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    • 25. 发明公开
    • METHOD FOR PRODUCING SILICON SINGLE CRYSTAL AND APPARATUS FOR PRODUCING THE SAME, AND SINGLE CRYSTAL AND WAFER PRODUCED WITH THE METHOD
    • DEVICE AND METHOD FOR硅单晶并因此生产的单晶硅和半导体板的制造(晶片)
    • EP1087040A4
    • 2006-08-09
    • EP00906720
    • 2000-03-06
    • SHINETSU HANDOTAI KK
    • ITOI KIRIOIINO EIICHIISHIZUKA TOHTA TOMOHIKOFUSEGAWA I
    • C30B15/00C30B15/30C30B30/04C30B29/06
    • C30B29/06C30B15/305C30B30/04Y10S117/917
    • A method for producing a silicon single crystal comprising growing the single crystal(6) through pulling up the crystal from a silicon melt (3) in a quartz crucible (4) while applying a horizontal magnetic field (10), characterized in that crystal growth is carried out in a manner such that either of a higher temperature portion and a lower temperature portion which are formed on the surface of the silicon melt (3) in the quartz crucible (4) is positioned at a solid-liquid interface observed during the crystal growth or in a manner such that a magnetic field at a crystallization center on the surface of the silicon melt (3) in the quartz crucible (4) has a strength wherein the ratio of its perpendicular component(12) to its horizontal component (11) is 0.3 to 0.5. The method can be used for producing a silicon single crystal rod having a highly uniform concentration distribution for interstitial oxygen atoms in the direction of crystal growth with high productivity and in good yield in the horizontal magnetic field-applied CZ method.
    • 在用于通过从容纳在石英坩埚中的熔液中的单晶的提拉中,而磁场垂直于晶体生长轴线被施加到容纳在石英坩埚中的硅熔体生长单晶锭制造硅单晶的方法 ,晶体生长,进行象低温区域和在容纳在坩埚shoulderstand硅熔体的表面所产生的高温区域中的一个总是覆盖晶体生长的固液界面,或垂直磁性的比率 在包含在所述石英坩埚的硅熔融液的结晶表面的中心场分量为磁场强度水平磁场成分被控制在0.3以上,0.5以下。 提供了用于基于在其中一个水平磁场施加CZ法,它可以产生间隙氧浓度的均匀性高的单晶硅锭连同高生长的单晶的生长方向上产生的硅单晶的方法 生产力和高收益。