专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

81. 发明公开

EP0813085A2 Catadioptric system for photolithography 失效
标题翻译： Katadioptrisches Systemfürdie Photolithographie
公开(公告)号：EP0813085A2
公开(公告)日：1997-12-17
申请号：EP97109679.7
申请日：1997-06-13
申请人： NIKON CORPORATION
发明人： Omura, Yasuhiro, c/o Nikon Corporation
IPC分类号： G02B17/08 , G03F7/20
CPC分类号： G02B17/0892 , G02B17/08 , G03F7/70225
摘要： Catadioptric systems are disclosed that project a demagnified image of an object on a substrate. A first optical system substantially collimates a light flux from the object and directs the light flux to a beamsplitter provided with a reflecting surface. A second optical system comprising a concave mirror and a negative lens and having unit magnification receives the light flux from the beamsplitter and directs the light flux back to the beamsplitter. A third optical system then receives the light flux from the beamsplitter and forms an image of the object on the substrate. The catadioptric systems satisfy various conditions.
摘要翻译：公开了反射折射系统，其将基板上的物体的缩小图像投影出来。第一光学系统基本上准直来自物体的光通量，并将光束引导到设置有反射表面的分束器。包括凹面镜和负透镜并具有单位倍率的第二光学系统接收来自分束器的光束并将光束引导回分束器。然后，第三光学系统从分束器接收光通量，并在基板上形成物体的图像。反射折射系统满足各种条件。

82. 发明公开

EP0809814A1 ARBITRARILY WIDE LENS ARRAY WITH AN IMAGE FIELD TO SPAN THE WIDTH OF A SUBSTRATE 失效
标题翻译：与任何WIDE透镜阵列在衬底上延伸的图像帧的宽度
公开(公告)号：EP0809814A1
公开(公告)日：1997-12-03
申请号：EP96906433.0
申请日：1996-02-12
申请人： Ultratech Stepper Inc.
发明人： MARKLE, David, A.
IPC分类号： G02B3 , G02B13 , G02B17 , G03F7 , H01L21
CPC分类号： G02B17/0892 , G02B13/26 , G02B17/002 , G02B17/008 , G02B17/08 , G03F7/70225 , G03F7/70258
摘要： A system to transfer a pattern from a reticle (10) to a substrate (34) using a lens array having an arbitrarily wide image field that spans the width of the substrate. The disclosed system incorporates multiple, Wynne Dyson lenses (14, 16; 26; 28) arranged in serial pairs and staggered in position so that each dual serial Wynne Dyson lens system (12, 14, 16, 18 and 20) transfers a portion of the overall image from the reticle to the substrate as each are transported past the array of leans pairs. To transfer a complete, unbroken pattern on the substrate, each of the dual serial Wynne Dyson lens pairs are positioned in opposing and side-by-side positions and are staggered with respect to the scan direction. Each lens pair optionally includes individual internal adjustments, so that the pattern produced on the substrate does not contain any breaks or discontinuities.

83. 发明授权

EP0475020B1 Field compensated lens 失效
标题翻译：现场镜头补偿
公开(公告)号：EP0475020B1
公开(公告)日：1997-03-26
申请号：EP91111996.4
申请日：1991-07-18
申请人： International Business Machines Corporation
发明人： Singh, Rama Nand , Wilczynski, Janusz Stanislaw
IPC分类号： G02B17/08 , G02B27/00
CPC分类号： G02B17/0892 , G02B13/26 , G02B17/008 , G02B17/08 , G02B27/0025 , G03F7/70225 , G03F7/70275

