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1. 发明申请

WO2008043433A8 COMPACT 3-MIRROR OBJECTIVE 审中-公开
标题翻译： COMPACT 3面镜
公开(公告)号：WO2008043433A8
公开(公告)日：2009-11-05
申请号：PCT/EP2007008315
申请日：2007-09-25
申请人： ZEISS CARL SMT AG , SOHMEN ERIK , MANN HANS-JUERGEN
发明人： SOHMEN ERIK , MANN HANS-JUERGEN
IPC分类号： G02B17/06 , G02B21/04
CPC分类号： G02B17/0652 , G02B21/04 , G03F7/70233
摘要： The invention relates to a catoptric objective for wavelengths below 193 nm for imaging an object in an object plane into an image in an image plane, wherein the objective comprises at least four reflecting mirrored surfaces (Ml, M2, M3, M4) which are constructed on at least three mirrors (Sl, S2, S3), wherein two mirrors (S2, S3) have an opening for the passage of a bundle of rays which passes through the objective from the object plane to the image plane, and one mirror has no opening for the passage of a bundle of rays.
摘要翻译：本发明涉及一种用于193nm以下的波长用于在图像平面中，其中，所述透镜包括至少四个反射镜表面（ML，M2，M3，M4），所述（至少三个反射镜S1成像在物平面中的对象到的图像的反射物镜，S2，S3）中形成，其中两个反射镜（S2，S3）具有用于穿过从物平面到像平面的物镜的光束束通过的开口，和一个反射镜具有用于光束束的通路没有开口。

2. 发明申请

WO2004010224A2 PROJECTION OBJECTIVE FOR A PROJECTION EXPOSURE APPARATUS 审中-公开
标题翻译：投影曝光装置投影目标
公开(公告)号：WO2004010224A2
公开(公告)日：2004-01-29
申请号：PCT/EP0300485
申请日：2003-01-20
申请人： ZEISS CARL SMT AG , SINGER WOLFGANG , MANN HANS-JUERGEN , WANGLER JOHANNES , ULRICH WILHELM
发明人： SINGER WOLFGANG , MANN HANS-JUERGEN , WANGLER JOHANNES , ULRICH WILHELM
IPC分类号： G02B17/06 , G03F7/20 , G21K1/06 , G21K5/00 , G21K5/04
CPC分类号： B82Y10/00 , G02B17/0657 , G03F7/70075 , G03F7/70083 , G03F7/70108 , G03F7/70166 , G03F7/702 , G03F7/70233 , G03F7/70358 , G03F7/708 , G21K1/06 , G21K1/062
摘要： The invention concerns a projection objective for a projection exposure apparatus, said projection exposure apparatus having a primary light source for emitting electromagnetic radiation with a wavelength
摘要翻译：本发明涉及投影曝光装置的投影物镜，所述投影曝光装置具有用于发射波长<= 193nm的电磁辐射的初级光源。投影物镜包括物平面，第一镜面; 第二个镜子第三个镜子第四个镜子和一个图像平面。物平面，第一镜，第二镜，第三镜，第四镜和像平面以居中布置的方式排列成共同的光轴。第一，第二，第三和第四反射镜位于物平面和图像平面之间。入射到位于物平面中的物体上的所述电磁辐射的主射线在从主光源朝向图像平面中的图像的方向上远离光轴倾斜。

