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1. 发明申请

WO2005054956A2 PROJECTION OPTICAL SYSTEM 审中-公开
标题翻译：投影光学系统
公开(公告)号：WO2005054956A2
公开(公告)日：2005-06-16
申请号：PCT/EP2004013519
申请日：2004-11-25
申请人： ZEISS CARL SMT AG , ROSTALSKI HANS-JUERGEN , DODOC AURELIAN , ULRICH WILHELM , EPPLE ALEXANDER
发明人： ROSTALSKI HANS-JUERGEN , DODOC AURELIAN , ULRICH WILHELM , EPPLE ALEXANDER
IPC分类号： G02B13/14 , G03F7/20
CPC分类号： G03F7/70241 , G02B13/143
摘要： A projection optical system comprises a plurality of lenses disposed along an optical axis of the projection optical system; wherein the plurality of lenses is dividable into four non-overlapping groups of lenses of positive and negative refractive powers, wherein the following relation (1) is fulfilled: (1) wherein: y is half a diameter in mm of a maximum image field imaged by the projection optical system, NA is a maximum numerical aperture on a side of the second object, phii is a refractive power in mm of the i lens, k is a total number of lenses of the projection optical system, and wherein V1 is greater than 0.045.
摘要翻译：投影光学系统包括沿投影光学系统的光轴设置的多个透镜; 其中所述多个透镜可分为正和负折射光焦度的四个不重叠的透镜组，其中满足以下关系式（1）：（1）其中：y是成像的最大图像场的直径的一半直径（mm）通过投影光学系统，NA是第二物体一侧的最大数值孔径，phii是第i个透镜的折射力，单位为mm -1，k是投影光学透镜的总数系统，其中V1大于0.045。

2. 发明申请

WO03075096A2 REFRACTIVE PROJECTION LENS 审中-公开
标题翻译：折射投影物镜
公开(公告)号：WO03075096A2
公开(公告)日：2003-09-12
申请号：PCT/EP0301147
申请日：2003-02-06
申请人： ZEISS CARL SMT AG , ULRICH WILHELM , HUDYMA RUSSELL , ROSTALSKI HANS-JUERGEN
发明人： ULRICH WILHELM , HUDYMA RUSSELL , ROSTALSKI HANS-JUERGEN
IPC分类号： G02B13/24 , G02B13/14 , G02B13/18 , G03F7/20 , H01L21/027
CPC分类号： G03F7/70975 , G03F7/70241 , G03F7/70958
摘要： Disclosed is a refractive projection lens with a numerical aperture of more than 0.7, comprising a first convex form, a second convex form, and a middle that is arranged between said bodies. The first form has a maximum diameter D1 while the second form has a maximum diameter D2, and 0.8
摘要翻译：折射式投影透镜的数值孔径大于0.7，包括一第一凸起，第二腹部和设置在波腹腰部，其中所述第一腹部表示最大直径D1之间，和所述第二凸出具有最大直径，与 D2表示，并具有以下适用：0.8

3. 发明专利

DE102008001719A1 未知
公开(公告)号：DE102008001719A1
公开(公告)日：2008-11-20
申请号：DE102008001719
申请日：2008-05-13
申请人： ZEISS CARL SMT AG
发明人： ROSTALSKI HANS-JUERGEN
IPC分类号： G02B17/08 , G03F7/20
摘要： A projection objective of a projection exposure apparatus for microlithography serves for imaging an object arranged in an object plane onto a light-sensitive wafer in an image plane. The projection objective has a plurality of optical elements which have at least one reflective element and at least one refractive element. The plurality of optical elements lie, in the light propagation direction of the useful light, downstream of the reflective element on a common straight optical axis. The at least one reflective element has a substrate having at least one opening through which light beams can pass. The at least one reflective element is at least partly made from a material which suppresses stray light impinging on the reflective element rearward.

4. 发明专利

DE102006022958A1 未知
公开(公告)号：DE102006022958A1
公开(公告)日：2007-11-22
申请号：DE102006022958
申请日：2006-05-11
申请人： ZEISS CARL SMT AG
发明人： ROSTALSKI HANS-JUERGEN , FELDMANN HEIKO , ULRICH WILLI
IPC分类号： G03F7/20 , G02B17/08
摘要： The system has a light source and an exposure device for reception of light and for formation of illumination radiation directed on a pattern of a mask. A catadioptric projection lens images the structure of the mask on a light-sensitive substrate using projection light and has a concave mirror (CM) arranged in an area of a pupil surface (P3) of the lens. A negative group (NG) with negative lenses (N1, N2) is arranged in a direct proximity of the mirror in a pupil close area, where the marginal ray height of the image is larger than the chief ray height in the pupil close area. An independent claim is also included for a projection exposure method for exposure of a radiation-sensitive substrate arranged in an area of an image surface of a projection lens.