84. 发明公开

EP0736789A3 Catadioptric optical system and exposure apparatus having the same 无效
标题翻译：反射折射系统，并使用这个方向曝光装置
公开(公告)号：EP0736789A3
公开(公告)日：1997-02-05
申请号：EP96105452.5
申请日：1996-04-04
申请人： NIKON CORPORATION
发明人： Takahashi, Tomowaki, c/o Nikon Corp.
IPC分类号： G02B17/08 , G03F7/20 , G03B27/32
CPC分类号： G02B17/0892 , G02B17/08 , G03F7/70225 , G03F7/70275 , G03F7/70358
摘要： The present invention relates to a catadioptric projection optical system configured such that the diameter of its concave mirror can be reduced without deteriorating performances of the optical system and to an exposure apparatus including the same. The catadioptric optical system in accordance with the present invention comprises a first imaging optical system (G1) forming an intermediate image of a pattern on a first surface with a reduced magnification, including a first lens group with a positive refracting power and a second lens group (G12) which has a concave mirror (M1) and a negative lens component whose concave surface faces the first surface; a second imaging optical system (G2) forming an image of the intermediate image upon a second surface, a combined magnification of the first and second imaging optical systems being a reduction magnification; and a first optical path deflecting member (M2) disposed in an optical path from the first imaging optical system to the second imaging optical system so as to guide light from the first imaging optical system to the second imaging optical system. In particular, the first lens group (G11) of the first imaging optical system is disposed, while a part thereof is positioned between the first optical path deflecting member (M2) and the second lens group (G12), in a space through which both light directed from the first surface to the second lens group and light directed from the second lens group to the first optical path deflecting member pass, and includes, successively from the first surface toward the second lens group, a front lens group having a positive refracting power, an intermediate lens group having a negative refracting power, and a rear lens group having a positive refracting power.

85. 发明公开

EP0723173A2 Exposure apparatus 失效
标题翻译： Belichtungsvorrichtung
公开(公告)号：EP0723173A2
公开(公告)日：1996-07-24
申请号：EP96100719.2
申请日：1996-01-18
申请人： NIKON CORPORATION
发明人： Kumazawa, Masato
IPC分类号： G02B13/22 , G03F7/20
CPC分类号： G02B17/0892 , G02B13/22 , G02B17/002 , G02B17/008 , G02B17/08 , G03F7/70066 , G03F7/70225 , G03F7/70275 , G03F7/70358
摘要： It is an object to provide a high-performance and compact exposure apparatus which can perform a projection exposure operation with satisfactory optical performance by using a plurality of compact projection optical systems each capable of ensuring a sufficient working distance and having excellent imaging performance, while preventing a decrease in throughput even in a large exposure area. An exposure apparatus for projecting and exposing an image of a mask (10) into a plate (30) while moving a mask and a plate has a first projection optical system (35a) and a second projection optical system each of which is real-size and both-side telecentric and forms the erect image of the mask on the plate. The first or second projection optical system (35a) has a refraction optical system (S 1 ) having a positive refracting power, and a concave reflecting mirror (M 1 ) for reflecting a light beam from the refraction optical system toward the refraction optical system.
摘要翻译：本发明的目的是提供一种高性能和紧凑的曝光装置，其可以通过使用能够确保足够的工作距离并且具有优异的成像性能的多个小型投影光学系统来执行具有令人满意的光学性能的投影曝光操作，同时防止吞吐量即使在大的曝光区域也会降低。用于在移动掩模和板的同时将掩模（10）的图像投影和曝光到板（30）中的曝光装置具有第一投影光学系统（35a）和第二投影光学系统，每个都是实际尺寸并且双面远心，并在面板上形成面罩的直立图像。第一或第二投影光学系统（35a）具有具有正折射率的折射光学系统（S1）和用于将来自折射光学系统的光束反射到折射光学系统的凹面反射镜（M1）。

