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1. 发明授权

US6158384A Plasma reactor with multiple small internal inductive antennas 失效
标题翻译：具有多个小型内部电感天线的等离子体电抗器
公开(公告)号：US6158384A
公开(公告)日：2000-12-12
申请号：US336642
申请日：1999-06-18
申请人： Yan Ye , Allan D'Ambra , Yeuk-Fai Edwin Mok , Richard E. Remmington , James E. Sammons, III
发明人： Yan Ye , Allan D'Ambra , Yeuk-Fai Edwin Mok , Richard E. Remmington , James E. Sammons, III
IPC分类号： H05H1/46 , C23C16/507 , H01J37/32 , H01L21/302 , C23C16/00 , H05H1/00
CPC分类号： H01J37/321 , H01J37/32477
摘要： The present invention employs a plurality of small inductive antennas to generate a processing plasma. In one embodiment, small coil antennas are secured within the chamber so that both of the pole regions of the antennas couple power to the plasma. The antennas may be oriented so that poles regions are anywhere from perpendicular, to parallel to a chamber wall. The number, location, and orientation of the small antennas within the chamber may be selected to optimize plasma characteristics. In addition, the antennas may be secured to top, side, or bottom walls to improve plasma characteristics; and power deposition within the processing chamber may be adjusted by changing the orientation of the coils, and the magnitude and phase relationship of RF power through the individual antennas. Process gas may be selectively delivered to areas of high power deposition such as adjacent pole regions or through the center of a coil or loop antenna to control plasma characteristics. In a preferred embodiment, the antennas are formed of a conductor surrounded by a non-sputtering, electrically insulating, thermally conductive jacket coupled to an electrically conductive chamber wall. The exposed surface of the jacket may be segmented to reduce eddy currents in conductive deposits.
摘要翻译：本发明采用多个小型电感天线来产生处理等离子体。在一个实施例中，小型线圈天线被固定在腔室内，使得天线的两个极区将功率耦合到等离子体。天线可以被定向成使得极区域从垂直方向到平行于室壁的任何地方。可以选择腔室内的小天线的数量，位置和取向以优化等离子体特性。此外，天线可固定到顶壁，侧壁或底壁以改善等离子体特性; 并且可以通过改变线圈的取向以及通过各个天线的RF功率的幅度和相位关系来调整处理室内的功率沉积。工艺气体可以选择性地输送到高功率沉积的区域，例如相邻的极区域或通过线圈或环形天线的中心来控制等离子体特性。在优选实施例中，天线由与由导电室壁连接的非溅射电绝缘导热套围绕的导体形成。夹套的暴露表面可以被分段以减少导电沉积物中的涡流。

2. 发明授权

US06178920B2 Plasma reactor with internal inductive antenna capable of generating helicon wave 失效
标题翻译：具有能够产生螺旋波的内部感应天线的等离子体反应器
公开(公告)号：US06178920B2
公开(公告)日：2001-01-30
申请号：US09336512
申请日：1999-06-18
申请人： Yan Ye , Allan D'Ambra , Yeuk-Fai Edwin Mok , Richard E. Remington , James E. Sammons, III
发明人： Yan Ye , Allan D'Ambra , Yeuk-Fai Edwin Mok , Richard E. Remington , James E. Sammons, III
IPC分类号： C23C1600
CPC分类号： H01J37/3211 , H01J37/321 , H01J37/32477
摘要： The present invention employs an internal inductive antenna capable of generating a helicon wave for generating a plasma. One embodiment of the present invention employs loop type antenna secured within a bell shaped portion of the chamber. Another embodiment employs a flat coil type antenna secured within the chamber. In the preferred embodiments, the internal antenna of the present invention is constructed to prevent sputtering of the antenna. The antenna may be formed of a non-sputtering conductive material, or may formed a conductive material surrounded, completely or partially, by a non-sputtering jacket. In one embodiment, the non-sputtering jacket may be coupled to the chamber wall so that heat generated by the antenna is transferred between the jacket and the chamber wall by conduction. Preferably, the non-sputtering jacket is formed of a material that also is electrically insulative with the surface of the antenna exposed to plasma being segmented to inhibit eddy current in conductive deposits. The gaps separate the exposed surface of the antennas so that conductive deposits are inhibited from electrically joining the separated surfaces, while inhibiting plasma generation within the gaps. A portion or all of the chamber wall may be constructed of electrically and thermally conductive material.
摘要翻译：本发明采用能够产生用于产生等离子体的螺旋波的内部感应天线。本发明的一个实施例采用固定在腔室的钟形部分内的环形天线。另一实施例采用固定在腔室内的扁平线圈型天线。在优选实施例中，本发明的内部天线被构造成防止天线的溅射。天线可以由非溅射导电材料形成，或者可以形成由非溅射护套完全或部分地包围的导电材料。在一个实施例中，非溅射护套可以耦合到室壁，使得由天线产生的热量通过传导在护套和腔室壁之间传递。优选地，非溅射护套由与绝缘等离子体的天线表面电绝缘的材料形成，以阻止导电沉积物中的涡流。间隙分开天线的暴露表面，使得阻止导电沉积物电连接分离的表面，同时抑制间隙内的等离子体产生。室壁的一部分或全部可以由导电和导热材料构成。

