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1. 发明申请

WO2011131289A1 IMAGING OPTICS, AND A PROJECTION EXPOSURE APPARATUS FOR MICROLITHOGRAPHY HAVING SUCH AN IMAGING OPTICS 审中-公开
标题翻译：成像光学，以及具有这种成像光学的微型计算机的投影曝光装置
公开(公告)号：WO2011131289A1
公开(公告)日：2011-10-27
申请号：PCT/EP2011/001671
申请日：2011-04-02
申请人： CARL ZEISS SMT GMBH , MANN, Hans-Juergen , SHAFER, David
发明人： MANN, Hans-Juergen , SHAFER, David
IPC分类号： G02B17/06 , G03F7/20
CPC分类号： G03F7/702 , G02B17/0657 , G02B17/0663 , G03F7/70233
摘要： An imaging optics (1) having a plurality of mirrors (M1-M6) that image an object field (3) in an object plane (5) into an image field (7) in an image plane (9), comprising a first partial objective (11) that images the object field onto an intermediate image (15), and a second partial objective (13) that images the intermediate image onto the image field, and that comprises a penultimate mirror (M5) in the beam path of imaging light (17) between the object field and the image field, and a last mirror (M6) in the beam path. Here, the penultimate mirror (M5) images the intermediate image onto a further intermediate image (19), and the last mirror images the further intermediate image onto the image field.
摘要翻译：一种具有将物体平面（5）中的物体场（3）成像为图像平面（9）中的图像场（7）的多个反射镜（M1-M6）的成像光学元件（1），包括第一部分将对象场成像到中间图像（15）上的目标（11）和将中间图像成像到图像场上的第二部分目标（13），并且其包括成像光束路径中的倒数第二反射镜（M5）对象场和图像场之间的光（17）和光束路径中的最后一个镜（M6）。这里，倒数第二反射镜（M5）将中间图像成像到另一个中间图像（19）上，并且最后一个镜像将另外的中间图像成像到图像场上。

2. 发明申请

WO2011073039A3 IMAGING OPTICS 审中-公开
标题翻译：成像光学
公开(公告)号：WO2011073039A3
公开(公告)日：2011-09-29
申请号：PCT/EP2010068782
申请日：2010-12-03
申请人： ZEISS CARL SMT GMBH , MANN HANS-JUERGEN , ENDRES MARTIN , SHAFER DAVID , WARM BERNDT , HERKOMMER ALOIS
发明人： MANN HANS-JUERGEN , ENDRES MARTIN , SHAFER DAVID , WARM BERNDT , HERKOMMER ALOIS
IPC分类号： G02B17/06 , G03F7/20
CPC分类号： G03F7/70233 , G02B17/0652 , G03F7/702 , G03F7/70275
摘要： An imaging optics (16) for lithographic projection exposure for guiding a bundle of imaging light (3) with a wavelength shorter than 193 nm by means of a plurality of mirrors (M1 to M6) for beam-splitter-free imaging of a reflective object (12) in an object field (4) in an object plane (5) into an image field (17) in an image plane (18), an object field point having a central ray angle (a) which is smaller than 3°. At least one of the mirrors (M1 to M6) is a near-field mirror. The result is an imaging optics which allows for high-quality imaging of a reflective object.
摘要翻译：一种用于光刻投影曝光的成像光学器件（16），用于借助多个反射镜（M1至M6）引导波长短于193nm的成像光束（3），用于反射物体的无分束器成像（5）中的物场（4）中的像场（12）转换成像平面（18）中的像场（17），具有小于3°的中心光线角度（a）的物场点。至少一个反射镜（M1至M6）是近场反射镜。其结果是成像光学器件可以对反射物体进行高质量成像。

