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1. 发明申请

WO02056114A3 PROJECTION SYSTEM FOR EUV LITHOGRAPHY 审中-公开
标题翻译：投影系统用于EUV地图
公开(公告)号：WO02056114A3
公开(公告)日：2003-12-11
申请号：PCT/EP0200030
申请日：2002-01-04
申请人： ZEISS CARL SMT AG , MANN HANS-JUERGEN , HUDYMA RUSSELL
发明人： MANN HANS-JUERGEN , HUDYMA RUSSELL
IPC分类号： G02B17/00 , G03F7/20 , H01L21/027
CPC分类号： G02B17/0657 , G03F7/70233 , G03F7/70275 , G03F7/70308
摘要： An EUV optical projection system includes at least six mirrors (M1, M2, M3, M4, M5, M6) for imaging an object (OB) to an image (IM). At least one mirror pair is preferably configured as an at least phase compensating mirror pair. The system is preferably configured to form an intermediate image (IMI) along an optical path from the object (OB) to the image (IM) between a second mirror (M2) and a third mirror (M3), such that a first mirror (M1) and the second mirror (M2) form a first optical group (G1) and the mirror (3), a fourth mirror (M4), a fith mirror (M5) and a sith mirror (M6) form a second optical group (G1). The system also preferably includes an aperture stop (APE located along the optical path from the object (OB) to the image (IM) between the first mirror (M1) and the second mirror (M2). The second mirror (M2) is preferably convex, and the third mirror (M3) is preferably concave. The system preferably forms an image (IM) with a numerical aperture greater than 0.18.
摘要翻译： EUV光学投影系统包括用于将对象（OB）成像到图像（IM）的至少六个反射镜（M1，M2，M3，M4，M5，M6）。优选地，至少一个镜对配置为至少相位补偿镜对。该系统优选地被配置为沿着从物体（OB）到第二反射镜（M2）和第三反射镜（M3）之间的图像（IM）的光路形成中间图像（IMI），使得第一反射镜 M1），第二反射镜（M2）形成第一光学组（G1），反射镜（3），第四反射镜（M4），第二反射镜（M5）和第二反射镜（M6）形成第二光学组 G1）。该系统还优选地包括孔径光阑（APE，沿着从物体（OB）到第一反射镜（M1）和第二反射镜（M2）之间的图像（IM）的光路）定位，第二反射镜（M2）并且第三反射镜（M3）优选是凹形的，该系统优选地形成数值孔径大于0.18的图像（IM）。

2. 发明申请

WO03075096A2 REFRACTIVE PROJECTION LENS 审中-公开
标题翻译：折射投影物镜
公开(公告)号：WO03075096A2
公开(公告)日：2003-09-12
申请号：PCT/EP0301147
申请日：2003-02-06
申请人： ZEISS CARL SMT AG , ULRICH WILHELM , HUDYMA RUSSELL , ROSTALSKI HANS-JUERGEN
发明人： ULRICH WILHELM , HUDYMA RUSSELL , ROSTALSKI HANS-JUERGEN
IPC分类号： G02B13/24 , G02B13/14 , G02B13/18 , G03F7/20 , H01L21/027
CPC分类号： G03F7/70975 , G03F7/70241 , G03F7/70958
摘要： Disclosed is a refractive projection lens with a numerical aperture of more than 0.7, comprising a first convex form, a second convex form, and a middle that is arranged between said bodies. The first form has a maximum diameter D1 while the second form has a maximum diameter D2, and 0.8
摘要翻译：折射式投影透镜的数值孔径大于0.7，包括一第一凸起，第二腹部和设置在波腹腰部，其中所述第一腹部表示最大直径D1之间，和所述第二凸出具有最大直径，与 D2表示，并具有以下适用：0.8