5. 发明专利

DE102007043896A1 未知
公开(公告)号：DE102007043896A1
公开(公告)日：2009-04-02
申请号：DE102007043896
申请日：2007-09-14
申请人： ZEISS CARL SMT AG
发明人： ROSTALSKI HANS-JUERGEN , FELDMANN HEIKO
IPC分类号： G02B21/02 , G01M11/02 , G02B13/14 , G03F7/20

6. 发明专利

DE102008043395A1 Projection lens for use in projection exposure system, has arrangement of optical elements arranged between object and image planes, and two imaging groups with lenses made from material with small absorption and/or high heat conductivity 未知
公开(公告)号：DE102008043395A1
公开(公告)日：2009-06-10
申请号：DE102008043395
申请日：2008-11-03
申请人： ZEISS CARL SMT AG
发明人： WALD CHRISTIAN , ROSTALSKI HANS-JUERGEN , KRAEHMER DANIEL , ULRICH WILHELM
IPC分类号： G02B13/00 , G03F7/20
摘要： The lens (18) has an arrangement of optical elements arranged between an object plane (OE) and an image plane (BE), where the arrangement of optical elements is viewed from the object plane and has a dioptric imaging group of optical elements. The arrangement of optical elements has an additional dioptric imaging group of optical elements, which contains a concave mirror. One of lenses of the imaging groups is made from a material with small absorption and/or high heat conductivity, where the lenses are made of calcium fluoride. An independent claim is also included for a projection exposure system for lithography, comprising a lighting device and a projection lens.

7. 发明专利

DE602004019142D1 未知
公开(公告)号：DE602004019142D1
公开(公告)日：2009-03-05
申请号：DE602004019142
申请日：2004-11-25
申请人： ZEISS CARL SMT AG
发明人： ROSTALSKI HANS-JUERGEN , DODOC AURELIAN , ULRICH WILHELM , EPPLE ALEXANDER
IPC分类号： G03F7/20 , G02B13/14
摘要： A projection optical system comprises a plurality of lenses disposed along an optical axis of the projection optical system; wherein the plurality of lenses is dividable into four non-overlapping groups of lenses (LG1-LG4) of positive and negative refractive powers, wherein the following relation is fulfilled: 2 ‹ y ‹ NA ‹ 1 k ‹ˆ‘ i = 1 k | Õ 1 | ‰¥ V 1 wherein; y is half a diameter in mm of a maximum image field imaged by the projection optical system, NA is a maximum numerical aperture on a side of the second object, Æ i is a refractive power in mm -1 of the i th lens, k is a total number of lenses of the projection optical system, and wherein V 1 is greater than 0.045.

8. 发明专利

DE10394297D2 未知
公开(公告)号：DE10394297D2
公开(公告)日：2006-07-06
申请号：DE10394297
申请日：2003-10-22
申请人： ZEISS CARL SMT AG
发明人： DODOC AURELIAN , ULRICH WILHELM , ROSTALSKI HANS-JUERGEN
IPC分类号： G03F7/20 , G02B13/14
摘要： A projection objective suitable for immersion microlithography is designed as a single-waist system with five lens groups, and has a first lens group of negative refractive power, a second lens group of positive refractive power, a third lens group of negative refractive power, a fourth lens group of positive refractive power and a fifth lens group of positive refractive power. The fourth lens group has an entrance surface (E) that lies in the vicinity of a point of inflection of a marginal ray height between the third lens group (LG3) and the fourth lens group (LG4). No negative lens of substantial refractive power is arranged between the entrance surface and the system diaphragm (5). Embodiments of inventive projection objectives achieve a very high numerical aperture NA>1 in conjunction with a large image field and are distinguished by a compact design size. For working wavelengths below 200 nm, structural widths of substantially under 100 nm can be resolved when use is made of immersion fluids between the projection objective and substrate.

9. 发明专利

DE102007062894A1 Lithographic projection lens has optical array of optical elements between object plane and image plane, and optical array has two correction elements for correcting aberration 未知
公开(公告)号：DE102007062894A1
公开(公告)日：2008-07-24
申请号：DE102007062894
申请日：2007-12-21
申请人： ZEISS CARL SMT AG
发明人： FELDMANN HEIKO , BEDER SUSANNE , DODOC AURELIAN , EPPLE ALEXANDER , ROSTALSKI HANS-JUERGEN
IPC分类号： G02B13/14 , G02B17/08 , G03F7/20
摘要： The projection lens (10) has an optical array of optical elements between an object plane (O) and an image plane (B). The optical array has two correction elements (K1,K2) for correcting aberration, by which corrective element is arranged optically in a closed pupil plane (P) and another corrective element is arranged in an area, which is optically closed neither in a pupil plane nor in a field plane.

10. 发明专利

DE102006028242A1 Projection objective of micro-lithographic projection exposure equipment e.g. for fabrication of integrated circuits, has diffractive optical element arranged in pupil plane 未知
$Projection objective of micro-lithographic projection exposure equipment e.g. for fabrication of integrated circuits, has diffractive optical element arranged in pupil plane$
公开(公告)号：DE102006028242A1
公开(公告)日：2007-01-18
申请号：DE102006028242
申请日：2006-06-20
申请人： ZEISS CARL SMT AG
发明人： ROSTALSKI HANS-JUERGEN , FELDMANN HEIKO , EPPLE ALEXANDER
IPC分类号： G02B13/14 , G02B17/08
摘要： A projection objective (100) for displaying a mask positionable in an object plane (OP) on to a light-sensitive layer positionable in an image plane (IP) has a first pupil plane (PP1) which is the pupil plane lying nearest to the object plane of the projection objective, at least a second pupil plane (PP2) which is the pupil plane lying nearest to the image plane of the projection objective and at least one diffractive optical element (115a) arranged mainly in the first pupil plane. Independent claims are included for the following. (1) (A) A micro-lithographic projection exposure installation (2) (B) A method for micro-lithographic fabrication of micro-structured components (3) (C) A micro-structured component.

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