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61. 发明公开

EP2804448A1 ACTIVE SPECIES IRRADIATION DEVICE, ACTIVE SPECIES IRRADIATION METHOD AND METHOD FOR FORMING OBJECT HAVING BEEN IRRADIATED WITH ACTIVE SPECIES 审中-公开
标题翻译：设备可以用有效的物种，用于与ACTIVE种辐照物体成型ACTIVE种和方法防辐射，方法
公开(公告)号：EP2804448A1
公开(公告)日：2014-11-19
申请号：EP13736091.3
申请日：2013-01-11
申请人： Osaka University
发明人： KITANO Katsuhisa , TANI Atsushi
IPC分类号： H05H1/24 , A61L2/14 , A61L2/20 , B01J19/08 , C02F1/30
CPC分类号： B01J19/087 , A61L2/0011 , A61L2/03 , A61L2/14 , B01J2219/0809 , B01J2219/0815 , C02F1/30 , H05H1/2406 , H05H1/46 , H05H2001/2462 , H05H2001/469
摘要： An active species radiation device is for efficiently radiating active species (active oxygen or nitrogen) by using a plasma source not in contact with an irradiated object. An active species radiation device (100) includes: a chamber (110) in which flows of plasma generation gas and active species generation gas enter and which has an active species radiation port (110c) through which active species are radiated; an upstream electrode (120) positioned in a part of the chamber (110) corresponding to an upstream portion of the flow of the plasma generation gas; and a downstream electrode (130) positioned in a part of the chamber (110) corresponding to a more downstream portion of the flow of the plasma generation gas than the upstream electrode (120). The chamber (110) is configured so that the active species generation gas flows into a position between the upstream electrode (120) and the active species radiation port (110c).
摘要翻译：的活性种辐射装置是用于通过在照射对象使用等离子源不接触辐射高效活性物质（活性氧或氮）。活性种辐射装置（100）包括：腔室（110）的等离子体产生气体和活性种生成气体进入流入，并且具有通过其活性种辐射活性种辐射端口（110℃）; 到在所述腔室（110）的至少一部分定位上游电极（120）对应于在等离子生成气体的流动的上游部分; 和在所述腔室（110）的至少一部分定位在下游电极（130）对应于所述等离子生成气体的比上游电极（120）流动的更下游部分。象的活性种生成的气体流入上游电极（120）和所述活性种辐射端口（110℃）之间的位置处的腔室（110）被配置。

62. 发明公开

EP2785153A3 Plasma waveguide using step part and block part 有权转让
标题翻译：等离子体波导与裆部分和块部
公开(公告)号：EP2785153A3
公开(公告)日：2014-11-05
申请号：EP14161587.2
申请日：2014-03-25
申请人： Triple Cores Korea Co., Ltd.
发明人： Kim, Ik Nyun , Kang, Sung Ok , Eum, Min Heum
IPC分类号： H05H1/46 , H01J37/32 , H01P5/02 , H03C7/02
CPC分类号： H01J37/32229 , H01P5/024 , H03H7/38 , H05H1/46 , H05H2001/4622
摘要： In a magnetron and a plasma waveguide through which a microwave oscillated from the magnetron moves, there is provided a plasma waveguide including a plurality of step parts formed at any one side on an inner side surface of the waveguide, and a block part of a predetermined height formed at any other side on the inner side surface of the waveguide, wherein the block part is formed at a side opposite to a boundary part between the plurality of step parts.
The present disclosure forms the step part having a height decreasing to a predetermined level formed within the waveguide, and provides the block part of the predetermined height at the inner side surface of the waveguide opposite to the step part of the waveguide. Thereby, a problem with microwave leaks involved in a 3-stub system penetrating through an overall waveguide and a problem with damage to an external system due to microwaves traveling outward may be effectively solved. Further, because the block part of the predetermined height provided at the inner side surface of the waveguide is located at an opposite surface to the step part, an effect of microwave concentration within the waveguide having a gradual reduction in height in a microwave propagation direction is maximized.

63. 发明公开

EP2478955A4 PLASMA-GENERATION DEVICE 有权
公开(公告)号：EP2478955A4
公开(公告)日：2014-10-01
申请号：EP10817303
申请日：2010-09-17
申请人： IMAGINEERING INC
发明人： IKEDA YUJI , KANEKO HITOE , KAWASHIMA MOTOKI
IPC分类号： B01J19/08 , B01D53/44 , B01D53/72 , B01J19/12
CPC分类号： B01D53/323 , B01D53/32 , B01D2257/708 , B01D2259/818 , H05H1/46 , H05H2001/463 , H05H2245/121

