the multipole lens.
    • 提供了一种使用简单的程序有效地制造多极镜的方法。 多极透镜具有多个极性元件(23)和环形保持构件(25)。 每个极性元件具有保持部分(22)。 环形保持构件设置有用于保持极性元件的保持部分的通孔(25a)。 通过形成在保持构件中的开口(32)将树脂(24)注入到保持构件的通孔中,开口与通孔连通。 注入的树脂被固化,从而将极性元件的保持部分保持在通孔内的保持构件上。 本发明还延伸到如此制造的多极透镜,以及包括多极透镜的带电粒子束仪器。
    • 88. 发明公开
    • Electron-optical system for making a pseudoparallel micro electron-beam
    • Elektronenoptisches System zur Erzeugung eines pseudoparallelen Elektronenstrahls mit kleinem Strahlquerschnitt。
    • EP0459047A1
    • 1991-12-04
    • EP90305987.1
    • 1990-06-01
    • SHIMADZU CORPORATION
    • Hayashi, Shigeki
    • H01J37/141H01J37/04H01J37/28
    • H01J37/141H01J37/04
    • An electron-optical system devised so as to generate a pseudoeparallel micro electron-beam coverging at a converging angle of 1 x 10⁻³ radian. The system comprises a condenser lens assembly (3, 4) and an asymmetric objective lens (6) whose smaller field gradient side is directed to the condenser lens assembly (3, 4). In another electron-optical system achieved by modifying the above system, the converging angle of the electron beam is made variable with an additional objective lens (8) inserted between the condenser lens assembly (3, 4) and the asymmetric objective lens (6). Theconversion angle can be varied by varying the conversion powers of both the objective lenses (6, 8).
    • 设计了一种电子光学系统,以便以1×10 -3弧度的会聚角度产生伪并行的微电子束覆盖。 该系统包括聚光透镜组件(3,4)和不对称物镜(6),其较小的场梯度侧被引导到聚光透镜组件(3,4)。 在通过改变上述系统实现的另一电子 - 光学系统中,通过插入聚光透镜组件(3)和不对称物镜(6)之间的附加物镜(8)使电子束的会聚角度可变, 。 可以通过改变两个物镜(6,8)的转换功率来改变转换角度。
    • 90. 发明公开
    • Telecentric sub-field deflection with a variable axis immersion lens
    • 具有可变轴倾斜透镜的电气子场偏移
    • EP0331859A3
    • 1990-05-30
    • EP88480086.3
    • 1988-12-06
    • International Business Machines Corporation
    • Groves, Timothy RobinsonPfeiffer, Hans ChristianStickel, WernerSturans, Maris Andris
    • H01J37/147H01J37/141H01J37/317
    • H01J37/141H01J37/1474
    • A two stage, electron beam projection system includes a target, a source of an electron beam and means for projecting an electron beam towards the target with its upper surface defining a target plane. A magnetic projection lens has a principal plane and a back focal plane located between said means for projecting and the target. The means for projecting provides an electron beam directed towards the target. First stage means provides deflection of the beam from area to area within a field. Second stage means provides for deflection of the beam for providing deflection of the beam within an area within a field. The beam crossing the back focal plane produces a telecentric condition of the beam in the image plane with the beam substantially normal to tghe target plane from the principal plane to the target plane. The magnetic projection lens includes a magnetic structure providing for magnetic compensation positioned within the bore of the projection lens, which produces a compensating magnetic field substantially proportional to the first derivative of the axial magnetic projection field. The axial magnetic projection field provides substantially a zero first derivative of the axial magnetic projection field in the vicinity of the target. The projection system projects on the target plane from the projection system as deflected by the upper and lower stages, at all times maintaining the telecentric condition of the electron beam at the target plane throughout the entire range of deflection of the beam, assuring minimum errors due to target height variations.