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1. 发明授权

US06558559B1 Method of manufacturing micromechanical surface structures by vapor-phase etching 失效
标题翻译：通过气相蚀刻制造微机械表面结构的方法
公开(公告)号：US06558559B1
公开(公告)日：2003-05-06
申请号：US09019011
申请日：1998-02-05
申请人： Volker Becker , Franz Laermer , Michael Offenberg , Andrea Schilp
发明人： Volker Becker , Franz Laermer , Michael Offenberg , Andrea Schilp
IPC分类号： C23F100
CPC分类号： B81C1/00
摘要： A method of sacrificial layer etching of micromechanical surface structures, in which a sacrificial layer is deposited on a heatable silicon substrate and is structured. A temperature difference between the substrate and the vapor phase of an etching medium is established in such a way that exposed metal contacts made of aluminum alloys are not attacked at the same time and are not subsequently exposed to any risk of corrosion.
摘要翻译：一种牺牲层蚀刻微机械表面结构的方法，其中牺牲层沉积在可加热的硅衬底上并被构造。蚀刻介质的衬底和气相之间的温度差异以这样的方式建立，使得由铝合金制成的暴露的金属触点不会同时受到冲击，并且不会随后暴露于任何腐蚀的风险。

2. 发明授权

US06214243B1 Process for producing a speed of rotation coriolis sensor 有权
标题翻译：生产旋转速度科里奥利传感器的方法
公开(公告)号：US06214243B1
公开(公告)日：2001-04-10
申请号：US09051878
申请日：1998-10-20
申请人： Horst Muenzel , Franz Laermer , Michael Offenberg , Andrea Schilp , Markus Lutz
发明人： Horst Muenzel , Franz Laermer , Michael Offenberg , Andrea Schilp , Markus Lutz
IPC分类号： B81B702
CPC分类号： G01C19/5747 , B81B3/0051 , B81B2201/0242 , B81B2203/058 , G01C19/5769
摘要： A process for the manufacture of a Coriolis rate-of-rotation sensor with oscillatory support masses spring-suspended on a substrate as well as driving means for the excitation of the planar oscillation of the oscillating masses and evaluation means for the determination of a Coriolis acceleration. Oscillating masses, driving means and integrated stops are structured in a common operation by means of plasma etching from a silicon-on-insulator (SOI) wafer.
摘要翻译：用于制造具有弹簧悬浮在基板上的振荡支撑质量的科里奥利旋转速度传感器的方法以及用于激发振荡块的平面振荡的驱动装置和用于确定科里奥利加速度的评估装置。通过从绝缘体上硅（SOI）晶片进行等离子体蚀刻，振荡质量，驱动装置和集成止动器通过共同的操作构成。

3. 发明授权

US6030850A Method for manufacturing a sensor 失效
标题翻译：制造传感器的方法
公开(公告)号：US6030850A
公开(公告)日：2000-02-29
申请号：US030414
申请日：1998-02-25
申请人： Juergen Kurle , Karsten Funk , Franz Laermer , Michael Offenberg , Andrea Schilp
发明人： Juergen Kurle , Karsten Funk , Franz Laermer , Michael Offenberg , Andrea Schilp
IPC分类号： G01L1/18 , B81B3/00 , B81C1/00 , G01P15/08 , G01P15/125 , H01L29/84 , G01L1/00 , H01L21/461
CPC分类号： B81B7/007 , B81C1/0019 , G01P15/0802 , G01P15/125 , B81B2201/0235 , B81B2203/033 , B81C2201/0136 , B81C2203/0118 , G01P2015/0814
摘要： In a sensor and a method for manufacturing a sensor, a movable element is patterned out of a silicon layer and is secured to a substrate. The conducting layer is subdivided into various regions, which are electrically insulated from one another. The electrical connection between the various regions of the silicon layer is established by a conducting layer, which is arranged between a first and a second insulating layer.
摘要翻译：在传感器和制造传感器的方法中，可移动元件被图案化为硅层并固定到基底。导电层被细分成彼此电绝缘的各个区域。通过布置在第一和第二绝缘层之间的导电层来建立硅层的各个区域之间的电连接。

