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1. 发明授权

US06607674B2 Method of repairing a phase shifting mask 有权
公开(公告)号：US06607674B2
公开(公告)日：2003-08-19
申请号：US09726459
申请日：2000-11-30
申请人： Ching-Yu Chang
发明人： Ching-Yu Chang
IPC分类号： B81B702
CPC分类号： C03C17/3649 , C03C17/3435 , C03C17/36 , C03C17/3665 , C03C2218/33 , G03F1/32 , G03F1/72
摘要： A phase shifting mask repair process is described. The process uses an etching gas or a hydrofluoric acid solution to etch the quartz substrate and the characteristics of the phase shifter layer being only slightly etched when clean with a NH3/H2O2/H2O2 solution to calculate and adjust the respective processing time accordingly. As a result, the phase difference between the quartz substrate and the MoSiON phase shifter layer stays relatively the same before and after the repair process.

2. 发明授权

US06777629B2 Micro electro-mechanical system with one or more moving parts method and apparatus 失效
标题翻译：具有一个或多个移动部件的微机电系统方法和装置
公开(公告)号：US06777629B2
公开(公告)日：2004-08-17
申请号：US10156780
申请日：2002-05-08
申请人： Spencer A. Lane , Krishna Jonnalagadda , Manes Eliacin
发明人： Spencer A. Lane , Krishna Jonnalagadda , Manes Eliacin
IPC分类号： B81B702
CPC分类号： B81C1/00182 , B81B2201/045 , B81B2203/0315 , B81C2201/0108 , B81C2203/0136 , H01H59/0009 , H01H2001/0073
摘要： A meso-scale MEMS device having a movable member (51) is formed using standard printed wiring board and high density interconnect technologies and practices. In one embodiment, sacrificial material disposed about the movable member (51) is removed through openings (101, 102) as formed through a cover (91) to form a cavity (121) that retains and limits the freedom of movement of the movable member (51). The movable member can support a reflective surface (224) to thereby provide a mechanism that will support a projection display and/or image scanner (such as a bar code scanner).
摘要翻译：使用标准印刷线路板和高密度互连技术和实践形成具有可移动部件（51）的中尺度MEMS器件。在一个实施例中，围绕可移动构件（51）设置的牺牲材料通过通过盖（91）形成的开口（101,102）去除以形成空腔（121），其保持并限制可移动构件（51）。可移动构件可以支撑反射表面（224），从而提供将支撑投影显示和/或图像扫描器（例如条形码扫描器）的机构。

3. 发明授权

US06438010B1 Drive circuits for microelectromechanical systems devices 有权
标题翻译：微机电系统装置的驱动电路
公开(公告)号：US06438010B1
公开(公告)日：2002-08-20
申请号：US09814063
申请日：2001-03-22
申请人： John S. Pease
发明人： John S. Pease
IPC分类号： B81B702
CPC分类号： H02M7/48 , H02M3/28 , H02M2001/007
摘要： Circuitry for generating AC signals is provided. The circuitry may be used to produce AC drive signals for microelectromechanical systems (MEMS) devices such as MEMS devices used in fiber-optic communications network equipment. The circuitry may include an amplitude controller for producing a DC voltage, a waveform generator for producing an AC waveform having an amplitude proportional to the DC voltage, and a transformer for boosting the AC waveform to produce the AC drive signals.
摘要翻译：提供了产生交流信号的电路。电路可以用于产生用于微机电系统（MEMS）装置的交流驱动信号，例如在光纤通信网络设备中使用的MEMS装置。电路可以包括用于产生DC电压的振幅控制器，用于产生具有与DC电压成比例的振幅的AC波形的波形发生器，以及用于升压AC波形以产生AC驱动信号的变压器。

