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71. 发明授权

EP2648206B1 TRANSMISSION ELECTRON MICROSCOPE FOR RECONSTRUCTING A THREE-DIMENSIONAL STRUCTURE AND TRANSMISSION ELECTRON MICROSCOPE IMAGE RECONSTRUCTION METHOD 失效转让
公开(公告)号：EP2648206B1
公开(公告)日：2019-03-20
申请号：EP11844611.1
申请日：2011-10-14
申请人： Hitachi High-Technologies Corporation
发明人： KUBO, Takashi , KOBAYASHI, Hiroyuki
IPC分类号： H01J37/22 , H01J37/20 , H01J37/24 , G06T11/00 , G06T7/30 , H01J37/26

72. 发明授权

EP1398819B1 Vacuum apparatus using a matching box, and vacuum processing method using the same 有权
标题翻译：具有阻抗匹配用这种阻抗匹配部部分，并在真空处理方法的真空设备
公开(公告)号：EP1398819B1
公开(公告)日：2016-11-09
申请号：EP03020603.1
申请日：2003-09-10
申请人： ULVAC, INC.
发明人： Yajima, Taro , Akaishi, Minoru , Horishita, Yoshikuni
IPC分类号： H01J37/32 , H01J37/24 , H01J37/08 , H01F29/14 , H05H1/46
CPC分类号： H01J37/08 , H01F29/14 , H01J37/24 , H01J37/32082 , H01J37/32183 , H01J37/32357 , H01J2237/31 , H05H1/46

73. 发明公开

EP2511937A4 ELECTRON MICROSCOPE 有权
标题翻译：电子显微镜
公开(公告)号：EP2511937A4
公开(公告)日：2015-03-04
申请号：EP10835635
申请日：2010-10-25
申请人： HITACHI HIGH TECH CORP
发明人： KAJI KAZUTOSHI
IPC分类号： H01J37/244 , G01N23/04 , G01N23/225 , H01J37/22 , H01J37/24 , H01J37/26 , H01J37/28
CPC分类号： H01J37/244 , G01N23/04 , G01N2223/102 , G01N2223/3037 , H01J37/26 , H01J2237/24415 , H01J2237/24485 , H01J2237/24495 , H01J2237/28
摘要： An object of the present invention relates to measurement of a quantitative element image with a high S/N ratio and measurement of an electron energy loss spectrum with high energy precision and energy resolution. The present invention relates to measurement of a characteristic X-ray spectrum obtained by correcting dead time due to excessive X rays and measurement of an electron energy loss spectrum obtained by correcting energy based on a zero loss peak in the case where the characteristic X-ray spectrum and the electron energy loss spectrum are measured by irradiating one irradiation position on a sample with an electron beam for a predetermined time while scanning the surface of the sample to observe a Z-contrast image. According to the present invention, it becomes possible to measure a quantitative element image with a high S/N ratio by a characteristic X ray, an element image with a high S/N ratio by an electron energy loss spectrum and a high energy resolution spectrum.

74. 发明公开

EP2599209A2 IGNITION CIRCUIT FOR IGNITING A PLASMA FED WITH ALTERNATING POWER 有权
标题翻译：点火电路等离子与WECHSELSTROMVESORGUNG点火
公开(公告)号：EP2599209A2
公开(公告)日：2013-06-05
申请号：EP11761016.2
申请日：2011-07-19
申请人： Hüttinger Elektronik GmbH & Co. KG
发明人： RICHTER, Ulrich , ZÄHRINGER, Gerhard , WIEDEMUTH, Peter
IPC分类号： H02M7/06 , H01H37/24 , H01J37/24
CPC分类号： H05H1/24 , H01J37/32036 , H01J37/32045 , H02M7/06 , H05B41/042 , H05H1/46 , H05H2001/4682
摘要： In an ignition circuit for igniting a plasma fed with alternating power in a gas discharge chamber, having two line sections for connection to an alternating power source and at least one line section for connection to a housing earth of the gas discharge chamber, at least one series connection of a non-linear element and an energy store is connected between the line sections for connection to an alternating power source, and the line section for connection to a housing earth of the gas discharge chamber is connected to a connection node between an energy store and a non-linear element.

