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1. 发明授权

US4898766A Polymer film with conductive pattern and method of manufacturing the same 失效
标题翻译：具有导电图案的聚合物膜及其制造方法
公开(公告)号：US4898766A
公开(公告)日：1990-02-06
申请号：US243242
申请日：1988-09-08
申请人： Toshiaki Tamamura , Katsuta , Osamu Niwa , Makoto Hikita , Akio Sugita
发明人： Toshiaki Tamamura , Katsuta , Osamu Niwa , Makoto Hikita , Akio Sugita
IPC分类号： H05K3/10
CPC分类号： H05K3/105 , H05K2201/0329 , Y10S428/901 , Y10T428/24802 , Y10T428/24876 , Y10T428/24901 , Y10T428/25 , Y10T428/31504 , Y10T428/31507 , Y10T428/31533 , Y10T428/3154 , Y10T428/31688 , Y10T428/31692 , Y10T428/31721 , Y10T428/31855 , Y10T428/31935 , Y10T428/31942 , Y10T428/31971
摘要： A polymer film with a conductive electrode has an insulated polymer film with an electrically conductive pattern containing an electrically conductive polymer of an aromatic compound, the conductive pattern being formed on at least one major surface of the insulated film, and an internal portion extending from the at least one major surface.

2. 发明授权

US4608129A Polymer film with conductive pattern and method of manufacturing the same 失效
标题翻译：具有导电图案的聚合物膜及其制造方法
公开(公告)号：US4608129A
公开(公告)日：1986-08-26
申请号：US736491
申请日：1985-05-21
申请人： Toshiaki Tamamura , Osamu Niwa , Makoto Hikita , Akio Sugita
发明人： Toshiaki Tamamura , Osamu Niwa , Makoto Hikita , Akio Sugita
IPC分类号： H05K3/10 , B44C1/04
CPC分类号： H05K3/105 , H05K2201/0329 , Y10S428/901 , Y10T428/24802 , Y10T428/24876 , Y10T428/24901 , Y10T428/25 , Y10T428/31504 , Y10T428/31507 , Y10T428/31533 , Y10T428/3154 , Y10T428/31688 , Y10T428/31692 , Y10T428/31721 , Y10T428/31855 , Y10T428/31935 , Y10T428/31942 , Y10T428/31971
摘要： A polymer film with a conductive electrode has an insulated polymer film with an electrically conductive pattern containing an electrically conductive polymer of an aromatic compound, the conductive pattern being formed on at least one major surface of the insulated film, and an internal portion extending from the at least one major surface.
摘要翻译：具有导电电极的聚合物膜具有绝缘聚合物膜，其具有包含芳族化合物的导电聚合物的导电图案，导电图案形成在绝缘膜的至少一个主表面上，并且内部部分从至少一个主表面。

3. 发明授权

US4559112A Electrically conducting polymer film and method of manufacturing the same 失效
标题翻译：导电聚合物膜及其制造方法
公开(公告)号：US4559112A
公开(公告)日：1985-12-17
申请号：US657314
申请日：1984-10-02
申请人： Toshiaki Tamamura , Osamu Niwa
发明人： Toshiaki Tamamura , Osamu Niwa
IPC分类号： H01B1/22 , C08G61/12 , H01B1/12 , H01M4/60 , C25D1/04 , C25C3/00
CPC分类号： H01B1/127 , C08G61/123 , H01B1/128 , H01M4/60 , Y10S205/918 , Y10T428/31511 , Y10T428/3154 , Y10T428/31663 , Y10T428/31721 , Y10T428/31797 , Y10T428/31855 , Y10T428/3188 , Y10T428/31909 , Y10T428/31935 , Y10T428/31938 , Y10T428/31942
摘要： A conducting polymer film has an insulating polymer film as a base, and a conducting aromatic polymer compound is contained by electrochemical polymerization in at least part of the insulating polymer film.

