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    • 7. 发明申请
    • SLIT VALVE CONTROL
    • 滑阀控制
    • US20100051111A1
    • 2010-03-04
    • US12538237
    • 2009-08-10
    • Takayuki MatsumotoShinichi Kurita
    • Takayuki MatsumotoShinichi Kurita
    • F15D1/00F16K3/00
    • F16K3/188F16K51/02H01L21/67772Y10T137/0391
    • Embodiments disclosed herein generally relate to methods for sealing a processing chamber with a slit valve door. The door initially raises from a position below the opening for the processing chamber to a raised position. The door then expands until an O-ring that is on the door just touches the sealing surface. Then, the door expands again to compress the O-ring against the sealing surface. The door expands by flowing a gas into the interior volume of the door. By controlling the pressure buildup within the door, the speed with which the door expands is controlled to ensure that the door gently contacts the sealing surface and then compresses against the sealing surface. Thus, the door may be prevented from contacting the sealing surface with too great a force that may jolt or shake the processing chamber and produce undesired particles that may contaminate the process.
    • 本文公开的实施例通常涉及用狭缝阀门密封处理室的方法。 门最初从处理室的开口下方的位置升高到升高位置。 门然后膨胀,直到门上的O形圈刚好碰到密封面。 然后,门再次膨胀以将O形环压靠在密封表面上。 通过将气体流入门的内部空间来扩大门。 通过控制门内的压力积分,控制门膨胀的速度,以确保门轻轻地接触密封表面,然后压靠密封表面。 因此,可以防止门用太大的力使密封表面接触,该力可能使处理室震动或摇晃并产生可能污染该过程的不期望的颗粒。