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1. 发明专利

JP2011070197A Method and device for generating pattern, and laser beam machining device 有权
标题翻译：用于产生图案的方法和装置以及激光束加工装置
公开(公告)号：JP2011070197A
公开(公告)日：2011-04-07
申请号：JP2010213242
申请日：2010-09-24
申请人： V Technology Co Ltd , 株式会社ブイ・テクノロジー
发明人： MIZUMURA MICHINOBU , SAITO YUJI
IPC分类号： G03F7/20 , B23K26/00 , B23K26/06 , G02B26/08 , H01L21/027
摘要： PROBLEM TO BE SOLVED: To stabilize generation of a pattern when the same pattern is continuously generated by repeatedly emitting light at least twice. SOLUTION: When the same pattern is continuously generated by repeatedly and intermittently emitting light from a light source to a micromirror device at least twice, until the frequency of light emission reaches a preset predetermined frequency, the same pattern information as the pattern information transmitted immediately with a preset timing from emission of light of one shot from the light source to emission of light of next shot is transmitted to the micromirror device. COPYRIGHT: (C)2011,JPO&INPIT
摘要翻译：要解决的问题：当通过重复发光至少两次连续产生相同图案时，稳定图案的产生。解决方案：当通过将光从光源重复地和间歇地发射到微镜器件至少两次而连续产生相同的图案，直到发光频率达到预设的预定频率时，与图案信息相同的图案信息将从光源发射的光照射到下一次射击的光的预定定时立即传送到微镜装置。版权所有（C）2011，JPO＆INPIT

2. 发明专利

JP2009208146A Pattern generation method, pattern generation device, and laser beam machining apparatus 有权
标题翻译：图案生成方法，图案生成装置和激光束加工装置
公开(公告)号：JP2009208146A
公开(公告)日：2009-09-17
申请号：JP2008056764
申请日：2008-03-06
申请人： V Technology Co Ltd , 株式会社ブイ・テクノロジー
发明人： MIZUMURA MICHINOBU , SAITO YUJI
IPC分类号： B23K26/08 , B23K26/00 , B23K26/06
摘要： PROBLEM TO BE SOLVED: To stably generate a pattern even when light is radiated at least two or more times to continuously generate the same pattern. SOLUTION: A pattern generation method is disclosed in which, based on transmitted pattern information, laser beam is radiated from a laser beam source to a micromirror device in which a plurality of individually tilted micromirros are arranged in a matrix, and by reflected light in the micromirror device, a prescribed pattern is generated on the irradiation object of the light. In the method, when the laser beam is intermittently repeatedly radiated from the laser beam source to the micromirror device at least two or more times to continuously generate the same pattern, till the radiation frequently of the laser beam reaches the preset prescribed frequency, every time the laser beam is radiated from the laser beam source, pattern information same as the pattern information transmitted immediately before is transmitted to the micromirror device. COPYRIGHT: (C)2009,JPO&INPIT
摘要翻译：要解决的问题：即使在至少两次以上的光照射时也能稳定地生成图案，以连续地生成相同的图案。解决方案：公开了一种图案生成方法，其中基于所发送的图案信息，将激光束从激光束源辐射到其中多个单独倾斜的微型光栅以矩阵形式布置的微镜器件，并且被反射在微镜装置中的光，在光的照射对象上产生规定的图案。在该方法中，当将激光束从激光束源间歇地重复地从微镜装置辐射至微镜装置时，连续产生相同的图案，直到激光束的频率达到预定的规定频率，每次激光束从激光束源辐射，与紧接在之前传输的图案信息相同的图案信息被传送到微镜装置。版权所有（C）2009，JPO＆INPIT

