专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明授权

EP1057203B1 PARTICLE-OPTICAL APPARATUS INVOLVING DETECTION OF AUGER ELECTRONS 有权
标题翻译：采用旋挖机电子检测KORPUSKULARSTRAHLOPTISCHES UNIT
公开(公告)号：EP1057203B1
公开(公告)日：2004-09-15
申请号：EP99963356.3
申请日：1999-12-01
申请人： FEI COMPANY
发明人： KRIJN, Marcellinus, P., C., M. , HENSTRA, Alexander
IPC分类号： H01J37/05
CPC分类号： H01J37/05 , H01J2237/2511
摘要： In an SEM it is desirable, in given circumstances, to acquire an image of the sample (14) by means of Auger electrons extracted from the sample and traveling back through the bore of the objective lens (8) in the direction opposing the direction of the primary beam. It is known to separate extracted electrons from the primary beam by positioning Wien filters (32, 34) in front of the objective lens (8), the filters being energized in such a way that they do not cause deflection of the primary beam but do defect the secondary electrons. This technique cannot be used for Auger electrons, considering their high energy and hence much stronger fields in the Wien filters, thus causing substantial imaging aberrations in the primary beam. According to the invention a quadrupole field is applied in the same position as the fields of each Wien filter (32, 34, 36), thus ensuring that the resolution of the image of the sample (14) is not degraded by the fields of the Wien filters.

2. 发明授权

EP0968517B1 SEM PROVIDED WITH AN ELECTROSTATIC OBJECTIVE AND AN ELECTRICAL SCANNING DEVICE 有权
标题翻译：用静电透镜与电工拾取扫描型电子显微镜
公开(公告)号：EP0968517B1
公开(公告)日：2003-09-03
申请号：EP98957066.8
申请日：1998-12-14
申请人： FEI COMPANY
发明人： KRANS, Jan, M. , KRIJN, Marcellinus, P., C., M. , HENSTRA, Alexander
IPC分类号： H01J37/28
CPC分类号： H01J37/28 , H01J2237/151 , H01J2237/2448
摘要： The detector (6) for the secondary electrons in a SEM provided with an electrostatic objective (14, 16) is arranged ahead of the objective, thus enabling a high detection efficiency. According to the invention, the deflection of the beam is performed electrically and the deflection electrodes (10, 12) are arranged between the detector (6) and the last two electrodes (14, 16) of the objective. The beam deflection is realized by means of two oppositely directed electrical deflection fields in such a manner that the tilting point of the scanning motion is situated at the center (20) of the objective lens, thus avoiding additional lens defects and obstruction of the beam by the limited dimensions of the objective bore. This results in a large field of view, without loss of resolution. Furthermore, deflection by means of two oppositely directed fields has the effect that the paths (24) of the secondary electrons traveling to the detector (6) are shaped such that a larger part thereof reaches the detection material (6).

3. 发明公开

EP4207242A1 ELECTROSTATIC MIRROR CHROMATIC ABERRATION CORRECTORS 审中-实审
公开(公告)号：EP4207242A1
公开(公告)日：2023-07-05
申请号：EP22217129.0
申请日：2022-12-29
申请人： FEI Company
发明人： HENSTRA, Alexander , MOHAMMADI-GHEIDARI, Ali
IPC分类号： H01J37/153
摘要： Electrostatic mirror chromatic aberration (Cc) correctors, according to the present disclosure, comprise an electrostatic electron mirror that itself comprises a multipole. The electrostatic electron mirror is positioned within the corrector such that, when the corrector is in use, an electron beam passing through the corrector is not incident on the electrostatic electron mirror along the optical axis of the mirror. The mirror object distance of the electrostatic mirror is equal to the mirror image distance of the electrostatic mirror, and the electrostatic mirror is configured such that the electrostatic mirror applies no dispersion or coma aberration to the electron beam. The multipole is positioned in the mirror plane of the electrostatic electron mirror, and in some embodiments the multipole is a quadrupole.