4. 发明授权

US06954562B2 Matrix switch of optical waveguide type and method for manufacturing the same 失效
标题翻译：光波导型矩阵开关及其制造方法
公开(公告)号：US06954562B2
公开(公告)日：2005-10-11
申请号：US10755388
申请日：2004-01-13
申请人： Tatsuo Izawa , Katsuhiko Kurumada , Toshiaki Tamamura , Makoto Sato , Katsunari Okamoto
发明人： Tatsuo Izawa , Katsuhiko Kurumada , Toshiaki Tamamura , Makoto Sato , Katsunari Okamoto
IPC分类号： G02B6/12 , G02B6/132 , G02B6/136 , G02B6/35
CPC分类号： G02B6/3596 , G02B6/132 , G02B6/136 , G02B6/3512 , G02B6/3546 , G02B2006/12097
摘要： A matrix switch of an optical waveguide type which has low transmission loss variations and includes uniform grooves with a deep vertical cross section is provided. A switching part for selecting between a light path extending from an input port of a first set of optical waveguides 111-11m to an output port of the first set of optical waveguides 111-11m and a light path extending from an input port of the first set of optical waveguides 111-11m to an output port of a second set of optical waveguides 121-12n is arranged for insertion into a switching groove arranged at each of the intersections of the first set of optical waveguides 111-11m and the second set of optical waveguides 121-12n. Each of the switching grooves is arranged on an imaginary straight line connecting intersections of the first set of optical waveguides 111-11m and the second set of optical waveguides 121-12n.
摘要翻译：提供了具有低传输损耗变化并且包括具有深垂直横截面的均匀凹槽的光波导型矩阵开关。一种切换部件，用于在从第一组光波导11 1〜11 m的输入端口延伸到第一组光学器件的输出端口的光路之间进行选择波导11 1〜11 3和从第一组光波导11的输入端口延伸的光路11 1〜11＆lt; m 2到第二组光波导12 1〜12 N n的输出端口被布置成插入到布置在每个交点处的切换槽中第一组光波导11 1〜11 3和第二组光波导12 1〜12 N 2 / >。每个开关槽布置在连接第一组光波导11 1〜11 2和第二组光波导12组合的交叉点的假想直线上 > 1 n 。

5. 发明授权

US4702990A Photosensitive resin composition and process for forming photo-resist pattern using the same 失效
标题翻译：光敏树脂组合物及使用其形成光刻胶图案的方法
公开(公告)号：US4702990A
公开(公告)日：1987-10-27
申请号：US733505
申请日：1985-05-10
申请人： Akinobu Tanaka , Masao Morita , Saburo Imamura , Toshiaki Tamamura , Osamu Kogure
发明人： Akinobu Tanaka , Masao Morita , Saburo Imamura , Toshiaki Tamamura , Osamu Kogure
IPC分类号： G03F7/09 , G03C1/54 , G03C1/60
CPC分类号： G03F7/094
摘要： The present invention provides a photosensitive resin composition used to form a top resist layer of a multilayer resist system, the composition comprising a photosensitive polyphenylsilsesquioxane represented by the following general formula (I) of: ##STR1## wherein X is selected from the group consisting of acryloyloxymethyl, methacryloyloxymethyl, and cinnamoyloxymethyl; and l, m and n are zero or positive integers but l and m do not take the value of zero simultaneously; and a bisazide compound added to act as a cross-linking agent.The photosensitive resin composition has high sensitivity to UV light and excellent resistance to reactive ion etching under oxygen gas (O.sub.2 RIE).
摘要翻译：本发明提供一种用于形成多层抗蚀剂体系的顶层抗蚀剂层的感光性树脂组合物，该组合物包含由以下通式（I）表示的感光性聚苯基倍半硅氧烷：其中X选自由丙烯酰氧基甲基，甲基丙烯酰氧基甲基和肉桂酰氧基甲基组成的组; l，m和n为零或正整数，但l和m不同时取零值; 并加入双叠氮化合物作为交联剂。感光性树脂组合物对紫外线具有高灵敏度，并且在氧气（O 2 RIE）下具有优异的抗反应离子蚀刻性。