3. 发明申请

WO2009053023A3 IMAGING OPTICAL SYSTEM AND PROJECTION EXPOSURE APPARATUS FOR MICROLITHOGRAPHY COMPRISING AN IMAGING OPTICAL SYSTEM OF THIS TYPE 审中-公开
标题翻译：包括这种类型的成像光学系统的用于微刻的成像光学系统和投影曝光设备
公开(公告)号：WO2009053023A3
公开(公告)日：2009-07-09
申请号：PCT/EP2008008886
申请日：2008-10-21
申请人： ZEISS CARL SMT AG , MANN HANS-JUERGEN
发明人： MANN HANS-JUERGEN
IPC分类号： G02B17/06 , G03F7/20
CPC分类号： G02B17/0657 , G03F7/70233
摘要： An imaging optical system (7) with a plurality of mirrors (M1 to M10) images an object field (4) in an object plane (5) into an image field (8) in an image plane (9). In the light path between non-obscured mirrors (M1 to M8), imaging rays (15) pass through at least one multiple pass-through region between spaced-apart planes which are arranged parallel to the object plane (5) and/or parallel to the image plane (9). The imaging optical system has at least one pupil plane (76, 77, 78, 17). Said pupil plane (76, 77, 78, 17) is arranged outside the multiple pass-through region between the non- obscured mirrors (M1 to M6). This results in an imaging optical system which provides for an easier correction of image errors. Other types of imaging optical systems with a correspondingly easier correction of image errors are presented as well.
摘要翻译：具有多个反射镜（M1到M10）的成像光学系统（7）将物平面（5）中的物场（4）成像到成像平面（9）中的像场（8）中。在非遮挡反射镜（M1至M8）之间的光路中，成像光线（15）穿过平行于物平面（5）布置的间隔平面和/或平行于物平面到图像平面（9）。成像光学系统具有至少一个光瞳平面（76,77,78,17）。所述光瞳平面（76,77,78,17）布置在非遮挡反射镜（M1至M6）之间的多个通过区域之外。这导致成像光学系统更容易校正图像错误。其他类型的成像光学系统也具有相应更容易校正图像误差。

4. 发明申请

WO02056114A3 PROJECTION SYSTEM FOR EUV LITHOGRAPHY 审中-公开
标题翻译：投影系统用于EUV地图
公开(公告)号：WO02056114A3
公开(公告)日：2003-12-11
申请号：PCT/EP0200030
申请日：2002-01-04
申请人： ZEISS CARL SMT AG , MANN HANS-JUERGEN , HUDYMA RUSSELL
发明人： MANN HANS-JUERGEN , HUDYMA RUSSELL
IPC分类号： G02B17/00 , G03F7/20 , H01L21/027
CPC分类号： G02B17/0657 , G03F7/70233 , G03F7/70275 , G03F7/70308
摘要： An EUV optical projection system includes at least six mirrors (M1, M2, M3, M4, M5, M6) for imaging an object (OB) to an image (IM). At least one mirror pair is preferably configured as an at least phase compensating mirror pair. The system is preferably configured to form an intermediate image (IMI) along an optical path from the object (OB) to the image (IM) between a second mirror (M2) and a third mirror (M3), such that a first mirror (M1) and the second mirror (M2) form a first optical group (G1) and the mirror (3), a fourth mirror (M4), a fith mirror (M5) and a sith mirror (M6) form a second optical group (G1). The system also preferably includes an aperture stop (APE located along the optical path from the object (OB) to the image (IM) between the first mirror (M1) and the second mirror (M2). The second mirror (M2) is preferably convex, and the third mirror (M3) is preferably concave. The system preferably forms an image (IM) with a numerical aperture greater than 0.18.
摘要翻译： EUV光学投影系统包括用于将对象（OB）成像到图像（IM）的至少六个反射镜（M1，M2，M3，M4，M5，M6）。优选地，至少一个镜对配置为至少相位补偿镜对。该系统优选地被配置为沿着从物体（OB）到第二反射镜（M2）和第三反射镜（M3）之间的图像（IM）的光路形成中间图像（IMI），使得第一反射镜 M1），第二反射镜（M2）形成第一光学组（G1），反射镜（3），第四反射镜（M4），第二反射镜（M5）和第二反射镜（M6）形成第二光学组 G1）。该系统还优选地包括孔径光阑（APE，沿着从物体（OB）到第一反射镜（M1）和第二反射镜（M2）之间的图像（IM）的光路）定位，第二反射镜（M2）并且第三反射镜（M3）优选是凹形的，该系统优选地形成数值孔径大于0.18的图像（IM）。

