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    • 1. 发明授权
    • Self-aligning bolt
    • 自调心螺栓
    • US6120227A
    • 2000-09-19
    • US348418
    • 1999-07-07
    • Yoshihiro MuraseYoshiyasu ItoYasuhiro Mitsui
    • Yoshihiro MuraseYoshiyasu ItoYasuhiro Mitsui
    • F16B35/00F16B35/04F16B25/00
    • F16B35/041
    • Disclosed is a bolt which has been contemplated to solve problems of prior bolts and to provide the bolt adapted to corrects its own position in a precise direction to permit normal fastening without failure such as slipping, seizure or the like even when the bolt is inserted slantingly into a mating female screw. The bolt comprises a constant diameter columnar portion having a smaller diameter than that of a bolt shank portion and formed on an end portion of the bolt shank portion, formed with normal screw threads, in a direction of insertion with a short tapered portion therebetween, and complete screw threads formed on the constant diameter columnar portion to be equal in pitch and thread groove depth to the normal screw threads on the bolt shank portion.
    • 公开了一种螺栓,其已经被设想来解决现有螺栓的问题,并且提供适于在精确方向上校正其自身位置的螺栓,以允许正常的紧固而没有诸如滑动,卡住或类似的故障,即使当螺栓被倾斜地插入 成为配合的内螺纹。 该螺栓包括直径比直径小于螺栓柄部分直径的柱状部分,并且形成在螺栓柄部分的端部上,该螺栓柄部分在其间具有短锥形部分的插入方向上形成有普通螺纹,以及 形成在恒定直径柱状部分上的完整螺纹螺纹相等,螺纹槽深度与螺栓柄部分上的普通螺纹相等。
    • 2. 发明授权
    • Opening/closing device
    • 开/关装置
    • US08713758B2
    • 2014-05-06
    • US13698095
    • 2011-05-02
    • Yasuhiro MitsuiHironobu Sayama
    • Yasuhiro MitsuiHironobu Sayama
    • E05D11/06
    • H04M1/0237G06F1/1615H04M1/0216Y10T16/544Y10T16/5448Y10T74/18944
    • An opening/closing device includes a fixed plate, a moving plate movable relative to the fixed plate, a slide plate formed having a groove, a hinge including a first shaft connected to the fixed plate, a third shaft connected to the moving plate, and a second shaft between the first and third shafts, and moves the moving plate between closed and open positions relative to the fixed plate, a slide arm including a fourth shaft connected to the moving plate and a fifth shaft connected slidably along the groove, and moves the moving plate between the closed and open positions, a link arm having one end connected to the second shaft and the other to the fifth shaft. The fifth shaft slides inside the groove as the link arm moves along with the moving of the hinge when the moving plate is moved between the closed and open positions.
    • 开闭装置包括固定板,相对于固定板可移动的移动板,形成有槽的滑动板,包括连接到固定板的第一轴的铰链,连接到移动板的第三轴,以及 在第一和第三轴之间的第二轴,并且使移动板相对于固定板在关闭和打开位置之间移动,包括连接到移动板的第四轴的滑动臂和沿着凹槽可滑动地连接的第五轴, 所述移动板在所述闭合位置和打开位置之间,连杆臂的一端连接到所述第二轴,而另一端连接到所述第五轴。 当移动板在关闭位置和打开位置之间移动时,连杆臂随着铰链的移动而移动,第五轴在凹槽内滑动。
    • 4. 发明申请
    • SLIDING DEVICE FOR ELECTRONIC APPARATUS
    • 电子设备滑动装置
    • US20130156354A1
    • 2013-06-20
    • US13818730
    • 2011-08-29
    • Yasuhiro Mitsui
    • Yasuhiro Mitsui
    • H04M1/02
    • H04M1/0235G06F1/1624H04M1/0237
    • A sliding device for an electronic apparatus includes a contact piece projecting outward in a widthwise direction from a sliding plate and a contacted part with which the contact piece is caused to come into contact when the sliding plate is caused to slide with a maximum displacement in a rear direction relative to a base plate. The contact piece includes a partially cylindrical surface and a connecting surface. The contacted part includes a contacted shape part configured to be contacted by a boundary part of the partially cylindrical surface and the connecting surface to provide the sliding plate with a rotational force to cause a front direction end portion of the sliding plate to move in the bottom direction relative to a rear direction end portion of the sliding plate, and an engaged shape part with which the partially cylindrical surface and the connecting surface are caused to engage.
