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41. 发明授权

EP1753010B1 Particle-optical system 有权
标题翻译：粒子系统
公开(公告)号：EP1753010B1
公开(公告)日：2012-12-05
申请号：EP05017318.6
申请日：2005-08-09
申请人： Carl Zeiss SMS GmbH
发明人： Platzgummer, Elmar, Dr. Dipl.-Ing. , Stengl, Gerhard, Dr. Dipl.-Ing. , Falkner, Helmut
IPC分类号： H01J37/317 , H01J37/12 , B82Y10/00
CPC分类号： H01J37/12 , B82Y10/00 , B82Y40/00 , H01J37/3177

42. 发明授权

EP1963812B1 VERFAHREN UND VORRICHTUNG ZUR UNTERSUCHUNG DES ABBILDUNGSVERHALTENS EINER ABBILDUNGSOPTIK 有权转让
标题翻译：方法和设备进行调查图片图表光学的行为
公开(公告)号：EP1963812B1
公开(公告)日：2011-11-30
申请号：EP06829651.6
申请日：2006-12-15
申请人： Carl Zeiss SMS GmbH
发明人： GREIF-WÜSTENBECKER, Jörn , STRÖSSNER, Ulrich
IPC分类号： G01M11/02
CPC分类号： G01M11/0285 , G03F7/705 , G03F7/70566 , G03F7/70591 , G03F7/7085
摘要： The invention relates to a method for analysing the imaging behaviour of a first optical imaging element, whereby an object is imaged into an image plane by a second optical imaging element and light in the image plane is detected in a spatially resolved manner, the two optical imaging elements differing in terms of at least one imaging characteristic. Values are determined for the intensity and for at least one second characteristic of the light, said values being then stored in image points, and processed in an emulation step. An emulation image is produced, emulating the imaging of the object by the first optical imaging element, taking into account the influence of the second characteristic. A series of images is produced by dividing a range of values of the second characteristic into subdomains, associating an image with each subdomain, and associating the corresponding intensity value with the image points of each image, in case the value of the second characteristic, associated with the image point, falls in the subdomain associated with the respective image. Otherwise, a pre-determined intensity value is associated therewith. The series of images is converted into a series of intermediate images in the emulation step. A constant value of the second characteristic is used in the emulation for each intermediate image, said value originating from the respective subdomain and differing from the values of the second characteristic for the other intermediate images. The intermediate images are then combined to form an emulation image.

43. 发明授权

EP1892748B1 Materialbearbeitungssystem und Materialbearbeitungsverfahren 有权
标题翻译：材料处理系统和材料处理过程
公开(公告)号：EP1892748B1
公开(公告)日：2011-10-19
申请号：EP07022228.6
申请日：2003-02-25
申请人： Carl Zeiss NTS GmbH , Carl Zeiss SMS GmbH
发明人： Koops, Hans, W., P. , Hoffrogge, Peter
IPC分类号： H01J37/305 , H01J37/301 , H01J37/18
CPC分类号： H01J37/18 , H01J37/3056 , H01J2237/006 , H01J2237/162 , H01J2237/166 , H01J2237/31744

44. 发明公开

EP2368152A1 VERFAHREN ZUM ERMITTELN EINER REPARATURFORM EINES DEFEKTS AN ODER IN DER NÄHE EINER KANTE EINES SUBSTRATS EINER PHOTOMASKE 有权转让
标题翻译：确定方法的缺陷或修理SHAPE附近的光掩模的图案的边缘
公开(公告)号：EP2368152A1
公开(公告)日：2011-09-28
申请号：EP09778702.2
申请日：2009-09-24
申请人： Carl Zeiss SMS GmbH
发明人： BUDACH, Michael
IPC分类号： G03F1/00 , G01Q40/02
CPC分类号： G03F1/74 , G01Q30/06 , G01Q80/00 , G03F1/84 , H01J2237/2817 , Y10T29/49718
摘要： The invention relates to a method for determining a repair shape (60, 260) of a defect (30, 200) on or in the vicinity of an edge (32, 232) of a substrate (100), comprising the steps of scanning the defect (30, 200) using a scanning probe microscope for determining a three-dimensional contour (40, 240) of the defect (30, 200), scanning the defect (30, 200) using a scanning electron microscope for determining the course (50, 250) of the at least one edge (32, 232) of the substrate (100), and determining the repair shape (60, 260) of the defect (30, 200) from a combination of the three-dimensional contour (40, 240) and the course (50, 250) of the at least one edge (32, 232).
摘要翻译：在确定的缺陷的修复形式或接近上的基板的边缘。缺陷可以用扫描探针显微镜来确定矿缺陷的三维轮廓进行扫描。缺陷可以用扫描粒子显微镜确定性矿的基板的至少一个边缘的形状来扫描。缺陷的修复形式可以从三维轮廓的组合，并且所述至少一个边缘的形状来确定的开采。

