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21. 发明授权

EP1258060B1 FAST WAVELENGTH CORRECTION TECHNIQUE FOR A LASER 有权
标题翻译：快速波长校正方法的激光
公开(公告)号：EP1258060B1
公开(公告)日：2008-08-06
申请号：EP01906566.3
申请日：2001-01-16
申请人： Cymer, Inc.
发明人： EVERAGE, George, J. , FOMENKOV, Igor, V. , DAS, Palash, P. , SANDSTROM, Richard, L. , ERIE, Frederick, G. , ALGOTS, John, M.
IPC分类号： H01S3/225 , H01S3/134 , H01S3/105
CPC分类号： G03F7/70333 , G03F7/70575 , G03F7/70933 , H01S3/036 , H01S3/104 , H01S3/105 , H01S3/1055 , H01S3/13 , H01S3/134 , H01S3/139 , H01S3/225
摘要： Electric discharge laser with chirp correction. Fast wavelength chirp correction equipment includes at least one piezoelectric drive and a fast wavelength detection means and has a feedback response time of less than 1.0 millisecond. In a preferred embodiment a simple learning algorithm is described to allow advance tuning mirror adjustment in anticipation of the learned chirp pattern. Techniques include a combination of a relatively slow stepper motor (82) and a very fast piezoelectric driver. In another preferred embodiment, chirp correction is made on a pulse-to-pulse basis where the wavelength of one pulse is measured and the wavelength of the next pulse is corrected based on the measurement. This correction technique is able to function at repetition rates as rapid as 2000 Hz and greater.

22. 发明授权

EP0994541B1 Gas laser chamber/optics support structure 有权
标题翻译：用于气体激光室和光学支撑结构
公开(公告)号：EP0994541B1
公开(公告)日：2008-01-02
申请号：EP99120466.0
申请日：1999-10-14
申请人： Cymer, Inc.
发明人： Pan, Xiaojiang J. , Howey, James K. , Mixon, Curtiss L.
IPC分类号： H01S3/02
CPC分类号： G02B7/00 , H01S3/02 , H01S3/225

23. 发明授权

EP1028502B1 Laser with automated beam quality control 有权
标题翻译：激光光束质量的自动化控制
公开(公告)号：EP1028502B1
公开(公告)日：2007-10-24
申请号：EP00102800.0
申请日：2000-02-10
申请人： Cymer, Inc.
发明人： Erie, Frederic G. , Buck, Jesse D. , Das, Palash P.
IPC分类号： H01S3/13 , H01S3/225
CPC分类号： G03F7/70025 , G02B5/1828 , G03F7/70483 , G03F7/70575 , H01S3/08009 , H01S3/08081 , H01S3/1055 , H01S3/13 , H01S3/134 , H01S3/1392 , H01S3/225

24. 发明公开

EP1692750A4 LASER OUTPUT LIGHT PULSE STRETCHER 有权转让
标题翻译：激光输出光脉冲STRAIGHTENER
公开(公告)号：EP1692750A4
公开(公告)日：2007-07-11
申请号：EP04800552
申请日：2004-11-01
申请人： CYMER INC
发明人： SMITH SCOT T , ERSHOV ALEXANDER I , LUKASHEV ALEXEI
IPC分类号： H01S3/223 , H01S3/00 , H01S3/225
CPC分类号： G03F7/7055 , H01S3/0057 , H01S3/225
摘要： An apparatus and method for providing a high peak power short pulse duration gas discharge laser comprising a pulse stretcher which may comprise a laser output pulse optical delay initiating optic diverting a portion of the output laser pulse into an optical delay having an optical delay path and comprising; a plurality of confocal resonators in series aligned to deliver an output of the optical delay to the laser output pulse optical delay initiating optic. The plurality of confocal resonators comprises four confocal resonators may comprise a first spherical having a radius of curvature a second concave spherical mirror having the same radius of curvature and separated from the first concave spherical mirror by the radius of curvature and receiving the first reflected beam at a first point on a face of the second concave spherical mirror and generating a second reflected beam incident on a second point on the face of the first concave spherical mirror, the second reflected beam being reflected by the first concave spherical mirror from the second point on the first mirror to form an output beam from the first confocal resonator cell; and, a second confocal resonator cell receiving the output beam of the first confocal resonator cell as an input beam of the second confocal resonator cell. The apparatus and method may comprise a plurality, e.g., two pulse stretchers in series and may include spatial coherency metrology.

