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21. 发明公开

EP1798751A1 Protecting aperture for charged particle emitter 审中-公开
标题翻译： Schutzblendefürgeladenen Teilchen Emitter
公开(公告)号：EP1798751A1
公开(公告)日：2007-06-20
申请号：EP05027205.3
申请日：2005-12-13
申请人： ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH
发明人： Adamec, Pavel
IPC分类号： H01J37/18 , H01J37/301 , H01J5/02
CPC分类号： H01J37/301 , H01J37/18 , H01J2237/188
摘要： A charged particle beam apparatus and a method are provided. The apparatus comprises a charged particle emitter (1) located within a gun chamber (11), the gun chamber being adapted to encompass a first pressure; at least one further vacuum chamber adapted to encompass a second pressure between one order and four orders of magnitude higher than the first pressure; a first aperture unit (102; 202, 402; 602; 702; 802); comprising at least a first aperture opening and a molecule blocking area; a second aperture unit (104; 204, 214) comprising a second aperture opening. Thereby, the first aperture unit and/or the second aperture unit is a differential pressure aperture separating two independently evacuateable vacuum chambers and being adapted for maintaining a pressure difference of at least two orders of magnitude and the emitter, the molecule blocking area (706; 806) and the second aperture opening are positioned to be on a straight line.
摘要翻译：提供带电粒子束装置和方法。该装置包括位于枪室（11）内的带电粒子发射器（1），枪室适于包围第一压力; 至少一个另外的真空室适于包围比第一压力高一级和四个数量级的第二压力; 第一光圈单元（102; 202,402; 602; 702; 802）; 包括至少第一开口和分子阻挡区域; 包括第二孔口的第二孔单元（104; 204,214）。因此，第一孔单元和/或第二孔单元是分离两个独立可抽空的真空室的差压孔，并适于保持至少两个数量级的压力差和发射极，分子阻挡面积（706; 806）并且第二孔径开口位于直线上。

22. 发明公开

EP1034377A4 DIFFERENTIAL PUMPING VIA CORE OF ANNULAR SUPERSONIC JET 审中-公开
标题翻译：差压泵送通过环形超声波喷流的核心
公开(公告)号：EP1034377A4
公开(公告)日：2005-08-24
申请号：EP98955258
申请日：1998-11-18
申请人： DANILATOS GERASIMOS DANIEL
发明人： DANILATOS GERASIMOS DANIEL
IPC分类号： F04F5/20 , F04F5/46 , G01Q30/02 , G01Q30/08 , H01J37/18 , H01J37/301
CPC分类号： H01J37/18 , F04F5/20 , F04F5/465 , H01J37/301 , H01J2237/188 , H01J2237/2605

23. 发明公开

EP1515358A2 Small electron gun 审中-公开
标题翻译： Kompakter Elektronenstrahlerzeuger
公开(公告)号：EP1515358A2
公开(公告)日：2005-03-16
申请号：EP04015558.2
申请日：2004-07-01
申请人： Hitachi High-Technologies Corporation
发明人： Katagiri, Soichi c/o Hitachi, Ltd. I.P.Group , Ohshima, Takashi c/o Hitachi, Ltd. I.P.Group
IPC分类号： H01J37/073 , H01J37/18 , H01J41/20
CPC分类号： H01J37/18 , H01J7/16 , H01J7/18 , H01J37/07 , H01J2237/022 , H01J2237/062 , H01J2237/06316 , H01J2237/1825 , H01J2237/188
摘要： To provide a small electron gun capable of keeping a high vacuum pressure used for an electron microscope and an electron-beam drawing apparatus. An electron gun constituted by a non-evaporative getter pump, a heater, a filament, and an electron-source positioning mechanism is provided with an opening for rough exhausting and its automatically opening/closing valve, and means for ionizing and decomposing an inert gas or a compound gas for the non-evaporative getter pump. It is possible to keep a high vacuum pressure of 10 -8 Pa without requiring an ion pump by using a small electron gun having a height and a width of approximately 15 cm while emitting electrons from the electron gun.
摘要翻译：提供能够保持用于电子显微镜和电子束拉伸装置的高真空压力的小型电子枪。由非蒸发吸气泵，加热器，灯丝和电子源定位机构构成的电子枪设置有用于粗排气的开口及其自动打开/关闭阀，以及用于电离和分解惰性气体的装置或用于非蒸发吸气泵的复合气体。通过使用电子枪发射电子的高度和宽度约为15cm的小型电子枪，可以保持10 -8 Pa的高真空压力，而不需要离子泵。

