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1. 发明专利

JP2014205870A 蒸着マスク有权
标题翻译：蒸气沉积掩模
公开(公告)号：JP2014205870A
公开(公告)日：2014-10-30
申请号：JP2013082687
申请日：2013-04-11
申请人：株式会社ブイ・テクノロジー , V Technology Co Ltd
发明人： MIZUMURA MICHINOBU , KUDO SHUJI , KAJIYAMA KOICHI
IPC分类号： C23C14/24 , H01L51/50 , H05B33/10
CPC分类号： C23C14/042 , H01L51/0011
摘要：【課題】熱変形を抑制して蒸着される薄膜パターンの高精細化を図る。【解決手段】スリット状の複数の貫通孔5を並列に並べて有するシート状の磁性金属部材2の一面に樹脂製のフィルム3を密接させた構造を有し、前記各貫通孔5内の前記フィルム3の部分に貫通する複数の開口パターン6を設けた蒸着マスク1であって、前記フィルム3は、線膨張係数が直交二軸で異なる異方性を有し、前記磁性金属部材2の前記貫通孔5の長軸に交差する方向に前記フィルム3の線膨張係数の小さい軸を合わせたものである。【選択図】図1
摘要翻译：要解决的问题：提供一种通过抑制热变形来提供高清晰度薄膜图案的气相沉积掩模。解决方案：蒸镀掩模1被构造成使得塑料膜3与片状物的一个表面接触磁性金属构件2，其中狭缝状多个通孔5平行布置，并且穿透膜3的多个开放图案6设置在相应的通孔5中。膜3具有不同各向异性的线性膨胀系数在正交双轴中，膜3中具有较小线膨胀系数的轴与磁性金属构件2的通孔5的长轴交叉的方向对齐。

2. 发明专利

JP2014177682A Manufacturing method of vapor deposition mask 有权
标题翻译：蒸汽沉积掩模的制造方法
公开(公告)号：JP2014177682A
公开(公告)日：2014-09-25
申请号：JP2013053207
申请日：2013-03-15
申请人： V Technology Co Ltd , 株式会社ブイ・テクノロジー
发明人： SAITO YUJI , KUDO SHUJI , KOSUGE TAKAYUKI , MIZUMURA MICHINOBU
IPC分类号： C23C14/24
CPC分类号： B32B38/10 , B32B15/00 , B32B2310/0843 , C23C14/042
摘要： PROBLEM TO BE SOLVED: To apply equal tension over the entire surface of a mask sheet and fix the sheet to a frame.SOLUTION: There is provided a manufacturing method of a vapor deposition mask having a structure that a metal mask sheet 4 on which a plurality of opening patterns are formed is stretched and fixed to a frame-shaped metal frame 7, in which a first step of adhering a peripheral part of the metal mask sheet 4 to a synthetic fiber mesh 1 to which fixed tension is applied; a second step of cutting off a portion of the mesh 1 corresponding to a vapor deposition effective region having an enough size that includes the plurality of opening patterns of the metal mask sheet 4; a third step of bonding and fixing the frame 7 to the peripheral part of the metal mask sheet 4 from the opposite side of the mesh 1; and a fourth step of removing the mesh 1 from the metal mask sheet 4 are performed.
摘要翻译：要解决的问题：在掩模片的整个表面上施加相等的张力并将片材固定到框架上。解决方案：提供一种蒸镀掩模的制造方法，其具有金属掩模片4，其上形成有形成有多个开口图案被拉伸并固定在框状的金属框架7上，其中将金属掩模片4的周边部分粘附到固定张力的合成纤维网1上的第一步骤; 第二步骤，切除与具有包括金属掩模片4的多个开口图案的足够尺寸的蒸镀有效区域对应的网孔1的一部分; 将框架7从网1的相对侧接合并固定到金属掩模片4的周边部分的第三步骤; 并且执行从金属掩模片4去除网格1的第四步骤。