25. 发明公开

EP1310022A4 LASER WAVELENGTH CONTROL UNIT WITH PIEZOELECTRIC DRIVER 有权
标题翻译：带压电驱动器激光波长控制单元
公开(公告)号：EP1310022A4
公开(公告)日：2007-07-04
申请号：EP01954584
申请日：2001-04-30
申请人： CYMER INC
发明人： SPANGLER RONALD L , JACQUES ROBERT N , EVERAGE GEORGE J , ANDERSON STUART L , PALENSCHAT FREDERICK A , FOMENKOV IGOR V , SANDSTROM RICHARD L , PARTLO WILLIAM N , ALGOTS JOHN M , BROWN DANIEL J W
IPC分类号： H01S3/137 , G03F7/20 , H01S3/036 , H01S3/038 , H01S3/04 , H01S3/041 , H01S3/097 , H01S3/0971 , H01S3/0975 , H01S3/104 , H01S3/105 , H01S3/1055 , H01S3/11 , H01S3/13 , H01S3/131 , H01S3/134 , H01S3/22 , H01S3/225
CPC分类号： G03F7/70025 , G03F7/70041 , G03F7/70333 , G03F7/70575 , G03F7/70933 , H01S3/02 , H01S3/036 , H01S3/038 , H01S3/0385 , H01S3/0404 , H01S3/041 , H01S3/08036 , H01S3/097 , H01S3/0971 , H01S3/0975 , H01S3/104 , H01S3/105 , H01S3/1055 , H01S3/1305 , H01S3/1312 , H01S3/134 , H01S3/137 , H01S3/22 , H01S3/2207 , H01S3/225
摘要： Fast wavelenght correction equipment for an electric discharge laser includes at least one piezoelectic drive (80) and a fast wavelength measurement system and a fast feedback response time. In a preferred embodiment equipment is provided to control wavelength on a slow, intermediate amd fast time scales, which vary in range from several milliseconds to a few microseconds respectively. Techniques include a combination of a relatively slow stepper motor (82) and a very fast piezoelectric drive (80) for tuning the laser wavelength using a tuning mirror (14).

26. 发明公开

EP1754291A2 GAS DISCHARGE LASER CHAMBER IMPROVEMENTS 有权转让
标题翻译：气体放电激光器室的改进
公开(公告)号：EP1754291A2
公开(公告)日：2007-02-21
申请号：EP05733083.9
申请日：2005-03-03
申请人： Cymer, Inc.
发明人： PARTLO, William, N. , AMADA, Yoshiho , CARMICHAEL, James, A. , DYER, Timothy, S. , GILLESPIE, Walter, D. , MOOSMAN, Bryan, G. , RETTIG, Curtis, L. , STRATE, Brian, D. , STEIGER, Thomas, D. , TRINTCHOUK, Fedor, B. , UJAZDOWSKI, Richard, C.
IPC分类号： H01S3/22
CPC分类号： H01S3/036 , H01S3/0384 , H01S3/041 , H01S3/0971 , H01S3/225
摘要： A method and apparatus if disclosed which may comprise a high power high repetition rate gas discharge laser UV light source which may comprise: a gas discharge chamber comprising an interior wall comprising a vertical wall and an adjacent bottom wall; a gas circulation fan creating a gas flow path adjacent the interior vertical wall and the adjacent bottom wall; an in-chamber dust trap positioned a region of low gas flow, which may be along an interior wall and may comprise at least one meshed screen, e.g., a plurality of meshed screens, which may comprise at least two different gauge meshed screens. The dust trap may extend along the bottom interior wall of the chamber and/or a vertical portion of the interior wall. The dust trap may comprise a first meshed screen having a first gauge; a second meshed screen having a second gauge smaller than the first gauge; and the second meshed screen intermediate the first meshed screen and the interior wall. The chamber may comprise a plurality of dust collecting recesses in at least one of the vertical interior wall and the bottom wall of the chamber which may be selected from a group comprising a one-part recess and a multi-part recess, which may comprise two sections angled with respect to each other. The dust trap may comprise a pressure trap positioned between a portion of a main insulator and an interior wall of the chamber. The chamber may comprise a gas circulating fan comprising a cross-flow fan with a fan cutoff that may comprise a vortex control pocket. The chamber may comprise a preionization mechanism comprising a preionization tub containing a ground rod within an elongated opening in the preionization tube that may comprise a compliant member, an automatic preionization shut-off mechanism, a preionization onset control mechanism and/or a focusing element. The chamber may comprise an elongated baffle plate that may comprise a plurality of pyramidal structures including varying numbers of generally pyramidal elements and oriented in groups of varying numbers of generally pyramidal elements and oriented along and transverse to the longitudinal axis. Acoustic resonances within the chamber may also be reduced by introducing an artificial fitter into the timing of the laser discharges varying the inter-pulse period randomly or in a repeating pattern from pulse to pulse within a burst.