86. 发明公开

EP0608572A2 Catadioptric optical reduction system with high numerical aperture 失效
标题翻译：具有高数值孔径的反折射光学还原系统
公开(公告)号：EP0608572A2
公开(公告)日：1994-08-03
申请号：EP93121146.0
申请日：1993-12-30
申请人： SVG LITHOGRAPHY SYSTEMS, INC.
发明人： Williamson, David W.
IPC分类号： G02B17/08 , G03F7/20
CPC分类号： G02B17/0892 , G02B17/08 , G03F7/70225 , G03F7/70358
摘要： A catadioptric optical reduction system for use in the photolithographic manufacture of semiconductors having a concave mirror operating near unit magnification, or close to a concentric condition. A lens group before the mirror provides only enough power to image the entrance pupil at infinity to the aperture stop at or near the concave mirror. A lens group after the mirror provides a larger proportion of reduction from object to image size, as well as projecting the aperture stop to an infinite exit pupil. An aspheric concave mirror is used to further reduce high order aberrations. The catadioptric optical reduction system provides a relatively high numerical aperture of 0.7 capable of patterning features smaller than 0.35 microns over a 26 x 5 millimeter field. The optical reduction system is thereby well adapted to a step and scan microlithographic exposure tool as used in semiconductor manufacturing. Several other embodiments combine glasses of different refracting power to widen the spectral bandwidth which can be achieved.
摘要翻译：一种反射折射光学还原系统，用于光刻制造具有单位放大倍数附近或接近同心条件的凹面镜的半导体。反射镜前的透镜组仅提供足够的能量来将入瞳无限远地成像到凹面镜处或附近的孔径光阑处。镜子后面的镜头组提供更大比例的物体到图像尺寸缩小比例，以及将光圈投影到无限出射瞳孔。非球面凹面镜用于进一步降低高阶像差。反折射光学还原系统提供0.7的相对较高的数值孔径，其能够在26×5毫米的场中对小于0.35微米的特征进行图案化。因此光学还原系统很好地适用于在半导体制造中使用的步进扫描微光刻曝光工具。若干其他实施例组合不同折射能力的眼镜以扩大可实现的光谱带宽。

87. 发明公开

EP0581585A1 Catadioptric reduction projection optical system 失效
标题翻译： Verkleinerndes katadioptrisches Projektionssystem。
公开(公告)号：EP0581585A1
公开(公告)日：1994-02-02
申请号：EP93305960.2
申请日：1993-07-28
申请人： NIKON CORPORATION
发明人： Suenaga,Yutaka Virunubu Hodogaya 624,
IPC分类号： G02B17/08 , G03F7/20
CPC分类号： G02B17/0812 , G02B17/0892 , G03F7/70225
摘要： A catadioptric reduction optical system for forming the reduced image of an object includes, a first partial optical system having first reflecting means and first refracting means to condense a light beam from the object and form a reduced primary image, and a second partial optical system having second reflecting means and second refracting means to form a further reduced secondary image from primary image. The first reflecting means has one concave reflecting mirror, the first refracting means has a front lens group G 11 of positive refractive power and a rear lens group G 12 of negative refractive power both disposed between said object and the concave reflecting mirror. The second reflecting means has one concave reflecting mirror. The second refracting means has a lens group of positive refractive power disposed between the concave reflecting mirror and the secondary mirror.
Use : Projector for litographic step in the production of semiconductor devices.
摘要翻译：用于形成物体的缩小图像的反折射减少光学系统包括：第一部分光学系统，具有第一反射装置和第一折射装置，用于冷凝来自物体的光束并形成减小的原始图像;以及第二部分光学系统，第二反射装置和第二折射装置，以从主图像形成进一步减小的次级图像。第一反射装置具有一个凹面反射镜，第一折射装置具有正折射力的前透镜组G11和负屈光力的后透镜组G12，两者都设置在所述物体和凹反射镜之间。第二反射装置具有一个凹面反射镜。第二折射装置具有设置在凹面反射镜和副反射镜之间的正折射力透镜组。用途：投影机用于生产半导体器件的散焦步骤。

88. 发明授权

EP0243950B1 Optical projection system 失效
标题翻译：光学投影系统
公开(公告)号：EP0243950B1
公开(公告)日：1993-03-24
申请号：EP87106243.6
申请日：1987-04-29
申请人： MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD.
发明人： Sato, Takeo , Araki, Nobuhiro , Kawata, Koichi , Nomura, Noboru , Ueno, Atsushi , Yoshida, Shotaro
IPC分类号： G02B17/08 , G03B41/00
CPC分类号： G02B17/0852 , G02B17/0808 , G02B17/0892 , G03F7/70225