3. 发明专利

JP2013095993A Method for manufacturing mask 有权
标题翻译：制造掩模的方法
公开(公告)号：JP2013095993A
公开(公告)日：2013-05-20
申请号：JP2011242090
申请日：2011-11-04
申请人： V Technology Co Ltd , 株式会社ブイ・テクノロジー
发明人： KUDO SHUJI , MIZUMURA MICHINOBU , KAJIYAMA KOICHI
IPC分类号： C23C14/04 , H01L51/50 , H05B33/10
摘要： PROBLEM TO BE SOLVED: To facilitate formation of a plurality of highly fine aperture patterns and maintain the shape and position of the aperture patterns even during handling.SOLUTION: A holding member 1 is formed by providing a plurality of penetrating openings 6 of a shape larger than a thin film pattern to a plate magnetic metal material. A resin film 2 that transmits visible light is firmly attached to one surface of the holding member 1 and held. After the holding member 1 is positioned for a substrate 3 placed on the first magnetic chuck 17, the holding member 1 is absorbed with magnetic force and the film 2 is firmly attached to the surface of the substrate 3. A laser beam is radiated to the film 2 part in the opening 6 of the holding member 1, and the penetrating aperture pattern 4 of the same shape as the thin film pattern is formed. The holding member 1 is absorbed by magnetic force of the second magnetic chuck 18, and the holding member 1 and the film 2 are integrally peeled from the substrate 3.
摘要翻译：要解决的问题：为了便于形成多个高度精细的孔径图案，并且即使在处理期间也保持孔径图案的形状和位置。解决方案：通过向板状金属材料提供大于薄膜图案的多个形状的穿透开口6，形成保持构件1。透过可见光的树脂膜2牢固地附着在保持构件1的一个表面并保持。在将保持构件1定位成放置在第一磁性卡盘17上的基板3之后，保持构件1被磁力吸收，并且膜2牢固地附着到基板3的表面。激光束被辐射到形成保持构件1的开口6中的膜2部分，并且形成与薄膜图案相同形状的穿透孔图案4。保持构件1被第二磁性卡盘18的磁力吸收，保持构件1和膜2从基板3一体地剥离。版权所有（C）2013，JPO＆INPIT

4. 发明专利

JP2014125671A Vapor deposition mask, and manufacturing method of the same 有权
标题翻译：蒸气沉积掩模及其制造方法
公开(公告)号：JP2014125671A
公开(公告)日：2014-07-07
申请号：JP2012284936
申请日：2012-12-27
申请人： V Technology Co Ltd , 株式会社ブイ・テクノロジー , Dainippon Printing Co Ltd , 大日本印刷株式会社
发明人： MIZUMURA MICHINOBU , KUDO SHUJI , OBATA KATSUYA
IPC分类号： C23C14/04 , H01L51/50 , H05B33/10
摘要： PROBLEM TO BE SOLVED: To provide a vapor deposition mask improved in an opening pattern shape and location accuracy.SOLUTION: A vapor deposition mask includes: a resin film 2 in which an opening pattern 6 with the same dimensions as that of a thin film pattern to be deposited on a substrate is formed; and a thin-plate type magnetic metal member 1 through which a through hole 4 is provided, of which size includes the opening pattern 6. The vapor deposition mask has a structure in which the resin film 2 and the thin-plate type film 2 contact tightly. A dummy through hole 5 is provided in a region of the magnetic metal member 1, other than the an evaporation effective region which includes the through hole 4. A dummy opening pattern 7 is provided to control deformation of the opening pattern 6 and the through hole 4, the deformation being caused by difference in thermal expansion between the film 2 and the magnetic metal member 1.
摘要翻译：要解决的问题：提供改善开口图形形状和定位精度的蒸镀掩模。解决方案：一种蒸镀掩模包括：树脂膜2，其中具有与薄膜图案相同尺寸的开口图案6 沉积在基板上; 以及设置有通孔4的薄板型磁性金属构件1，其尺寸包括开口图案6.蒸镀掩模具有树脂膜2和薄板型膜2接触的结构紧紧。除了包括通孔4的蒸发有效区域之外，在磁性金属构件1的区域中设置虚拟通孔5.虚拟开口图案7设置成用于控制开口图案6和通孔如图4所示，变形是由膜2和磁性金属构件1之间的热膨胀差引起的。