27. 发明公开

EP1722451A1 Lasersystem mit integrierter Stickstoffversorgung 审中-公开
公开(公告)号：EP1722451A1
公开(公告)日：2006-11-15
申请号：EP05010157.5
申请日：2005-05-10
申请人： WaveLight Laser Technologie AG
发明人： Donitzky, Christof , Vogler, Klaus, Dr.
IPC分类号： H01S3/225 , H01S3/03 , G03F7/20 , B23K26/12
CPC分类号： H01S3/225 , B23K26/12 , B23K26/127 , B23K26/128 , H01S3/027 , H01S3/03
摘要： Lasersystem mit einer Laserquelle zur Erzeugung von Laserstrahlung, einem Raum zur Ausbreitung von Laserstrahlung und einer Stickstoffquelle zur Versorgung des Raums mit Stickstoff.
摘要翻译：激光系统包括激光器，用于传播激光辐射的室和用于将氮气与环境空气分离并将氮气供应到室的氮源。

28. 发明公开

EP1449013A4 METHOD OF MAKING HIGH REPETITION RATE EXCIMER LASER CRYSTAL OPTICS AND UV-200NM TRANSMITTING OPTICAL FLORIDE CRYSTAL 审中-公开
标题翻译：用于生产EXCIMERLASERKRISTALLOPTIK高重复率和UV 200纳米渗透OPTICAL氟化物晶体
公开(公告)号：EP1449013A4
公开(公告)日：2006-09-20
申请号：EP02728371
申请日：2002-03-01
申请人： CORNING INC
发明人： PELL MICHAEL A , SMITH CHARLENE M , SPARROW ROBERT W , THEN PAUL M , GRAY SANDRA LEE
IPC分类号： C30B29/12 , C30B11/00 , H01S3/02 , H01S3/034 , H01S3/08 , H01S3/1055 , H01S3/106 , H01S3/225 , G02B1/00 , B29D11/00 , C01D3/02 , C01F5/24 , C01F5/28 , C01F11/18 , C01F11/22
CPC分类号： H01S3/225 , C30B11/00 , C30B29/12 , H01S3/034 , H01S3/0346 , H01S3/08004 , H01S3/1055 , H01S3/106
摘要： The invention relates to an High Repetition Rate UV Excimer Laser which includes a source of a laser beam and one or more windows which include magnesium fluoride. Another aspect of the invention relates to an excimer laser which includes a source of a laser beam, one or more windows which include magnesium fluoride and a source for annealing the one or more windows. Another aspect of the invention relates to a method of producing a predetermined narrow width laser beam.
摘要翻译：本发明涉及在高重复率的UV准分子激光器，其包括激光束和一个或多个窗口包括哪个氟化镁的来源。本发明的另一个方面涉及在受激准分子激光器，其包括激光束，一个或多个窗口包括哪个氟化镁和用于退火的一个或多个窗口的源极的源极。本发明的另一个方面涉及一种制造预定宽度窄激光束的方法。