24. 发明公开

EP1469306A1 INSPECTION DEVICE USING SCANNING ELECTRON MICROSCOPE 审中-公开
标题翻译： INSPEKTIONSVORRICHTUNG MIT RASTERELEKTRONENMIKROSKOP
公开(公告)号：EP1469306A1
公开(公告)日：2004-10-20
申请号：EP03701825.6
申请日：2003-01-21
申请人： Sony Corporation , Jeol Ltd.
发明人： ABE, Tetsuo, c/o SONY CORPORATION , OKAWAUCHI, Kouki, c/o SONY CORPORATION , HATTORI, Tadashi, c/o SONY CORPORATION , FUJITA, Hironori, c/o SONY CORPORATION , TAKEDA, Minoru, c/o SONY CORPORATION , AKI, Yuichi, c/o SONY CORPORATION , DATE, Naoki, c/o JEOL LTD. , NORIOKA, Setsuo, c/o JEOL LTD. , MIYOKAWA, Toshiaki, c/o JEOL LTD. , NAKAGAWA, Seiichi, c/o JEOL LTD.
IPC分类号： G01N23/225 , H01J37/20 , H01J37/28 , H01L21/66
CPC分类号： H01J37/20 , G01N23/225 , H01J37/18 , H01J2237/188 , H01J2237/2817
摘要： A testing apparatus using a scanning electron microscope for enabling tests and measurements on any part of a test subject in a nondestructive way without being limited by a size of the test subject, which is, a testing apparatus 1 using a scanning electron microscope for performing tests and measurements on any part of a test subject in a nondestructive way by using a scanning electron microscope 6a, comprising a local vacuum formation portion 9 for forming a local vacuum region by blocking around a part to be tested of the test subject from the outside air, wherein the local vacuum formation portion comprises an exhaust portion for exhausting to form a partial vacuum region, a float means 14 for floating the whole local vacuum formation portion above the test subject by emitting a compressed gas to an outer circumference portion of the local vacuum formation portion and a length measuring means 16 for measuring a distance between the test subject and the local vacuum formation portion for controlling floating of the local vacuum formation portion by the float means.
摘要翻译：一种使用扫描电子显微镜的测试装置，用于以非破坏性方式对测试对象的任何部分进行测试和测量，而不受受试对象的尺寸限制，即使用扫描电子显微镜进行测试的测试装置1 以及通过使用扫描电子显微镜6a以非破坏性的方式对测试对象的任何部分进行测量，所述扫描电子显微镜6a包括局部真空形成部分9，用于通过从外部空气中围绕测试对象的被测试部分围绕而形成局部真空区域其中，局部真空形成部分包括用于排出以形成部分真空区域的排气部分，用于通过将压缩气体发射到局部真空的外圆周部分而使整个局部真空形成部分漂浮在测试对象上方的浮子装置14 形成部分和用于测量测试对象与局部真空形成口之间的距离的长度测量装置16 n用于通过浮动装置控制局部真空形成部分的浮动。