4. 发明公开

EP4167265A1 ELECTRON OPTICAL MODULE FOR PROVIDING AN OFF-AXIAL ELECTRON BEAM WITH A TUNABLE COMA 审中-实审
公开(公告)号：EP4167265A1
公开(公告)日：2023-04-19
申请号：EP22198145.9
申请日：2022-09-27
申请人： FEI Company
发明人： MOHAMMADI-GHEIDARI, Ali , TIEMEIJER, Peter Christiaan , HENSTRA, Alexander , RADLICKA, Tomas
IPC分类号： H01J37/153
摘要： An electron optical module for providing an off-axial electron beam with a tunable coma, according to the present disclosure includes a structure positioned downstream of an electron source and an electron lens assembly positioned between the structure and the electron source. The structure generates a decelerating electric field, and is positioned to prevent the passage of electrons along the optical axis of the electron lens assembly. The electron optical module further includes a micro-lens that is not positioned on the optical axis of the electron lens assembly and is configured to apply a lensing effect to an off-axial election beam. Aberrations applied to the off-axial electron beam by the micro-lens and the electron lens assembly combine so that a coma of the off-axial beam has a desired value in a downstream plane.

5. 发明授权

EP3203493B1 CHARGED-PARTICLE MICROSCOPE WITH ASTIGMATISM COMPENSATION AND ENERGY-SELECTION 有权
公开(公告)号：EP3203493B1
公开(公告)日：2018-10-03
申请号：EP16153875.6
申请日：2016-02-02
申请人： FEI Company
发明人： SED'A, Bohuslav , TUMA, Lubomír , HENSTRA, Alexander
IPC分类号： H01J37/05 , H01J37/153
CPC分类号： H01J37/153 , H01J37/05 , H01J37/09 , H01J37/26 , H01J37/28 , H01J2237/0451 , H01J2237/0453 , H01J2237/1532 , H01J2237/2826
摘要： A method of producing a corrected beam of charged particles for use in a charged-particle microscope, comprising the following steps: - Providing a non-monoenergetic input beam 3a of charged particles; - Passing said input beam through an optical module comprising a series arrangement of: –ª A stigmator 33, thereby producing an astigmatism-compensated, energy-dispersed intermediate beam 3b with a particular monoenergetic line focus direction; –ª A beam selector 37, comprising a slit 43-43b' that is rotationally oriented so as to match a direction of the slit to said line focus direction, thereby producing an output beam 3d comprising an energy-discriminated portion of said intermediate beam.

6. 发明授权

EP0868739B1 CORRECTION DEVICE FOR CORRECTING CHROMATIC ABERRATION IN PARTICLE-OPTICAL APPARATUS 失效
标题翻译：校正装置用于在粒子光学装置，校正色ERROR
公开(公告)号：EP0868739B1
公开(公告)日：2005-06-01
申请号：EP97927338.0
申请日：1997-07-09
申请人： FEI COMPANY
发明人： KRIJN, Marcellinus, Petrus, Carolus, Michael , HENSTRA, Alexander , VAN DER MAST, Karel, Diederick
IPC分类号： H01J37/153
CPC分类号： H01J37/153 , H01J2237/1534

7. 发明公开

EP4322198A3 SIMPLE SPHERICAL ABERRATION CORRECTOR FOR SEM 审中-实审
公开(公告)号：EP4322198A3
公开(公告)日：2024-06-12
申请号：EP23190106.7
申请日：2023-08-07
申请人： FEI Company
发明人： MOHAMMADI-GHEIDARI, Ali , HENSTRA, Alexander
IPC分类号： H01J37/153
CPC分类号： H01J37/153 , H01J2237/153420130101 , H01J2237/153220130101 , H01J2237/1220130101 , H01J2237/2820130101 , H01J37/12
摘要： Optical corrector modules for charged particle columns which comprise split multipoles, according to the present invention include at least one split multipole composed of two multipoles separated by a distance less than 10mm, 1m, 100µm, and/or 10µm. Each of the individual multipoles may comprise at least two electrodes positioned to partially define a beam path through the multipole. According to the present invention, each of the electrodes comprises: a first surface that faces upstream of a charged particle beam when used in the charged particle column; and a second surface that faces downstream of the charged particle beam when used in the charged particle column, wherein the thickness between the first surface and the second surface for each of the electrodes is less than 10 mm, 5mm, and/or 3mm. Within the scope of the disclosure, the split multipoles may be electrostatic and may correspond to hexapoles.

