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    • 2. 发明授权
    • Ridge-waveguide semiconductor laser device
    • 脊波导半导体激光器件
    • US06768760B2
    • 2004-07-27
    • US10260280
    • 2002-10-01
    • Yutaka MihashiTohru TakiguchiYoshihiko Hanamaki
    • Yutaka MihashiTohru TakiguchiYoshihiko Hanamaki
    • H01S500
    • H01S5/223H01S5/12H01S5/124H01S5/209H01S5/22H01S5/2231H01S5/3211
    • A laser device includes a double hetero-structure element constructed by depositing a p-type cladding layer, a quantum well active layer, an n-type thin first cladding layer and an n-type thick second cladding layer sequentially. A ridge-waveguide is shaped between two trenches formed in the second cladding layer. The first cladding layer serves as an etching stopper while etching the second cladding layer to form the two trenches. The trenches reach to or reach in vicinity to the surface of the first cladding layer. High-resistance regions may be formed in portions of the first cladding layer directly underneath the trenches. The thin first cladding layer, suppresses leakage current and improves the temperature characteristics and the operating speed characteristics of the laser device.
    • 激光器件包括通过依次沉积p型包覆层,量子阱有源层,n型薄第一覆层和n型厚第二覆层而构成的双异质结构元件。 脊形波导形成在形成在第二覆层中的两个沟槽之间。 第一覆层在蚀刻第二覆层以形成两个沟槽时用作蚀刻停止层。 沟槽到达或到达第一包层的表面附近。 高电阻区域可以形成在第一包层的直接在沟槽下方的部分中。 薄的第一包层抑制漏电流,提高激光装置的温度特性和工作速度特性。
    • 6. 发明授权
    • Long wavelength transmitter opto-electronic integrated circuit
    • 长波长发射机光电集成电路
    • US5311046A
    • 1994-05-10
    • US757803
    • 1991-09-11
    • Yutaka Mihashi
    • Yutaka Mihashi
    • H01L21/338H01L27/15H01L29/778H01L29/812H01S5/00H01S5/026H01S5/042H01S5/062H01L33/00
    • H01S5/06203H01L27/15H01S5/0424H01S5/026
    • A long wavelength transmitter OEIC includes a transverse direction current injection type semiconductor laser and a high electron mobility transistor which are integrated on a semi-insulating substrate. The semiconductor laser includes at least an AlGaInAs lower cladding layer, a quantum well active layer and a high resistivity AlGaInAs upper cladding layer successively grown on the semi-insulating substrate, disordered regions formed in the quantum well active layer by diffusions of p type and n type dopants, and an active region sandwiched by the disordered regions. The transistor includes an operating layer and a carrier supplying layer both including AlGaInAs series material and formed on the high resistivity AlGaInAs upper cladding layer. This transistor uses the upper cladding layer as a leakage current preventing layer. This structure can be formed by only one epitaxial growth, resulting in low cost. In addition, since the above layers are successively grown on a flat substrate, photolithography processes for forming a gate of HEMT are performed on a flat surface, so that a fine gate pattern can be formed with high precision. As a result, a transmitter OEIC performing high speed modulation are produced.
    • 长波长发射器OEIC包括集成在半绝缘衬底上的横向电流注入型半导体激光器和高电子迁移率晶体管。 半导体激光器至少包括在半绝缘基板上连续生长的AlGaInAs下包层,量子阱活性层和高电阻率AlGaInAs上包层,通过p型和n型扩散形成在量子阱活性层中的无序区域 型掺杂剂和由无序区域夹持的有源区域。 该晶体管包括工作层和载流子供应层,其两者都包括AlGaInAs系列材料并形成在高电阻率AlGaInAs上覆层上。 该晶体管使用上覆层作为防漏电流层。 这种结构只能通过一个外延生长形成,导致低成本。 此外,由于上述层在平坦基板上连续生长,因此在平坦表面上进行用于形成HEMT的栅极的光刻处理,从而可以高精度地形成精细的栅极图案。 结果,产生执行高速调制的发射机OEIC。