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    • 3. 发明公开
    • ELECTRICAL RESISTANCE HEATER FOR CRYSTAL GROWING APPARATUS
    • 电阻加热晶体提拉装置
    • EP1084286A1
    • 2001-03-21
    • EP99927263.6
    • 1999-06-04
    • MEMC Electronic Materials, Inc.
    • SCHRENKER, Richard, G.LUTER, William, L.
    • C30B15/14
    • C30B15/14Y10T117/1068Y10T117/1088
    • An electrical resistance heater of the present invention for use in a crystal puller used for growing monocrystalline silicon ingots according to the Czochralski method comprises a heating element sized and shaped for disposition in the housing of the crystal puller around the crucible for applying heat to the crucible and silicon therein. The heating element includes heating segments connected together in an electric circuit. The segments have upper and lower sections and are arranged relative to each other so that when disposed around the crucible containing molten silicon the upper sections are disposed generally above a horizontal plane including the surface of the molten silicon and the lower sections are disposed generally below the horizontal plane. The upper sections are constructed to generate more heating power than the lower sections thereby to reduce a temperature gradient between the molten silicon at its surface and the ingot just above the surface of the molten silicon. The upper sections have a thickness substantially equal to the thickness of the lower sections and have a width substantially less than the width of the lower sections. The cross-sectional area of the upper sections is everywhere less than the cross-sectional area of the lower sections.
    • 6. 发明公开
    • APPARATUS FOR USE IN CRYSTAL PULLING
    • 用于晶体取出的装置
    • EP1034323A1
    • 2000-09-13
    • EP98956673.2
    • 1998-11-10
    • MEMC Electronic Materials, Inc.
    • CHERKO, Carl, F.KORB, HaroldSCHRENKER, Richard, G.WILLIAMS, Dick, S.
    • C30B15/30
    • C30B15/30Y10S117/911Y10T117/1032Y10T117/1072
    • The apparatus comprises a drum, a chuck constructed for holding the seed crystal and the ingot, and a cable having a first end connected to the drum, a second end connected to the chuck and a portion wound around the drum. The portion of the cable wound around the drum exerts a normal force on a circumferential surface of the drum corresponding to the tension in the cable. The drum and cable interact to produce a friction force resisting sliding movement of the cable relative to the drum in a direction lengthwise of the cable. The chuck has a mass selected to exert a pre-tension on the cable prior to growing the ingot such that the increase in the friction on the portion of the cable wound around the drum as the cable is reeled in to pull the ingot from the source material is at least equal to the increase of the weight of the ingot as it grows on the seed crystal from the molten source material.
    • 该设备包括滚筒,构造成用于保持晶种和晶锭的卡盘,以及具有连接到滚筒的第一端,连接到卡盘的第二端和卷绕在滚筒周围的部分的电缆。 缠绕在滚筒周围的电缆部分在滚筒的圆周表面上施加与电缆中的张力对应的法向力。 滚筒和缆线相互作用以产生阻止缆线相对于滚筒在缆线长度方向上的滑动运动的摩擦力。 卡盘具有选定的质量,以在生长锭块之前在电缆上施加预张力,使得当电缆卷入以拉动锭块从源头拉动时,缠绕在卷筒周围的电缆部分上的摩擦增加 材料至少等于晶锭从熔化的源材料生长在晶种上时的重量增加。
    • 7. 发明授权
    • ELECTRICAL RESISTANCE HEATER FOR CRYSTAL GROWING APPARATUS
    • 电阻加热晶体提拉装置
    • EP1084286B1
    • 2002-09-04
    • EP99927263.6
    • 1999-06-04
    • MEMC Electronic Materials, Inc.
    • SCHRENKER, Richard, G.LUTER, William, L.
    • C30B15/14
    • C30B15/14Y10T117/1068Y10T117/1088
    • An electrical resistance heater of the present invention for use in a crystal puller used for growing monocrystalline silicon ingots according to the Czochralski method comprises a heating element sized and shaped for disposition in the housing of the crystal puller around the crucible for applying heat to the crucible and silicon therein. The heating element includes heating segments connected together in an electric circuit. The segments have upper and lower sections and are arranged relative to each other so that when disposed around the crucible containing molten silicon the upper sections are disposed generally above a horizontal plane including the surface of the molten silicon and the lower sections are disposed generally below the horizontal plane. The upper sections are constructed to generate more heating power than the lower sections thereby to reduce a temperature gradient between the molten silicon at its surface and the ingot just above the surface of the molten silicon. The upper sections have a thickness substantially equal to the thickness of the lower sections and have a width substantially less than the width of the lower sections. The cross-sectional area of the upper sections is everywhere less than the cross-sectional area of the lower sections.