29. 发明授权

EP1002242B1 Semiconductor wafer fabrication system having two energy detectors for a laser 失效
标题翻译：系统用于通过使用两个能量检测器，用于一个激光制造半导体晶片
公开(公告)号：EP1002242B1
公开(公告)日：2006-07-05
申请号：EP98938031.6
申请日：1998-07-27
申请人： Cymer, Inc.
发明人： DAS, Palash, P. , FOMENKOV, Igor, V.
IPC分类号： G02B1/00 , G03F7/20
CPC分类号： G03F7/70358 , G03F7/70558 , H01S3/225
摘要： A first laser light intensity detector (44) is positioned within a stepper or scanner (20) proximate to a reticle (36) so that attenuation due to stepper optics has already occurred prior to the laser light impinging upon the light intensity detector. Preferably, the first light intensity detector is mounted as closed to the wafer (22) as practical. A second light intensity detector (46) is located at the output of the laser (12). The light intensity detected from the outputs of the first and second light intensity detectors, in conjunction, forms part of a feedback mechanism which adjusts the light output of the laser, during wafer fabrication, so that the light intensity detected by the first light intensity detector is an optimum value.

30. 发明公开

EP1386376A4 LASER SPECTRAL ENGINEERING FOR LITHOGRAPHIC PROCESS 有权
标题翻译： LASERSPEKTRALTECHNIK用于光刻工艺
公开(公告)号：EP1386376A4
公开(公告)日：2006-06-28
申请号：EP02731433
申请日：2002-04-19
申请人： CYMER INC
发明人： KROYAN ARMEN , LALOVIC IVAN , FOMENKOV IGOR , DAS PALASH P , SANDSTROM RICHARD L , ALGOTS JOHN M , AHMED KHURSHID
IPC分类号： G03F7/207 , G03F7/20 , H01L21/027 , H01S3/036 , H01S3/038 , H01S3/04 , H01S3/041 , H01S3/08 , H01S3/097 , H01S3/0971 , H01S3/0975 , H01S3/102 , H01S3/104 , H01S3/105 , H01S3/1055 , H01S3/11 , H01S3/13 , H01S3/134 , H01S3/137 , H01S3/139 , H01S3/22 , H01S3/223 , H01S3/225 , H01S3/10
CPC分类号： G03F7/70025 , G03F7/70041 , G03F7/70333 , G03F7/70575 , G03F7/70933 , H01S3/02 , H01S3/036 , H01S3/038 , H01S3/0385 , H01S3/0404 , H01S3/041 , H01S3/08009 , H01S3/08036 , H01S3/097 , H01S3/0971 , H01S3/0975 , H01S3/1024 , H01S3/104 , H01S3/105 , H01S3/1055 , H01S3/13 , H01S3/1305 , H01S3/134 , H01S3/139 , H01S3/22 , H01S3/2207 , H01S3/223 , H01S3/225 , H01S3/2251 , H01S3/2256 , H01S3/2258 , H01S3/2308
摘要： An integrated circuit lithograohy technique (pectral engineering) for bandwidth control of an electric discharge laser. A computer models lithographic parameters to determine a desired laser spectrum needed to produce a desired lithographic result. A fast responding tuning mechanism (104) adjusts the center wavelength of laser pulses in a burst of pulses to achieve an integrated spectrum approximating the desired laser spectrum. The laser beam bandwidth is controlled to produce an effective beam spectrum having at least two spectral peaks to produce improved pattern resolution in photo resits film. Line narrowing equipment (106) is provided having at least one piezoelectric drive and a fast banwidth detection control system having a time response of less than about 2.0 millisecond. A wavelength tuning mirror is dithered at dither rates of more than 500 dithers per second in phase with the repetition rate of the laser.

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