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1. 发明申请

WO2013001437A1 A TRACKING SYSTEM FOR TRACKING INTERVENTIONAL TOOLS IN ULTRASOUND GUIDED INTERVENTIONS AND AN ULTRASOUND DIAGNOSTIC SYSTEM COMPRISING SUCH A TRACKING SYSTEM 审中-公开
标题翻译：用于跟踪超声引导干预中的传统工具的跟踪系统和包含这种追踪系统的超声诊断系统
公开(公告)号：WO2013001437A1
公开(公告)日：2013-01-03
申请号：PCT/IB2012/053195
申请日：2012-06-25
申请人： KONINKLIJKE PHILIPS ELECTRONICS N.V. , DIRKSEN, Peter , SOER, Wouter Anthon , VAN RENS, Antonia Cornelia , MARCELIS, Bout , DEKKER, Ronald
发明人： DIRKSEN, Peter , SOER, Wouter Anthon , VAN RENS, Antonia Cornelia , MARCELIS, Bout , DEKKER, Ronald
IPC分类号： A61B5/06 , A61B8/08 , A61B17/34 , A61B19/52
CPC分类号： A61B5/066 , A61B8/0841 , A61B34/20 , A61B2034/2063 , A61B2090/3786
摘要： An interventional tooltracking system is disclosed which utilises the response ofa CMUT-based tracking sensor located on the interventional tool to insonification, from a remoteultrasoundsource, in order to determine the position of the interventional tool during an interventional procedure.
摘要翻译：公开了一种介入式工具跟踪系统，其利用位于介入工具上的基于CMUT的跟踪传感器的响应来从远程超声源进行增强，以便在介入过程期间确定介入工具的位置。

2. 发明申请

WO2012140556A3 TEMPERATURE COMPENSATION IN A CMUT DEVICE 审中-公开
公开(公告)号：WO2012140556A3
公开(公告)日：2012-10-18
申请号：PCT/IB2012/051719
申请日：2012-04-06
申请人： KONINKLIJKE PHILIPS ELECTRONICS N.V. , DIRKSEN, Peter , LEEUWESTEIN, Adriaan
发明人： DIRKSEN, Peter , LEEUWESTEIN, Adriaan
IPC分类号： B06B1/02
摘要： CMUT devices are used in many applications e.g. for ultrasound imaging and pressure measurement. These devices operate by sensing a change in capacitance caused by deflection of a membrane (32) comprising one of a pair of electrodes in the device by ultrasound exposure of, or pressure applied on, the membrane. The CMUT device may be susceptible to the effects of changing temperature.

3. 发明申请

WO2012014111A2 THIN FILM ULTRASOUND TRANSDUCER 审中-公开
标题翻译：薄膜超声波传感器
公开(公告)号：WO2012014111A2
公开(公告)日：2012-02-02
申请号：PCT/IB2011/053096
申请日：2011-07-12
申请人： KONINKLIJKE PHILIPS ELECTRONICS N.V. , KLEE, Mareike , MAUCZOK, Ruediger , BOOTS, Henri Marie Joseph , DE WILD, Nico Maris Adriaan , SREEDHARAN NAIR, Biju Kumar , WUNNICKE, Olaf , PASVEER, Willem Franke , VAN DE LAGEMAAT, Dirk , DIRKSEN, Peter
发明人： KLEE, Mareike , MAUCZOK, Ruediger , BOOTS, Henri Marie Joseph , DE WILD, Nico Maris Adriaan , SREEDHARAN NAIR, Biju Kumar , WUNNICKE, Olaf , PASVEER, Willem Franke , VAN DE LAGEMAAT, Dirk , DIRKSEN, Peter
IPC分类号： B06B1/06
CPC分类号： H03H3/02 , B06B1/06 , B06B1/0622 , B06B1/0688 , H03H9/172
摘要： The present invention relates to a transducer (11) comprising - a membrane (31) configured to change shape in response to a force, the membrane (31) having a first major surface (16) and a second major surface (17), - a piezoelectric layer (18) formed over the first major surface (16) of the membrane (31), the piezoelectric layer (18) having an active portion, - first and second electrodes (19) in contact with the piezoelectric layer (18), wherein an electric field between the first and second electrodes (19) determines the mechanical movement of the piezoelectric layer (18), -support structures (40) at the second major surface (17) of the membrane (15) on adjacent sides of the active portion of the piezoelectric layer (18), at least part of the support structures (40) forming walls perpendicular, or at least not parallel, to the second major surface (17) of the membrane (31), so as to form a trench (41) of any shape underlying the active portion, so that an ultrasound transducer is obtained with a high output pressure at the support side than at the opposite side. The invention also relates to a method of forming such a transducer, and an array comprising at least one transducer of the like.
摘要翻译：本发明涉及一种换能器（11），其包括 - 被配置为响应于力而改变形状的膜（31），所述膜（31）具有第一主表面（16）和第二主表面（17）， - 形成在膜（31）的第一主表面（16）上方的压电层（18），压电层（18）具有有源部分， - 与压电层（18）接触的第一和第二电极（19），其中所述第一和第二电极（19）之间的电场确定所述压电层（18）的机械运动， - 在所述膜（15）的相邻侧上的所述膜（15）的第二主表面（17）处支撑结构（40）压电层（18）的有效部分，至少部分支撑结构（40）形成与膜（31）的第二主表面（17）垂直或至少不平行的壁，以便形成在活动部分下方具有任何形状的沟槽（41），使得超声波换能器为ob 在支撑侧具有高于在相对侧的高输出压力。本发明还涉及一种形成这种换能器的方法，以及包括至少一个这样的换能器的阵列。