3. 发明专利

JP2014177682A Manufacturing method of vapor deposition mask 有权
标题翻译：蒸汽沉积掩模的制造方法
公开(公告)号：JP2014177682A
公开(公告)日：2014-09-25
申请号：JP2013053207
申请日：2013-03-15
申请人： V Technology Co Ltd , 株式会社ブイ・テクノロジー
发明人： SAITO YUJI , KUDO SHUJI , KOSUGE TAKAYUKI , MIZUMURA MICHINOBU
IPC分类号： C23C14/24
CPC分类号： B32B38/10 , B32B15/00 , B32B2310/0843 , C23C14/042
摘要： PROBLEM TO BE SOLVED: To apply equal tension over the entire surface of a mask sheet and fix the sheet to a frame.SOLUTION: There is provided a manufacturing method of a vapor deposition mask having a structure that a metal mask sheet 4 on which a plurality of opening patterns are formed is stretched and fixed to a frame-shaped metal frame 7, in which a first step of adhering a peripheral part of the metal mask sheet 4 to a synthetic fiber mesh 1 to which fixed tension is applied; a second step of cutting off a portion of the mesh 1 corresponding to a vapor deposition effective region having an enough size that includes the plurality of opening patterns of the metal mask sheet 4; a third step of bonding and fixing the frame 7 to the peripheral part of the metal mask sheet 4 from the opposite side of the mesh 1; and a fourth step of removing the mesh 1 from the metal mask sheet 4 are performed.
摘要翻译：要解决的问题：在掩模片的整个表面上施加相等的张力并将片材固定到框架上。解决方案：提供一种蒸镀掩模的制造方法，其具有金属掩模片4，其上形成有形成有多个开口图案被拉伸并固定在框状的金属框架7上，其中将金属掩模片4的周边部分粘附到固定张力的合成纤维网1上的第一步骤; 第二步骤，切除与具有包括金属掩模片4的多个开口图案的足够尺寸的蒸镀有效区域对应的网孔1的一部分; 将框架7从网1的相对侧接合并固定到金属掩模片4的周边部分的第三步骤; 并且执行从金属掩模片4去除网格1的第四步骤。

4. 发明专利

JP2013082589A Laser processing apparatus for glass substrate 审中-公开
标题翻译：玻璃基板激光加工装置
公开(公告)号：JP2013082589A
公开(公告)日：2013-05-09
申请号：JP2011224381
申请日：2011-10-11
申请人： V Technology Co Ltd , 株式会社ブイ・テクノロジー
发明人： MIZUMURA MICHINOBU , WATANABE YOSHIO , SAITO YUJI
IPC分类号： C03B33/09 , B23K26/00 , B23K26/06 , B23K26/38 , B23K26/40
摘要： PROBLEM TO BE SOLVED: To provide a laser processing apparatus for a glass substrate with which cutting of a glass substrate along an optional shape such as a circular arc is easy, a treatment time for dividing a glass substrate can be shortened, and waste formation is prevented.SOLUTION: For example, a pulsed laser light 2 with 250-400 nm wavelength is imaged by an imaging lens 5 on the glass substrate 10 to be cut, and the glass substrate 10 is moved by an X-Y table 11 to form a laser scribing trace 20 along the scheduled cut line. In this case, a slit member 3 is rotated so that the longitudinal direction of horizontally long opening 4 of the slit member 3 directs toward the direction of the scheduled cut line. Thereby, the beam shape of laser light irradiated on the glass substrate 10 has horizontally long directionality, and the formed laser scribing trace 20 has directionality directing toward the scheduled cut line. Accordingly, a crack occurs along the scheduled cut line without breaking the glass substrate 10 irregularly.
摘要翻译：解决的问题：为了提供一种玻璃基板的激光加工装置，通过这样一种玻璃基板沿圆弧等任意形状的切割容易，能够缩短玻璃基板的分割处理时间，防止废物形成。解决方案：例如，将具有250-400nm波长的脉冲激光2通过成像透镜5在待切割的玻璃基板10上成像，并且通过XY工作台11移动玻璃基板10以形成激光划线20沿着预定切割线。在这种情况下，狭缝构件3旋转，使得狭缝构件3的水平长的开口4的长度方向指向预定的切割线的方向。由此，照射在玻璃基板10上的激光的光束形状具有水平方向性，并且所形成的激光划线迹线20具有指向预定切割线的方向性。因此，沿着预定的切割线发生裂纹，而不会不规则地破坏玻璃基板10。版权所有（C）2013，JPO＆INPIT