3. 发明申请

WO0248796A3 PROJECTION SYSTEM FOR EUV LITHOGRAPHY 审中-公开
标题翻译：投影系统用于EUV地图
公开(公告)号：WO0248796A3
公开(公告)日：2003-01-23
申请号：PCT/EP0114301
申请日：2001-12-06
申请人： CARL ZEISS SEMICONDUCTOR MFG , MANN HANS-JUERGEN , HUDYMA RUSSELL
发明人： MANN HANS-JUERGEN , HUDYMA RUSSELL
IPC分类号： G21K1/06 , G02B17/00 , G02B17/06 , G03F7/20 , G21K5/02 , H01L21/027
CPC分类号： G03F7/70233 , G02B17/0657 , G03F7/70275
摘要： An EUV optical projection system includes at least six reflecting surfaces for imaging an object (OB) on an image (IM). The system is preferably configured to form an intermediate image (IMI) along an optical path from the object (OB) to the image (IM) between a secondary mirror (M2) and a tertiary mirror (M3), such that a primary mirror (M1) and the secondary mirror (M2) form a first optical group (G1) and the tertiary mirror (M3), a fourth mirror (M4), a fifth mirror (M5) and a sixth mirror (M6) form a second optical group (G2). The system also preferably includes an aperture stop (APE) located along the optical path from the object (OB) to the image (IM) between the primary mirror (M1) and the secondary mirror (M2). The secondary mirror (M2) is concave, and the tertiary mirror (M3) is convex. Each of the six reflecting surfaces preferably receives a chief ray (CR) from a central field point at an incidence angle of less than substantially 15 DEG .
摘要翻译： EUV光学投影系统包括用于对图像（IM）上的物体（OB）进行成像的至少六个反射表面。该系统优选地被配置成沿着从物体（OB）到次级反射镜（M2）和第三反射镜（M3）之间的图像（IM）的光路形成中间图像（IMI），使得主反射镜 M1）和副镜（M2）形成第一光学组（G1），第三反射镜（M3），第四反射镜（M4），第五反射镜（M5）和第六反射镜（M6）形成第二光学组（G2）。该系统还优选地包括沿着从物体（OB）到主镜（M1）和副镜（M2）之间的图像（IM）的光路定位的孔径光阑（APE）。副镜（M2）是凹的，第三镜（M3）是凸的。六个反射面中的每一个优选地以小于大约15°的入射角从中心场点接收主光线（CR）。

4. 发明专利

AU2003230593A8 Refractive projection objective 未知
$Refractive projection objective$
公开(公告)号：AU2003230593A8
公开(公告)日：2003-09-16
申请号：AU2003230593
申请日：2003-03-03
申请人： ZEISS CARL SMT AG
发明人： ROSTALSKI HANS-JURGEN , ULRICH WILHELM , HUDYMA RUSSELL , FREIMANN ROLF
IPC分类号： G02B13/24 , G02B13/14 , G02B13/18 , G03F7/20 , H01L21/027 , G02B9/00 , G02B3/00
摘要： Refractive projection objective with a numerical aperture greater than 0.7, consisting of a first convexity, a second convexity, and a waist arranged between the two convexities. The first convexity has a maximum diameter denoted by D1, and the second convexity has a maximum diameter denoted by D2, and 0.8

5. 发明专利

DE60206908D1 未知
公开(公告)号：DE60206908D1
公开(公告)日：2005-12-01
申请号：DE60206908
申请日：2002-01-04
申请人： ZEISS CARL SMT AG
发明人： MANN HANS-JUERGEN , HUDYMA RUSSELL
IPC分类号： G02B17/00 , G03F7/20 , H01L21/027
摘要： An EUV optical projection system includes at least six mirrors (M1, M2, M3, M4, M5, M6) for imaging an object (OB) to an image (IM). At least one mirror pair is preferably configured as an at least phase compensating mirror pair. The system is preferably configured to form an intermediate image (IMI) along an optical path from the object (OB) to the image (IM) between a second mirror (M2) and a third mirror (M3), such that a first mirror (M1) and the second mirror (M2) form a first optical group (G1) and the mirror (3), a fourth mirror (M4), a fith mirror (M5) and a sith mirror (M6) form a second optical group (G1). The system also preferably includes an aperture stop (APE located along the optical path from the object (OB) to the image (IM) between the first mirror (M1) and the second mirror (M2). The second mirror (M2) is preferably convex, and the third mirror (M3) is preferably concave. The system preferably forms an image (IM) with a numerical aperture greater than 0.18.