75. 发明公开

EP2365511A1 Feedback loop for emitter flash cleaning 有权
标题翻译： Rückkopplungsschleifefüreine Emitter Blitzreinigung
公开(公告)号：EP2365511A1
公开(公告)日：2011-09-14
申请号：EP10156118.1
申请日：2010-03-10
申请人： ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH
发明人： Adamec, Pavel
IPC分类号： H01J3/02 , H01J37/073 , H01J37/24
CPC分类号： H01J37/073 , H01J2237/022 , H01J2237/0653 , H01J2237/2485
摘要： A method and a device for stabilizing the emission current of an emitter (11) of a charged particle beam device (10) are provided. In the method, the emitter (11) is operated under predetermined operation parameters including at least one voltage with a predetermined value. The method includes determining a first value of the emission current under the predetermined operation parameters (112) and flash cleaning the emitter (120) while a first electric field is applied to the emitter. The first electric field is generated by the at least one voltage having a first value of the at least one voltage, wherein the first value of the at least one voltage is provided in dependence of the determined first value of the emission current.
摘要翻译：提供了一种用于稳定带电粒子束装置（10）的发射器（11）的发射电流的方法和装置。在该方法中，发射器（11）在包括至少一个具有预定值的电压的预定操作参数下运行。该方法包括在预定操作参数（112）下确定发射电流的第一值，并且在向发射器施加第一电场时闪光清洁发射器（120）。第一电场由具有至少一个电压的第一值的至少一个电压产生，其中根据所确定的发射电流的第一值提供至少一个电压的第一值。

76. 发明公开

EP2362410A2 Plasma igniter for an inductively coupled plasma ion source 有权
标题翻译：用于电感耦合等离子体离子源的等离子体点火器
公开(公告)号：EP2362410A2
公开(公告)日：2011-08-31
申请号：EP11154434.2
申请日：2011-02-15
申请人： FEI COMPANY
发明人： Graupera, Anthony , Kellogg, Sean , Miller, Tom , Laur, Dustin , Zhang, Shouyin
IPC分类号： H01J37/08 , H01J37/24
CPC分类号： H01J37/08 , H01J37/24 , H01J2237/0815 , H01J2237/31749 , H05H1/36
摘要： A focused ion beam (FIB) system (900) is disclosed, comprising an inductively coupled plasma ion source, an insulating plasma chamber (954) containing the plasma, a conducting source biasing electrode (906) in contact with the plasma and biased to a high voltage to control the ion beam energy at a sample, and a plurality of apertures (914,956,in 906). The plasma within the plasma chamber serves as a virtual source for an ion column comprising one or more lenses (912,942) which form a focused ion beam on the surface of a sample (940) to be imaged and/or FIB-processed. The plasma is initiated by a plasma igniter (950) mounted near or at the column which induces a high voltage oscillatory pulse on the source biasing electrode. By mounting the plasma igniter near the column, capacitive effects of the cable connecting the source biasing electrode to the biasing power supply are minimized. Ion beam sputtering of the apertures is minimized by proper aperture materials selection.
摘要翻译：公开了一种聚焦离子束（FIB）系统（900），其包括感应耦合等离子体离子源，包含等离子体的绝缘等离子体室（954），与等离子体接触并且偏向于等离子体的导电源偏置电极（906）用于控制样品处的离子束能量的高电压以及多个孔（906中的914,956）。等离子体腔室内的等离子体用作包括一个或多个透镜（912,942）的离子柱的虚拟源，该透镜在要成像和/或FIB处理的样品（940）的表面上形成聚焦离子束。等离子体由等离子体点火器（950）启动，等离子体点火器（950）安装在柱附近或柱上，其在源偏置电极上引起高电压振荡脉冲。通过在柱附近安装等离子体点火器，连接源偏压电极和偏压电源的电缆的电容效应被最小化。通过适当的孔径材料选择，孔的离子束溅射被最小化。