5. 发明申请

WO2006111319A2 PROJECTION EXPOSURE SYSTEM, METHOD FOR MANUFACTURING A MICRO-STRUCTURED STRUCTURAL MEMBER BY THE AID OF SUCH A PROJECTION EXPOSURE SYSTEM AND POLARIZATION-OPTICAL ELEMENT ADAPTED FOR USE IN SUCH A SYSTEM 审中-公开
标题翻译：投影曝光系统，通过这种投影曝光系统的辅助制造微结构结构构件的方法和适用于这种系统的偏光光学元件
公开(公告)号：WO2006111319A2
公开(公告)日：2006-10-26
申请号：PCT/EP2006003401
申请日：2006-04-12
申请人： ZEISS CARL SMT AG , MANN HANS-JUERGEN , SINGER WOLFGANG , GRUNER TORALF , DITTMANN OLAF , TOTZECK MICHAEL
发明人： MANN HANS-JUERGEN , SINGER WOLFGANG , GRUNER TORALF , DITTMANN OLAF , TOTZECK MICHAEL
IPC分类号： G03F7/20
CPC分类号： G03F7/70566 , G03F7/70058
摘要： The invention relates to a projection exposure system, in particular for micro-lithography. The projection exposure system according to the invention comprises a light source (18) for producing light in the EUV region. The projection exposure system further comprises a first optical system (19, 20, 21, 22, 23, 24) for illuminating a mask (25) by the light of the light source (18) and a second optical system (26, 27, 28, 29, 30, 31) for imaging the mask (25) on a component (32). At least one polarization-optical element (1) is disposed on the beam path between the light source (18) and the component (32).
摘要翻译：本发明涉及一种投影曝光系统，特别涉及微光刻技术。根据本发明的投影曝光系统包括用于在EUV区域中产生光的光源（18）。投影曝光系统还包括用于通过光源（18）的光照射掩模（25）的第一光学系统（19,20,21,22,23,24）和第二光学系统（26,27,24） 28,29,30,31），用于将所述掩模（25）成像在部件（32）上。至少一个偏振光学元件（1）设置在光源（18）和部件（32）之间的光束路径上。

6. 发明申请

WO2004079753A3 REFLECTIVE OPTICAL ELEMENT AND EUV LITHOGRAPHY APPLIANCE 审中-公开
标题翻译：反射光学元件及EUV光刻设备
公开(公告)号：WO2004079753A3
公开(公告)日：2005-04-14
申请号：PCT/EP2004002014
申请日：2004-03-01
申请人： ZEISS CARL SMT AG , TRENKLER JOHANN , MANN HANS-JUERGEN , NOTHELFER UDO
发明人： TRENKLER JOHANN , MANN HANS-JUERGEN , NOTHELFER UDO
IPC分类号： G03F7/20 , G21K1/06
CPC分类号： G02B5/0891 , B82Y10/00 , G02B5/0816 , G02B5/085 , G03F7/7015 , G03F7/70916 , G03F7/70958 , G21K1/062
摘要： The invention relates to a reflective optical element and an EUV lithography appliance containing one such element, said appliance displaying a low propensity to contamination. According to the invention, the reflective optical element has a protective layer system consisting of at least one layer. The optical characteristics of the protective layer system are between those of a spacer and an absorber or correspond to those of a spacer. The selection of a material with the smallest possible imaginary part and a real part which is as close to 1 as possible in terms of the refractive index leads to a plateau-type reflectivity course according to the thickness of the protective layer system between two thicknesses d1 and d2. The thickness of the protective layer system is selected in such a way that it is less than d2.
摘要翻译：它提出了一种反射光学元件，和一个含有这种EUV光刻设备，呈现出低的倾向污染。根据本发明的一个或一个以上层的层系统上的反射型光学元件。保护层系统的光学特性是那些间隔件和吸收器或者对应于一个间隔件之间。具有小虚部尽可能和尽可能接近于实部1的折射率成两种厚度d 1和d之间的层系统的厚度的函数的材料的选择平台形状的Reflektivitätsverlauf。保护层系统的厚度被选择d2小。