6. 发明专利

AU2003230593A1 REFRACTIVE PROJECTION OBJECTIVE 未知
公开(公告)号：AU2003230593A1
公开(公告)日：2003-09-16
申请号：AU2003230593
申请日：2003-03-03
申请人： ZEISS CARL SMT AG
发明人： ULRICH WILHELM , FREIMANN ROLF , HUDYMA RUSSELL , ROSTALSKI HANS-JURGEN
IPC分类号： G02B13/24 , G02B13/14 , G02B13/18 , G03F7/20 , H01L21/027
摘要： Refractive projection objective with a numerical aperture greater than 0.7, consisting of a first convexity, a second convexity, and a waist arranged between the two convexities. The first convexity has a maximum diameter denoted by D1, and the second convexity has a maximum diameter denoted by D2, and 0.8

7. 发明专利

DE60206908T2 未知
公开(公告)号：DE60206908T2
公开(公告)日：2006-07-20
申请号：DE60206908
申请日：2002-01-04
申请人： ZEISS CARL SMT AG
发明人： MANN HANS-JUERGEN , HUDYMA RUSSELL
IPC分类号： G02B17/00 , G03F7/20 , H01L21/027
摘要： An EUV optical projection system includes at least six mirrors (M1, M2, M3, M4, M5, M6) for imaging an object (OB) to an image (IM). At least one mirror pair is preferably configured as an at least phase compensating mirror pair. The system is preferably configured to form an intermediate image (IMI) along an optical path from the object (OB) to the image (IM) between a second mirror (M2) and a third mirror (M3), such that a first mirror (M1) and the second mirror (M2) form a first optical group (G1) and the mirror (3), a fourth mirror (M4), a fith mirror (M5) and a sith mirror (M6) form a second optical group (G1). The system also preferably includes an aperture stop (APE located along the optical path from the object (OB) to the image (IM) between the first mirror (M1) and the second mirror (M2). The second mirror (M2) is preferably convex, and the third mirror (M3) is preferably concave. The system preferably forms an image (IM) with a numerical aperture greater than 0.18.

8. 发明专利

AU2003210214A1 REFRACTIVE PROJECTION LENS 未知
公开(公告)号：AU2003210214A1
公开(公告)日：2003-09-16
申请号：AU2003210214
申请日：2003-02-06
申请人： ZEISS CARL SMT AG
发明人： ULRICH WILHELM , HUDYMA RUSSELL , ROSTALSKI HANS-JURGEN
IPC分类号： G02B13/24 , G02B13/14 , G02B13/18 , G03F7/20 , H01L21/027
摘要： Refractive projection objective with a numerical aperture greater than 0.7, consisting of a first convexity, a second convexity, and a waist arranged between the two convexities. The first convexity has a maximum diameter denoted by D1, and the second convexity has a maximum diameter denoted by D2, and 0.8