5. 发明专利

JP2009202223A Laser beam machine 有权
标题翻译：激光束机
公开(公告)号：JP2009202223A
公开(公告)日：2009-09-10
申请号：JP2008049604
申请日：2008-02-29
申请人： V Technology Co Ltd , 株式会社ブイ・テクノロジー
发明人： MIZUMURA MICHINOBU , SAITO YUJI
IPC分类号： B23K26/06 , B23K26/00 , G01B11/02
摘要： PROBLEM TO BE SOLVED: To provide a laser beam machine which enhances operating efficiency and processing accuracy in laser beam machining. SOLUTION: The laser beam machine is equipped with a luminous flux regulating means 3 which reflects a laser beam incoming from a laser beam source 2 by means of a plurality of micromirrors, regulates the cross-sectional shape of the luminous flux of the laser beam and sends out the laser beam, and an object lens 4 which is placed opposite a workpiece 10 to be machined by the laser beam and concentrates the laser beam on the workpiece 10. The laser beam machine is also equipped with a white light source 6 which emits white light to the plurality of the micromirrors of the luminous flux regulating means 3 placed on a branch of an optical path going toward the laser beam source 2 from the luminous flux regulating means 3, an imaging means 7 having a plurality of light receiving elements which is placed on a branch of an optical path going toward the luminous flux regulating means 3 from the object lens 4 and receives reflected light from the workpiece 10 of the white light reflected by the plurality of the micromirrors, and a displacing means 9 which displaces the distance between the object lens 4 and the workpiece 10 so as to measure a microheight. COPYRIGHT: (C)2009,JPO&INPIT
摘要翻译：要解决的问题：提供一种提高激光束加工的操作效率和加工精度的激光束机。
解决方案：激光束机器配备有光束调节装置3，其通过多个微镜反射从激光束源2入射的激光束，调节光束的光通量的横截面形状激光束并发出激光束;以及物镜4，放置在工件10的对面，被激光束加工，并将激光束集中在工件10上。激光束机还配有白光源 6，其向从光束调节装置3朝向激光束源2的光路的分支上的光束调节装置3的多个微反射镜发射白光;成像装置7，具有多个光接收元件，其从物镜4放置在朝向光束调节装置3的光路的分支上，并且接收来自工件10的反射的由白色光反射的白光的光多个微镜，以及移动物镜4与工件10之间的距离的位移装置9，以便测量微观高度。版权所有（C）2009，JPO＆INPIT

6. 发明专利

JP2009183991A Laser machining device 有权
标题翻译：激光加工设备
公开(公告)号：JP2009183991A
公开(公告)日：2009-08-20
申请号：JP2008028071
申请日：2008-02-07
申请人： V Technology Co Ltd , 株式会社ブイ・テクノロジー
发明人： MIZUMURA MICHINOBU , SAITO YUJI
IPC分类号： B23K26/04 , B23K26/06 , B23K101/40
摘要： PROBLEM TO BE SOLVED: To improve working efficiency of laser machining and to improve machining accuracy. SOLUTION: A laser machining device is provided with a luminous flux regulating means 3 for regulating the luminous flux cross section shape of a laser beam L1 emitted from a laser beam source 2 by a shape regulating part 12 and emitting it, and an objective lens 4 arranged opposite to a workpiece 11, which is machined with the laser beam L1, and condensing the laser beam L1 on the workpiece 11. Further, the laser machining device is provided with: a pinhole member 6, which is provided on optical paths branched from an optical path proceeding to the luminous flux regulating means 3 from the objective lens 4, and in which a plurality of pinholes is formed; a white light source 7 for applying white light L2 to the pinhole member 6; a photographing means 8, which is provided above optical paths branched from an optical path proceeding to the pinhole member 6 from the objective lens 4 and provided with a plurality of light receiving elements to receive reflection light L3 of the white light L2, which is past the pinholes and reflected from the workpiece 11; and a displacement means 10 for displacing the distance between the objective lens 4 and the workpiece 11. Thereby, measurement of minute heights is enabled. COPYRIGHT: (C)2009,JPO&INPIT
摘要翻译：要解决的问题：提高激光加工的工作效率，提高加工精度。解决方案：激光加工装置设置有光束调节装置3，用于通过形状调节部分12调节从激光束源2发射的激光束L1的光通量截面形状并将其发射，物镜4与被加工有激光束L1的工件11相对配置，并且将激光束L1聚焦在工件11上。此外，激光加工装置设置有：设置在光学部件上的针孔部件6 从物镜4前进到光束调节装置3的光路分支，并且形成有多个针孔; 用于将白光L2施加到针孔构件6的白光源7; 设置在从物镜4前进到针孔构件6的光路分支的光路上并具有多个光接收元件的摄像装置8，以接收过去的白光L2的反射光L3 针孔并从工件11反射; 以及用于移动物镜4和工件11之间的距离的位移装置10.由此，能够进行微小高度的测量。版权所有（C）2009，JPO＆INPIT