25. 发明授权

EP0880798B1 SYSTEM AND METHOD FOR COOLING WORKPIECES PROCESSED BY AN ION IMPLANTATION SYSTEM 失效
标题翻译：设备和方法用于冷却一个离子注入机经处理WORKPIECES
公开(公告)号：EP0880798B1
公开(公告)日：2004-09-22
申请号：EP97908672.5
申请日：1997-02-14
申请人： Axcelis Technologies, Inc.
发明人： BRAILOVE, Adam, A. , ROSE, Peter, H. , BLAKE, Julian, G. , YANG, Zhongmin , PURSER, Kenneth, H.
IPC分类号： H01L21/00 , H01J37/317
CPC分类号： H01L21/67109 , H01J27/14 , H01J37/08 , H01J37/18 , H01J37/3002 , H01J37/3007 , H01J37/304 , H01J37/3171 , H01J2237/022 , H01J2237/083 , H01J2237/184 , H01J2237/2001 , H01J2237/2007 , H01J2237/20228 , H01J2237/204 , H01J2237/31701 , H01J2237/31705 , H01L21/67069 , H01L21/67748 , H01L21/67751 , H01L21/67778 , H01L21/6838
摘要： A system and method for conductively and/or convectively transferring heat away from a workpiece that has been processed by a processing system, such as an ion implantation system. The conductive transfer of heat from the workpiece is effectuated by disposing the workpiece in relatively close proximity with a floor of a load lock, which is maintained at a relatively cool temperature. The chamber pressure is disposed at a selected pressure by a pressure regulator and a vacuum pressure is applied to the backside of the workpiece closest to draw the workpiece into contact with the chamber floor, thereby effecting heat transfer from the workpiece to the cooling surface.

26. 发明公开

EP1339084A2 Electron beam irradiation apparatus and method 审中-公开
标题翻译： Vorrichtung und Verfahren zur Bestrahlung mittels Elektronen
公开(公告)号：EP1339084A2
公开(公告)日：2003-08-27
申请号：EP03250922.6
申请日：2003-02-14
申请人： SONY CORPORATION , Jeol Ltd.
发明人： Miura, Yoshihisa, c/o Sony Corporation , Aki, Yuichi, c/o Sony Corporation , Kawase, Hiroshi, c/o Sony Corporation , Yamamoto, Masanobu, c/o Sony Corporation , Date, Naoki , Norioka, Setsuo , Koikumi, Mitsuru , Komatsubara, Gakuo
IPC分类号： H01J37/301 , H01J37/20
CPC分类号： H01J37/18 , G11B7/261 , H01J37/305 , H01J37/3056 , H01J2237/162 , H01J2237/188
摘要： An electron beam irradiation apparatus in a partial vacuum method is structured with a static pressure floating pad 18 connected to a vacuum chamber 14 containing an electron beam column 15 and in a condition that the static pressure floating pad 18 is attached to a subject 1 to be irradiated without contacting, and an electron beam irradiating the subject 1 to be irradiated through an electron beam path 19 of the static pressure floating pad 18, whereby the vacuum chamber and the electron beam column can be maintained in the required degree of vacuum even in a condition that the static pressure floating pad 18 is separated from the subject 1 to be irradiated. A vacuum seal valve 30 including a piston to open and close the electron beam path 19 is provided within the static pressure floating pad 18. When the static pressure floating pad 18 is separated from the subject 1, the vacuum seal valve 30 is structured to be activated to close the electron beam path 19 so as to prevent the air from flowing into the vacuum chamber 14. In this structure, the vacuum seal valve 30 is formed with a round shaped cross section and in a tapered shape with a narrow tip so as to accomplish high vacuum seal without a gap, so that the degree of vacuum in the vacuum chamber and the electron beam column can surely be maintained.
摘要翻译：部分真空法中的电子束照射装置由连接到包含电子束柱15的真空室14的静压浮动垫18构成，并且在将静压浮动垫18附着到被检体1的状态下照射没有接触的电子束，以及照射被摄体1以通过静压浮动垫18的电子束路径19照射的电子束，由此即使在真空室和电子束柱中也可以将真空室和电子束柱保持在所需的真空度条件是静压浮动垫18与待照射的被检体1分离。在静压浮动垫18内设置包括打开和关闭电子束通道19的活塞的真空密封阀30.当静压浮动垫18与被检体1分离时，真空密封阀30构成为激活以闭合电子束路径19，以防止空气流入真空室14.在该结构中，真空密封阀30形成为圆形截面并具有窄尖端的锥形形状，以便以实现高真空密封而没有间隙，从而可以可靠地保持真空室和电子束柱中的真空度。