9. 发明申请

WO2005054949A3 LASER THIN FILM POLY-SILICON ANNEALING SYSTEM 审中-公开
标题翻译：激光薄膜多晶硅退火系统
公开(公告)号：WO2005054949A3
公开(公告)日：2005-12-15
申请号：PCT/US2004037617
申请日：2004-11-12
申请人： CYMER INC , PARTLO WILLIAM N , DAS PALASH P , HUDYMA RUSSELL , THOMAS MICHAEL
发明人： PARTLO WILLIAM N , DAS PALASH P , HUDYMA RUSSELL , THOMAS MICHAEL
IPC分类号： B23K26/06 , G03F20060101 , H01L21/20 , H01S3/081 , H01S3/22 , H01S3/223 , H01S3/225 , H01S3/23
CPC分类号： H01S3/0818 , B23K26/042 , B23K26/0622 , B23K26/0738 , B23K26/705 , H01L21/02532 , H01L21/02675 , H01S3/225 , H01S3/2255 , H01S3/2308 , H01S3/2366
摘要： A gas discharge laser crystallization apparatus and method for performing a transformation of a crystal makeup or orientation in a film on a workpiece is disclosed, which may comprise a master oscillator power amplifier MOPA or power oscillator power amplifier configured XeF laser system producing a laser output light pulse beam at a high repetition rate and high power with a pulse to pulse dose control; an optical system producing an elongated thin pulsed working beam from the laser output light pulse beam. The apparatus may further comprise the laser system is configured as a POPA laser system and further comprising: relay optics operative to direct a first output laser light pulse beam from a first laser PO unit into a second laser PA unit; and, a timing and control module timing the creation of a gas discharge in the first and second laser units within plus or minus 3 ns, to produce the a second laser output light pulse beam as an amplification of the first laser output light pulse beam. The system may comprise divergence control in the oscillator laser unit. Divergence control may comprise an unstable resonator arrangement. The system may further comprise a beam pointing control mechanism intermediate the laser and the workpiece and a beam position control mechanism intermediate the laser and the workpiece. Beam parameter metrology may provide active feedback control to the beam pointing mechanism and active feedback control to the beam position control mechanism.
摘要翻译：公开了一种气体放电激光结晶装置和方法，用于在工件上进行膜内晶体结构或取向的变换，其可包括主振荡器功率放大器MOPA或功率振荡器功率放大器配置的XeF激光系统，产生激光输出光脉冲束以高重复率和高功率以及脉冲到脉冲剂量控制; 光学系统从激光输出光脉冲束产生细长的薄脉冲工作光束。该设备可以进一步包括激光系统被配置为POPA激光系统并且还包括：中继光学器件，用于将来自第一激光PO单元的第一输出激光脉冲光束引导到第二激光PA单元中; 以及定时和控制模块，用于在第一和第二激光单元中产生正或负3ns内的气体放电，以产生作为第一激光输出光脉冲束的放大的第二激光输出光脉冲束。该系统可以包括振荡器激光器单元中的发散控制。发散控制可以包括不稳定的谐振器布置。该系统还可以包括位于激光器和工件之间的光束指向控制机构以及位于激光器和工件之间的光束位置控制机构。波束参数测量可以提供对波束指向机构的主动反馈控制和对波束位置控制机构的主动反馈控制。

10. 发明申请

WO0244786A3 CATADIOPTRIC PROJECTION SYSTEM FOR 157 NM LITHOGRAPHY 审中-公开
标题翻译： 157纳米光刻的临界投影系统
公开(公告)号：WO0244786A3
公开(公告)日：2002-08-29
申请号：PCT/EP0113851
申请日：2001-11-28
申请人： ZEISS CARL SEMICONDUCTOR MFG , HUDYMA RUSSELL
发明人： HUDYMA RUSSELL
IPC分类号： G02B13/24 , G02B17/08 , G03F7/20 , H01L21/027
CPC分类号： G02B17/0892 , G02B17/0844 , G03F7/70225 , G03F7/70275 , G03F7/70358
摘要： A photolithographic reduction projection catadioptric objective includes a first optical group G1 including an even number of at least four mirrors M1-M6; and a second at least substantially dioptric optical group G2 imageward than the first optical group G1 including a number of lenses E4-E13. The first optical group G1 provides compensative axial aberrative correction for the second optical group G2 which forms an image with a numerical aperture of at least substantially 0.65, and preferably at least 0.70 or 0.75. Six mirror examples are shown.
摘要翻译：光刻还原投影反射折射物镜包括：包括偶数个至少四个反射镜M1-M6的第一光学组G1; 以及比包括多个透镜E4-E13的第一光学组G1成像的第二至少大致屈光光学组G2。第一光学组G1为第二光学组G2提供补偿轴向像差校正，该第二光学组G2形成具有至少基本0.65，优选至少0.70或0.75的数值孔径的图像。显示了六个镜像示例。

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