3. 发明申请

WO2009152959A1 PROJECTION EXPOSURE APPARATUS FOR SEMICONDUCTOR LITHOGRAPHY COMPRISING A DEVICE FOR THE THERMAL MANIPULATION OF AN OPTICAL ELEMENT 审中-公开
标题翻译：包含用于光学元件的热处理的器件的半导体光刻机的投影曝光装置
公开(公告)号：WO2009152959A1
公开(公告)日：2009-12-23
申请号：PCT/EP2009/004006
申请日：2009-06-04
申请人： CARL ZEISS SMT AG , HAUF, Markus , BLEIDISTEL, Sascha , MIGURA, Sascha , MANN, Hans-Juergen , ENKISCH, Hartmut , ZELLNER, Johannes , SCHOTTNER, Michael , KRAEHMER, Daniel , TOTZECK, Michael , DODOC, Aurelian , HETZLER, Jochen , BEIERL, Helmut , ULRICH, Wilhelm
发明人： HAUF, Markus , BLEIDISTEL, Sascha , MIGURA, Sascha , MANN, Hans-Juergen , ENKISCH, Hartmut , ZELLNER, Johannes , SCHOTTNER, Michael , KRAEHMER, Daniel , TOTZECK, Michael , DODOC, Aurelian , HETZLER, Jochen , BEIERL, Helmut , ULRICH, Wilhelm
IPC分类号： G03F7/20
CPC分类号： G03F7/70891 , G03F7/70266
摘要： The invention relates to a projection exposure apparatus (16) for semiconductor lithography comprising a device for the thermal manipulation of an optical element (1,100), wherein the optical element (1,100) has a front side (2) for the reflection of electromagnetic radiation and a rear side (3,103), and wherein thermal actuators (4) for influencing the optical properties of the optical element (1,100) are present, which act on the optical element (1,100) from the rear side (3,103) thereof.
摘要翻译：本发明涉及一种用于半导体光刻的投影曝光装置（16），包括用于光学元件（1,100）的热操纵的装置，其中光学元件（1,100）具有用于反射电磁辐射的前侧（2）后侧（3,103），并且其中存在用于影响光学元件（1,100）的光学特性的热致动器（4），其从其后侧（3,103）作用在光学元件（1,100）上。

4. 发明申请

WO2004010224A2 PROJECTION OBJECTIVE FOR A PROJECTION EXPOSURE APPARATUS 审中-公开
标题翻译：投影曝光装置投影目标
公开(公告)号：WO2004010224A2
公开(公告)日：2004-01-29
申请号：PCT/EP0300485
申请日：2003-01-20
申请人： ZEISS CARL SMT AG , SINGER WOLFGANG , MANN HANS-JUERGEN , WANGLER JOHANNES , ULRICH WILHELM
发明人： SINGER WOLFGANG , MANN HANS-JUERGEN , WANGLER JOHANNES , ULRICH WILHELM
IPC分类号： G02B17/06 , G03F7/20 , G21K1/06 , G21K5/00 , G21K5/04
CPC分类号： B82Y10/00 , G02B17/0657 , G03F7/70075 , G03F7/70083 , G03F7/70108 , G03F7/70166 , G03F7/702 , G03F7/70233 , G03F7/70358 , G03F7/708 , G21K1/06 , G21K1/062
摘要： The invention concerns a projection objective for a projection exposure apparatus, said projection exposure apparatus having a primary light source for emitting electromagnetic radiation with a wavelength
摘要翻译：本发明涉及投影曝光装置的投影物镜，所述投影曝光装置具有用于发射波长<= 193nm的电磁辐射的初级光源。投影物镜包括物平面，第一镜面; 第二个镜子第三个镜子第四个镜子和一个图像平面。物平面，第一镜，第二镜，第三镜，第四镜和像平面以居中布置的方式排列成共同的光轴。第一，第二，第三和第四反射镜位于物平面和图像平面之间。入射到位于物平面中的物体上的所述电磁辐射的主射线在从主光源朝向图像平面中的图像的方向上远离光轴倾斜。