    • 一种用于电子设备的滑动装置,包括从滑动板沿宽度方向向外突出的接触片和当滑动板以最大位移滑动时使接触片接触的接触部分 相对于基板的后方向。 接触件包括部分圆柱形表面和连接表面。 接触部分包括接触形状部分,其被构造成与部分圆柱形表面的边界部分和连接表面接触,以向滑动板提供旋转力,以使滑板的前方端部在底部移动 相对于滑动板的后方端部的方向,以及与部分圆筒形表面和连接表面接合的接合形状部分。
    • 6. 发明授权
    • Method and apparatus for X-ray analyses
    • X射线分析的方法和装置
    • US5877498A
    • 1999-03-02
    • US893034
    • 1997-07-15
    • Aritoshi SugimotoYoshimi SudoTokuo KureKen NinomiyaKatsuhiro KurodaTakashi NishidaHideo TodokoroYasuhiro MitsuiHiroyasu Shichi
    • Aritoshi SugimotoYoshimi SudoTokuo KureKen NinomiyaKatsuhiro KurodaTakashi NishidaHideo TodokoroYasuhiro MitsuiHiroyasu Shichi
    • G01N23/225H01J37/256
    • G01N23/2252H01J2237/2445H01J2237/2807
    • An X-ray analyzing method for inspecting opening states of fine holes comprises the steps of: irradiating a finely converged electron beam into a first fine hole, observing an X-ray emitted from the inside of said first fine hole in order to obtain an first X-ray analysis data about the residue substance existing at the bottom of said first fine hole; irradiating a finely converged electron beam into a second fine hole, observing an X-ray emitted from the inside of said second fine hole in order to obtain an second X-ray analysis data about the residue substance existing at the bottom of said second fine hole; and comparing said first X-ray analysis data with said second X-ray analysis data, forming a judgment as to whether or not a difference between said first and second analysis data is smaller than a predetermined threshold value and using an outcome of said judgment to determine the opening states of said first and second fine holes. The X-ray observations are carried out by detecting only the X-rays emitted within the angular range -.theta. to +.theta. where notation .theta. is an angle formed with a center axis of the irradiated electron beam and so defined that tan .theta. is equal to a/d whereas notations a and d are the radius and the depth of the fine holes.
    • 用于检查细孔的打开状态的X射线分析方法包括以下步骤:将精细会聚的电子束照射到第一细孔中,观察从所述第一细孔的内部发射的X射线,以获得第一细孔 关于存在于所述第一细孔底部的残留物质的X射线分析数据; 将精细会聚的电子束照射到第二细孔中,观察从所述第二细孔的内部发射的X射线,以获得关于存在于所述第二细孔底部的残留物质的第二X射线分析数据 ; 以及将所述第一X射线分析数据与所述第二X射线分析数据进行比较,形成关于所述第一和第二分析数据之间的差是否小于预定阈值的判断,并且使用所述判断结果 确定所述第一和第二细孔的打开状态。 通过仅检测在角度范围θ至+θ内发射的X射线来进行X射线观察,其中符号θ是与照射的电子束的中心轴形成的角度,并且如此定义,tanθ等于 a / d,而符号a和d是细孔的半径和深度。
    • 9. 发明授权
    • Atmospheric pressure ionization mass spectrometer
    • 大气压电离质谱仪
    • US5485016A
    • 1996-01-16
    • US231847
    • 1994-04-25
    • Takashi IrieYasuhiro MitsuiKazuaki MizokamiKatsumi Kuriyama
    • Takashi IrieYasuhiro MitsuiKazuaki MizokamiKatsumi Kuriyama
    • G01N27/62H01J49/04H01J49/10H01J49/26
    • H01J49/168H01J49/0422H01J49/145
    • A mass spectrometer for analyzing trace impurities on a level between ppt and ppb contained in silicon material gas such as monosilane gas. The mass spectrometer includes an ion formation region, reaction region, and mass analysis region. Ion formation gas is introduced into the ion formation region and sample gas (silicon material gas) is introduced into the reaction region. The ion formation region ionizes ion formation gas by an ionizer and forms primary ions. When the pressure of ion formation gas is made higher than the pressure of sample gas, the ion formation gas flows into the reaction region from the ion formation region together with primary ions and is mixed with the sample gas. In the reaction region, an ion-molecule reaction is produced between the primary ions and trace impurities contained in the sample gas and the trace impurities contained in the sample gas are ionized. The ion intensity of trace impunities, the concentration of trace impurities in the sample gas is determined using a calibration curve. When the gas pressure in the reaction region is kept at almost 1 atmosphere, the reaction is promoted and when the ion-molecule reaction time is optimized according to the size of the reaction region and the voltage condition, impurities on a level between ppt and ppb can be detected and determined.
    • 用于分析硅材料气体(如硅烷气体)中含有的ppt和ppb之间的痕量杂质的质谱仪。 质谱仪包括离子形成区域,反应区域和质量分析区域。 将离子形成气体引入离子形成区域,并将样品气体(硅材料气体)引入反应区域。 离子形成区域通过离子发生器离子化形成气体并形成初级离子。 当离子形成气体的压力高于样品气体的压力时,离子形成气体与一次离子一起从离子形成区域流入反应区域,并与样品气体混合。 在反应区域中,在原料离子和样品气体中含有的微量杂质之间产生离子分子反应,并将样品气体中所含的痕量杂质离子化。 使用校准曲线确定痕量缺陷的离子强度,样品气体中微量杂质的浓度。 当反应区域的气体压力保持在大致1气道时,促进反应,当根据反应区域的大小和电压条件优化离子分子反应时间时,ppt与ppb之间的杂质 可以被检测和确定。