7. 发明申请

WO2008113858A3 METHOD AND DEVICE FOR PRODUCING AN ELEMENT HAVING AT LEAST ONE FREEFORM SURFACE WITH HIGH DIMENSIONAL ACCURACY AND LOW SURFACE ROUGHNESS 审中-公开
标题翻译：方法和设备制作元件与至少一个自由形式表面的高形状精度和表面粗糙度低
公开(公告)号：WO2008113858A3
公开(公告)日：2009-01-22
申请号：PCT/EP2008053398
申请日：2008-03-20
申请人： ZEISS CARL SMT AG , BOEHM THURE , BURKART STEFAN , MANN HANS-JUERGEN , CHAN DANNY , MALTOR HOLGER
发明人： BOEHM THURE , BURKART STEFAN , MANN HANS-JUERGEN , CHAN DANNY , MALTOR HOLGER
IPC分类号： B24B13/00
CPC分类号： B24B13/0043 , Y10T428/24355
摘要： The present invention relates to a method for producing an element having at least one arbitrarily freely formed surface (freeform surface) with high dimensional accuracy and low surface roughness, and to an optical element having an optical freeform surface and a projection exposure system for microlithography having a corresponding optical element, wherein the freeform surface is obtained by means of at least one first processing step using a forming material processing method, in which at least an approximation of the desired freeform surface (target shape) occurs, and at least one second step using a surface-smoothing material processing method, wherein at least during a second processing step for smoothing material processing the element (1) to be processed is elastically stressed by applying a force such that the freeform surface to be smoothed can be processed using smoothing processes for spherical, planar or aspherical surfaces. The invention further relates to a corresponding device for smoothing an arbitrarily freely formed surface (freeform surface) of an element with high dimensional accuracy and low surface roughness having a holder for receiving the element to be processed and a smoothing tool for the smoothing processing of the freeform surface, wherein the receptacle has at least one actuator (6) for applying a force to the element to be processed, so that the element to be processed is elastically stressed into an intermediate shape (2''), so that the freeform surface to be smoothed can be processed by means of the smoothing tool using smoothing processes for spherical, planar or aspherical surfaces.
摘要翻译：本发明涉及一种用于具有至少一个任意地自由形成的表面（自由曲面）与形式和低的表面粗糙度的精度高以及具有用于微光刻光学自由形式表面和投射曝光系统与相应的光学元件，其中，所述自由形态的表面由光学元件产生的元件至少用模制材料处理方法，其中至少一个近似为所需的自由形式表面（目标形状）的第一加工步骤中进行，和至少一个第二步骤中，用表面平滑化，其中在平滑材料处理元件的第二处理步骤，用于至少编辑材料的加工方法获得的（1）通过的力，该自由曲面以通过平滑球形，平面，或一个进程被平滑应用弹性支撑球形表面是可编辑的。本发明还涉及一种相应的装置，用于保持待加工的构件和用于自由形式表面的平滑化处理的平滑化工具，其中所述接收至少一个致动器平滑用的保持件的形式和低的表面粗糙度的精度高的元件的任意自由曲面（自由曲面）（ 6），用于在元件上施加力，以进行处理，从而使待处理的部件（在中间形式2“）被弹性地通过平滑球形，平面，或非球面表面处理强调与平滑工具处理，使得被平滑的自由曲面是。