5. 发明专利

JP2014121720A Method for manufacturing vapor deposition mask 有权
标题翻译：制造蒸气沉积掩模的方法
公开(公告)号：JP2014121720A
公开(公告)日：2014-07-03
申请号：JP2012279276
申请日：2012-12-21
申请人： V Technology Co Ltd , 株式会社ブイ・テクノロジー
发明人： KUDO SHUJI , YANAGAWA YOSHIKATSU , GOTO TAKAYUKI
IPC分类号： B23K26/00 , B23K26/36 , C23C14/04 , H01L51/50 , H05B33/10
CPC分类号： B05C21/005 , B23K26/0869 , B23K26/382 , B23K2203/42 , B23K2203/50 , C23C14/042
摘要： PROBLEM TO BE SOLVED: To enable high-speed laser machining without generating a burr on an edge of an opening pattern.SOLUTION: In a vapor deposition mask manufacturing method where a penetrating opening pattern 1 is formed at a predetermined position of a resin film 2 by laser machining, a meniscus of a liquid film 14 is formed between the film 2 and a smooth surface 13b of a reference substrate 13 supporting the film 2, and after the film 2 and the reference substrate 13 are brought into close contact with each other by adsorption force generated by Laplace pressure, the opening pattern 1 is subjected to laser machining.
摘要翻译：要解决的问题：为了实现高速激光加工，而不会在开口图案的边缘上产生毛刺。解决方案：在其中在树脂膜2的预定位置处形成穿透开口图案1的蒸镀掩模制造方法中，通过激光加工，在膜2和支撑膜2的参考基板13的光滑表面13b之间形成液膜14的弯液面，并且在膜2和参考基板13彼此紧密接触之后通过拉普拉斯压力产生的吸附力，对开口图案1进行激光加工。

6. 发明专利

JP2013095992A Thin film pattern forming method and mask 有权
标题翻译：薄膜图案形成方法和面膜
公开(公告)号：JP2013095992A
公开(公告)日：2013-05-20
申请号：JP2011242089
申请日：2011-11-04
申请人： V Technology Co Ltd , 株式会社ブイ・テクノロジー
发明人： KUDO SHUJI , MIZUMURA MICHINOBU , KAJIYAMA KOICHI
IPC分类号： C23C14/04 , H01L51/50 , H05B33/10
摘要： PROBLEM TO BE SOLVED: To efficiently form a plurality of kinds of highly fine thin film patterns.SOLUTION: A mask 1 provided with an aperture pattern 4 of the same shape as organic EL layers 17R, 17G and 17B on a film 2 is positioned and placed on a TFT substrate 19 so that the film 2 is on the TFT substrate 19 side. A film is formed on an anode electrode 21R corresponding to R of the TFT substrate 19 through the aperture pattern 4 of the mask 1, and after an R organic EL layer 17R is formed, the mask 1 is moved in an arrangement direction of the anode electrodes 21R, 21G and 21B by the same dimension as the alignment pitch of a plurality of kinds of the organic EL layers 17R-17B. A film is formed on the anode electrode 21G corresponding to G of the TFT substrate 19 through the aperture pattern 4 of the mask 1, and a G organic EL layer 17G is formed.
摘要翻译：要解决的问题：有效地形成多种高度精细的薄膜图案。解决方案：在膜2上设置具有与有机EL层17R，17G和17B相同形状的孔径图案4的掩模1，并将其放置在TFT基板19上，使得膜2在TFT基板上 19边。通过掩模1的孔径图案4在与TFT基板19的R相对应的阳极电极21R上形成膜，在形成R有机EL层17R之后，掩模1沿阳极的排列方向移动电极21R，21G和21B的尺寸与多种有机EL层17R-17B的对准间距相同。通过掩模1的孔径图案4在与TFT基板19的G对应的阳极电极21G上形成膜，形成G有机EL层17G。版权所有（C）2013，JPO＆INPIT