4. 发明授权

US5756901A Sensor and method for manufacturing a sensor 失效
标题翻译：用于制造传感器的传感器和方法
公开(公告)号：US5756901A
公开(公告)日：1998-05-26
申请号：US718603
申请日：1996-09-24
申请人： Juergen Kurle , Karsten Funk , Franz Laermer , Michael Offenberg , Andrea Schilp
发明人： Juergen Kurle , Karsten Funk , Franz Laermer , Michael Offenberg , Andrea Schilp
IPC分类号： G01L1/18 , B81B3/00 , B81C1/00 , G01P15/08 , G01P15/125 , H01L29/84 , G01L1/00
CPC分类号： B81B7/007 , B81C1/0019 , G01P15/0802 , G01P15/125 , B81B2201/0235 , B81B2203/033 , B81C2201/0136 , B81C2203/0118 , G01P2015/0814
摘要： In a sensor and a method for manufacturing a sensor, a movable element is patterned out of a silicon layer and is secured to a substrate. The conducting layer is subdivided into various regions, which are electrically insulated from one another. The electrical connection between the various regions of the silicon layer is established by a conducting layer, which is arranged between a first and a second insulating layer.
摘要翻译：在传感器和制造传感器的方法中，可移动元件被图案化为硅层并固定到基底。导电层被细分成彼此电绝缘的各个区域。通过布置在第一和第二绝缘层之间的导电层来建立硅层的各个区域之间的电连接。

5. 发明授权

US5542558A Method for manufacturing micro-mechanical components using selective anodization of silicon 失效
标题翻译：使用硅的选择性阳极氧化制造微机械部件的方法
公开(公告)号：US5542558A
公开(公告)日：1996-08-06
申请号：US308245
申请日：1994-09-19
申请人： Gerhard Benz , Jiri Marek , Martin Willmann , Frank Bantien , Horst Muenzel , Franz Laermer , Michael Offenberg , Andrea Schilp
发明人： Gerhard Benz , Jiri Marek , Martin Willmann , Frank Bantien , Horst Muenzel , Franz Laermer , Michael Offenberg , Andrea Schilp
IPC分类号： H01L29/84 , F16C11/06 , F16C23/04 , F16C33/10 , G01P15/08 , H01L21/3063 , H01L21/316 , H01L21/306
CPC分类号： G01P15/0802 , Y10S438/96
摘要： A method for manufacturing micro-mechanical components in which a structure is produced on a silicon layer, which is to be undercut in a further step. The silicon is selectively anodized for this undercutting operation. Thus, the method enables the manufacturing of micro-mechanical components that can be integrated together with bipolar circuit elements.
摘要翻译：一种制造微机械部件的方法，其中在另一步骤中将被切削的硅层上产生结构。对于该底切操作，硅被选择性地阳极氧化。因此，该方法能够制造可与双极电路元件集成在一起的微机械部件。

6. 发明授权

US5616523A Method of manufacturing sensor 失效
标题翻译：制造传感器的方法
公开(公告)号：US5616523A
公开(公告)日：1997-04-01
申请号：US627819
申请日：1996-04-02
申请人： Gerhard Benz , Jiri Marek , Frank Bantien , Horst Muenzel , Franz Laermer , Michael Offenberg , Andrea Schilp
发明人： Gerhard Benz , Jiri Marek , Frank Bantien , Horst Muenzel , Franz Laermer , Michael Offenberg , Andrea Schilp
IPC分类号： H01L21/306 , G01P15/08 , G01P15/125 , H01L29/84
CPC分类号： G01P15/125 , G01P15/0802 , G01P2015/0817 , G01P2015/0828
摘要： A method for manufacturing sensors from a multilayer plate with upper and lower monocrystalline silicon layers and an etching layer between them. The upper silicon layer is structured by the introduction of troughs therein extending down to the etching layer. Sensor structures, such as a bending beam that is used in an acceleration sensor, are created by etching the etching layer beneath a part of the silicon layer structured in this manner.
摘要翻译：一种从具有上，下单晶硅层的多层板和它们之间的蚀刻层制造传感器的方法。上硅层通过引入其中向下延伸到蚀刻层的槽而构成。传感器结构，例如用于加速度传感器中的弯曲梁，通过蚀刻以这种方式构造的硅层的一部分下方的蚀刻层来产生。