8. 发明公开

EP4322196A2 CHARGED PARTICLE OPTICS COMPONENTS AND THEIR FABRICATION 审中-实审
公开(公告)号：EP4322196A2
公开(公告)日：2024-02-14
申请号：EP23190282.6
申请日：2023-08-08
申请人： FEI COMPANY
发明人： MOHAMMADI-GHEIDARI, Ali , HENSTRA, Alexander , MELE, Luigi
IPC分类号： H01J37/147 , H01J37/153 , H01J1/46 , H01J9/14 , H01J37/28
摘要： The present invention is directed to an electrode component 200 with at least two electrodes 202,204 or a multipole component as generally known in the art. Each of the electrodes can be provided with a beam neighboring section or end section forming the free electrodes. This section is the section exposed to high voltages, i.e. more than 10 KV, and is intended to nevertheless work very reliable and precise with respect to the guidance and/or controlling of a beam of a charged particle beam in a microscope or lithographic apparatus. This neighboring section are positioned in the vicinity or close to a charged particle beam or even facing it. This bears the preferred advantage that high voltages can be generated by the electrodes or to the electrode component and they can withstand those high voltages. This assists in a better guidance and/or controlling of the charged beam, such as for compensating aberration etc. The beam neighboring section can have a surface configured to face the beam. This neighboring section or surface are fabricated with absolute dimensional tolerances less than a desired maximum absolute dimensional tolerance wherein the desired maximum absolute dimensional tolerance is based at least on a maximum voltage to be applied to the electrode. With such a precisely fabricated surface, a more precise and/or efficient field can be generated being able to control the charged particle beam more precisely and efficiently.

9. 发明公开

EP3203493A1 CHARGED-PARTICLE MICROSCOPE WITH ASTIGMATISM COMPENSATION AND ENERGY-SELECTION 有权
标题翻译：带有补偿和能量选择的带电粒子显微镜
公开(公告)号：EP3203493A1
公开(公告)日：2017-08-09
申请号：EP16153875.6
申请日：2016-02-02
申请人： FEI Company
发明人： SED'A, Bohuslav , TUMA, Lubomír , HENSTRA, Alexander
IPC分类号： H01J37/05 , H01J37/153
CPC分类号： H01J37/153 , H01J37/05 , H01J37/09 , H01J37/26 , H01J37/28 , H01J2237/0451 , H01J2237/0453 , H01J2237/1532 , H01J2237/2826
摘要： A method of producing a corrected beam of charged particles for use in a charged-particle microscope, comprising the following steps:
- Providing a non-monoenergetic input beam 3a of charged particles;
- Passing said input beam through an optical module comprising a series arrangement of:
▪ A stigmator 33, thereby producing an astigmatism-compensated, energy-dispersed intermediate beam 3b with a particular monoenergetic line focus direction;
▪ A beam selector 37, comprising a slit 43-43b' that is rotationally oriented so as to match a direction of the slit to said line focus direction, thereby producing an output beam 3d comprising an energy-discriminated portion of said intermediate beam.
摘要翻译：一种产生用于带电粒子显微镜的带电粒子的校正束的方法，包括以下步骤： - 提供带电粒子的非单能输入射束3a; - 使所述输入光束通过光学模块，所述光学模块包括以下系列装置：·一个散光装置33，由此产生具有特定单能线聚焦方向的散光补偿的能量散射中间光束3b; ▪光束选择器37，包括狭缝43-43b'，狭缝43-43b'被旋转地定向以便使狭缝的方向与所述线聚焦方向匹配，从而产生包括所述中间光束的能量区分部分的输出光束3d。

10. 发明授权

EP0981829B1 ELECTROSTATIC DEVICE FOR CORRECTING CHROMATIC ABERRATION IN A PARTICLE-OPTICAL APPARATUS 有权
标题翻译：静电DEVICE FOR在粒子-UNIT CHROMATIC误差的校正
公开(公告)号：EP0981829B1
公开(公告)日：2008-01-30
申请号：EP98945499.6
申请日：1998-10-12
申请人： FEI COMPANY
发明人： HENSTRA, Alexander , KRIJN, Marcellinus, Petrus, Carolus, Michael
IPC分类号： H01J37/153 , H01J37/12
CPC分类号： H01J37/153 , H01J2237/04924 , H01J2237/1534
摘要： Electron-optical rotationally symmetrical lenses inevitably suffer from chromatic aberration which often determines the resolution limit at low acceleration voltages. This lens defect cannot be eliminated by compensation by means of rotationally symmetrical fields. In order to improve the resolution nevertheless, it has aleeady been proposed to correct the chromatic aberration by means of a corrector (28) provided with two correction elements (34, 40). Each correction element consists of a number of quadrupole fields. Using the known corrector, it has been found that the chromatic magnification error is inadmissibly high. In order to solve this problem, the correction elements in the corrector according to the invention are provided with at least five layers of electrodes (60-a, 60-b, 60-c, 60-d) which produce quadrupole fields. Because of the strong periodicity of the electron paths in the correcting quadrupole fields, the chromatic magnification error is limited sufficiently (or even reduced to zero) so as to allow the use of the corrector for practical purposes.

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式