7. 发明专利

JP2012124366A Laser annealing device and laser annealing method 有权
标题翻译：激光退火装置和激光退火方法
公开(公告)号：JP2012124366A
公开(公告)日：2012-06-28
申请号：JP2010274659
申请日：2010-12-09
申请人： V Technology Co Ltd , 株式会社ブイ・テクノロジー
发明人： MIZUMURA MICHINOBU , SAITO YUJI
IPC分类号： H01L21/20 , B23K26/00 , B23K26/04 , B23K26/06 , B23K101/40 , H01L21/268
CPC分类号： H01L21/67115 , B23K26/066 , B23K26/0676 , B23K2201/40 , H01L21/02532 , H01L21/0268 , H01L21/02691 , H01L21/477
摘要： PROBLEM TO BE SOLVED: To easily maintain and manage irradiation energy of a laser beam, and restrain an irregular shape of an irradiation pattern.SOLUTION: This laser annealing device performs annealing by radiating a plurality of laser beams Lb on an amorphous silicon film formed on a TFT substrate 10. The device comprises a mask 3, on which plural openings with a shape similar to a shape of an annealed area on the TFT substrate 10 are formed; a microlens substrate 4 for collecting the plural laser beams Lb passing through the plural openings of the mask 3 on the TFT substrate 10 via the plural microlenses formed on one surface, and providing constant optical energy to the amorphous silicon film; a pair of guides 25, which are formed into a semi-columnar shape, and opposed to each other at both edge positions across the microlens substrate 4 with axial cores almost in parallel to each other, and whose top parts project nearer the TFT substrate 10 than the positions of the top parts of the microlenses; and a film 22 extending movably between a pair of the guides 25 and transmitting the laser beams Lb.
摘要翻译：要解决的问题：为了容易地维护和管理激光束的照射能量，并且抑制照射图案的不规则形状。解决方案：该激光退火装置通过在形成在TFT基板10上的非晶硅膜上照射多个激光束Lb来进行退火。该装置包括掩模3，多个开口的形状类似于形成TFT基板10上的退火区域; 微透镜基板4，用于经由形成在一个表面上的多个微透镜收集通过TFT基板10上的掩模3的多个开口的多个激光束Lb，并向非晶硅膜提供恒定的光能; 一对引导件25，其形成为半柱状，并且在两个边缘位置处彼此相对，所述两个边缘位置穿过微透镜基板4，所述两个边缘位置具有几乎彼此平行的轴芯，并且其顶部突出于更靠近TFT基板10 比微透镜顶部的位置大; 以及在一对引导件25之间可移动地延伸并透射激光束Lb的膜22。版权所有（C）2012，JPO＆INPIT

8. 发明专利

JP2009262191A Defect correcting method for pattern 有权
标题翻译：缺陷修正方法
公开(公告)号：JP2009262191A
公开(公告)日：2009-11-12
申请号：JP2008114406
申请日：2008-04-24
申请人： V Technology Co Ltd , 株式会社ブイ・テクノロジー
发明人： MIZUMURA MICHINOBU , SAITO YUJI
IPC分类号： B23K26/36 , B23K26/00 , B23K26/06 , G02F1/13
摘要： PROBLEM TO BE SOLVED: To improve the production efficiency of a prescribed product by reducing a defect correcting stage for a pattern. SOLUTION: The defect correcting method where laser light emitted from a light source is shaped in accordance with a processing shape by a plurality of micromirrors arranged into a matrix shape, so as to be emitted to a workpiece, and the defect part of a pattern formed at the workpiece is corrected, comprises: a stage where, while the irradiation optical system emitting the laser light and the workpiece are step-moved by prescribed quantity relatively to a prescribed direction within a face parallel to the surface of the workpiece, the pattern formed at the surface of the workpiece is imaged by an imaging means each time; a stage where the imaged pattern is compared with a normal pattern, and a defect part is detected; and a stage where the plurality of micromirrors corresponding to the defect part are on-driven, and the laser light is shaped into a shape corresponding to the defect part and is emitted to the workpiece. COPYRIGHT: (C)2010,JPO&INPIT
摘要翻译：要解决的问题：通过减少图案的缺陷校正阶段来提高规定产品的生产效率。解决方案：从光源发射的激光根据处理形状通过多个布置成矩阵形状的微镜成形以便发射到工件的缺陷校正方法，并且缺陷部分校正在工件上形成的图案，包括：在平行于工件的表面的面内相对于规定方向将发射激光的照射光学系统和工件相对于规定的方向移动规定量的阶段，每次通过成像装置对在工件表面形成的图案进行成像; 将成像图案与正常图案进行比较的阶段，并且检测缺陷部分; 以及对应于缺陷部分的多个微镜的驱动阶段，激光成形为对应于缺陷部分的形状并被发射到工件。版权所有（C）2010，JPO＆INPIT