7. 发明专利

JP2013083704A Mask and mask member used for the same 有权
标题翻译：面具和面膜成员用于此
公开(公告)号：JP2013083704A
公开(公告)日：2013-05-09
申请号：JP2011221883
申请日：2011-10-06
申请人： V Technology Co Ltd , 株式会社ブイ・テクノロジー
发明人： KAJIYAMA KOICHI , MIZUMURA MICHINOBU , KUDO SHUJI , KIMURA ERIKO
IPC分类号： G03F1/68 , G03F7/20
摘要： PROBLEM TO BE SOLVED: To make it possible to form a thin film pattern with high definition.SOLUTION: There is provided a mask 1 for forming a thin film pattern having a fixed shape on a substrate, which comprises a resin film 2 transmitting visible light and a holding member 3 constituted by a plate body in which penetrating openings 5 larger than the thin film pattern are formed in correspondence with a predetermined thin film pattern formation region on the substrate and which holds the film 2, wherein the film 2 has an opening pattern 4 having the same shape as the thin film pattern inside the openings 5 of the holding member 3 in correspondence with the thin film pattern formation region on the substrate.
摘要翻译：要解决的问题：使得可以形成具有高清晰度的薄膜图案。解决方案：提供一种用于在基板上形成具有固定形状的薄膜图案的掩模1，该掩模1包括透射可见光的树脂膜2和由板体构成的保持部件3，其中穿孔5大于形成与基板上的预定薄膜图案形成区域相对应的薄膜图案，并且保持薄膜2，其中薄膜2具有与开口5内的薄膜图案相同形状的开口图案4，保持构件3与基板上的薄膜图案形成区域对应。版权所有（C）2013，JPO＆INPIT

8. 发明专利

JP2013041686A Vacuum deposition method, vacuum deposition apparatus and manufacturing method of organic el display device 有权
标题翻译：真空沉积方法，有机EL显示装置的真空沉积装置和制造方法
公开(公告)号：JP2013041686A
公开(公告)日：2013-02-28
申请号：JP2011176252
申请日：2011-08-11
申请人： V Technology Co Ltd , 株式会社ブイ・テクノロジー
发明人： KUDO SHUJI , KIMURA ERIKO , MIZUMURA MICHINOBU , KAJIYAMA KOICHI
IPC分类号： H05B33/10 , C23C14/04 , C23C14/24 , H01L51/50 , H05B33/12
摘要： PROBLEM TO BE SOLVED: To facilitate deposition of a high definition thin film pattern without using a shadow mask.SOLUTION: The vacuum deposition method includes a step for charging the deposition molecules 23 of an organic EL material evaporated from an evaporation source 2 before reaching a substrate 5 for organic EL display, a step for electrifying a resistor 21 provided in contact electrically with the surface of a pixel electrode 14, located corresponding to a point where a luminous layer 16 is formed, on the substrate side by applying a voltage having a polarity different from the charging polarity of the charged deposition molecules 23 so that a temperature limited not to cause sublimation of the organic EL material occurs therein, and a step for electrifying a resistor 21 provided in contact electrically with the surface of a pixel electrode 14, located corresponding to a point where a luminous layer 16 is not formed, on the substrate side by applying a voltage having the same polarity as the charging polarity of the charged deposition molecules 23 so that a temperature sufficient for causing sublimation of the organic EL material occurs therein.
摘要翻译：要解决的问题：为了便于在不使用荫罩的情况下沉积高清晰度薄膜图案。解决方案：真空沉积方法包括在到达用于有机EL显示的基板5之前对从蒸发源2蒸发的有机EL材料的沉积分子23进行充电的步骤，用于使电气接触设置的电阻器21通电通过施加与带电沉积分子23的充电极性不同的极性的电压，使基板侧的与对应于形成发光层16的点相对应的像素电极14的表面，使得温度不受限制在其中发生有机EL材料的升华，并且使基板一侧的与形成有发光层16的点对应地设置在与像素电极14的表面电接触的电阻器21的步骤通过施加与带电沉积分子23的充电极性相同极性的电压，使得足够的温度c 发生有机EL材料的有效升华。版权所有（C）2013，JPO＆INPIT