27. 发明授权

EP0594084B1 Scanning electron microscope 失效
标题翻译：扫描型电子显微镜
公开(公告)号：EP0594084B1
公开(公告)日：2003-05-21
申请号：EP93116733.2
申请日：1993-10-15
申请人： Hitachi, Ltd.
发明人： Todokoro, Hideo , Otaka, Tadashi
IPC分类号： H01J37/28
CPC分类号： H01J37/18 , H01J37/20 , H01J37/28 , H01J2237/0475 , H01J2237/04756 , H01J2237/057 , H01J2237/18 , H01J2237/204 , H01J2237/244

28. 发明授权

EP0791665B1 Exhaust apparatus in ion implantation system 失效
标题翻译：排气系统中的离子注入系统
公开(公告)号：EP0791665B1
公开(公告)日：2002-05-08
申请号：EP97102105.0
申请日：1997-02-10
申请人： EBARA CORPORATION
发明人： Fukunaga, Akira , Komai, Tetsuo
IPC分类号： C23C14/48 , H01J27/02 , H01J37/18 , C23C14/56 , F16L25/02
CPC分类号： C23C14/48 , C23C14/564 , H01J37/18 , H01J2237/31701

29. 发明公开

EP1122761A1 Optical column for charged particle beam device 有权
标题翻译： OptischeSäulefürTeilchenstrahlvorrichtung
公开(公告)号：EP1122761A1
公开(公告)日：2001-08-08
申请号：EP00101987.6
申请日：2000-02-01
申请人： ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH
发明人： Feuerbaum, Hans-Peter, c/o ICT GmbH
IPC分类号： H01J37/26 , H01J37/252 , H01J37/18
CPC分类号： H01J37/256 , H01J37/18 , H01J37/28 , H01J2237/2449
摘要： The invention provides a miniaturized optical column for a charged particle beam apparatus for examining a specimen 14. Thereby, the column comprises a charged particle source 2 for providing a beam of charged particles 10; a lens system for guiding the beam of charged particles 10 from the source 2 onto the specimen 14; and a housing 40 which, during operation, is set on beam boost potential.
摘要翻译：本发明提供了一种用于检查样本14的带电粒子束装置的小型光学柱。由此，该柱包括用于提供带电粒子束10的带电粒子源2; 用于将带电粒子束10从源2引导到样本14上的透镜系统; 以及在操作期间被设置为波束增压电位的壳体40。

30. 发明公开

EP0880797A1 ION IMPLANTATION SYSTEM FOR IMPLANTING WORKPIECES 失效
标题翻译：用于植入的工件的离子注入系统
公开(公告)号：EP0880797A1
公开(公告)日：1998-12-02
申请号：EP97907646.0
申请日：1997-02-14
申请人： Eaton Corporation
发明人： ROSE, Peter, H. , BLAKE, Julian, G. , BRAILOVE, Adam, A. , YANG, Zhongmin , MCRAY, Richard, F. , HUGHEY, Barbara, J.
IPC分类号： H01J27 , H01J37 , H01L21
CPC分类号： H01L21/67109 , H01J27/14 , H01J37/08 , H01J37/18 , H01J37/3002 , H01J37/3007 , H01J37/304 , H01J37/3171 , H01J2237/022 , H01J2237/083 , H01J2237/184 , H01J2237/2001 , H01J2237/2007 , H01J2237/20228 , H01J2237/204 , H01J2237/31701 , H01J2237/31705 , H01L21/67069 , H01L21/67745 , H01L21/67748 , H01L21/67751 , H01L21/67778 , H01L21/6838
摘要： An ion implantation system that rapidly and efficiently processes large quantities of workpieces, such as flat panel displays. The ion implantation system includes a high vacuum process chamber (318) that mounts an ion source (330), a single workpiece translating stage (320) and a loadlock (310). The single workpiece handling assembly mounted within the process chamber both removes the workpiece from the loadlock and supports the workpiece during implantation by the ion beam generated by the ion source. The process chamber is in selective fluid communication with a loadlock assembly, which in turn is mechanically integrated with a workpiece loading or end station. Additionally, the workpiece handling assembly includes a translation stage or element for translating the workpiece in a linear scanning direction during implantation. This linear scanning direction extends along a path transverse or orthogonal to the horizontal longitudinal axis of the implantation system. According to one practice, the scanning direction and the longitudinal axis form an angle therebetween that is less than or equal to about 85 degrees.

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