7. 发明授权

US06268232B1 Method for fabricating a micromechanical component 有权
标题翻译：微机械部件的制造方法
公开(公告)号：US06268232B1
公开(公告)日：2001-07-31
申请号：US09302224
申请日：1999-04-29
申请人： Helmut Skapa , Horst Muenzel , Franz Laermer , Michael Offenberg , Heinz-Georg Vossenberg
发明人： Helmut Skapa , Horst Muenzel , Franz Laermer , Michael Offenberg , Heinz-Georg Vossenberg
IPC分类号： H01L2100
CPC分类号： G01P15/0802 , B81B2201/0235 , B81C1/00571 , B81C2201/0109 , B81C2201/014 , B81C2201/056 , B81C2203/0109 , G01P1/023
摘要： A method for fabricating a micromechanical component, in particular a surface-micromechanical acceleration sensor, involves preparing a substrate and providing an insulation layer on the substrate, in which a patterned circuit trace layer is buried. A conductive layer, including a first region and a second region, is provided on the insulation layer, and a movable element is configured in the first region by forming a first plurality of trenches and by using an etching agent to remove at least one portion of the insulation layer from underneath the conductive layer. A contact element is formed and electrically connected to the circuit trace layer in the second region by configuring a second plurality of trenches, and the resultant movable element is encapsulated in the first region. The second plurality of trenches for forming the contact element in the second region is first formed after the encapsulation of the movable element formed in the first region.
摘要翻译：用于制造微机械部件，特别是表面微机械加速度传感器的方法涉及准备衬底并在衬底上提供绝缘层，其中掩埋有图案化的电路迹线层。包括第一区域和第二区域的导电层设置在绝缘层上，并且可移动元件通过形成第一多个沟槽而被构造在第一区域中，并且通过使用蚀刻剂去除至少一部分绝缘层从导电层下面。通过构造第二多个沟槽，形成接触元件并在第二区域中电连接到电路迹线层，并且所得到的可移动元件被封装在第一区域中。在第二区域中形成接触元件的第二多个沟槽首先在形成在第一区域中的可移动元件的封装之后形成。

8. 发明授权

US6117701A Method for manufacturing a rate-of-rotation sensor 失效
标题翻译：旋转传感器的制造方法
公开(公告)号：US6117701A
公开(公告)日：2000-09-12
申请号：US907601
申请日：1997-08-08
申请人： Nicholas Buchan , Horst Muenzel , Franz Laermer , Michael Offenberg , Udo Bischof , Markus Lutz
发明人： Nicholas Buchan , Horst Muenzel , Franz Laermer , Michael Offenberg , Udo Bischof , Markus Lutz
IPC分类号： G01C19/56 , G01C19/5755 , G01C19/5769 , G01P15/08 , H01L29/84 , H01L41/08 , H01L21/00 , G01P15/00
CPC分类号： G01C19/5755 , G01C19/5769 , G01P15/0802 , G01P2015/0814
摘要： A rate-of-rotation sensor includes a three-layer system. The rate-of-rotation sensor and the conductor traces are patterned out of the third layer. The conductor traces are electrically insulated (isolated) by cutouts from other regions of the third layer and by a second electrically insulating layer from a first layer. Thus, a simple electrical contacting (configuration) is achieved that is patterned out of a three-layer system. Since the same etching process is used for the first and the third layer, an especially efficient manufacturing is possible.
摘要翻译：旋转速度传感器包括三层系统。转速传感器和导体迹线从第三层图案化。导体迹线通过从第三层的其它区域的切口和与第一层的第二电绝缘层的切口电绝缘（隔离）。因此，实现了由三层系统构图的简单的电接触（构造）。由于在第一和第三层使用相同的蚀刻工艺，所以可以进行特别有效的制造。