64. 发明公开

EP2767146A1 ELECTRODE COOLING SYSTEM IN A MULTI-ELECTRODE MICROWAVE PLASMA EXCITATION SOURCE 审中-公开
标题翻译：在多电极微波等离子体激发源电极冷却系统
公开(公告)号：EP2767146A1
公开(公告)日：2014-08-20
申请号：EP12758668.3
申请日：2012-07-07
申请人： Instytut Optyki Stosowanej
发明人： RAMSZA, Andrzej , JANKOWSKI, Krzysztof , RESZKE, Edward
IPC分类号： H05H1/46
CPC分类号： H01J7/24 , H01J37/32192 , H01J37/3222 , H01J37/32568 , H05H1/46
摘要： Three identical electrodes (7) arranged symmetrically to the axis of a central tube, and electrode cooling system. The length of each electrode is 1/4 L, L is the length of the microwave. Each electrode (7) has a hollow chamber for the cooling flow connected with metal tubes (1, 2). The tube ends (D, F) are shortened with the housing (10). The length of each tube (1, 2) is 1/4 L. These tubes (1, 2) are isolated from the housing (10). In another configuration, the length of each electrode (7') is 3/4 L. The tubes for the cooling flow are embedded in the electrode hollow chamber, with the inlet tube (12) internal to the outlet tube. The tube connectors (3, 4) are located outside the met al housing (10'). The distance from the power supply connection and from the microwave connection to the electrode tip is, respectively, 1/2 L and 1/4 L.

65. 发明授权

EP2145514B8 HARMONIC COLD PLASMA DEVICE AND ASSOCIATED METHODS 有权
标题翻译：谐波冷等离子体设备及其相关方法
公开(公告)号：EP2145514B8
公开(公告)日：2014-08-06
申请号：EP08746627.2
申请日：2008-04-23
申请人： Cold Plasma Medical Technologies, Inc.
发明人： WATSON, Gregory A.
IPC分类号： H05H1/24 , A61N1/06 , H05H1/46
CPC分类号： H05H1/46 , A61L2/0011 , A61L2202/11 , A61N1/44 , H05H2001/4652 , H05H2001/466 , H05H2001/4697 , H05H2240/20 , H05H2277/10
摘要： A device for generating atmospheric pressure cold plasma inside a hand-held unit discharges cold plasma with simultaneously different rf wavelengths and their harmonics. The device includes an rf tuning network that is powered by a low-voltage power supply connected to a series of high-voltage coils and capacitors. The rf energy signal is transferred to a primary containment chamber and dispersed through an electrode plate network of various sizes and thicknesses to create multiple frequencies. Helium gas is introduced into the first primary containment chamber, where electron separation is initiated. The energized gas flows into a secondary magnetic compression chamber, where a balanced frequency network grid with capacitance creates the final electron separation, which is inverted magnetically and exits through an orifice with a nozzle. The cold plasma thus generated has been shown to be capable of accelerating a healing process in flesh wounds on animal laboratory specimens.

66. 发明公开

EP2425459A4 MICROPLASMA GENERATOR AND METHODS THEREFOR 审中-公开
标题翻译：微等离子体发生器及其方法
公开(公告)号：EP2425459A4
公开(公告)日：2014-07-16
申请号：EP10772520
申请日：2010-04-27
申请人： TUFTS COLLEGE
发明人： HOPWOOD JEFFREY A
IPC分类号： H01L31/042 , H05H1/24 , H05H1/46
CPC分类号： H01L31/1876 , C23C16/24 , C23C16/511 , C23C16/545 , H01J37/32366 , H01J37/32825 , H05H1/46 , H05H2001/4622 , Y02E10/50 , Y02P70/521

67. 发明公开

EP2753154A1 ANTENNA FOR PLASMA PROCESSING APPARATUS, AND PLASMA PROCESSING APPARATUS USING ANTENNA 审中-公开
标题翻译：天线FÜREINE PLASMABEHANDLUNGSVORRICHTUNG UND PLASMABEHANDLUNGSVORRICHTUNG MIT DER ANTENNE
公开(公告)号：EP2753154A1
公开(公告)日：2014-07-09
申请号：EP11871785.9
申请日：2011-08-30
申请人： EMD Corporation
发明人： SETSUHARA, Yuichi , EBE, Akinori
IPC分类号： H05H1/46 , C23C16/44 , C23C16/509 , H01L21/205 , H01L21/3065
CPC分类号： H01J37/32651 , C23C14/358 , C23C16/509 , H01J37/32082 , H01J37/321 , H01J37/3211 , H01J2237/0266 , H05H1/46 , H05H2001/4667
摘要： Provided is a radio-frequency antenna with which the blocking or weakening of a radio-frequency induction electric field will not occur even if a thin-film material deposits on the antenna surface. A radio-frequency antenna 10 includes a linear antenna conductor 13, a dielectric protective pipe 14 provided around the antenna conductor 13, and a deposit shield 15 provided around the protective pipe 14, the deposit shield 15 covering at least one portion of the protective pipe 14 and having at least one opening 153 on any line extending along the length of the antenna conductor 13. Although the thin-film material adheres to the surfaces of the protective pipe and the deposit shield, the deposited substance has at least one discontinuous portion in the longitudinal direction of the antenna conductor. Therefore, in the case where the thin-film material is electrically conductive, the blocking of the radio-frequency induction electric field is prevented. In the case where the thin-film material is not electrically conductive, an attenuation in the intensity of the radio-frequency induction electric field is suppressed.
摘要翻译：提供一种射频天线，即使薄膜材料沉积在天线表面上也不会发生射频感应电场的阻塞或弱化。射频天线10包括线状天线导体13，设置在天线导体13周围的介质保护管14和设置在保护管14周围的沉积屏蔽15，沉积屏蔽15覆盖保护管的至少一部分 14，并且在沿着天线导体13的长度延伸的任何线上具有至少一个开口153.尽管薄膜材料粘附到保护管和沉积屏蔽的表面上，但沉积物质具有至少一个不连续部分天线导体的纵向。因此，在薄膜材料导电的情况下，防止了射频感应电场的阻塞。在薄膜材料不导电的情况下，抑制了射频感应电场强度的衰减。