6. 发明申请

US20050018955A1 Light-beam switching/adjusting apparatus and manufacturing method thereof 失效
标题翻译：光束切换/调节装置及其制造方法
公开(公告)号：US20050018955A1
公开(公告)日：2005-01-27
申请号：US10500086
申请日：2002-12-12
申请人： Keiichi Akagawa , Yoshihiko Suzuki , Tohru Ishizuya , Junji Suzuki , Katsuhiko Kurumada , Masatoshi Kanaya , Toshiaki Tamamura
发明人： Keiichi Akagawa , Yoshihiko Suzuki , Tohru Ishizuya , Junji Suzuki , Katsuhiko Kurumada , Masatoshi Kanaya , Toshiaki Tamamura
IPC分类号： G02B6/35 , H01L25/065 , H04Q11/00 , G02B6/26
CPC分类号： G02B6/3596 , G02B6/3512 , G02B6/3546 , G02B6/357 , G02B6/3582 , G02B6/3584 , H04Q11/0005 , H04Q2011/003 , H04Q2011/0039 , H04Q2011/0058
摘要： The light guide substrate 2 has mirror receiving grooves 24 and light guides. The light guides conduct light that is input into the input ports to selected output ports in accordance with the advance and retraction of the mirrors 31 with respect to the grooves 24. The actuator substrate 4 has mirrors 31 and actuators which place the mirrors 31 in a state in which the mirrors are drawn in toward the substrate 4, or a state in which the mirrors protrude from the substrate 4. The light guide substrate 2 and actuator substrate 4 are aligned using alignment marks and joined with a spacer 3 interposed so that the mirrors 31 retract from the grooves 24 when the mirrors 31 are drawn in toward the substrate 4, and so that the mirrors 31 advance into the grooves 24 when the mirrors 31 protrude from the substrate 4. This alignment is performed in a state in which all of the mirrors 31 are drawn in toward the substrate 4.
摘要翻译：导光基板2具有反射镜容纳槽24和光导。根据反射镜31相对于凹槽24的前进和后退，导光板将输入到输入端口的光输入到选定的输出端口。致动器基板4具有反射镜31和将反射镜31放置在其中的致动器反射镜朝向基板4的状态，或反射镜从基板4突出的状态。导光基板2和致动器基板4使用对准标记对齐，并且与间隔件3相接合，当反射镜31朝向基板4被拉入时，反射镜31从凹槽24缩回，并且当反射镜31从基板4突出时，反射镜31前进到凹槽24中。该对准在所有反射镜31被朝向基板4拉入。

7. 发明授权

US4564579A Pattern forming material of a siloxane polymer 失效
标题翻译：图案形成材料的硅氧烷聚合物
公开(公告)号：US4564579A
公开(公告)日：1986-01-14
申请号：US680739
申请日：1984-12-12
申请人： Masao Morita , Akinobu Tanaka , Saburo Imamura , Toshiaki Tamamura , Osamu Kogure
发明人： Masao Morita , Akinobu Tanaka , Saburo Imamura , Toshiaki Tamamura , Osamu Kogure
IPC分类号： C08G77/20 , C08G77/24 , G03F7/075 , G03F7/09 , G03C5/00
CPC分类号： G03F7/094 , C08G77/20 , C08G77/24 , G03F7/0757
摘要： A pattern forming material contains a siloxane polymer having the general formula: ##STR1## [wherein R, R' and R" are the same or different and are respectively one member selected from hydrogen, an alkyl group or a phenyl group; X is one member selected from fluorine, chlorine, bromine, iodine and a --CH.sub.2 Y group (wherein Y is one member selected from chlorine, fluorine, bromine, iodine, an acryloyloxy group, a methacryloyloxy group, and a cinnamoyloxy group); and l, m and n are respectively 0 or a positive integer, l and m not being simultaneously 0]. The material has a high sensitivity to high-energy radiation, a high contrast, and an excellent resistance to reactive ion etching under oxygen gas. The material is conveniently used as a negative resist for forming a submicron pattern having a high aspect ratio.

8. 发明授权

US4426247A Method for forming micropattern 失效
标题翻译：微图案形成方法
公开(公告)号：US4426247A
公开(公告)日：1984-01-17
申请号：US482613
申请日：1983-04-06
申请人： Toshiaki Tamamura , Saburo Imamura , Masao Morita , Osamu Kogure
发明人： Toshiaki Tamamura , Saburo Imamura , Masao Morita , Osamu Kogure
IPC分类号： G03F7/075 , G03F7/26 , G03F7/36 , G03F7/38 , B44C1/22 , B29C17/08 , C03C15/00 , C03C25/06
CPC分类号： G03F7/265 , G03F7/0757 , G03F7/36 , G03F7/38 , Y10S438/95
摘要： A method for forming a micropattern, comprises the steps of forming an organic polymeric material layer on a substrate, forming a silicone layer on the organic polymeric material layer, selectively irradiating a surface of the silicone layer with a high-energy beam, exposing the surface of the silicone layer to a radical addition polymerizable monomer gas so as to form a graft polymer film on an irradiated portion of the surface of the silicone layer, performing reactive ion etching using the graft polymer film as a mask so as to form a silicone pattern, and performing reactive ion etching using the silicone pattern as a mask so as to form an organic polymeric material pattern. The method allows formation of a resist pattern with a high precision and a high aspect ratio.
摘要翻译：一种用于形成微图案的方法，包括以下步骤：在基底上形成有机聚合材料层，在有机聚合材料层上形成硅树脂层，用高能束选择性地照射硅树脂层的表面，以在硅氧烷层的表面的照射部分上形成接枝聚合物膜，使用接枝聚合物膜作为掩模进行反应离子蚀刻，以形成硅氧烷图案，并使用硅氧烷图案作为掩模进行反应离子蚀刻，以形成有机聚合材料图案。该方法允许以高精度和高纵横比形成抗蚀剂图案。