5. 发明申请

WO2007115596A1 MICROLITHOGRAPHY PROJECTION OPTICAL SYSTEM AND METHOD FOR MANUFACTURING A DEVICE 审中-公开
标题翻译：微型投影光学系统及其制造方法
公开(公告)号：WO2007115596A1
公开(公告)日：2007-10-18
申请号：PCT/EP2007/000067
申请日：2007-01-05
申请人： CARL ZEISS SMT AG , MANN, Hans-Juergen , ULRICH, Wilhelm
发明人： MANN, Hans-Juergen , ULRICH, Wilhelm
IPC分类号： G03F7/20
CPC分类号： G03F7/702 , G02B17/08 , G03F1/62 , G03F7/70058 , G03F7/70233
摘要： A catoptric microlithography projection optical system (300) comprises a plurality of reflective optical elements (310, 320, 330, 340, 350, 360) arranged to image radiation having a wavelength λ from an object field in an object plane (103) to an image field, having a size of at least 1 mm x 1 mm, in an image plane (102). This optical system has an object-image shift (OIS) of about 75 mm or less. In this case, metrology and testing can be easily implemented despite rotations of the optical system about a rotation axis.
摘要翻译：折射微光刻投影光学系统（300）包括多个反射光学元件（310,320,330,340,350,360），其被布置成对波长λ 在图像平面（102）中，从对象平面（103）中的对象场到尺寸为至少1mm×1mm的图像场。该光学系统具有约75mm或更小的物体 - 图像偏移（OIS）。在这种情况下，尽管光学系统围绕旋转轴旋转，但是可以容易地实现测量和测试。

6. 发明申请

WO2007031271A1 MICROLITHOGRAPHY PROJECTION OPTICAL SYSTEM, METHOD FOR MANUFACTURING A DEVICE AND METHOD TO DESIGN AN OPTICAL SURFACE 审中-公开
标题翻译：微型投影光学系统，制造设备的方法和设计光学表面的方法
公开(公告)号：WO2007031271A1
公开(公告)日：2007-03-22
申请号：PCT/EP2006/008869
申请日：2006-09-12
申请人： CARL ZEISS SMT AG , MANN, Hans-Juergen , ULRICH, Wilhelm , PRETORIUS, Marco
发明人： MANN, Hans-Juergen , ULRICH, Wilhelm , PRETORIUS, Marco
IPC分类号： G03F7/20
CPC分类号： G03F7/70233 , G02B13/0065 , G02B13/16 , G02B17/0621 , G02B17/0663 , G02B17/08 , G02B17/0804 , G02B21/04 , G03F7/70308
摘要： In general, in one aspect, the invention features a microlithography projection optical system (101) that includes a plurality of elements (310-360) arranged to image radiation from an object plane (103) to an image plane (102), at least one of the elements being a reflective element that has a rotationally asymmetric surface positioned in a path of the radiation. The rotationally asymmetric surface deviates from a rotationally symmetric surface by about 10 nm or more and the optical system is a microlithography projection optical system.
摘要翻译：通常，在一个方面，本发明的特征在于一种微光刻投影光学系统（101），其包括布置成将来自物平面（103）到图像平面（102）的辐射成像的多个元件（310-360），至少元件之一是具有位于辐射路径中的旋转非对称表面的反射元件。旋转对称表面偏离旋转对称表面约10nm或更大，并且光学系统是微光刻投影光学系统。

7. 发明申请

WO2012034995A3 IMAGING OPTICAL SYSTEM 审中-公开
标题翻译：成像光学系统
公开(公告)号：WO2012034995A3
公开(公告)日：2012-05-18
申请号：PCT/EP2011065823
申请日：2011-09-13
申请人： ZEISS CARL SMT GMBH , MANN HANS-JUERGEN
发明人： MANN HANS-JUERGEN
IPC分类号： G02B13/08 , G02B17/06 , G03F7/20
CPC分类号： G03F7/702 , G02B5/09 , G02B13/08 , G02B17/0663 , G02B26/0833 , G03F7/70058 , G03F7/701 , G03F7/70216 , G03F7/70233
摘要： An imaging optical system (9) for a projection exposure system has at least one anamorphically imaging optical element (M1 to M6). This allows a complete illumination of an image field in a first direction with a large object-side numerical aperture in this direction, without the extent of the reticle to be imaged having to be enlarged and without a reduction in the throughput of the projection exposure system occurring.
摘要翻译：用于投影曝光系统的成像光学系统（9）具有至少一个变形成像光学元件（M1至M6）。这允许在该方向上以大的物体侧数值孔径在第一方向上完全照射像场，而不必扩大成像的标线片的范围，并且不会降低投影曝光系统的生产量发生。

