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    • 3. 发明授权
    • Hybrid molecular memory devices and methods of use thereof
    • 混合分子记忆装置及其使用方法
    • US06958485B2
    • 2005-10-25
    • US10729144
    • 2003-12-05
    • Veena MisraSrivardhan GowdaGuru Mathur
    • Veena MisraSrivardhan GowdaGuru Mathur
    • G11C13/02H01L51/00H01L51/30H01L29/06
    • G11C13/0014B82Y10/00G11C13/0009G11C2213/15H01L27/285H01L51/0077H01L51/0595
    • The present invention provides hybrid microelectronic memory device, comprising: (a) a substrate having a surface, a first region of first work function adjacent the surface, and a second region of second work function adjacent the surface and adjacent the first region; (b) a film comprising redox-active molecules on the first and second regions; and (c) an electrode connected to the film. The present invention further provides a hybrid microelectronic memory device, comprising: (a) a substrate having surface and a structure or region such as a diode for increasing the retention time of the device formed adjacent the surface; (b) a film comprising redox-active molecules on or associated with the region or structure; and (c) an electrode connected to the redox active molecules opposite the substrate surface. Methods of using such devices are also described.
    • 本发明提供了一种混合式微电子存储装置,包括:(a)具有表面,邻近表面的第一功函数的第一区域和与表面相邻并邻近第一区域的第二功能函数的第二区域的衬底; (b)在第一和第二区域上包含氧化还原活性分子的膜; 和(c)连接到膜的电极。 本发明还提供了一种混合微电子存储器件,包括:(a)具有表面和诸如二极管的结构或区域的衬底的衬底,用于增加邻近表面形成的器件的保留时间; (b)在该区域或结构上或与该区域或结构相关联的包含氧化还原活性分子的膜; 和(c)连接到与衬底表面相对的氧化还原活性分子的电极。 还描述了使用这种装置的方法。
    • 10. 发明授权
    • Optoelectonic devices having arrays of quantum-dot compound semiconductor superlattices therein
    • 具有量子点化合物半导体超晶格阵列的光电器件
    • US07265375B2
    • 2007-09-04
    • US11065085
    • 2005-02-24
    • Zhibo ZhangVeena MisraSalah M. A. BedairMehmet Ozturk
    • Zhibo ZhangVeena MisraSalah M. A. BedairMehmet Ozturk
    • H01L29/12
    • H01L29/0665B82Y10/00H01L21/02381H01L21/02395H01L21/02463H01L21/02488H01L21/02546H01L21/0262H01L21/02642H01L29/0673H01L29/0676H01L29/068H01L29/125H01L29/127Y10S977/762
    • Methods of forming a nano-scale electronic and optoelectronic devices include forming a substrate having a semiconductor layer therein and a substrate insulating layer on the semiconductor layer. An etching template having a first array of non-photolithographically defined nano-channels extending therethrough, is formed on the substrate insulating layer. This etching template may comprise an anodized metal oxide, such as an anodized aluminum oxide (AAO) thin film. The substrate insulating layer is then selectively etched to define a second array of nano-channels therein. This selective etching step preferably uses the etching template as an etching mask to transfer the first array of nano-channels to the underlying substrate insulating layer, which may be thinner than the etching template. An array of semiconductor nano-pillars is then formed in the second array of nano-channels. The semiconductor nano-pillars in the array may have an average diameter in a range between about 8 nm and about 50 nm. The semiconductor nano-pillars are also preferably homoepitaxial or heteroepitaxial with the semiconductor layer.
    • 形成纳米级电子和光电子器件的方法包括在其中形成其中具有半导体层的衬底和在半导体层上的衬底绝缘层。 在衬底绝缘层上形成具有非光刻限定的纳米通道的第一阵列的蚀刻模板。 该蚀刻模板可以包括阳极氧化的金属氧化物,例如阳极氧化的氧化铝(AAO)薄膜。 然后选择性地蚀刻衬底绝缘层以在其中限定纳米通道的第二阵列。 该选择蚀刻步骤优选使用蚀刻模板作为蚀刻掩模,将第一纳米通道阵列转移到下面的衬底绝缘层,其可以比蚀刻模板更薄。 然后在第二纳米通道阵列中形成半导体纳米柱阵列。 阵列中的半导体纳米柱可以具有在约8nm和约50nm之间的范围内的平均直径。 半导体纳米柱也优选与半导体层同质外延或异质外延。