9. 发明专利

JP2014201819A 蒸着マスク及び蒸着マスクの製造方法有权
标题翻译：蒸气沉积掩模和蒸汽沉积掩模的生产方法
公开(公告)号：JP2014201819A
公开(公告)日：2014-10-27
申请号：JP2013081096
申请日：2013-04-09
申请人：株式会社ブイ・テクノロジー , V Technology Co Ltd
发明人： KUDO SHUJI , MIZUMURA MICHINOBU , OBUCHI KAZUTO
IPC分类号： C23C14/24 , H01L51/50 , H05B33/10
摘要：【課題】製造が容易で、且つマスクの大型化に容易に対応する。【解決手段】蒸着して基板上に複数の薄膜パターンを形成するための蒸着マスクであって、一面1aに磁性体粉末を含む磁性層2を備える樹脂製のベースフィルム1に、前記複数の薄膜パターンに対応して貫通する複数の開口パターン4を形成したものである。【選択図】図1
摘要翻译：要解决的问题：提供一种容易制造的能够容易地应对掩模扩大的气相沉积掩模。解决方案：在通过气相沉积在基板上形成多个薄膜图案的气相沉积掩模中，多个开口在包括在一个表面1a上包含磁性体粉末的磁性层2的树脂基底膜1上形成对应于多个薄膜图案的图案4。

10. 发明专利

JP2014122384A Vapor deposition mask manufacturing method and vapor deposition mask 有权
标题翻译：蒸气沉积掩模制造方法和蒸气沉积掩模
公开(公告)号：JP2014122384A
公开(公告)日：2014-07-03
申请号：JP2012278929
申请日：2012-12-21
申请人： V Technology Co Ltd , 株式会社ブイ・テクノロジー
发明人： KUDO SHUJI , MIZUMURA MICHINOBU , KAJIYAMA KOICHI
IPC分类号： C23C14/24 , H01L51/50 , H05B33/10
摘要： PROBLEM TO BE SOLVED: To prevent the spread of a crack generated in a peripheral part of a magnetic metal member.SOLUTION: A vapor deposition mask manufacturing method comprises: a step S1 of forming a magnetic metal member that has a plurality of first through holes and second through holes circling along a peripheral part of a resin film in a region outside a vapor deposition region including the plurality of first through holes, on one side of the resin film by plating; a step S2 of cutting a part of the magnetic metal member and the film closer to the inside than the formation positions of the second through holes by a certain dimension and removing an outer peripheral part thereof to form a member for a mask; a step S3 of stretching the member for a mask on one end surface of a frame-shaped frame having an opening with a size including the first through holes to connect a peripheral region of the magnetic metal member to the one end surface of the frame; and a step S4 of applying a laser beam to predetermined positions in the plurality of first through holes to form opening patterns penetrating the film parts in the first through holes.
摘要翻译：要解决的问题：为了防止在磁性金属构件的周边部分中产生的裂纹的扩展。解决方案：一种蒸镀掩模制造方法包括：形成具有多个第一通孔的磁性金属构件的步骤S1 以及在包括多个第一通孔的气相沉积区域外的区域中沿着树脂膜的周边部分循环的第二通孔，通过电镀在所述树脂膜的一侧上; 将一部分磁性金属构件和薄膜的一部分切割成比第二通孔的形成位置靠近内侧的膜一定尺寸的步骤S2，并且移除其外围部分以形成掩模构件; 在具有包括第一通孔的尺寸的开口的框状框架的一个端面上拉伸掩模用构件以将磁性金属构件的周边区域连接到框架的一个端面的步骤S3; 以及将激光束施加到多个第一通孔中的预定位置以形成穿透第一通孔中的膜部分的开口图案的步骤S4。

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