77. 发明公开

EP2360712A2 Particle beam system 有权转让
标题翻译： Teilchenstrahlsystem
公开(公告)号：EP2360712A2
公开(公告)日：2011-08-24
申请号：EP11001143.4
申请日：2011-02-11
申请人： Carl Zeiss NTS GmbH
发明人： Biberger, Josef , Pulwey, Ralph
IPC分类号： H01J37/04 , H01J37/24
CPC分类号： H01J37/3174 , H01J37/045 , H01J37/24 , H01J37/26 , H01J2237/0432 , H01J2237/2485 , H01J2237/28 , H01J2237/317
摘要： A particle beam system includes a particle beam source for generating a particle beam, a high voltage source, a beam blanker system with deflection plates 56, 57, and a control circuit. The control circuit provides a first current path 67 between the two deflection plates, wherein a switch 70, a node 72 connected to the high voltage source and a switch 76 are arranged in this order in the first current path starting from the deflection plate 56. The control circuit provides a second current path 85 between the deflection plate 56 and the deflection plate 57, wherein in the second current path, starting from the deflection plate 56, a series connection 88 comprising a voltage source 91 a switch 90, a node 86 connected to the high voltage source and a series connection 92 comprising a voltage source 95 and a switch 94 are arranged in this order.
摘要翻译：粒子束系统包括用于产生粒子束的粒子束源，高压源，具有偏转板56,57和控制电路的束消除系统。控制电路在两个偏转板之间提供第一电流通路67，其中开关70，连接到高电压源的节点72和开关76以从偏转板56开始的第一电流路径依次布置。控制电路在偏转板56和偏转板57之间提供第二电流路径85，其中在偏转板56的第二电流路径中，串联连接88包括电压源91，开关90，节点86 连接到高电压源，并且包括电压源95和开关94的串联连接92按此顺序排列。

78. 发明公开

EP1398819A3 Matching box, vacuum apparatus using the same, and vacuum processing method 有权
标题翻译：阻抗匹配部，真空装置及真空处理方法与这种阻抗匹配部
公开(公告)号：EP1398819A3
公开(公告)日：2010-01-13
申请号：EP03020603.1
申请日：2003-09-10
申请人： ULVAC, INC.
发明人： Yajima, Taro , Akaishi, Minoru , Horishita, Yoshikuni
IPC分类号： H01J37/32 , H01J37/08 , H01J37/24
CPC分类号： H01J37/08 , H01F29/14 , H01J37/24 , H01J37/32082 , H01J37/32183 , H01J37/32357 , H01J2237/31 , H05H1/46
摘要： A vacuum apparatus which can easily regenerate plasma is provided. A matching box used in the vacuum apparatus can vary the impedance thereof by varying the magnitudes of the inductance of variable inductance elements. Controlling the magnitude of direct current makes it possible to control the magnitudes of inductance of the variable inductance elements so that it is possible to carry out matching operation at high speed.

79. 发明授权

EP1199739B1 A device and method for suppressing space charge induced abberations in charged-particle projection lithography systems 有权
标题翻译：在Ladungsträgerteilchenstrahl光刻系统的设备和方法消除空间电荷引起的错误
公开(公告)号：EP1199739B1
公开(公告)日：2009-12-23
申请号：EP01308857.0
申请日：2001-10-18
申请人： eLith LLC , Agere Systems Guardian Corporation
发明人： Katsap, Victor , Liddle, James A. , Mkrtchyan, Masis , Stanton, Stuart T.
IPC分类号： H01J37/24 , H01J37/153 , H01J37/317
CPC分类号： B82Y10/00 , B82Y40/00 , H01J37/065 , H01J37/153 , H01J37/3174 , H01J2237/0656 , Y10S977/881 , Y10S977/887

80. 发明授权

EP1720193B1 Anordnung für die Regelung der Elektronenstrahlleistung einer Elektronenstrahlkanone 有权转让
标题翻译：安排用于控制的电子枪的电子束的功率
公开(公告)号：EP1720193B1
公开(公告)日：2008-04-23
申请号：EP06004324.7
申请日：2006-03-03
申请人： Applied Materials GmbH & Co. KG , ALD Vacuum Technologies GmbH
发明人： Klemm, Günter , Thiede, Andreas , Schneider, Hans-Jürgen
IPC分类号： H01J37/24
CPC分类号： H01J37/242

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