4. 发明申请

WO2010032156A3 CAPACITIVE MICROMACHINED ULTRASOUND TRANSDUCER 审中-公开
公开(公告)号：WO2010032156A3
公开(公告)日：2010-03-25
申请号：PCT/IB2009/053914
申请日：2009-09-08
申请人： KONINKLIJKE PHILIPS ELECTRONICS N.V. , KLOOTWIJK, Johan, H. , DIRKSEN, Peter , MULDER, Marcel , MOONEN, Elisabeth, M. L.
发明人： KLOOTWIJK, Johan, H. , DIRKSEN, Peter , MULDER, Marcel , MOONEN, Elisabeth, M. L.
IPC分类号： B06B1/02
摘要： The patent application discloses a capacitive micromachined ultrasound transducer, comprising a silicon substrate; a cavity; a first electrode, which is arranged between the silicon substrate and the cavity; wherein the first electrode is arranged under the cavity; a membrane, wherein the membrane is arranged above the cavity and opposite to the first electrode; a second electrode, wherein the second electrode is arranged above the cavity and opposite to the first electrode; wherein the second electrode is arranged in or close to the membrane, wherein the first electrode and the second electrode are adapted to be supplied by a voltage; and a first isolation layer, which is arranged between the first electrode and the second electrode, wherein the first isolation layer comprises a dielectric. It is also described a system for generating or detecting ultrasound waves, wherein the system comprises a transducer according to the patent application. Further, it is disclosed a method for manufacturing a transducer according to the patent application, wherein the transducer is manufactured with the help of a CMOS manufacturing process,wherein the transducer can be manufactured as a post-processing feature during a CMOS process.