45. 发明公开

EP2257853A2 METHOD FOR PROCESSING AN OBJECT WITH MINIATURIZED STRUCTURES 有权转让
标题翻译：一种用于处理一个对象，具有微型化结构
公开(公告)号：EP2257853A2
公开(公告)日：2010-12-08
申请号：EP09715092.4
申请日：2009-02-24
申请人： Carl Zeiss SMS GmbH
发明人： BUDACH, Michael , BRET, Tristan , EDINGER, Klaus , HOFMANN, Thorsten
IPC分类号： G03F1/00
CPC分类号： G03F1/74 , C23C16/047 , H01J37/304 , H01J37/3056 , H01J2237/24495 , H01J2237/30466 , H01J2237/30483 , H01J2237/31732 , H01J2237/31744
摘要： The present invention relates to a method for processing an object with miniaturized structures, having the steps of : feeding a reaction gas onto a surface of the object; processing the object by directing an energetic beam onto a processing site in a region, which is to be processed, on the surface of the object, in order to deposit material on the object or to remove material from the object, detecting interaction products of the beam with the object, and deciding whether the processing of the object must be continued or can be terminated with the aid of information which is obtained from the detected interaction products of the beam with the object, the region to be processed being subdivided into a number of surface segments, and the interaction products detected upon the beam striking regions of the same surface segment being integrated to form a total signal in order to determine whether processing of the object must be continued or can be terminated.

46. 发明授权

EP1875307B1 VERFAHREN ZUR MASKENINSPEKTION IM RAHMEN DES MASKENDESIGNS UND DER MASKENHERSTELLUNG 有权转让
标题翻译：方法掩模检查的面罩设计下方和掩模制造
公开(公告)号：EP1875307B1
公开(公告)日：2009-08-05
申请号：EP06706655.5
申请日：2006-02-04
申请人： Carl Zeiss SMS GmbH , Synopsys GmbH
发明人： HARNISCH, Wolfgang , ZIBOLD, Axel , BÖHM, Klaus , KALUS, Christian , SCHMÖLLER, Thomas
IPC分类号： G03F1/00 , G03F7/20
CPC分类号： G03F1/84 , G03F7/7065 , G03F7/70666
摘要： The invention relates to a mask inspection method that can be used for the design and production of masks, in order to detect relevant weak points early on and to correct the same. According to said method for mask inspection, an aerial image simulation, preferably an all-over aerial image simulation, is carried out on the basis of the mask design converted into a mask layout, in order to determine a list of hot spots. The mask/test mask is analysed by means of an AIMS tool, whereby real aerial images are produced and compared with the simulated aerial images. The determined differences between the aerial images are used to improve the mask design. The inventive arrangement enables a method to be carried out for mask inspection for mask design and mask production. The use of the AIMS tool directly in the mask production process essentially accelerates the mask production, while reducing the error rate and cost.

47. 发明公开

EP1943660A1 CHARGED PARTICLE BEAM EXPOSURE SYSTEM 有权
标题翻译：曝光系统带电粒子
公开(公告)号：EP1943660A1
公开(公告)日：2008-07-16
申请号：EP05801831.8
申请日：2005-10-28
申请人： Carl Zeiss SMS GmbH
发明人： PLATZGUMMER, Elmar , KNIPPELMEYER, Rainer
IPC分类号： H01J37/04 , H01J37/317
CPC分类号： H01J37/3177 , B82Y10/00 , B82Y40/00 , H01J37/045 , H01J37/3023 , H01J2237/0435 , H01J2237/30472 , H01J2237/31754 , H01J2237/31774
摘要： A charged particle beam exposure system has a blanking aperture array (31) having groups of apertures (53) controlled by shift registers (75), wherein different inputs (C) to the shift registers influence a different number of apertures. Charged particle beamlets traversing the apertures are scanned across a charged particle sensitive substrate in synchronism with a clock signal of the shift registers.

