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81. 发明公开

EP0241190A2 Method and apparatus for photodeposition of films on surfaces 失效
标题翻译： Methode und Apparat zum photochemischen Auftragen von Filmen aufOberflächen。
公开(公告)号：EP0241190A2
公开(公告)日：1987-10-14
申请号：EP87302703.1
申请日：1987-03-30
申请人： MASSACHUSETTS INSTITUTE OF TECHNOLOGY
发明人： Ehrlich, Daniel J. , Rothschild, Mordecai
IPC分类号： C23C16/48 , C23C16/16 , H01F41/14 , H01F41/22
CPC分类号： G03F1/72 , C23C16/047 , C23C16/483 , G03F7/2043 , H01F41/20 , H01F41/22 , H01F41/34
摘要： The invention relates to visible-laser deposition reactions of metal containing oxyhalide and carbonyl vapors, such as, chromyl chloride vapor, CrO 2 Cl 2 , or cobalt carbonyl, Co 2 (CO) 8 , for direct writing of metal containing opaque patterns on various substrates (S i , S i O 2 , GaAs and glass). Deposition at low laser power is by photolyses of adsorbed reactant molecules. Higher powers initiate deposition photochemically and continue it with a combined photolytic/ pyrolytic reaction, simultaneously inducing a solid-phase conversion of the deposited film. Mixed Cr 2 O 3 /CrO 2 or cobalt thin films of 1-nanometerto several-micrometer thickness, as well as 1-millimeter-long single crystals of Cr 2 0 3 or cobalt, can be grown with this process, the former at rates up to 3 µm/s. Thin chromium oxide films produced in this manner are strongly ferromagnetic.
摘要翻译：本发明涉及含有卤氧化物和羰基蒸气的染料的可见激光沉积反应，例如氯化铬蒸气，CrO 2 Cl 2或羰基钴Co 2（CO）8，用于将各种不透明图案的金属直接写入各种衬底（Si， SiO2，GaAs和玻璃）。在低激光功率下沉积是通过吸附的反应物分子的光解。更高的功率开始光化学沉积，并通过组合的光解/热解反应继续进行，同时诱导沉积膜的固相转化。可以用该方法生长1纳米至几微米厚的混合Cr2O3 / CrO2或钴薄膜，以及1毫米长的Cr2O3或钴单晶，前者的速率高达3微米/ 秒。以这种方式生产的薄铬氧化物膜是强铁磁性的。

82. 发明公开

EP0228295A2 Method for producing an electronic device having a multi-layer structure 有权
标题翻译：一种用于制造具有多层结构的电子装置的过程。
公开(公告)号：EP0228295A2
公开(公告)日：1987-07-08
申请号：EP86310163.0
申请日：1986-12-24
申请人： CANON KABUSHIKI KAISHA
发明人： Ohtoshi, Hirokazu , Hanna, Jun-ichi , Shimizu, Isamu
IPC分类号： H01L31/18 , H01L31/08 , H01L29/78 , H01L21/205 , C23C16/48
CPC分类号： H01L21/02425 , C23C16/02 , C23C16/482 , C23C16/483 , G03G5/08235 , H01L21/02422 , H01L21/0245 , H01L21/02505 , H01L21/02532 , H01L21/02576 , H01L21/02579 , H01L21/0262 , H01L31/075 , H01L31/095 , H01L31/202 , Y02E10/548 , Y02P70/521 , Y10S438/909
摘要： A method for producing an electronic device having a multi-layer structure comprising one or more semiconductor thin layers controlled in band gap formed on a substrate comprises forming at least one of said semiconductor thin layers controlled in band gap according to the optical CVD method and forming at least one of other constituent layers according to the method comprising introducing a gaseous starting material for formation of a deposited film and a gaseous halogenic oxidizing agent having the property of oxidation action for said starting material into a reaction space to effect chemical contact therebetween to thereby form a plural number of precursors containing a precursor under excited state and transferring at least one precursor of those precursors into a film forming space communicated with the reaction space as a feeding source for the constituent element of the deposited film.

83. 发明公开

EP0172604A2 Method for depositing a micron-size metallic film on a transparent substrate utilizing a visible laser 失效
标题翻译：使用可见激光束在透明基板上沉积在微米范围内的金属膜的方法。
公开(公告)号：EP0172604A2
公开(公告)日：1986-02-26
申请号：EP85303092.2
申请日：1985-05-01
申请人： GOULD INC.
发明人： Oprysko, Modest M. , Beranek, Mark W.
IPC分类号： C23C16/04
CPC分类号： C23C16/481 , C23C16/047 , C23C16/482 , C23C16/483 , H05K3/146 , H05K3/225
摘要： A method for depositing a micron-size metallic film on a transparent substrate by thermal deposition employing a focused visible laser. The method includes the step of positioning the substrate in a gas cell containing a metal bearing gaseous compound. A nucleation layer is formed on a surface of the substrate by either shining an ultraviolet light on the substrate surface or by heating the substrate to a temperature which is less than the temperature at which the molecules of the gaseous compound decompose. Next, a laser which may be visible or near infrared is focused onto the substrate to provide localized heating of the area of the substrate to which the beam is incident. Molecules of the gaseous compound thermally decompose on the heated area to deposit a metal film thereon.