4. 发明授权

US06743988B2 Optically controlled switches 失效
标题翻译：光控开关
公开(公告)号：US06743988B2
公开(公告)日：2004-06-01
申请号：US09864125
申请日：2001-05-23
申请人： Zhenan Bao , David John Bishop , Robert Albert Boie , Dustin W. Carr , Edwin Arthur Chandross , Peter Kian-Hoon Ho
发明人： Zhenan Bao , David John Bishop , Robert Albert Boie , Dustin W. Carr , Edwin Arthur Chandross , Peter Kian-Hoon Ho
IPC分类号： B81B702
CPC分类号： H01L51/42 , Y02E10/549 , Y10T307/773
摘要： An optically controlled switch includes first and second electrodes, a channel extending between the electrodes, and a light source positioned to illuminate the channel. The light source produces a wavelength capable of changing the material's conductivity. The channel includes a photosensitive organic material and is configured to operate as a light controlled switch.
摘要翻译：光控开关包括第一和第二电极，在电极之间延伸的通道和定位成照亮通道的光源。光源产生能够改变材料导电性的波长。该通道包括光敏有机材料并被配置为作为光控开关操作。

5. 发明授权

US06706200B2 Method for fabricating ESI device using smile and delayed LOCOS techniques 有权
标题翻译：使用微笑和延迟LOCOS技术制造ESI器件的方法
公开(公告)号：US06706200B2
公开(公告)日：2004-03-16
申请号：US10004300
申请日：2001-11-02
申请人： James E. Moon , Timothy J. Davis , Gregory J. Galvin , Kevin A. Shaw , Paul C. Waldrop , Sharlene A. Wilson
发明人： James E. Moon , Timothy J. Davis , Gregory J. Galvin , Kevin A. Shaw , Paul C. Waldrop , Sharlene A. Wilson
IPC分类号： B81B702
CPC分类号： B05B5/00 , H01J49/0018 , H01J49/167 , Y10S438/942
摘要： Three fundamental and three derived aspects of the present invention are disclosed. The three fundamental aspects each disclose a process sequence that may be integrated in a full process. The first aspect, designated as “latent masking”, defines a mask in a persistent material like silicon oxide that is held abeyant after definition while intervening processing operations are performed. The latent oxide pattern is then used to mask an etch. The second aspect, designated as “simultaneous multi-level etching (SMILE)”, provides a process sequence wherein a first pattern may be given an advanced start relative to a second pattern in etching into an underlying material, such that the first pattern may be etched deeper, shallower, or to the same depth as the second pattern. The third aspect, designated as “delayed LOCOS”, provides a means of defining a contact hole pattern at one stage of a process, then using the defined pattern at a later stage to open the contact holes. The fourth aspect provides a process sequence that incorporates all three fundamental aspects to fabricate an integrated liquid chromatography (LC)/electrospray ionization (ESI) device. The fifth aspect provides a process sequence that incorporates two of the fundamental aspects to fabricate an ESI device. The sixth aspect provides a process sequence that incorporates two of the fundamental aspects to fabricate an LC device. The process improvements described provide increased manufacturing yield and design latitude in comparison to previously disclosed methods of fabrication.
摘要翻译：公开了本发明的三个基本和三个派生方面。三个基本方面各自公开了可以整合到完整过程中的过程序列。第一方面，被指定为“潜屏蔽”，定义了在固定材料（例如氧化硅）中的掩模，该掩模在定义之后被保持为静止，而执行中间处理操作。然后将潜在氧化物图案用于掩模蚀刻。指定为“同时多级蚀刻（SMILE）”的第二方面提供了一种处理顺序，其中在蚀刻到下面的材料中第一图案可相对于第二图案被赋予高级开始，使得第一图案可以是蚀刻成更深，更浅或与第二图案相同的深度。指定为“延迟LOCOS”的第三方面提供了在过程的一个阶段定义接触孔图案的方法，然后在稍后阶段使用限定的图案来打开接触孔。第四方面提供了一个整合三个基本方面来制造液相色谱（LC）/电喷雾离子化（ESI）装置的方法。第五方面提供了一种结合两个基本方面来制造ESI装置的过程序列。第六方面提供了一种结合两个基本方面来制造LC器件的过程序列。与先前公开的制造方法相比，所描述的工艺改进提供了增加的制造产量和设计自由度。

