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    • 5. 发明申请
    • CAPACITIVE MICROMACHINE ULTRASOUND TRANSDUCER
    • 电容式MICROMACHINE超声波传感器
    • US20110163630A1
    • 2011-07-07
    • US13062744
    • 2009-09-08
    • Johan H. KlootwijkPeter DirksenMarcel MulderElisabeth M. L. Moonen
    • Johan H. KlootwijkPeter DirksenMarcel MulderElisabeth M. L. Moonen
    • H02N1/00H04R31/00
    • B60B1/0292B06B1/0292H02N1/006H02N1/08Y10T29/49005
    • The patent application discloses a capacitive micromachined ultrasound transducer, comprising a silicon substrate; a cavity; a first electrode, which is arranged between the silicon substrate and the cavity; wherein the first electrode is arranged under the cavity; a membrane, wherein the membrane is arranged above the cavity and opposite to the first electrode; a second electrode, wherein the second electrode is arranged above the cavity and opposite to the first electrode; wherein the second electrode is arranged in or close to the membrane, wherein the first electrode and the second electrode are adapted to be supplied by a voltage; and a first isolation layer, which is arranged between the first electrode and the second electrode, wherein the first isolation layer comprises a dielectric. It is also described a system for generating or detecting ultrasound waves, wherein the system comprises a transducer according to the patent application. Further, it is disclosed a method for manufacturing a transducer according to the patent application, wherein the transducer is manufactured with the help of a CMOS manufacturing process, wherein the transducer can be manufactured as a post-processing feature during a CMOS process.
    • 该专利申请公开了一种电容式微机械超声换能器,其包括硅衬底; 一个空腔 布置在硅衬底和腔之间的第一电极; 其中所述第一电极布置在所述空腔下方; 膜,其中所述膜布置在所述腔的上方并与所述第一电极相对; 第二电极,其中所述第二电极布置在所述空腔上方并与所述第一电极相对; 其中所述第二电极布置在所述膜中或靠近所述膜,其中所述第一电极和所述第二电极适于由电压供应; 以及布置在所述第一电极和所述第二电极之间的第一隔离层,其中所述第一隔离层包括电介质。 还描述了用于产生或检测超声波的系统,其中该系统包括根据该专利申请的换能器。 此外,公开了根据专利申请的用于制造换能器的方法,其中借助于CMOS制造工艺制造所述换能器,其中所述换能器可以在CMOS工艺期间被制造为后处理特征。
    • 9. 发明申请
    • CAPACITIVE MICROMACHINED ULTRASOUND TRANSDUCER
    • 电容式MICROMACHINED超声波传感器
    • WO2010032156A2
    • 2010-03-25
    • PCT/IB2009053914
    • 2009-09-08
    • KONINKL PHILIPS ELECTRONICS NVKLOOTWIJK JOHAN HDIRKSEN PETERMULDER MARCELMOONEN ELISABETH M L
    • KLOOTWIJK JOHAN HDIRKSEN PETERMULDER MARCELMOONEN ELISABETH M L
    • B60B1/0292B06B1/0292H02N1/006H02N1/08Y10T29/49005
    • The patent application discloses a capacitive micromachined ultrasound transducer, comprising a silicon substrate; a cavity; a first electrode, which is arranged between the silicon substrate and the cavity; wherein the first electrode is arranged under the cavity; a membrane, wherein the membrane is arranged above the cavity and opposite to the first electrode; a second electrode, wherein the second electrode is arranged above the cavity and opposite to the first electrode; wherein the second electrode is arranged in or close to the membrane, wherein the first electrode and the second electrode are adapted to be supplied by a voltage; and a first isolation layer, which is arranged between the first electrode and the second electrode, wherein the first isolation layer comprises a dielectric. It is also described a system for generating or detecting ultrasound waves, wherein the system comprises a transducer according to the patent application. Further, it is disclosed a method for manufacturing a transducer according to the patent application, wherein the transducer is manufactured with the help of a CMOS manufacturing process,wherein the transducer can be manufactured as a post-processing feature during a CMOS process.
    • 该专利申请公开了一种电容式微机械超声换能器,其包括硅衬底; 一个空腔 布置在硅衬底和腔之间的第一电极; 其中所述第一电极布置在所述空腔下方; 膜,其中所述膜布置在所述腔的上方并与所述第一电极相对; 第二电极,其中所述第二电极布置在所述空腔上方并与所述第一电极相对; 其中所述第二电极布置在所述膜中或靠近所述膜,其中所述第一电极和所述第二电极适于由电压供应; 以及布置在所述第一电极和所述第二电极之间的第一隔离层,其中所述第一隔离层包括电介质。 还描述了用于产生或检测超声波的系统,其中该系统包括根据该专利申请的换能器。 此外,公开了根据专利申请的用于制造换能器的方法,其中借助于CMOS制造工艺制造所述换能器,其中所述换能器可以在CMOS工艺期间被制造为后处理特征。