8. 发明申请

WO2010149487A3 IMAGING OPTICAL SYSTEM FOR IMAGING AN OBJECT FIELD IN AN IMAGE FIELD AND ILLUMINATION OPTICAL SYSTEM FOR ILLUMINATING AN OBJECT FIELD 审中-公开
标题翻译：用于在物体场中成像的成像光学系统和用于照射对象场的照明光学系统
公开(公告)号：WO2010149487A3
公开(公告)日：2011-02-17
申请号：PCT/EP2010057971
申请日：2010-06-08
申请人： ZEISS CARL SMT GMBH , MANN HANS-JUERGEN , ZELLNER JOHANNES , DODOC AURELIAN , PRETORIUS MARCO , MENKE CHRISTOPH , ULRICH WILHELM , ENDRES MARTIN
发明人： MANN HANS-JUERGEN , ZELLNER JOHANNES , DODOC AURELIAN , PRETORIUS MARCO , MENKE CHRISTOPH , ULRICH WILHELM , ENDRES MARTIN
IPC分类号： G02B17/06 , G02B27/09 , G03F7/20
CPC分类号： G02B17/0663 , G02B27/0905 , G03F7/70233
摘要： An imaging optical system has a plurality of mirrors, which image an object field (9) in an object plane (11) into an image field (13) in an image plane (14). A reflection face of at least one of the mirrors is configured as a free form face which cannot be described by a rotationally symmetrical function. The object field has an aspect ratio (x/y), which is greater than 1, a ratio of a minimal and a maximal transverse dimension of the object field being smaller than 0.9. In a further aspect, the object field (9) and/or the image field (13) deviate from a mirror-symmetrical field form. An illumination optical system (10) for illuminating the object field (9) has components guiding illumination light (3) which are designed to illuminate a correspondingly formed object field (9). The result is an imaging optical system, an illumination optical system and a projection exposure system equipped therewith, with which increased demands on the correction of imaging errors are taken into account over the field imaged by the imaging optical system.
摘要翻译：成像光学系统具有多个反射镜，其将物平面（11）中的物场（9）成像为图像平面（14）中的图像场（13）。至少一个反射镜的反射面构成为不能用旋转对称的功能描述的自由表面。对象字段的长宽比（x / y）大于1，对象字段的最小和最大横向维度的比值小于0.9。在另一方面，对象字段（9）和/或图像字段（13）偏离镜像对称字段形式。用于照明物场（9）的照明光学系统（10）具有引导照明光（3）的部件，其被设计成照射相应形成的物体场（9）。结果是成像光学系统，照明光学系统和配备有其的投影曝光系统，在成像光学系统成像的场上考虑对成像误差的校正的增加的需求。

9. 发明申请

WO2010034382A1 MICROLITHOGRAPHY PROJECTION EXPOSURE APPARATUS HAVING AT LEAST TWO OPERATING STATES 审中-公开
标题翻译：具有两个操作状态的微观投影曝光装置
公开(公告)号：WO2010034382A1
公开(公告)日：2010-04-01
申请号：PCT/EP2009/006113
申请日：2009-08-22
申请人： CARL ZEISS SMT AG , MANN, Hans-Juergen , KAISER, Winfried
发明人： MANN, Hans-Juergen , KAISER, Winfried
IPC分类号： G03F7/20
CPC分类号： G03F7/70475 , G03F7/70191 , G03F7/70283
摘要： The present invention relates to a microlithography projection exposure apparatus for producing microelectronic components having at least two operating states. The microlithography projection exposure apparatus comprises a reflective mask in an object plane. In the first operating state a first partial, region of the mask is illuminated by a first radiation, which has an assigned first centroid direction having a first centroid direction vector at each point of the first partial region. In the second operating state a second partial region of the mask is illuminated by a second radiation, which has an assigned second centroid direction having a second centroid direction vector at each point of the second partial region. The first and the second partial region have a common overlap region. The microlithography projection exposure apparatus is configured in such a way that at each point of at least one partial region of the overlap region the scalar triple product of the normalized first centroid direction vector, the normalized second centroid direction vector and a normalized vector that is perpendicular to the mask is less than 0.05.
摘要翻译：本发明涉及一种用于生产具有至少两个操作状态的微电子部件的微光刻投影曝光装置。微光刻投影曝光装置包括物平面内的反射掩模。在第一操作状态下，掩模的第一部分区域由第一辐射照射，第一辐射具有在第一部分区域的每个点处具有第一质心方向矢量的分配的第一质心方向。在第二操作状态下，掩模的第二部分区域被第二辐射照射，第二辐射具有在第二部分区域的每个点处具有第二质心方向矢量的分配的第二质心方向。第一和第二部分区域具有共同的重叠区域。该微光刻投影曝光装置被配置成使得在重叠区域的至少一个部分区域的每个点处，归一化的第一质心方向矢量的标量三乘积，归一化的第二质心方向矢量和垂直的归一化矢量面膜小于0.05。