6. 发明授权

US06602427B1 Micromachined optical mechanical modulator based transmitter/receiver module 失效
标题翻译：基于微机械光学机械调制器的发射机/接收机模块
公开(公告)号：US06602427B1
公开(公告)日：2003-08-05
申请号：US09649425
申请日：2000-08-28
申请人： Xiang Zheng Tu
发明人： Xiang Zheng Tu
IPC分类号： B81B702
CPC分类号： H01S5/02284 , G01L9/0079 , G02B6/421 , G02B6/4239 , H01S3/101 , H01S5/02272 , H01S5/02288 , H01S5/183
摘要： A method for fabricating a micromachined optical mechanical modulator based WDM transmitter/receiver module is described. The Fabry-Perot cavity of the mechanical modulator is structured from a three-polysilicon-layer stack formed on the surface of a single crystalline silicon substrate. The polysilicon membrane and its supporting polysilicon beams of the cavity are cut from the top polysilicon layer of the stack and are released by selective etching of their underlying polysilicon. The etched underlying polysilicon layer is heavily doped and then converted into porous polysilicon by anodization in HF solution. The polysilicon membrane and its supporting polysilicon are finally released using a reactive ion etch process to avoid stiction often generated in a wet etch process. A conic hole is formed on the backside of the single crystalline silicon substrate for receiving an optical fiber that can be passively aligned with the Fabry-Perot cavity.
摘要翻译：描述了一种用于制造基于微机械光学机械调制器的WDM发射机/接收机模块的方法。机械调制器的法布里 - 珀罗腔由在单晶硅衬底的表面上形成的三晶硅层叠层构成。从堆叠的顶部多晶硅层切割空腔的多晶硅膜及其支撑多晶硅束，并通过选择性蚀刻其下面的多晶硅而释放。蚀刻下面的多晶硅层是重掺杂的，然后通过HF溶液中的阳极氧化转化为多孔多晶硅。使用反应离子蚀刻工艺最终释放多晶硅膜及其支撑多晶硅，以避免在湿蚀刻工艺中经常产生的沉淀。在单晶硅衬底的背面上形成锥孔，用于接收可以与法布里 - 珀罗腔被动对准的光纤。

7. 发明授权

US06706202B1 Method for shaped optical MEMS components with stressed thin films 失效
标题翻译：具有应力薄膜的成形光学MEMS部件的方法
公开(公告)号：US06706202B1
公开(公告)日：2004-03-16
申请号：US09672386
申请日：2000-09-28
申请人： Decai Sun , Michel A. Rosa , Eric Peeters , Francesco Lemmi , Patrick Y. Maeda , Christopher L. Chua
发明人： Decai Sun , Michel A. Rosa , Eric Peeters , Francesco Lemmi , Patrick Y. Maeda , Christopher L. Chua
IPC分类号： B81B702
CPC分类号： B81C1/00666 , B81B2201/047 , B81C2201/017
摘要： A method is disclosed for making shaped optical moems components with stressed thin films. In particular, stressed thin films are used to make mirror structures.
摘要翻译：公开了一种用于制造具有应力薄膜的成形光学元件的方法。特别地，应力薄膜用于制造镜面结构。