84. 发明授权

EP2424707B1 ADDITIVE LAYER FABRICATION METHOD 有权
公开(公告)号：EP2424707B1
公开(公告)日：2018-10-31
申请号：EP10718667.8
申请日：2010-04-27
申请人： BAE Systems PLC
发明人： WESCOTT, Andrew, David , MORELAND, Benjamin, Richard , SIDHU, Jagjit
IPC分类号： B23K26/34 , B22F3/105
CPC分类号： B33Y10/00 , B22F3/1055 , B22F2003/1056 , B23K26/32 , B23K26/342 , B23K35/0244 , B23K2103/50 , B29C64/153 , C23C16/483 , C23C24/00 , Y02P10/295
摘要： A selective layer melting or other additive layer fabrication method in which powdered material is fused by heating it with a pulsed laser, the pulses being modulated while the laser is traversing the substrate so as to control the thickness and/or width of the layer being formed. Initial layers of the fabrication structure may be formed more thickly than subsequent layers, e.g. by means of a CW laser, to reduce distortion. This aspect of the invention may be employed independently of the use of a pulsed laser to form the subsequent layers.

85. 发明公开

EP3158563A4 AN ADDITIVE MANUFACTURING TECHNOLOGY FOR THE FABRICATION AND CHARACTERIZATION OF NUCLEAR REACTOR FUEL 有权
公开(公告)号：EP3158563A4
公开(公告)日：2018-02-14
申请号：EP15811002
申请日：2015-06-23
申请人： FREE FORM FIBERS LLC
发明人： PEGNA JOSEPH , VAALER ERIK G , HARRISON SHAY L , SCHNEITER JOHN L , WILLIAMS KIRK L , GODUGUCHINTA RAM K
IPC分类号： G21C3/02 , B23B19/00 , C04B35/565 , C04B35/628 , C04B35/80 , G21C3/04 , G21C3/42 , G21C21/02
CPC分类号： G21C3/20 , C04B35/565 , C04B35/62857 , C04B35/6286 , C04B35/62863 , C04B35/62865 , C04B35/62868 , C04B35/62873 , C04B35/62878 , C04B35/62884 , C04B35/62889 , C04B35/62894 , C04B35/62897 , C04B35/806 , C04B35/83 , C04B2235/3244 , C04B2235/3813 , C04B2235/422 , C04B2235/524 , C04B2235/5244 , C04B2235/5264 , C04B2235/5454 , C04B2235/614 , C23C16/08 , C23C16/483 , G21C3/04 , G21C3/07 , G21C3/18 , G21C3/28 , G21C3/42 , G21C3/62 , G21C21/02 , Y02E30/38
摘要： Nuclear fuel structures and methods for fabricating are disclosed herein. The nuclear fuel structure includes a plurality of fibers arranged in the structure and a multilayer fuel region within at least one fiber of the plurality of fibers. The multilayer fuel region includes an inner layer region made of a nuclear fuel material, and an outer layer region encasing the nuclear fuel material. A plurality of discrete multilayer fuel regions may be formed over a core region along the at least one fiber, the plurality of discrete multilayer fuel regions having a respective inner layer region of nuclear fuel material and a respective outer layer region encasing the nuclear fuel material. The plurality of fibers may be wrapped around an inner rod or tube structure or inside an outer tube structure of the nuclear fuel structure, providing both structural support and the nuclear fuel material of the nuclear fuel structure.

86. 发明公开

EP3237650A4 ALD METHOD AND APPARATUS 有权
公开(公告)号：EP3237650A4
公开(公告)日：2018-01-17
申请号：EP15872018
申请日：2015-11-25
申请人： PICOSUN OY
发明人： MALINEN TIMO , KOSTAMO JUHANA , LI WEI-MIN , PILVI TERO
IPC分类号： C23C16/455 , C23C16/48 , C23C16/54
CPC分类号： C23C16/45527 , C23C16/45536 , C23C16/45574 , C23C16/45578 , C23C16/48 , C23C16/482 , C23C16/483
摘要： A method that includes performing an atomic layer deposition sequence including at least one deposition cycle, each cycle producing a monolayer of deposited material, the deposition cycle including introducing at least a first precursor species and a second precursor species to a substrate surface in a reaction chamber, wherein both of said first and second precursor species are present in gas phase in said reaction chamber simultaneously.