3. 发明授权

US07777152B2 High AC current high RF power AC-RF decoupling filter for plasma reactor heated electrostatic chuck 有权
标题翻译：高AC电流高RF功率AC-RF去耦滤波器用于等离子体反应器加热静电卡盘
公开(公告)号：US07777152B2
公开(公告)日：2010-08-17
申请号：US11671927
申请日：2007-02-06
申请人： Valentin N. Todorov , Michael D. Willwerth , Alexander Paterson , Brian K. Hatcher , James E. Sammons, III , John P. Holland
发明人： Valentin N. Todorov , Michael D. Willwerth , Alexander Paterson , Brian K. Hatcher , James E. Sammons, III , John P. Holland
IPC分类号： B23K9/02 , H01P5/08 , C23C16/00
CPC分类号： H05H1/46 , H01J37/32706 , H03H1/0007
摘要： An RF blocking filter isolates a two-phase AC power supply from at least 2 kV p-p of power of an HF frequency that is reactively coupled to a resistive heating element, while conducting several kW of 60 Hz AC power from the two-phase AC power supply to the resistive heating element without overheating, the two-phase AC power supply having a pair of terminals and the resistive heating element having a pair of terminals. The filter includes a pair of cylindrical non-conductive envelopes each having an interior diameter between about one and two inches and respective pluralities of fused iron powder toroids of magnetic permeability on the order of about 10 stacked coaxially within respective ones of the pair of cylindrical envelopes, the exterior diameter of the toroids being about the same as the interior diameter of each of the envelopes. A pair of wire conductors of diameter between 3 mm and 3.5 mm are helically wound around corresponding ones of the pair of envelopes to form respective inductor windings in the range of about 16 to 24 turns for each the envelope, each of the conductors having an input end and an output end. The input end of each one of the conductors is coupled to a corresponding one of the pair of terminals of the two-phase AC power supply, and the output end of each one of the conductors is coupled to a corresponding one of the pair of terminals of the resistive heating element.
摘要翻译： RF阻断滤波器将两相交流电源从反应耦合到电阻加热元件的HF频率的至少2kV pp的功率隔离，同时从两相交流电源进行几kW的60Hz AC电力供给电阻加热元件而不会过热，两相交流电源具有一对端子和电阻加热元件具有一对端子。该过滤器包括一对圆柱形非导电封套，每一个内径均在约一英寸至两英寸之间，并且相应的多个约10层的磁导率的熔融铁粉末环形环共轴同心地位于一对圆柱形封套中环形线圈的外径与每个信封的内径大致相同。直径在3毫米与3.5毫米之间的一对电线导体螺旋缠绕在一对信封的相应的一对信封上，以形成每个封套约16至24匝范围的相应的电感绕组，每个导体具有一个输入结束和输出结束。每个导体的输入端耦合到两相交流电源的一对端子中的对应的一个，并且每一个导体的输出端耦合到该对端子中相应的一个端子的电阻加热元件。

4. 发明授权

US5856906A Backside gas quick dump apparatus for a semiconductor wafer processing system 失效
标题翻译：用于半导体晶片处理系统的背面气体快速倾倒装置
公开(公告)号：US5856906A
公开(公告)日：1999-01-05
申请号：US854509
申请日：1997-05-12
申请人： Arnold Kholodenko , Maya Shendon , Gary Hsueh , James E. Sammons, III
发明人： Arnold Kholodenko , Maya Shendon , Gary Hsueh , James E. Sammons, III
IPC分类号： H01L21/00 , H01L21/683 , H02N13/00
CPC分类号： H01L21/67109 , H01L21/6831 , H02N13/00 , Y10T279/23
摘要： Apparatus for retaining a workpiece in a semiconductor wafer processing system. The apparatus has a collector positioned between an electrostatic chuck pedestal and the floor of the processing chamber. The collector has inlet and exhaust control valves connected to inlet and exhaust ports for providing and expelling a backside heat transfer gas (e.g., Helium). Heat transfer exhaust cavities in the collector are connected to the exhaust port to rapidly draw the gas off the backside of the wafer. Additionally, control of the heat transfer gas layer uniformity during processing is achieved by opening and closing the valves to the inlet and exhaust ports as required.
摘要翻译：用于将工件保持在半导体晶片处理系统中的装置。该设备具有位于静电吸盘基座和处理室底板之间的收集器。收集器具有连接到入口和排气口的入口和排气控制阀，用于提供和排出背面传热气体（例如氦气）。收集器中的传热排气腔连接到排气口，以将气体从晶片的背面快速吸出。此外，通过根据需要打开和关闭入口和排气口的阀门来实现加工过程中传热气体层的均匀性的控制。

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