8. 发明授权

US06673253B2 Method of fabricating integrated LC/ESI device using smile, latent masking, and delayed locos techniques. 有权
标题翻译：使用微笑，潜屏蔽和延迟定位技术制造集成LC / ESI器件的方法。
公开(公告)号：US06673253B2
公开(公告)日：2004-01-06
申请号：US10004493
申请日：2001-11-02
申请人： James E. Moon , Timothy J. Davis , Gregory J. Galvin , Kevin A. Shaw , Paul C. Waldrop , Sharlene A. Wilson
发明人： James E. Moon , Timothy J. Davis , Gregory J. Galvin , Kevin A. Shaw , Paul C. Waldrop , Sharlene A. Wilson
IPC分类号： B81B702
CPC分类号： B05B5/00 , H01J49/0018 , H01J49/167 , Y10S438/942
摘要： Three fundamental and three derived aspects of the present invention are disclosed. The three fundamental aspects each disclose a process sequence that may be integrated in a full process. The first aspect, designated as “latent masking”, defines a mask in a persistent material like silicon oxide that is held abeyant after definition while intervening processing operations are performed. The latent oxide pattern is then used to mask an etch. The second aspect, designated as “simultaneous multi-level etching (SMILE)”, provides a process sequence wherein a first pattern may be given an advanced start relative to a second pattern in etching into an underlying material, such that the first pattern may be etched deeper, shallower, or to the same depth as the second pattern. The third aspect, designated as “delayed LOCOS”, provides a means of defining a contact hole pattern at one stage of a process, then using the defined pattern at a later stage to open the contact holes. The fourth aspect provides a process sequence that incorporates all three fundamental aspects to fabricate an integrated liquid chromatography (LC)/electrospray ionization (ESI) device. The fifth aspect provides a process sequence that incorporates two of the fundamental aspects to fabricate an ESI device. The sixth aspect provides a process sequence that incorporates two of the fundamental aspects to fabricate an LC device. The process improvements described provide increased manufacturing yield and design latitude in comparison to previously disclosed methods of fabrication.
摘要翻译：公开了本发明的三个基本和三个派生方面。三个基本方面各自公开了可以整合到完整过程中的过程序列。第一方面，被指定为“潜屏蔽”，定义了在固定材料（例如氧化硅）中的掩模，该掩模在定义之后被保持为静止，而执行中间处理操作。然后将潜在氧化物图案用于掩模蚀刻。指定为“同时多级蚀刻（SMILE）”的第二方面提供了一种处理顺序，其中在蚀刻到下面的材料中第一图案可相对于第二图案被赋予高级开始，使得第一图案可以是蚀刻成更深，更浅或与第二图案相同的深度。指定为“延迟LOCOS”的第三方面提供了在过程的一个阶段定义接触孔图案的方法，然后在稍后阶段使用限定的图案来打开接触孔。第四方面提供了一个整合三个基本方面来制造液相色谱（LC）/电喷雾离子化（ESI）装置的方法。第五方面提供了一种结合两个基本方面来制造ESI装置的过程序列。第六方面提供了一种结合两个基本方面来制造LC器件的过程序列。与先前公开的制造方法相比，所描述的工艺改进提供了增加的制造产量和设计自由度。

9. 发明授权

US06214243B1 Process for producing a speed of rotation coriolis sensor 有权
标题翻译：生产旋转速度科里奥利传感器的方法
公开(公告)号：US06214243B1
公开(公告)日：2001-04-10
申请号：US09051878
申请日：1998-10-20
申请人： Horst Muenzel , Franz Laermer , Michael Offenberg , Andrea Schilp , Markus Lutz
发明人： Horst Muenzel , Franz Laermer , Michael Offenberg , Andrea Schilp , Markus Lutz
IPC分类号： B81B702
CPC分类号： G01C19/5747 , B81B3/0051 , B81B2201/0242 , B81B2203/058 , G01C19/5769
摘要： A process for the manufacture of a Coriolis rate-of-rotation sensor with oscillatory support masses spring-suspended on a substrate as well as driving means for the excitation of the planar oscillation of the oscillating masses and evaluation means for the determination of a Coriolis acceleration. Oscillating masses, driving means and integrated stops are structured in a common operation by means of plasma etching from a silicon-on-insulator (SOI) wafer.
摘要翻译：用于制造具有弹簧悬浮在基板上的振荡支撑质量的科里奥利旋转速度传感器的方法以及用于激发振荡块的平面振荡的驱动装置和用于确定科里奥利加速度的评估装置。通过从绝缘体上硅（SOI）晶片进行等离子体蚀刻，振荡质量，驱动装置和集成止动器通过共同的操作构成。

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