89. 发明公开

EP0527043A1 Catadioptric reduction projection optical system 失效
标题翻译： Verkleinerndes katadioptrisches Projektionssystem。
公开(公告)号：EP0527043A1
公开(公告)日：1993-02-10
申请号：EP92307152.6
申请日：1992-08-05
申请人： NIKON CORPORATION
发明人： Suenaga, Yutaka
IPC分类号： G02B17/08
CPC分类号： G02B17/0812 , G02B17/0892 , G03F7/70225
摘要： A first partial optical system including a first group of lenses G₁ having a positive refractive power, a first concave reflection mirror M₁ and a second group of lenses G₂ having a positive refractive power, for forming a primary reduced image of an object, a second partial optical system including a second concave reflection mirror M₂ and a third group of lenses G₃ having a positive refractive power, for further reducing the primary reduced image and refocusing it, and a reflection mirror arranged between the first partial optical system and the second partial optical system, for deflecting a light path are arranged in a sequence as viewed from the object. A good image-forming ability as a projection optical system for fabricating a semiconductor device is attained with a simple construction.
摘要翻译：第一部分光学系统，包括具有正屈光力的第一组透镜G1，具有正屈光力的第一凹面反射镜M1和第二组透镜G2，用于形成物体的初级缩小图像;第二部分光学系统光学系统包括具有正折射力的第二凹面反射镜M2和第三组透镜G3，用于进一步减小初级缩小图像并对其进行再聚焦;以及反射镜，布置在第一部分光学系统和第二部分光学系统之间用于偏转光路的方式按照从物体观察的顺序排列。以简单的结构实现了作为用于制造半导体器件的投影光学系统的良好的图像形成能力。

90. 发明公开

EP0465882A3 High resolution reduction catadioptric relay lens 失效
标题翻译：高分辨率降低有源继电器镜头
公开(公告)号：EP0465882A3
公开(公告)日：1992-09-30
申请号：EP91110043.6
申请日：1991-06-19
申请人： International Business Machines Corporation
发明人： Singh, Rama Nand , Wilczynski, Janusz Stanislaw
IPC分类号： G02B17/00 , G02B13/00 , G02B27/28
CPC分类号： G02B17/0892 , G02B13/00 , G02B17/08 , G03F7/70225 , G03F7/70791
摘要： An optical system of a NX reduction catadioptric relay lens having sub-half micron resolution over the ultraviolet band width is described. A spherical mirror (16) with a stop at the mirror is used to work at substantially the desired reduction ratio and the desired high numerical aperture sufficient to provide the desired high resolution. A beam splitting cube (22) with appropriate coatings (20) is used to form an accessible image of an object (6) on an image plane (8). Refracting correctors (7, 9) in the path of the slow beam incident on the mirror and in the path of the fast beam reflected on the mirror are designed to fix the aberrations of the image formed by the mirror. The beam splitter coatings are chosen in such a way that beams reflected from and transmitted therethrough suffer no net aberration as a result of multiple reflections within the thin film beam splitter coatings and therefore are substantially free of aberration, distortion and apodization which would result from the beam splitting surface in the absence of these coatings.
摘要翻译：描述了在紫外线带宽上具有半微米分辨率的NX还原反射折射中继透镜的光学系统。使用在反射镜处具有止动件的球面镜（16）以基本上所需的减小比率和足以提供期望的高分辨率的期望的高数值孔径进行工作。使用具有适当涂层（20）的分束立方体（22）在图像平面（8）上形成物体（6）的可访问图像。入射在反射镜上的慢光束和在反射镜上反射的快光束的路径中的折射校正器（7,9）被设计成固定由反射镜形成的图像的像差。选择分束器涂层，使得从薄膜分束器涂层中反射并从其透射的光束由于薄膜分束器涂层内的多次反射而不会产生净像差，因此基本上不会产生像差，变形和变迹在没有这些涂层的情况下分束表面。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式