5. 发明申请

WO2005083525A2 DETERMINING IMAGE BLUR IN AN IMAGING SYSTEM 审中-公开
标题翻译：在成像系统中确定图像图像
公开(公告)号：WO2005083525A2
公开(公告)日：2005-09-09
申请号：PCT/IB2005/050496
申请日：2005-02-08
申请人： KONINKLIJKE PHILIPS ELECTRONICS N.V. , DIRKSEN, Peter , JANSSEN, Augustus, J., E., M. , BRAAT, Josephus, J., M. , LEEUWESTEIN, Adriaan
发明人： DIRKSEN, Peter , JANSSEN, Augustus, J., E., M. , BRAAT, Josephus, J., M. , LEEUWESTEIN, Adriaan
IPC分类号： G03F9/00
CPC分类号： G03F7/70608 , G03F7/706
摘要： The invention relates to a method of determining a parameter relating to image blur in an imaging system (IS) comprising the step of illuminating an object having a test pattern (MTP) by means of the imaging system (IS), thereby forming an image of the test pattern,. The test pattern (MTP) has a size smaller than the resolution of the imaging system (IS), which makes the image of the test pattern independent of illuminator aberrations. The test pattern (MTP) is an isolated pattern, which causes the image to be free of optical proximity effects. The image is blurred due to stochastic fluctuations in the imaging system and/or in the detector detecting the blurred image. The parameter relating to the image blur is determined from a parameter relating to the shape of the blurred image. According to the invention, resist diffusion and/or focus noise may be characterized. In the method of designing a mask, the parameter relating to the image blur due to diffusion in the resist is taken into account. The computer program according to the invention is able to execute the step of determining the parameter relating to the image blur from a parameter relating to a shape of the blurred image.
摘要翻译：本发明涉及一种确定与成像系统（IS）中的图像模糊相关的参数的方法，包括通过成像系统（IS）照亮具有测试图案（MTP）的对象的步骤，从而形成图像测试模式。测试图案（MTP）的尺寸小于成像系统（IS）的分辨率，这使得测试图案的图像与照明器像差无关。测试图案（MTP）是一种孤立的图案，使图像无光学邻近效应。图像由于成像系统中的随机波动和/或检测模糊图像的检测器而模糊。根据与模糊图像的形状相关的参数确定与图像模糊有关的参数。根据本发明，可以表征抗蚀剂扩散和/或聚焦噪声。在设计掩模的方法中，考虑与抗蚀剂中的扩散引起的图像模糊有关的参数。根据本发明的计算机程序能够执行从与模糊图像的形状相关的参数确定与图像模糊有关的参数的步骤。

6. 发明申请

WO2005064409A2 REMOVABLE PELLICLE FOR IMMERSION LITHOGRAPHY 审中-公开
标题翻译：可移除胶片用于浸没式光刻
公开(公告)号：WO2005064409A2
公开(公告)日：2005-07-14
申请号：PCT/IB2004052886
申请日：2004-12-22
申请人： KONINKL PHILIPS ELECTRONICS NV , DIRKSEN PETER , MORTON ROBERT D , ZANDBERGEN PETER , VAN STEENWINCKEL DAVID , AKSENOV YURI , LAMMERS JEROEN H , VAN WINGERDEN JOHANNES , MARINIER LAURENT
发明人： DIRKSEN PETER , MORTON ROBERT D , ZANDBERGEN PETER , VAN STEENWINCKEL DAVID , AKSENOV YURI , LAMMERS JEROEN H , VAN WINGERDEN JOHANNES , MARINIER LAURENT
IPC分类号： G03F7/20
CPC分类号： G03F7/70341 , G03F7/70983
摘要： A method of irradiating to pattern a photosensitive layer such as a resist (L2) immersed in a fluid (L3), involves applying a removable transparent layer (L4, L5), projecting the radiation onto the resist through the immersion fluid and through the transparent layer, such that imperfections in the fluid are out of focus as projected on the surface, and subsequently removing the transparent layer. The transparent layer can help distance such imperfections from the focus of the radiation on the surface and so can reduce or eliminate shadowing. Hence the irradiation can be more complete, and defects reduced. It can be particularly effective for imperfections in the form of small bubbles or particles in the immersion fluid especially at the fluid/surface interface for example. The radiation can be for any purpose including inspection, processing, patterning and so on. The removal of the transparent layer can be combined with a step of developing the resist layer.
摘要翻译：一种照射方法来照射浸没在流体（L3）中的抗蚀剂（L2）的感光层，包括施加可去除的透明层（L4，L5），通过浸没流体将辐射投射到抗蚀剂上，并通过透明使得流体中的缺陷如投射在表面上而失焦，随后去除透明层。透明层可以帮助将这种缺陷从辐射的焦点远离在表面上，因此可以减少或消除阴影。因此，照射可以更完整，并且缺陷减少。对于浸入液体中的小气泡或颗粒形式的缺陷，特别是在流体/表面界面处的缺陷可能特别有效。辐射可以用于任何目的，包括检查，加工，图案化等。可以将透明层的去除与显影抗蚀剂层的步骤组合。