9. 发明授权

US07092593B2 Microactuator device and optical switching system using the same 有权
标题翻译：微致动器装置和使用其的光开关系统
公开(公告)号：US07092593B2
公开(公告)日：2006-08-15
申请号：US11099253
申请日：2005-04-04
申请人： Keiichi Akagawa , Yoshihiko Suzuki , Katsuhiko Kurumada , Toshiaki Tamamura , Masatoshi Kanaya
发明人： Keiichi Akagawa , Yoshihiko Suzuki , Katsuhiko Kurumada , Toshiaki Tamamura , Masatoshi Kanaya
IPC分类号： G02B6/26
CPC分类号： G02B6/358 , G02B6/3516 , G02B6/3546 , G02B6/357 , G02B6/3572 , G02B6/3584 , G02B26/0858 , H02K33/18 , H02K41/0354
摘要： A movable plate is fastened to a substrate via flexure parts and can move upward and downward with respect to the substrate. The substrate serves as a fixed electrode. The movable plate has second electrode parts which generate an electrostatic force between these electrode parts and the substrate by virtue of a voltage that is applied across these electrode parts and the substrate and a current path which is disposed in a magnetic field, and which generates a Lorentz force when powered. A mirror advances into and withdraws from the optical path. When the movable plate moves from the lower position in which the electrostatic force is increased to the upper position, the control part controls the current so that the Lorentz force is generated in a downward orientation and gradually decreases while the movable plate moves from an intermediate position to the upper position.
摘要翻译：可移动板通过弯曲部件固定到基板上，并可相对于基板上下移动。基板用作固定电极。可移动板具有第二电极部分，其通过施加在这些电极部分和基板上的电压和设置在磁场中的电流路径而在这些电极部分和基板之间产生静电力，并且产生动力时洛伦兹力。镜子进入和退出光路。当可动板从静电力增加的下部位置移动到上部位置时，控制部分控制电流，使得洛伦兹力在向下取向上产生并且当可动板从中间位置移动时逐渐减小到上位。

10. 发明授权

US07006722B2 Waveguide type optical device and position detecting method 失效
标题翻译：波导型光学装置及位置检测方法
公开(公告)号：US07006722B2
公开(公告)日：2006-02-28
申请号：US10509012
申请日：2003-03-28
申请人： Katsuhiko Kurumada , Toshiaki Tamamura , Masatoshi Kanaya , Shigendo Nishi , Keiichi Akagawa
发明人： Katsuhiko Kurumada , Toshiaki Tamamura , Masatoshi Kanaya , Shigendo Nishi , Keiichi Akagawa
IPC分类号： G02B6/26
CPC分类号： G01D5/35345 , G01D5/342
摘要： A waveguide type optical device performs such monitoring as detection of a relative position of an insert plate to a groove. The waveguide type optical device comprises a groove disposed at an intersection position of a first optical waveguide and a second optical waveguide; an insert plate disposed to be insertable into the groove; means for applying a static magnetic field such that a vector product of a velocity vector (A) of the insert plate and its magnetic field vector (B) is nonzero; a cantilever that has electrical wiring including therein a wiring part lying in a direction perpendicular to both the velocity vector and the magnetic field vector and that supports the insert plate; and means for detecting a relative position of the insert plate to the groove by detecting a current induced in the electrical wiring.
摘要翻译：波导型光学器件执行诸如检测插入板相对于凹槽的相对位置的监视。波导型光学器件包括设置在第一光波导和第二光波导的交叉位置处的槽; 插入板，其设置成可插入到所述凹槽中; 用于施加静态磁场的装置，使得插入板的速度矢量（A）和其磁场矢量（B）的矢量积不为零; 具有电线的悬臂，其中包括布置部分，所述布线部分位于垂直于所述速度矢量和所述磁场矢量的方向上并且支撑所述插入板; 以及用于通过检测在所述电线中感应出的电流来检测所述插入板到所述凹槽的相对位置的装置。

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