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    • 92. 发明公开
    • LASER
    • 激光
    • EP3070792A1
    • 2016-09-21
    • EP13899254.0
    • 2013-12-12
    • Huawei Technologies Co., Ltd.
    • CHEN, XiCHEN, BoZENG, LiGAO, Lei
    • H01S3/082
    • H01S5/1007H01S5/021H01S5/0265H01S5/028H01S5/0287H01S5/06256H01S5/142H01S5/3013
    • A laser provided by embodiments of the present invention includes a substrate and a resonant cavity. In addition to an active gain region, a first phase shift region, an optical branching region, and N reflective mode selection regions, the resonant cavity further includes a highly reflective surface, where a reflectivity of the highly reflective surface is greater than reflectivities of the N reflective mode selection regions, so that laser beams are output from the N reflective mode selection regions. Because the laser naturally includes at least two reflective mode selection regions, at least two laser beams are output. According to the laser provided by the embodiments of the present invention, one laser can output two laser beams or even multiple laser beams; therefore, laser beam generation efficiency is high and average costs for generating a single laser beam are accordingly reduced.
    • 由本发明实施例提供的激光器包括衬底和谐振腔。 除了有源增益区域,第一相移区域,光分支区域和N个反射模式选择区域之外,谐振腔还包括高反射表面,其中高反射表面的反射率大于反射率的反射率 N个反射模式选择区域,从而从N个反射模式选择区域输出激光束。 由于激光自然包括至少两个反射模式选择区域,所以输出至少两个激光束。 根据本发明实施例提供的激光器,一个激光器可以输出两束激光束或者甚至多束激光束; 因此,激光束产生效率高,并且用于产生单个激光束的平均成本相应地降低。
    • 96. 发明公开
    • Nitride semiconductor laser element
    • 氮化物半导体激光元件
    • EP2736130A3
    • 2016-01-06
    • EP13194375.5
    • 2013-11-26
    • Nichia Corporation
    • Masui, Shingo
    • H01S5/20H01S5/343H01S5/32
    • H01S5/34B82Y20/00H01S5/021H01S5/0213H01S5/2009H01S5/2018H01S5/2031H01S5/22H01S5/3013H01S5/3202H01S5/34333
    • To realize a nitride semiconductor laser element having improved internal quantum efficiency. The nitride semiconductor laser element includes an n-type semiconductor layer, a p-type semiconductor layer, and an active layer between the n-type semiconductor layer and the p-type semiconductor layer; wherein the n-type semiconductor layer includes an n-side optical guide layer; wherein the active layer includes two or more well layers, and at least one barrier layer provided between the well layers; wherein the barrier layer includes a barrier layer having band gap energy higher than that of the n-side optical guide layer; wherein the p-type semiconductor layer includes: an electron barrier layer having band gap energy higher than that of all barrier layers included in the active layer, and a p-side optical guide layer provided between a final well layer, that is a well layer nearest to the p-type semiconductor layer of the two or more well layer, and the electron barrier layer; and wherein the p-side optical guide layer includes: a first region that is disposed on a side of the final well layer and has band gap energy lower than that of the n-side optical guide layer, and a second region that is disposed on a side of the electron barrier layer and has band gap energy higher than that of the n-side optical guide layer.