7. 发明申请

WO2005064399A2 LITHOGRAPHY SYSTEM USING A PROGRAMMABLE ELECTRO-WETTING MASK 审中-公开
标题翻译：使用可编程电湿面膜的光刻系统
公开(公告)号：WO2005064399A2
公开(公告)日：2005-07-14
申请号：PCT/IB2004052620
申请日：2004-12-01
申请人： KONINKL PHILIPS ELECTRONICS NV , DIRKSEN PETER , HAYES ROBERT A , JUFFERMANS CASPARUS A H , STEFFEN THOMAS
发明人： DIRKSEN PETER , HAYES ROBERT A , JUFFERMANS CASPARUS A H , STEFFEN THOMAS
IPC分类号： G03F1/00 , G03F7/20 , G03F1/14 , G02B26/02
CPC分类号： G03F7/70291
摘要： A maskless lithography system is described having a programmable mask to allow performing several lithographic steps using the same mask. In every lithographic step, the corresponding pattern is obtained by providing a digital pattern to the programmable mask. The programmable mask includes an array of pixels which are based on the electro-wetting principle. According to this principle, every pixel has a transparent reservoir containing a first, non-polar, non-transparent fluid and a second, polar, transparent fluid which are immiscible. Applying a field to the reservoir allows to displace the fluids with respect to each other. This allows to make the pixel either transparent or non-transparent. This lithographic programmable mask allows high resolution and fast setting and refreshing. A corresponding method for performing maskless optical lithography also is described.
摘要翻译：描述了具有可编程掩模的无掩模光刻系统，以允许使用相同的掩模执行几个光刻步骤。在每个光刻步骤中，通过向可编程掩模提供数字图案来获得相应的图案。可编程掩模包括基于电润湿原理的像素阵列。根据这个原理，每个像素都有一个透明的容器，它含有第一个，非极性的，不透明的流体和一个不混溶的第二个极性透明的流体。将场施加到储存器允许流体相对于彼此移位。这允许使像素透明或不透明。该光刻可编程掩模允许高分辨率和快速设置和刷新。还描述了用于执行无掩模光学光刻的相应方法。

8. 发明申请

WO2004059394A3 DETERMINING LITHOGRAPHIC PARAMETERS TO OPTIMISE A PROCESS WINDOW 审中-公开
公开(公告)号：WO2004059394A3
公开(公告)日：2004-07-15
申请号：PCT/IB2003/006094
申请日：2003-12-18
申请人： KONINKLIJKE PHILIPS ELECTRONICS N.V. , VAN WINGERDEN, Johannes , JUFFERMANS, Casparus, A., H. , DIRKSEN, Peter
发明人： VAN WINGERDEN, Johannes , JUFFERMANS, Casparus, A., H. , DIRKSEN, Peter
IPC分类号： G03F7/20
摘要： For determining best process variables (E, F, W) setting that provide optimum process window for a lithographic process for printing features having critical dimensions (CD) use is made of an overall performance characterizing parameter (C pk ) and of an analytical model, which describes CD data as a function of process parameters, like exposure dose (E) and focus( F). This allows calculating of the average value (µCD) and the variance (σCD) of the statistical CD distribution (CDd) and to determine the highest C pk value and the associated values of process parameters, which values provide the optimum process window.