68. 发明公开

EP2743496A1 PLASMA GENERATING DEVICE, AND INTERNAL COMBUSTION ENGINE 有权
标题翻译： VASBRENNUNGSMOTOR公司的PLASMAERZEUGUNGSVORRICHTUNG
公开(公告)号：EP2743496A1
公开(公告)日：2014-06-18
申请号：EP12815258.4
申请日：2012-07-13
申请人： Imagineering, Inc.
发明人： IKEDA Yuji
IPC分类号： F02P23/04 , F02P3/01 , H05H1/24
CPC分类号： F02P23/045 , F02M27/042 , F02P3/01 , F02P3/045 , F02P9/007 , F02P15/00 , F02P23/04 , H05H1/46 , H05H1/52 , H05H2001/463
摘要： The size of the plasma produced by a plasma-generating device that generates plasma using electromagnetic (EM) radiation is enlarged. The plasma-generating device has an EM-wave-generating device that generates EM radiation, a radiation antenna that emits the EM radiation supplied from the EM-wave-generating device to a target space, and a receiving antenna located near the radiation antenna. The receiving antenna is grounded such that an adjacent portion that is close to the radiation antenna has a higher voltage while the EM radiation is emitted from the radiation antenna. The plasma-generating device generates plasma in the target space near the radiation antenna and the adjacent portion by emitting EM radiation from the radiation antenna.
摘要翻译：通过使用电磁（EM）辐射产生等离子体的等离子体产生装置产生的等离子体的尺寸被扩大。等离子体产生装置具有产生EM辐射的EM波发生装置，将从EM波产生装置提供的EM辐射发射到目标空间的辐射天线和位于辐射天线附近的接收天线。接收天线接地，使得靠近辐射天线的相邻部分具有较高的电压，同时从辐射天线发射EM辐射。等离子体产生装置通过从辐射天线发射EM辐射而在辐射天线和相邻部分附近的目标空间中产生等离子体。

69. 发明授权

EP2495350B1 Microwave plasma processing device with a plasma processing gas supply member 有权
标题翻译：与气体供应元件微波等离子体处理装置
公开(公告)号：EP2495350B1
公开(公告)日：2014-06-18
申请号：EP12161819.3
申请日：2004-03-11
申请人： Toyo Seikan Group Holdings, Ltd.
发明人： Kobayashi, Akira , Yamada, Kouji , Kurashima, Hideo , Namiki, Tsunehisa , Aihara, Takeshi , Onozawa, Yasunori
IPC分类号： C23C16/511 , B65D1/00 , H05H1/46 , H01J37/32 , C23C16/455 , C23C16/04 , H05H1/24
CPC分类号： H01J37/3244 , C23C16/045 , C23C16/45568 , C23C16/45578 , C23C16/511 , H01J37/32192 , H05H1/46 , H05H2001/463

70. 发明公开

EP2642833A3 Vorrichtung und Verfahren zur Erzeugung eines Plasmas 有权
标题翻译：装置和方法用于产生等离子体
公开(公告)号：EP2642833A3
公开(公告)日：2014-06-04
申请号：EP13159136.4
申请日：2013-03-14
申请人： Forschungsverbund Berlin e.V.
发明人： Kühn, Silvio
IPC分类号： H05H1/46
CPC分类号： H05H1/46 , H05H2001/4682
摘要： Es wird eine Vorrichtung (200) zur Erzeugung eines Plasmas offenbart, die eine als Hohlraum ausgebildete Plasmaquelle (241) und einen Resonator (201) aufweist, welcher einen Wellenleiter (211, 212, 2131) und die Plasmaquelle (241) umfasst, wobei der Wellenleiter (212, 213) mit der Plasmaquelle (241) wirkverbunden ist; die Vorrichtung (200) ein erstes Kopplungsmittel (231) zur Energie-Einspeisung (251) und ein zweites Kopplungsmittel (232) zur Energie-Auskopplung (252) aufweist, wobei jedes Kopplungsmittel (231, 232) Energie- und Signal- führend (251, 252) mit dem Wellenleiter wirkverbunden ist; die Vorrichtung ein aktives Element (261) zur Energieversorgung des Resonators (201) aufweist, welches mit dem ersten (231) und mit dem zweiten (232) Kopplungsmittel wirkverbunden ist, wobei die Plasmaquelle (241) zumindest teilweise in einem Bereich des Wellenleiters (211, 212, 213) integriert ist, der sich zwischen dem ersten Kopplungsmittel (231) und dem zweiten Kopplungsmittel (232) erstreckt.

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