9. 发明授权

US07259436B2 Micromechanical component and corresponding production method 有权
标题翻译：微机械部件及相应的生产方式
公开(公告)号：US07259436B2
公开(公告)日：2007-08-21
申请号：US10018180
申请日：2001-03-22
申请人： Michael Offenberg , Markus Lutz
发明人： Michael Offenberg , Markus Lutz
IPC分类号： H01L29/76 , H01L29/94 , C30B23/00 , C30B25/00
CPC分类号： B81C1/00246 , B81C2203/0735
摘要： A micromechanical component includes: a substrate; a micromechanical functional plane provided on the substrate; a covering plane provided on the micromechanical functional plane; and a printed circuit trace plane provided on the covering plane. The covering plane includes a monocrystalline region which is epitaxially grown on an underlying monocrystalline region, and the covering plane includes a polycrystalline region which is epitaxially grown on an underlying polycrystalline starting layer at the same time.
摘要翻译：微机械部件包括：基板; 设置在基板上的微机械功能平面; 设置在微机械功能平面上的覆盖平面; 以及设置在覆盖平面上的印刷电路迹线平面。覆盖平面包括在下面的单晶区域外延生长的单晶区域，并且覆盖平面包括同时在下面的多晶起始层上外延生长的多晶区域。

10. 发明授权

US06187607B1 Manufacturing method for micromechanical component 有权
标题翻译：微机械部件的制造方法
公开(公告)号：US06187607B1
公开(公告)日：2001-02-13
申请号：US09292282
申请日：1999-04-15
申请人： Michael Offenberg , Udo Bischof , Markus Lutz
发明人： Michael Offenberg , Udo Bischof , Markus Lutz
IPC分类号： H01L21302
CPC分类号： G01C19/5769 , B81B2201/025 , B81B2203/0136 , B81C1/00571 , B81C2201/014 , B81C2201/053
摘要： A manufacturing method for a micromechanical component, and in particular for a micromechanical rotation rate sensor, which has a supporting first layer, an insulating second layer that is arranged on the first layer, and a conductive third layer that is arranged on the second layer. The method includes the following steps: provide the second layer, in the form of patterned first and second insulation regions, on the first layer; provide a first protective layer on an edge region of the first insulation regions and on a corresponding boundary region of the first layer; provide the third layer on the structure resulting from the previous steps; pattern out a structure of conductor paths running on the first insulation regions, and a functional structure of the micromechanical component above the second insulation regions, from the third layer; and remove the second layer in the second insulation regions, the second layer being protected in the first insulation regions by the first protective layer in such a way that it is essentially not removed there.
摘要翻译：具有支撑第一层，布置在第一层上的绝缘第二层和布置在第二层上的导电第三层的微机械组件的制造方法，特别是用于微机械转速传感器的制造方法。该方法包括以下步骤：在第一层上提供呈图案化的第一和第二绝缘区域的形式的第二层; 在所述第一绝缘区域的边缘区域和所述第一层的对应边界区域上提供第一保护层; 提供由上述步骤导致的结构上的第三层; 形成在第一绝缘区域上运行的导体路径的结构以及来自第三层的第二绝缘区域上方的微机械部件的功能结构; 并且在所述第二绝缘区域中移除所述第二层，所述第二层在所述第一绝缘区域中被所述第一保护层保护，使得其基本上不被去除。

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