48. 发明授权

EP1616222B1 ANORDNUNG ZUR INSPEKTION VON MASKEN IN DER MIKROLITHOGRAPHIE 有权转让
标题翻译：安排口罩在微光刻检查
公开(公告)号：EP1616222B1
公开(公告)日：2007-03-21
申请号：EP04728345.2
申请日：2004-04-20
申请人： Carl Zeiss SMS GmbH
发明人： DOBSCHAL, Hans-Jürgen , HARNISCH, Wolfgang , SCHERÜBL, Thomas , ROSENKRANZ, Norbert , SEMMLER, Ralph
IPC分类号： G03F1/00
CPC分类号： B82Y10/00 , B82Y40/00 , G01N21/956 , G03F1/24 , G03F1/84
摘要： The invention relates to an arrangement for inspecting objects, especially masks in microlithography. Said masks are disposed in a vacuum chamber. A converter converts illuminating radiation emitted from the object into radiation of a higher wave length. A sensor is also provided for recording images. The sensor is disposed outside the vacuum chamber and is arranged as an optical interface between the vacuum chamber to the sensor of the converter or at least one part of an image lens is arranged as a window in the vacuum chamber.

49. 发明授权

EP1631809B1 VERFAHREN ZUR BESTIMMUNG DER ABBILDUNGSGÜTE EINES OPTISCHEN ABBILDUNGSSYSTEMS 有权
标题翻译： VERFAHREN ZUR BESTIMMUNG DERABBILDUNGSGÜTEEINES OPTISCHEN ABBILDUNGSSYSTEMS
公开(公告)号：EP1631809B1
公开(公告)日：2006-11-29
申请号：EP04739798.9
申请日：2004-06-11
申请人： Carl Zeiss SMS GmbH
发明人： ENGEL, Thomas , GROSS, Herbert
IPC分类号： G01M11/02
CPC分类号： G01M11/0257
摘要： The invention relates to a method for determining the image quality of an optical imaging system and to the use of the inventive method for determining the influence of samples on the amplitude distribution and on the phase front distribution of the illuminating light of which the amplitude distribution, in particular, is known. The invention comprises the following steps: adjusting the subassemblies relative to one another whereby making it possible to project images of a sample onto the detection device; recording a number of images of the sample from different planes of reference near the best focus plane; improving the image quality by image processing, particularly by reducing the noise in order to compare local sensitivity differences of the detection device and to center the intensity concentration points at a predetermined location in the images; computational linking of locally resolved image information, of the set values and system values related to the optical imaging system, and of information concerning the sample with the aim of determining characteristic numbers that are characteristic of the wave front deformation caused by the imaging system, and; outputting the characteristic numbers and assigning them to the imaging system in order to describe the image quality.
摘要翻译：本发明涉及一种用于确定光学成像系统的图像质量的方法以及本发明的方法用于确定样本对幅度分布和照明光的相位正面分布的影响，其幅度分布，特别是已知的。本发明包括以下步骤：相对于彼此调整子组件，从而使得能够将样本的图像投影到检测装置上; 在最佳聚焦平面附近从不同参考平面记录样本的多个图像; 通过图像处理改善图像质量，特别是通过降低噪声以比较检测装置的局部灵敏度差异并将强度集中点居中在图像中的预定位置处; 计算局部解析的图像信息的计算链接，与光学成像系统有关的设定值和系统值以及与样本有关的信息的计算链接，目的是确定成像系统引起的波阵面变形的特征数字，以及 ; 输出特征数并将它们分配给成像系统以描述图像质量。

50. 发明公开

EP1644775A2 VERFAHREN ZUR ANALYSE VON OBJEKTEN IN DER MIKROLITHOGRAPHIE 审中-公开
标题翻译：程序对物体在微光刻分析
公开(公告)号：EP1644775A2
公开(公告)日：2006-04-12
申请号：EP04740612.9
申请日：2004-07-03
申请人： Carl Zeiss SMS GmbH
发明人： SEITZ, Holger , WINDPASSINGER, Roman
IPC分类号： G03F1/00
CPC分类号： G03F1/84 , G03F1/70 , G03F7/70666
摘要： The invention relates to a method for analysing objects in microlithography, preferably masks with the aid of aerial image measurement systems (AIMS) comprising at least two imaging stages wherein a detected image is corrected by means of a correction filter with respect to the dynamic systems behaviour of a second imaging stage or another imaging stage, the lighting of the object being carried out by incident and/or transmitted light. The resulted correction is such that corrected output quantities correspond to the image of a photolithography stepper or scanner, said correction being made by reconvolution and the measured correction values being taken into account for the correction.

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