10. 发明申请

WO2008113858A3 METHOD AND DEVICE FOR PRODUCING AN ELEMENT HAVING AT LEAST ONE FREEFORM SURFACE WITH HIGH DIMENSIONAL ACCURACY AND LOW SURFACE ROUGHNESS 审中-公开
标题翻译：方法和设备制作元件与至少一个自由形式表面的高形状精度和表面粗糙度低
公开(公告)号：WO2008113858A3
公开(公告)日：2009-01-22
申请号：PCT/EP2008053398
申请日：2008-03-20
申请人： ZEISS CARL SMT AG , BOEHM THURE , BURKART STEFAN , MANN HANS-JUERGEN , CHAN DANNY , MALTOR HOLGER
发明人： BOEHM THURE , BURKART STEFAN , MANN HANS-JUERGEN , CHAN DANNY , MALTOR HOLGER
IPC分类号： B24B13/00
CPC分类号： B24B13/0043 , Y10T428/24355
摘要： The present invention relates to a method for producing an element having at least one arbitrarily freely formed surface (freeform surface) with high dimensional accuracy and low surface roughness, and to an optical element having an optical freeform surface and a projection exposure system for microlithography having a corresponding optical element, wherein the freeform surface is obtained by means of at least one first processing step using a forming material processing method, in which at least an approximation of the desired freeform surface (target shape) occurs, and at least one second step using a surface-smoothing material processing method, wherein at least during a second processing step for smoothing material processing the element (1) to be processed is elastically stressed by applying a force such that the freeform surface to be smoothed can be processed using smoothing processes for spherical, planar or aspherical surfaces. The invention further relates to a corresponding device for smoothing an arbitrarily freely formed surface (freeform surface) of an element with high dimensional accuracy and low surface roughness having a holder for receiving the element to be processed and a smoothing tool for the smoothing processing of the freeform surface, wherein the receptacle has at least one actuator (6) for applying a force to the element to be processed, so that the element to be processed is elastically stressed into an intermediate shape (2''), so that the freeform surface to be smoothed can be processed by means of the smoothing tool using smoothing processes for spherical, planar or aspherical surfaces.
摘要翻译：本发明涉及一种用于具有至少一个任意地自由形成的表面（自由曲面）与形式和低的表面粗糙度的精度高以及具有用于微光刻光学自由形式表面和投射曝光系统与相应的光学元件，其中，所述自由形态的表面由光学元件产生的元件至少用模制材料处理方法，其中至少一个近似为所需的自由形式表面（目标形状）的第一加工步骤中进行，和至少一个第二步骤中，用表面平滑化，其中在平滑材料处理元件的第二处理步骤，用于至少编辑材料的加工方法获得的（1）通过的力，该自由曲面以通过平滑球形，平面，或一个进程被平滑应用弹性支撑球形表面是可编辑的。本发明还涉及一种相应的装置，用于保持待加工的构件和用于自由形式表面的平滑化处理的平滑化工具，其中所述接收至少一个致动器平滑用的保持件的形式和低的表面粗糙度的精度高的元件的任意自由曲面（自由曲面）（ 6），用于在元件上施加力，以进行处理，从而使待处理的部件（在中间形式2“）被弹性地通过平滑球形，平面，或非球面表面处理强调与平滑工具处理，使得被平滑的自由曲面是。

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