9. 发明申请

WO2012014111A3 THIN FILM ULTRASOUND TRANSDUCER 审中-公开
标题翻译：薄膜超声波传感器
公开(公告)号：WO2012014111A3
公开(公告)日：2013-03-07
申请号：PCT/IB2011053096
申请日：2011-07-12
申请人： KONINKL PHILIPS ELECTRONICS NV , KLEE MAREIKE , MAUCZOK RUEDIGER , BOOTS HENRI MARIE JOSEPH , DE WILD NICO MARIS ADRIAAN , SREEDHARAN NAIR BIJU KUMAR , WUNNICKE OLAF , PASVEER WILLEM FRANKE , VAN DE LAGEMAAT DIRK , DIRKSEN PETER
发明人： KLEE MAREIKE , MAUCZOK RUEDIGER , BOOTS HENRI MARIE JOSEPH , DE WILD NICO MARIS ADRIAAN , SREEDHARAN NAIR BIJU KUMAR , WUNNICKE OLAF , PASVEER WILLEM FRANKE , VAN DE LAGEMAAT DIRK , DIRKSEN PETER
IPC分类号： B06B1/06
CPC分类号： H03H3/02 , B06B1/06 , B06B1/0622 , B06B1/0688 , H03H9/172
摘要： The present invention relates to a transducer (11) comprising - a membrane (31) configured to change shape in response to a force, the membrane (31) having a first major surface (16) and a second major surface (17), - a piezoelectric layer (18) formed over the first major surface (16) of the membrane (31), the piezoelectric layer (18) having an active portion, - first and second electrodes (19) in contact with the piezoelectric layer (18), wherein an electric field between the first and second electrodes (19) determines the mechanical movement of the piezoelectric layer (18), -support structures (40) at the second major surface (17) of the membrane (15) on adjacent sides of the active portion of the piezoelectric layer (18), at least part of the support structures (40) forming walls perpendicular, or at least not parallel, to the second major surface (17) of the membrane (31), so as to form a trench (41) of any shape underlying the active portion, so that an ultrasound transducer is obtained with a high output pressure at the support side than at the opposite side. The invention also relates to a method of forming such a transducer, and an array comprising at least one transducer of the like.
摘要翻译：本发明涉及一种换能器（11），其包括 - 被配置为响应于力而改变形状的膜（31），所述膜（31）具有第一主表面（16）和第二主表面（17）， - 形成在膜（31）的第一主表面（16）上方的压电层（18），压电层（18）具有有源部分， - 与压电层（18）接触的第一和第二电极（19），其中所述第一和第二电极（19）之间的电场确定所述压电层（18）的机械运动， - 在所述膜（15）的相邻侧上的所述膜（15）的第二主表面（17）处支撑结构（40）压电层（18）的有效部分，至少部分支撑结构（40）形成与膜（31）的第二主表面（17）垂直或至少不平行的壁，以形成在活动部分下方具有任何形状的沟槽（41），使得超声波换能器为ob 在支撑侧具有高于在相对侧的高输出压力。本发明还涉及一种形成这种换能器的方法，以及包括至少一个这样的换能器的阵列。

10. 发明申请

WO2010109363A3 GAS SENSING USING ULTRASOUND 审中-公开
标题翻译：使用超声波进行气体感应
公开(公告)号：WO2010109363A3
公开(公告)日：2010-11-18
申请号：PCT/IB2010051043
申请日：2010-03-10
申请人： KONINKL PHILIPS ELECTRONICS NV , PHILIPS CORP , SCHELLEKENS MARTIJN , KAHLMAN JOSEPHUS ARNOLDUS HENRICUS MARIA , VAN DER MARK MARTINUS BERNARDUS , DIRKSEN PETER , VAN KESTEREN HANS WILLEM
发明人： SCHELLEKENS MARTIJN , KAHLMAN JOSEPHUS ARNOLDUS HENRICUS MARIA , VAN DER MARK MARTINUS BERNARDUS , DIRKSEN PETER , VAN KESTEREN HANS WILLEM
IPC分类号： G01N33/00 , B06B1/02 , G01N29/02 , G01N29/024 , G01N33/497
CPC分类号： G01N33/497 , G01N29/2406 , G01N29/348 , G01N33/004 , G01N2291/0215 , G01N2291/02809
摘要： A sensor chip (1030) for gas has cells (200) for emitting and receiving ultrasound and is configured for a sufficiently large frequency range and for measuring concentration of at least one of the gas components based on at least two responses within the range. The frequency range can be achieved by varying the size of cell membranes (230), varying bias voltages, and/or varying air pressure for an array (205) of cMUTs or MEMS microphones. The sensor chip can be applied in, for example, capnography. A measurement air chamber (515) is implemented in the respiratory pathway (400), and it and/or the pathway may be designed to reduce turbulence in the exhaled breath (120) subject to ultrasound interrogation. The chip (1030) can be implemented as self-contained in the monitoring of parameters, obviating the need for off-chip sensors.
摘要翻译：用于气体的传感器芯片（1030）具有用于发射和接收超声波的电池（200），并且被配置为足够大的频率范围，并且用于基于在该范围内的至少两个响应来测量至少一个气体成分的浓度。频率范围可以通过改变cMUT或MEMS麦克风的阵列（205）的细胞膜（230）的尺寸，改变的偏置电压和/或变化的空气压力来实现。传感器芯片可以应用于例如二氧化碳图谱中。在呼吸路径（400）中实施测量空气室（515），并且其和/或路径可以被设计成减少经受超声询问的呼出呼吸（120）中的湍流。芯片（1030）可以被实现为独立于监视参数，从而避免了片外传感器的需要。

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