87. 发明公开

EP3176286A4 MULTILAYER COATING MEMBER AND MANUFACTURING METHOD OF MULTILAYER COATING MEMBER 有权
公开(公告)号：EP3176286A4
公开(公告)日：2018-01-17
申请号：EP15827384
申请日：2015-07-06
申请人： IBIDEN CO LTD
发明人： KUBO SHUICHI , KARIYA SATORU , HAN MINGXU , NAKAMURA TOMOYOSHI , OHNO KAZUSHIGE
IPC分类号： C23C28/04 , C23C16/02 , C23C16/32 , C23C16/48
CPC分类号： C23C16/325 , C23C16/0272 , C23C16/483 , C23C28/046 , C23C28/048
摘要： The present invention relates to a multilayer coated member including a substrate containing a metal, an amorphous inorganic material layer formed on the substrate, and a non-oxide ceramic layer formed on the amorphous inorganic material layer.

88. 发明授权

EP2683669B1 PROCEDE D'OBTENTION D'UN SUBSTRAT MUNI D'UN REVÊTEMENT 有权
标题翻译：促进对联合国基金会的发展
公开(公告)号：EP2683669B1
公开(公告)日：2017-08-16
申请号：EP12712342.0
申请日：2012-03-07
申请人： Saint-Gobain Glass France
发明人： BILAINE, Matthieu , YEH, Li-Ya
IPC分类号： C03C17/34 , C03C17/36 , B23K26/06 , C23C16/48 , C23C16/56 , B23K101/34 , B23K26/064 , C03C17/00 , C23C14/58
CPC分类号： C23C16/483 , B23K26/0608 , B23K26/064 , B23K2201/34 , C03C17/002 , C03C17/3417 , C03C17/366 , C03C2218/156 , C03C2218/32 , C23C14/5813 , C23C16/56

89. 发明公开

EP3176286A1 MULTILAYER COATING MEMBER AND MANUFACTURING METHOD OF MULTILAYER COATING MEMBER 有权
标题翻译：维多利亚州赫尔辛基公民健康与安全基金会
公开(公告)号：EP3176286A1
公开(公告)日：2017-06-07
申请号：EP15827384.7
申请日：2015-07-06
申请人： IBIDEN CO., LTD.
发明人： KUBO Shuichi , KARIYA Satoru , HAN Mingxu , NAKAMURA Tomoyoshi , OHNO Kazushige
IPC分类号： C23C28/04 , C23C16/32
CPC分类号： C23C16/325 , C23C16/0272 , C23C16/483 , C23C28/046 , C23C28/048
摘要： The present invention relates to a multilayer coated member including a substrate containing a metal, an amorphous inorganic material layer formed on the substrate, and a non-oxide ceramic layer formed on the amorphous inorganic material layer.
摘要翻译：本发明涉及包括含有金属的基板，形成在基板上的无定形无机材料层和形成在无定形无机材料层上的非氧化物陶瓷层的多层涂覆构件。

90. 发明公开

EP2842156A4 LOCALIZED ATMOSPHERIC LASER CHEMICAL VAPOR DEPOSITION 有权
标题翻译： LOKALISIERTEATMOSPHÄRISCHELASER-BASIERTE GASPHASENABSCHEIDUNG
公开(公告)号：EP2842156A4
公开(公告)日：2015-06-03
申请号：EP13781209
申请日：2013-04-19
申请人： L LIVERMORE NAT SECURITY LLC
发明人： MATTHEWS MANYALIBO JOSEPH , ELHADJ SELIM
IPC分类号： H01L21/268 , C03C15/02 , C03C17/245 , C23C16/02 , C23C16/04 , C23C16/448 , C23C16/46 , C23C16/48 , C23C16/52
CPC分类号： C23C16/047 , C03C17/245 , C03C2217/213 , C03C2218/152 , C23C16/0263 , C23C16/4488 , C23C16/46 , C23C16/483 , C23C16/52 , H01L21/268
摘要： An atmospheric, Laser-based Chemical Vapor Deposition (LCVD) technique provides highly localized deposition of material to mitigate damage sites on an optical component. The same laser beam can be used to deposit material as well as for in-situ annealing of the deposited material. The net result of the LCVD process is in-filling and planarization of a treated site, which produces optically more damage resistant surfaces. Several deposition and annealing steps can be interleaved during a single cycle for more precise control on amount of deposited material as well as for increasing the damage threshold for the deposited material.
摘要翻译：大气中的基于激光的化学气相沉积（LCVD）技术提供高度局部化的材料沉积，以减轻光学部件上的损伤部位。相同的激光束可用于沉积材料以及沉积材料的原位退火。 LCVD工艺的最终结果是处理部位的填充和平坦化，其产生光学上更耐损伤的表面。可以在单个循环期间交错几个沉积和退火步骤，以更精确地控制沉积材料的量以及增加沉积材料的损伤阈值。

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