8. 发明申请

WO2006094729A3 MICROLITHOGRAPHY PROJECTION SYSTEM WITH AN ACCESSIBLE DIAPHRAGM OR APERTURE STOP 审中-公开
标题翻译：具有可接触的膜片或光刻胶的微型投影系统
公开(公告)号：WO2006094729A3
公开(公告)日：2006-12-28
申请号：PCT/EP2006002005
申请日：2006-03-04
申请人： ZEISS CARL SMT AG , MANN HANS-JUERGEN
发明人： MANN HANS-JUERGEN
IPC分类号： G03F7/20
CPC分类号： G03F7/70058 , G02B17/0647 , G03F7/70233 , G03F7/7025 , G03F7/70258 , G03F7/70275 , G03F7/708
摘要： The invention relates to a microlithography projection lens for wavelengths
摘要翻译：本发明涉及用于波长<= 248nm，优选<= 193mm的微光刻投影透镜，特别是用于将物平面（100）中的物体场成像到图像上的范围为1至30nm的EUV光刻在平面（102）中，微光刻投影透镜以为可进入光阑平面（2000）提供的方式展开，其中可以引入例如虹膜光阑。

9. 发明申请

WO2005069055A3 CATADIOPTRIC PROJECTION OBJECTIVE 审中-公开
标题翻译：目标投影目标
公开(公告)号：WO2005069055A3
公开(公告)日：2006-03-02
申请号：PCT/EP2005000262
申请日：2005-01-13
申请人： ZEISS CARL SMT AG , SHAFER DAVID , ULRICH WILHELM , DODOC AURELIAN , VON BUENAU RUDOLF , MANN HANS-JUERGEN , EPPLE ALEXANDER
发明人： SHAFER DAVID , ULRICH WILHELM , DODOC AURELIAN , VON BUENAU RUDOLF , MANN HANS-JUERGEN , EPPLE ALEXANDER
IPC分类号： G02B17/08 , G03F7/20 , G02B17/00
CPC分类号： G03F7/70958 , G02B13/22 , G02B17/0812 , G02B17/0892 , G03F7/70225 , G03F7/70275 , G03F7/70341 , G03F7/70966
摘要： A catadioptric projection objective (200) for imaging a pattern provided in an object plane (201) of the projection objective onto an image plane (202) of the projection objective comprises: a first objective part (210) for imaging the pattern provided in the object plane into a first intermediate image; a second objective part (220) for imaging the first intermediate imaging into a second intermediate image; a third objective part (230) for imaging the second intermediate imaging directly onto the image plane; wherein a first concave mirror (221) having a first continuous mirror surface and at least one second concave mirror (222) having a second continuous mirror surface are arranged upstream of the second intermediate image; pupil surfaces are formed between the object plane and the first intermediate image, between the first and the second intermediate image and between the second intermediate image and the image plane; and all concave mirrors are arranged optically remote from a pupil surface. The system has potential for very high numerical apertures at moderate lens material mass consumption.
摘要翻译：用于将设置在投影物镜的物平面（201）中的图案成像到投影物镜的像平面（202）上的反射折射投射物镜（200）包括：第一物镜部分（210），用于对设置在投影物镜物平面成为第一中间图像; 第二目标部分（220），用于将第一中间成像成像成第二中间图像; 用于将所述第二中间成像直接成像到所述图像平面上的第三目标部分（230）其中具有第一连续镜面的第一凹面镜（221）和具有第二连续镜面的至少一个第二凹面镜（222）布置在所述第二中间图像的上游; 瞳孔表面形成在物平面与第一中间图像之间，第一和第二中间图像之间以及第二中间图像与图像平面之间; 并且所有凹面反射镜光学地远离光瞳表面布置。该系统具有中等透镜材料质量消耗的非常高的数值孔径的潜力。

10. 发明专利

DE602006014368D1 MIKROLITHOGRAPHIE-PROJEKTIONSSYSTEM MIT EINER ZUGÄNGLICHEN MEMBRAN- ODER APERTURBLENDE 未知
公开(公告)号：DE602006014368D1
公开(公告)日：2010-07-01
申请号：DE602006014368
申请日：2006-03-04
申请人： ZEISS CARL SMT AG
发明人： MANN HANS-JUERGEN
IPC分类号： G03F7/20

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