9. 发明专利

JP2009300826A Wiring disconnection correction method 审中-公开
标题翻译：接线断线校正方法
公开(公告)号：JP2009300826A
公开(公告)日：2009-12-24
申请号：JP2008156337
申请日：2008-06-16
申请人： V Technology Co Ltd , 株式会社ブイ・テクノロジー
发明人： MIZUMURA MICHINOBU , HIRANO TAKAFUMI , SAITO YUJI , NAKABAYASHI AI
IPC分类号： G02F1/13 , G09F9/00 , H01L21/3205 , H01L23/52 , H05K3/00 , H05K3/22
摘要： PROBLEM TO BE SOLVED: To improve the reliability of corrected wiring while making correction work safe and easy. SOLUTION: A disconnection correcting method for wiring formed on the surface of a TFT substrate and covered with a membrane of a color filter carries out laser machining step S1 for forming a linear pattern of predetermined width by eliminating the membrane of the color filter by laser machining to connect wiring parts across a disconnected part of wiring placed in between, correction liquid applying step S2 for applying a correction liquid with metal particles dispersed, on the linear pattern, conductive film forming step S3 for baking the applied correction liquid to form a conductive film, and upper layer film forming step S5 for covering at least the conductive film and its peripheral part to form the same membrane as the membrane of the color filter. COPYRIGHT: (C)2010,JPO&INPIT
摘要翻译：要解决的问题：提高校正线路的可靠性，同时使校正工作安全，容易。解决方案：在TFT基板的表面上形成并被滤色器的膜覆盖的布线的断线校正方法，通过消除滤色器的膜来进行用于形成预定宽度的线状图案的激光加工步骤S1 通过激光加工将布线部分连接在放置在其间的布线的断开部分上，校正液施加步骤S2，用于将分散有金属颗粒的校正液施加在线性图案上，用于烘烤施加的校正液的导电膜形成步骤S3以形成导电膜和上层膜形成步骤S5，用于至少覆盖导电膜及其周边部分以形成与滤色器膜相同的膜。版权所有（C）2010，JPO＆INPIT

10. 发明专利

JP2009192366A Device for measurement of micro height 有权
标题翻译：微高度测量装置
公开(公告)号：JP2009192366A
公开(公告)日：2009-08-27
申请号：JP2008033157
申请日：2008-02-14
申请人： V Technology Co Ltd , 株式会社ブイ・テクノロジー
发明人： MIZUMURA MICHINOBU , SAITO YUJI
IPC分类号： G01B11/02
摘要： PROBLEM TO BE SOLVED: To provide a device for measurement of a micro height, having a simple optical structure.
SOLUTION: This device for measurement of the micro height includes a white light source 2 for emitting white light L1 to a pin hole member 3 having a plurality of pin holes formed thereon, an objective lens 4 for collecting the white light L1 passing through the pin holes on an object 11 to be measured, the pin holes being provided so as to face the object to be measured 11, an image capture means 6 that has a plurality of light receiving elements and receives reflection light L2 of the white light L1 which passed through the pin hole from the object 11 to be measured as it is, and a displacement means 10 for varying a distance between the objective lens 4 and the object 11 to be measured.
COPYRIGHT: (C)2009,JPO&INPIT
摘要翻译：要解决的问题：提供一种具有简单光学结构的微高度测量装置。解决方案：用于测量微高度的装置包括：白光源2，用于将白光L1发射到具有形成在其上的多个针孔的针孔构件3;物镜4，用于收集通过的白光L1 通过被测量物体11上的针孔，设置为与待测对象物11对置地设置的针孔，具有多个受光元件并接收白色光的反射光L2的摄像单元6 L1从要被测量的物体11原样穿过针孔;以及位移装置10，用于改变物镜4和被测量物体11之间的距离。版权所有（C）2009，JPO＆INPIT

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